HK1224024A1 - 曝光裝置和器件製造方法 - Google Patents

曝光裝置和器件製造方法

Info

Publication number
HK1224024A1
HK1224024A1 HK16112343.1A HK16112343A HK1224024A1 HK 1224024 A1 HK1224024 A1 HK 1224024A1 HK 16112343 A HK16112343 A HK 16112343A HK 1224024 A1 HK1224024 A1 HK 1224024A1
Authority
HK
Hong Kong
Prior art keywords
exposure apparatus
device manufacturing
manufacturing
exposure
Prior art date
Application number
HK16112343.1A
Other languages
English (en)
Inventor
Yasushi Yoda
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1224024A1 publication Critical patent/HK1224024A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Microscoopes, Condenser (AREA)
  • Length Measuring Devices By Optical Means (AREA)
HK16112343.1A 2012-11-12 2016-10-27 曝光裝置和器件製造方法 HK1224024A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012248374 2012-11-12
US13/727,229 US9772564B2 (en) 2012-11-12 2012-12-26 Exposure apparatus and exposure method, and device manufacturing method

Publications (1)

Publication Number Publication Date
HK1224024A1 true HK1224024A1 (zh) 2017-08-11

Family

ID=50681426

Family Applications (2)

Application Number Title Priority Date Filing Date
HK16101639.7A HK1213642A1 (zh) 2012-11-12 2016-02-16 曝光裝置及曝光方法、以及元件製造方法
HK16112343.1A HK1224024A1 (zh) 2012-11-12 2016-10-27 曝光裝置和器件製造方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK16101639.7A HK1213642A1 (zh) 2012-11-12 2016-02-16 曝光裝置及曝光方法、以及元件製造方法

Country Status (7)

Country Link
US (2) US9772564B2 (zh)
EP (2) EP2917784A1 (zh)
JP (2) JP6423797B2 (zh)
CN (2) CN108919609A (zh)
HK (2) HK1213642A1 (zh)
TW (3) TWI624734B (zh)
WO (1) WO2014073120A1 (zh)

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Also Published As

Publication number Publication date
TWI624734B (zh) 2018-05-21
EP2917784A1 (en) 2015-09-16
US20140132940A1 (en) 2014-05-15
EP3029525A1 (en) 2016-06-08
JP6423797B2 (ja) 2018-11-14
TW201418896A (zh) 2014-05-16
HK1213642A1 (zh) 2016-07-08
CN108919609A (zh) 2018-11-30
JP2019008311A (ja) 2019-01-17
TWI628519B (zh) 2018-07-01
TW201734672A (zh) 2017-10-01
CN104919371A (zh) 2015-09-16
US9772564B2 (en) 2017-09-26
US20170371249A1 (en) 2017-12-28
JP2015535615A (ja) 2015-12-14
WO2014073120A1 (en) 2014-05-15
TW201832018A (zh) 2018-09-01
CN104919371B (zh) 2018-07-31

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