HK1135477A1 - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
HK1135477A1
HK1135477A1 HK09111807.1A HK09111807A HK1135477A1 HK 1135477 A1 HK1135477 A1 HK 1135477A1 HK 09111807 A HK09111807 A HK 09111807A HK 1135477 A1 HK1135477 A1 HK 1135477A1
Authority
HK
Hong Kong
Prior art keywords
exposure apparatus
exposure
Prior art date
Application number
HK09111807.1A
Other languages
English (en)
Inventor
Hans Opower
Original Assignee
Kleo Maschb Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kleo Maschb Ag filed Critical Kleo Maschb Ag
Publication of HK1135477A1 publication Critical patent/HK1135477A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/123—Multibeam scanners, e.g. using multiple light sources or beam splitters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
HK09111807.1A 2006-12-11 2009-12-16 Exposure apparatus HK1135477A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006059818.0A DE102006059818B4 (de) 2006-12-11 2006-12-11 Belichtungsanlage
PCT/EP2007/010648 WO2008071347A2 (fr) 2006-12-11 2007-12-07 Installation d'éclairage

Publications (1)

Publication Number Publication Date
HK1135477A1 true HK1135477A1 (en) 2010-06-04

Family

ID=39399802

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09111807.1A HK1135477A1 (en) 2006-12-11 2009-12-16 Exposure apparatus

Country Status (7)

Country Link
US (1) US8314921B2 (fr)
EP (1) EP2054772B1 (fr)
JP (1) JP5001379B2 (fr)
CN (1) CN101558360B (fr)
DE (1) DE102006059818B4 (fr)
HK (1) HK1135477A1 (fr)
WO (1) WO2008071347A2 (fr)

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JP5351272B2 (ja) 2008-09-22 2013-11-27 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
DE102009032210B4 (de) 2009-07-03 2011-06-09 Kleo Ag Bearbeitungsanlage
DE102009046809B4 (de) * 2009-11-18 2019-11-21 Kleo Ag Belichtungsanlage
TWI448830B (zh) 2010-02-09 2014-08-11 Asml Netherlands Bv 微影裝置及元件製造方法
WO2011104180A1 (fr) 2010-02-23 2011-09-01 Asml Netherlands B.V. Appareil de lithographie et procédé de fabrication d'un dispositif
EP2539771B1 (fr) 2010-02-25 2017-02-01 ASML Netherlands BV Appareil lithographique et méthode de fabrication d'un dispositif
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WO2012076300A1 (fr) 2010-12-08 2012-06-14 Asml Netherlands B.V. Appareil lithographique et procédé de fabrication de dispositif
NL2008329A (en) 2011-03-29 2012-10-02 Asml Netherlands Bv Lithographic apparatus, method for measuring radiation beam spot position, device manufacturing method, and radiation detector system for a lithographic apparatus.
US9645502B2 (en) 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
US9513561B2 (en) 2011-04-21 2016-12-06 Asml Netherlands B.V. Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
WO2013023876A1 (fr) 2011-08-18 2013-02-21 Asml Netherlands B.V. Appareil lithographique et procédé de fabrication de dispositif
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5815887B2 (ja) 2011-11-29 2015-11-17 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、デバイス製造方法およびコンピュータプログラム
US10346729B2 (en) 2011-11-29 2019-07-09 Asml Netherlands B.V. Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
US9341960B2 (en) 2011-12-05 2016-05-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101607176B1 (ko) 2011-12-06 2016-03-29 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 세트포인트 데이터를 제공하는 장치, 디바이스 제조 방법, 세트포인트 데이터를 계산하는 방법, 및 컴퓨터 프로그램
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9354502B2 (en) 2012-01-12 2016-05-31 Asml Netherlands B.V. Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
KR101633761B1 (ko) 2012-01-17 2016-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
JP6042457B2 (ja) 2012-02-23 2016-12-14 エーエスエムエル ネザーランズ ビー．ブイ． デバイス、露光装置および放射誘導方法
DE102012108211A1 (de) 2012-09-04 2014-03-06 Kleo Halbleitertechnik Gmbh Belichtungsanlage
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
DE102013222913A1 (de) * 2013-11-11 2015-05-13 Carl Zeiss Ag Belichtungsanlage
JP6308523B2 (ja) * 2014-03-11 2018-04-11 株式会社ブイ・テクノロジー ビーム露光装置
US10114289B2 (en) 2014-04-15 2018-10-30 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Exposure head, exposure apparatus and method of operating an exposure head
CN107003616B (zh) 2014-11-27 2021-11-30 卡尔蔡司Smt有限责任公司 包含多个单独可控的写入头的光刻设备
DE102016122353A1 (de) 2016-11-21 2018-05-24 Manz Ag Bearbeitungsanlage
TWI620038B (zh) 2017-01-11 2018-04-01 財團法人工業技術研究院 曝光方法和系統以及雷射直接成像系統
DE102017102320A1 (de) 2017-02-07 2018-08-09 Manz Ag Bearbeitungsanlage
DE102017103624A1 (de) 2017-02-22 2018-08-23 Manz Ag Belichtungsanlage

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Also Published As

Publication number Publication date
US8314921B2 (en) 2012-11-20
DE102006059818B4 (de) 2017-09-14
JP5001379B2 (ja) 2012-08-15
EP2054772A2 (fr) 2009-05-06
CN101558360B (zh) 2012-03-28
WO2008071347A3 (fr) 2008-07-31
JP2010512549A (ja) 2010-04-22
WO2008071347A2 (fr) 2008-06-19
EP2054772B1 (fr) 2014-03-12
CN101558360A (zh) 2009-10-14
DE102006059818A1 (de) 2008-06-19
US20090296063A1 (en) 2009-12-03

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Effective date: 20211207