HK1134145A1 - Pellicle and method of manufacturing same - Google Patents

Pellicle and method of manufacturing same

Info

Publication number
HK1134145A1
HK1134145A1 HK10101481.2A HK10101481A HK1134145A1 HK 1134145 A1 HK1134145 A1 HK 1134145A1 HK 10101481 A HK10101481 A HK 10101481A HK 1134145 A1 HK1134145 A1 HK 1134145A1
Authority
HK
Hong Kong
Prior art keywords
pellicle
manufacturing same
manufacturing
same
Prior art date
Application number
HK10101481.2A
Other languages
English (en)
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1134145A1 publication Critical patent/HK1134145A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK10101481.2A 2008-05-22 2010-02-10 Pellicle and method of manufacturing same HK1134145A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008134261A JP4934099B2 (ja) 2008-05-22 2008-05-22 ペリクルおよびペリクルの製造方法

Publications (1)

Publication Number Publication Date
HK1134145A1 true HK1134145A1 (en) 2010-04-16

Family

ID=41010286

Family Applications (1)

Application Number Title Priority Date Filing Date
HK10101481.2A HK1134145A1 (en) 2008-05-22 2010-02-10 Pellicle and method of manufacturing same

Country Status (7)

Country Link
US (1) US7919217B2 (xx)
EP (1) EP2124102B1 (xx)
JP (1) JP4934099B2 (xx)
KR (1) KR101512198B1 (xx)
CN (1) CN101587294B (xx)
HK (1) HK1134145A1 (xx)
TW (1) TWI388924B (xx)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2051139B1 (en) * 2007-10-18 2010-11-24 Shin-Etsu Chemical Co., Ltd. Pellicle and method for manufacturing the same
JP4928494B2 (ja) * 2008-05-02 2012-05-09 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
JP5394808B2 (ja) * 2009-04-22 2014-01-22 信越化学工業株式会社 リソグラフィ用ペリクルおよびその製造方法
KR101572269B1 (ko) * 2009-09-14 2015-12-04 에스케이하이닉스 주식회사 극자외선 마스크를 보호하는 펠리클 제조 방법
JP2012151158A (ja) * 2011-01-17 2012-08-09 Shin Etsu Chem Co Ltd Ｅｕｖ用ペリクル膜及びペリクル、並びに該膜の製造方法
WO2013152921A1 (en) * 2012-04-12 2013-10-17 Asml Netherlands B.V. Pellicle, reticle assembly and lithographic apparatus
US9182686B2 (en) 2013-06-13 2015-11-10 Globalfoundries U.S. 2 Llc Extreme ultraviolet radiation (EUV) pellicle formation apparatus
US9057957B2 (en) 2013-06-13 2015-06-16 International Business Machines Corporation Extreme ultraviolet (EUV) radiation pellicle formation method
JP6261004B2 (ja) * 2014-01-20 2018-01-17 信越化学工業株式会社 Ｅｕｖ用ペリクルとこれを用いたｅｕｖ用アセンブリーおよびその組立方法
US9606459B2 (en) 2014-01-27 2017-03-28 Luxel Corporation Monolithic EUV transparent membrane and support mesh and method of manufacturing same
JP6308592B2 (ja) * 2014-04-02 2018-04-11 信越化学工業株式会社 Ｅｕｖ用ペリクル
KR101680937B1 (ko) 2014-04-17 2016-11-30 한양대학교 산학협력단 Euv 리소그래피용 펠리클 및 그 제조방법
US9958770B2 (en) 2014-04-17 2018-05-01 Industry-University Cooperation Foundation Hanyang University Pellicle for EUV lithography
WO2015174412A1 (ja) * 2014-05-16 2015-11-19 三井化学株式会社 ペリクル枠、ペリクル、枠部材、露光原版、露光装置、及び半導体装置の製造方法
KR102233579B1 (ko) 2014-08-12 2021-03-30 삼성전자주식회사 극자외선 리소그래피용 펠리클
SG11201701805QA (en) * 2014-09-19 2017-04-27 Mitsui Chemicals Inc Pellicle, production method thereof, exposure method
CN106796391B (zh) 2014-09-19 2020-02-11 三井化学株式会社 防护膜组件、防护膜组件的制造方法及使用了防护膜组件的曝光方法
KR102251999B1 (ko) * 2015-01-09 2021-05-17 삼성전자주식회사 펠리클 및 이의 제조 방법
JP2016206171A (ja) * 2015-04-21 2016-12-08 レーザーテック株式会社 パターンの検査方法、マスクの検査方法、パターンの検査装置、マスクの検査装置、及びマスク
JP6830097B2 (ja) * 2015-09-02 2021-02-17 エーエスエムエル ネザーランズ ビー．ブイ． 膜アセンブリを製造する方法
JP2017083791A (ja) * 2015-10-30 2017-05-18 三井化学株式会社 ペリクル、ペリクルの製造方法及びペリクルを用いた露光方法
CN105188168B (zh) * 2015-10-30 2018-03-02 淮安亮谷光电科技有限公司 一种基于红外线高反辐射节能卤素加热管的制备方法
KR20230023066A (ko) * 2016-04-25 2023-02-16 에이에스엠엘 네델란즈 비.브이. Euv 리소그래피를 위한 멤브레인
KR102649129B1 (ko) 2016-11-16 2024-03-19 삼성전자주식회사 반도체 장치의 제조 방법
JP6518801B2 (ja) * 2017-03-10 2019-05-22 エスアンドエス テック カンパニー リミテッド 極紫外線リソグラフィ用ペリクル及びその製造方法
KR101940791B1 (ko) * 2017-05-19 2019-01-21 주식회사 에프에스티 유기물 희생층 기판을 이용한 초극자외선용 펠리클의 제조방법
KR102008057B1 (ko) 2017-06-08 2019-08-06 주식회사 에프에스티 펠리클 제조방법
US11947256B2 (en) * 2017-08-03 2024-04-02 Asml Netherlands B.V. Simultaneous double-side coating of multilayer graphene pellicle by local thermal processing
KR101900720B1 (ko) 2017-11-10 2018-09-20 주식회사 에스앤에스텍 극자외선 리소그래피용 펠리클 및 그의 제조방법
US11056371B2 (en) * 2018-08-14 2021-07-06 Taiwan Semiconductor Manufacturing Co., Ltd. Tool and method for cleaning electrostatic chuck
KR20200088528A (ko) 2019-01-14 2020-07-23 주식회사 에프에스티 펠리클 장착 시스템, 스터드 부착 장치, 펠리클 부착 장치 및 펠리클 부착 방법
KR102207851B1 (ko) 2019-03-12 2021-01-26 주식회사 에프에스티 미세 금속 마스크 및 이를 이용한 초극자외선 리소그라피용 펠리클의 제조방법
KR102301568B1 (ko) 2019-09-10 2021-09-14 주식회사 에프에스티 탄화규소 층을 포함하는 극자외선용 펠리클의 제조방법
KR102282273B1 (ko) 2020-01-17 2021-07-27 주식회사 에프에스티 극자외선 리소그래피용 펠리클의 제조방법
CN111223095B (zh) * 2020-03-13 2024-03-12 中冶长天国际工程有限责任公司 一种烧结机的台车箅条间距检测方法及系统
KR102482649B1 (ko) 2020-07-09 2022-12-29 (주)에프에스티 극자외선 리소그라피용 펠리클의 제조방법
KR102514745B1 (ko) 2020-10-07 2023-03-29 주식회사 에프에스티 극자외선 리소그라피용 펠리클 및 그 제조방법
KR102530226B1 (ko) 2020-10-28 2023-05-09 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법
KR102546968B1 (ko) 2020-11-19 2023-06-23 주식회사 에프에스티 극자외선 리소그라피용 펠리클의 제조방법
KR102668456B1 (ko) 2020-12-07 2024-05-23 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임
KR102512243B1 (ko) 2020-12-16 2023-03-21 주식회사 에프에스티 극자외선 리소그라피용 다공성 펠리클 프레임
KR102349295B1 (ko) 2021-02-02 2022-01-10 주식회사 에프에스티 카르빈(carbyne) 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법
KR102581084B1 (ko) 2021-02-04 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임
KR102482650B1 (ko) 2021-02-25 2022-12-29 (주)에프에스티 질화 붕소 나노 구조 층을 포함하는 극자외선 리소그라피용 펠리클 막 및 그 제조방법
KR102581086B1 (ko) 2021-03-16 2023-09-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 막
KR20220141378A (ko) * 2021-04-12 2022-10-20 한국전자기술연구원 이트륨계 기반의 극자외선 노광용 펠리클
KR102624936B1 (ko) 2021-05-21 2024-01-15 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 극자외선 리소그라피용 펠리클 프레임용 실링재
KR102662986B1 (ko) 2021-07-06 2024-05-07 주식회사 에프에스티 극자외선 리소그라피용 펠리클의 제조방법
KR20230039294A (ko) 2021-09-14 2023-03-21 주식회사 에프에스티 극자외선 리소그라피용 펠리클 프레임 및 그 제조방법
KR20230069757A (ko) 2021-11-12 2023-05-19 주식회사 에프에스티 다성분계 실리콘 화합물 층을 포함하는 극자외선 리소그래피용 펠리클 막
KR20230073539A (ko) 2021-11-19 2023-05-26 주식회사 에프에스티 극자외선 리소그라피용 펠리클의 제조방법
KR20230125966A (ko) 2022-02-22 2023-08-29 주식회사 에프에스티 극자외선 리소그라피용 펠리클의 제조방법
KR20230174998A (ko) 2022-06-22 2023-12-29 주식회사 에프에스티 극자외선 리소그라피용 펠리클의 제조방법
KR20240061059A (ko) 2022-10-31 2024-05-08 주식회사 에프에스티 필터를 구비한 펠리클 프레임 및 그 제조방법
KR20240078781A (ko) 2022-11-28 2024-06-04 주식회사 에프에스티 극자외선 리소그라피용 펠리클

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Also Published As

Publication number Publication date
US20090291372A1 (en) 2009-11-26
JP2009282298A (ja) 2009-12-03
JP4934099B2 (ja) 2012-05-16
KR20090122114A (ko) 2009-11-26
CN101587294B (zh) 2012-09-19
EP2124102B1 (en) 2013-12-04
EP2124102A3 (en) 2012-07-04
TWI388924B (zh) 2013-03-11
EP2124102A2 (en) 2009-11-25
US7919217B2 (en) 2011-04-05
KR101512198B1 (ko) 2015-04-14
TW200949432A (en) 2009-12-01
CN101587294A (zh) 2009-11-25

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Effective date: 20210525