HK1133090A1 - Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method - Google Patents

Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method

Info

Publication number
HK1133090A1
HK1133090A1 HK09111097.0A HK09111097A HK1133090A1 HK 1133090 A1 HK1133090 A1 HK 1133090A1 HK 09111097 A HK09111097 A HK 09111097A HK 1133090 A1 HK1133090 A1 HK 1133090A1
Authority
HK
Hong Kong
Prior art keywords
immersion
exposure apparatus
recovery system
liquid recovery
device fabricating
Prior art date
Application number
HK09111097.0A
Other languages
English (en)
Inventor
Hiroyuki Nagasaka
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1133090A1 publication Critical patent/HK1133090A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
HK09111097.0A 2007-01-23 2009-11-27 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method HK1133090A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US88182607P 2007-01-23 2007-01-23
US12/010,162 US8004651B2 (en) 2007-01-23 2008-01-22 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
PCT/JP2008/051328 WO2008091014A2 (en) 2007-01-23 2008-01-23 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method

Publications (1)

Publication Number Publication Date
HK1133090A1 true HK1133090A1 (en) 2010-03-12

Family

ID=39640853

Family Applications (2)

Application Number Title Priority Date Filing Date
HK09111097.0A HK1133090A1 (en) 2007-01-23 2009-11-27 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
HK19101855.1A HK1259450A1 (zh) 2007-01-23 2019-02-01 液體回收系統、浸入式曝光裝置、浸入式曝光方法和設備製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK19101855.1A HK1259450A1 (zh) 2007-01-23 2019-02-01 液體回收系統、浸入式曝光裝置、浸入式曝光方法和設備製造方法

Country Status (8)

Country Link
US (2) US8004651B2 (xx)
EP (3) EP3407137A1 (xx)
JP (7) JP5136080B2 (xx)
KR (5) KR101644479B1 (xx)
CN (1) CN101589341B (xx)
HK (2) HK1133090A1 (xx)
TW (4) TWI567506B (xx)
WO (1) WO2008091014A2 (xx)

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Also Published As

Publication number Publication date
JP2012209592A (ja) 2012-10-25
EP2653924B1 (en) 2018-03-28
KR20150041162A (ko) 2015-04-15
KR101496478B1 (ko) 2015-02-26
EP3407137A1 (en) 2018-11-28
TW200846837A (en) 2008-12-01
KR20090126239A (ko) 2009-12-08
JP2016095528A (ja) 2016-05-26
JP2015035628A (ja) 2015-02-19
JP5136080B2 (ja) 2013-02-06
JP2013070074A (ja) 2013-04-18
JP2008182241A (ja) 2008-08-07
EP2653924A2 (en) 2013-10-23
WO2008091014A3 (en) 2008-11-27
US20120013860A1 (en) 2012-01-19
KR20140099523A (ko) 2014-08-12
TWI468872B (zh) 2015-01-11
TW201704897A (zh) 2017-02-01
US8004651B2 (en) 2011-08-23
JP5338938B2 (ja) 2013-11-13
KR101644479B1 (ko) 2016-08-01
KR20160093092A (ko) 2016-08-05
CN101589341A (zh) 2009-11-25
TWI610147B (zh) 2018-01-01
KR101563447B1 (ko) 2015-10-26
CN101589341B (zh) 2011-08-24
JP6048598B2 (ja) 2016-12-21
WO2008091014A2 (en) 2008-07-31
KR20180074815A (ko) 2018-07-03
US8891059B2 (en) 2014-11-18
US20080174748A1 (en) 2008-07-24
TWI567506B (zh) 2017-01-21
EP2106574B1 (en) 2013-10-16
JP2013239741A (ja) 2013-11-28
EP2653924A3 (en) 2014-07-30
JP5136715B2 (ja) 2013-02-06
HK1259450A1 (zh) 2019-11-29
JP2012142605A (ja) 2012-07-26
TW201441772A (zh) 2014-11-01
JP5867569B2 (ja) 2016-02-24
TW201804263A (zh) 2018-02-01
JP5263441B2 (ja) 2013-08-14
EP2106574A2 (en) 2009-10-07
KR101873344B1 (ko) 2018-07-03

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