HK1126309A1 - Method of manufacturing superconducting thin film material, superconducting device and superconducting thin film material - Google Patents

Method of manufacturing superconducting thin film material, superconducting device and superconducting thin film material

Info

Publication number
HK1126309A1
HK1126309A1 HK09104507.9A HK09104507A HK1126309A1 HK 1126309 A1 HK1126309 A1 HK 1126309A1 HK 09104507 A HK09104507 A HK 09104507A HK 1126309 A1 HK1126309 A1 HK 1126309A1
Authority
HK
Hong Kong
Prior art keywords
thin film
film material
superconducting
superconducting thin
manufacturing
Prior art date
Application number
HK09104507.9A
Other languages
English (en)
Inventor
Shuji Hahakura
Kazuya Ohmatsu
Munetsugu Ueyama
Katsuya Hasegawa
Original Assignee
Sumitomo Electric Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries filed Critical Sumitomo Electric Industries
Publication of HK1126309A1 publication Critical patent/HK1126309A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/02—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
    • H01B12/06—Films or wires on bases or cores
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F6/00—Superconducting magnets; Superconducting coils
    • H01F6/06—Coils, e.g. winding, insulating, terminating or casing arrangements therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/20—Permanent superconducting devices
    • H10N60/203—Permanent superconducting devices comprising high-Tc ceramic materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Power Engineering (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
HK09104507.9A 2006-02-16 2009-05-18 Method of manufacturing superconducting thin film material, superconducting device and superconducting thin film material HK1126309A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006039396 2006-02-16
PCT/JP2007/050593 WO2007094147A1 (ja) 2006-02-16 2007-01-17 超電導薄膜材料の製造方法、超電導機器、および超電導薄膜材料

Publications (1)

Publication Number Publication Date
HK1126309A1 true HK1126309A1 (en) 2009-08-28

Family

ID=38371335

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09104507.9A HK1126309A1 (en) 2006-02-16 2009-05-18 Method of manufacturing superconducting thin film material, superconducting device and superconducting thin film material

Country Status (12)

Country Link
US (1) US20090149330A1 (xx)
EP (1) EP1990810A4 (xx)
JP (1) JPWO2007094147A1 (xx)
KR (1) KR20080096828A (xx)
CN (1) CN101385097B (xx)
AU (1) AU2007216116A1 (xx)
CA (1) CA2642015A1 (xx)
HK (1) HK1126309A1 (xx)
NO (1) NO20083914L (xx)
RU (1) RU2008137079A (xx)
TW (1) TW200735129A (xx)
WO (1) WO2007094147A1 (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5838596B2 (ja) 2011-05-30 2016-01-06 住友電気工業株式会社 超電導薄膜材料およびその製造方法
JP5889072B2 (ja) * 2012-03-23 2016-03-22 古河電気工業株式会社 超電導線用基材の製造方法及び超電導線の製造方法
RU2580213C1 (ru) * 2015-02-02 2016-04-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Омский государственный университет им. Ф.М. Достоевского" Способ формирования сверхпроводящей тонкой пленки с локальными областями переменной толщины
CN111969102B (zh) * 2020-09-11 2023-10-27 中国科学院紫金山天文台 一种改善超导钛-铌薄膜接触电极的制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2822447B2 (ja) * 1989-05-19 1998-11-11 住友電気工業株式会社 酸化物超電導線材の製造方法および装置
JPH0428871A (ja) * 1990-05-24 1992-01-31 Seiko Instr Inc 多層膜製造装置
JPH0567515A (ja) * 1991-09-06 1993-03-19 Chodendo Hatsuden Kanren Kiki Zairyo Gijutsu Kenkyu Kumiai 酸化物超電導コイルの製造方法
JP2829221B2 (ja) * 1993-06-30 1998-11-25 財団法人国際超電導産業技術研究センター 熱プラズマ蒸発法による金属基板上への酸化物の成膜方法
JP2963901B1 (ja) * 1998-10-16 1999-10-18 株式会社東芝 超電導薄膜の製造方法
EP1271666A3 (en) * 2001-06-22 2006-01-25 Fujikura Ltd. Oxide superconductor layer and its production method
JP3771143B2 (ja) * 2001-06-22 2006-04-26 株式会社フジクラ 酸化物超電導導体の製造方法
JP3822077B2 (ja) * 2001-09-18 2006-09-13 株式会社フジクラ 酸化物超電導体テープ線材の製造方法と酸化物超電導体テープ線材
CN1464570A (zh) * 2002-06-14 2003-12-31 中国科学院物理研究所 制备大面积高温超导厚膜的方法和专用设备
JP3854551B2 (ja) * 2002-08-06 2006-12-06 財団法人国際超電導産業技術研究センター 酸化物超電導線材
JP2004263227A (ja) * 2003-02-28 2004-09-24 Fujikura Ltd 薄膜の形成方法及び形成装置
US20050005846A1 (en) 2003-06-23 2005-01-13 Venkat Selvamanickam High throughput continuous pulsed laser deposition process and apparatus
JP4626134B2 (ja) * 2003-09-17 2011-02-02 住友電気工業株式会社 超電導体およびその製造方法
JP4619697B2 (ja) * 2004-03-11 2011-01-26 株式会社フジクラ 酸化物超電導導体とその製造方法
US7736438B2 (en) * 2005-06-01 2010-06-15 Los Alamos National Security, Llc Method and apparatus for depositing a coating on a tape carrier

Also Published As

Publication number Publication date
AU2007216116A1 (en) 2007-08-23
US20090149330A1 (en) 2009-06-11
CN101385097A (zh) 2009-03-11
EP1990810A4 (en) 2012-08-29
JPWO2007094147A1 (ja) 2009-07-02
WO2007094147A1 (ja) 2007-08-23
CN101385097B (zh) 2011-05-11
EP1990810A1 (en) 2008-11-12
TW200735129A (en) 2007-09-16
CA2642015A1 (en) 2007-08-23
KR20080096828A (ko) 2008-11-03
RU2008137079A (ru) 2010-03-27
NO20083914L (no) 2008-09-12

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20150117