HK1084186A1 - Optical element holding device, lens barrel, exposing device, and device producing method - Google Patents

Optical element holding device, lens barrel, exposing device, and device producing method

Info

Publication number
HK1084186A1
HK1084186A1 HK06106029.6A HK06106029A HK1084186A1 HK 1084186 A1 HK1084186 A1 HK 1084186A1 HK 06106029 A HK06106029 A HK 06106029A HK 1084186 A1 HK1084186 A1 HK 1084186A1
Authority
HK
Hong Kong
Prior art keywords
optical element
element holding
lens barrel
producing method
exposing
Prior art date
Application number
HK06106029.6A
Other languages
English (en)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=33508740&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1084186(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1084186A1 publication Critical patent/HK1084186A1/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825Mounting of individual elements, e.g. mounts, holders or supports
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Lens Barrels (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Eyeglasses (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
HK06106029.6A 2003-06-06 2006-05-25 Optical element holding device, lens barrel, exposing device, and device producing method HK1084186A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003163023 2003-06-06
PCT/JP2004/007947 WO2004109357A1 (ja) 2003-06-06 2004-06-07 光学素子保持装置、鏡筒、露光装置、及びデバイスの製造方法

Publications (1)

Publication Number Publication Date
HK1084186A1 true HK1084186A1 (en) 2006-07-21

Family

ID=33508740

Family Applications (1)

Application Number Title Priority Date Filing Date
HK06106029.6A HK1084186A1 (en) 2003-06-06 2006-05-25 Optical element holding device, lens barrel, exposing device, and device producing method

Country Status (9)

Country Link
US (2) US20060139775A1 (ko)
EP (1) EP1632799B2 (ko)
JP (1) JP4665759B2 (ko)
KR (1) KR101281357B1 (ko)
CN (1) CN100576003C (ko)
AT (1) ATE449978T1 (ko)
DE (1) DE602004024302D1 (ko)
HK (1) HK1084186A1 (ko)
WO (1) WO2004109357A1 (ko)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004025832A1 (de) * 2004-05-24 2005-12-22 Carl Zeiss Smt Ag Optikmodul für ein Objektiv
JP4654915B2 (ja) * 2003-12-25 2011-03-23 株式会社ニコン 光学素子の保持装置、鏡筒、露光装置、及びデバイスの製造方法
JP4655520B2 (ja) * 2004-06-29 2011-03-23 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法
JP2007147760A (ja) * 2005-11-24 2007-06-14 Fujitsu Ten Ltd レンズ構造および調整治具構造
US7886449B2 (en) * 2007-02-20 2011-02-15 Electro Scientific Industries, Inc. Flexure guide bearing for short stroke stage
JP2008242448A (ja) * 2007-02-28 2008-10-09 Canon Inc 光学要素保持装置
JP5165699B2 (ja) * 2007-02-28 2013-03-21 コーニング インコーポレイテッド 一点の周囲に回動可能な光学マウント
DE102007027200A1 (de) * 2007-06-13 2008-12-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
KR101843699B1 (ko) * 2007-07-18 2018-03-29 가부시키가이샤 니콘 계측 방법, 스테이지 장치, 및 노광 장치
DE102007047109A1 (de) * 2007-10-01 2009-04-09 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
WO2009110963A2 (en) * 2008-02-29 2009-09-11 Corning Incorporated Kinematic optical mount
NL1036701A1 (nl) * 2008-04-15 2009-10-19 Asml Holding Nv Apparatus for supporting an optical element, and method of making same.
US8227768B2 (en) * 2008-06-25 2012-07-24 Axcelis Technologies, Inc. Low-inertia multi-axis multi-directional mechanically scanned ion implantation system
DE102009044957A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element
CN101770063B (zh) * 2009-01-07 2011-07-27 鸿富锦精密工业(深圳)有限公司 调焦模组制造方法
TWI425291B (zh) * 2009-01-16 2014-02-01 Hon Hai Prec Ind Co Ltd 調焦模組及調焦模組的製造方法
DE102009005954B4 (de) * 2009-01-20 2010-10-21 Carl Zeiss Smt Ag Dämpfungsvorrichtung
JP2010271457A (ja) * 2009-05-20 2010-12-02 Canon Inc 光学素子位置調整機構、光学素子位置調整機構を備えた露光装置及び光学素子位置調整方法
DE102009037133B4 (de) * 2009-07-31 2013-01-31 Carl Zeiss Laser Optics Gmbh Haltevorrichtung für ein optisches Element
KR101631958B1 (ko) * 2010-01-14 2016-06-20 엘지전자 주식회사 입력 장치 및 이를 구비하는 이동 단말기
DE102011114123A1 (de) 2010-09-29 2012-04-05 Carl Zeiss Smt Gmbh System zur Ausrichtung eines optischen Elements und Verfahren hierfür
US8941814B2 (en) * 2011-06-20 2015-01-27 Nikon Corporation Multiple-blade holding devices
WO2013094286A1 (ja) * 2011-12-20 2013-06-27 株式会社ニコン 基板処理装置、デバイス製造システム、及びデバイス製造方法
EP2757571B1 (en) * 2013-01-17 2017-09-20 IMS Nanofabrication AG High-voltage insulation device for charged-particle optical apparatus
JP2015023286A (ja) 2013-07-17 2015-02-02 アイエムエス ナノファブリケーション アーゲー 複数のブランキングアレイを有するパターン画定装置
DE102014102220B3 (de) * 2014-02-20 2015-04-30 Jenoptik Optical Systems Gmbh Verfahren zum Herstellen einer Linsenfassung und eine in einem Tubus radial fixierbare Linsenfassung
EP2913838B1 (en) 2014-02-28 2018-09-19 IMS Nanofabrication GmbH Compensation of defective beamlets in a charged-particle multi-beam exposure tool
EP2937889B1 (en) 2014-04-25 2017-02-15 IMS Nanofabrication AG Multi-beam tool for cutting patterns
EP3358599B1 (en) 2014-05-30 2021-01-27 IMS Nanofabrication GmbH Compensation of dose inhomogeneity using row calibration
JP6890373B2 (ja) 2014-07-10 2021-06-18 アイエムエス ナノファブリケーション ゲーエムベーハー 畳み込みカーネルを使用する粒子ビーム描画機における結像偏向の補償
KR20160019809A (ko) * 2014-08-12 2016-02-22 현대모비스 주식회사 레이져 광학계와 이를 구비한 차량용 램프
US9568907B2 (en) 2014-09-05 2017-02-14 Ims Nanofabrication Ag Correction of short-range dislocations in a multi-beam writer
US9214314B1 (en) * 2015-03-10 2015-12-15 Varian Semiconductor Equipment Associates, Inc. Ion beam manipulator
US9653263B2 (en) 2015-03-17 2017-05-16 Ims Nanofabrication Ag Multi-beam writing of pattern areas of relaxed critical dimension
EP3096342B1 (en) 2015-03-18 2017-09-20 IMS Nanofabrication AG Bi-directional double-pass multi-beam writing
US10410831B2 (en) 2015-05-12 2019-09-10 Ims Nanofabrication Gmbh Multi-beam writing using inclined exposure stripes
NL2015170B1 (en) * 2015-07-15 2017-02-01 Suss Microtec Lithography Gmbh Spacer displacement device for a wafer illumination unit and wafer illumination unit.
CN106933060B (zh) * 2015-12-30 2018-10-16 上海微电子装备(集团)股份有限公司 一种棱镜旋转调节机构和光刻机曝光系统及光刻机
US10325756B2 (en) 2016-06-13 2019-06-18 Ims Nanofabrication Gmbh Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer
CN106291866A (zh) * 2016-09-30 2017-01-04 中国科学院长春光学精密机械与物理研究所 一种适合月基力学及温差的反射镜支撑机构
CN106291907B (zh) * 2016-09-30 2018-10-19 中国科学院长春光学精密机械与物理研究所 一种三自由度次镜调整装置
KR20180068228A (ko) 2016-12-13 2018-06-21 삼성전자주식회사 위치 조정 유닛 및 이를 포함하는 마스크리스 노광 장치
US10325757B2 (en) 2017-01-27 2019-06-18 Ims Nanofabrication Gmbh Advanced dose-level quantization of multibeam-writers
US10522329B2 (en) 2017-08-25 2019-12-31 Ims Nanofabrication Gmbh Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus
US11569064B2 (en) 2017-09-18 2023-01-31 Ims Nanofabrication Gmbh Method for irradiating a target using restricted placement grids
US10678018B2 (en) * 2017-10-23 2020-06-09 Magna Electronics Inc. Camera for vehicle vision system with replaceable lens
CN108214952B (zh) * 2017-12-27 2024-05-31 青岛高测科技股份有限公司 一种全自动分布式多晶硅开方方法
US10651010B2 (en) 2018-01-09 2020-05-12 Ims Nanofabrication Gmbh Non-linear dose- and blur-dependent edge placement correction
US10840054B2 (en) 2018-01-30 2020-11-17 Ims Nanofabrication Gmbh Charged-particle source and method for cleaning a charged-particle source using back-sputtering
RU2681668C1 (ru) * 2018-03-07 2019-03-12 Федеральное государственное бюджетное образовательное учреждение высшего образования "Оренбургский государственный университет" Устройство ввода излучения шаровых ламп в световод
DE102018216344A1 (de) * 2018-09-25 2020-03-26 Carl Zeiss Smt Gmbh Abstützung eines optischen elements
US11099482B2 (en) 2019-05-03 2021-08-24 Ims Nanofabrication Gmbh Adapting the duration of exposure slots in multi-beam writers
DE102019207826A1 (de) * 2019-05-28 2020-12-03 Zf Friedrichshafen Ag Segmentierter Schwingungstilger
KR20210132599A (ko) 2020-04-24 2021-11-04 아이엠에스 나노패브릭케이션 게엠베하 대전 입자 소스
EP4095882A1 (en) 2021-05-25 2022-11-30 IMS Nanofabrication GmbH Pattern data processing for programmable direct-write apparatus
DE102022214186A1 (de) * 2022-12-21 2024-06-27 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4559717A (en) 1984-02-21 1985-12-24 The United States Of America As Represented By The Secretary Of Commerce Flexure hinge
US4733945A (en) 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
US5428482A (en) 1991-11-04 1995-06-27 General Signal Corporation Decoupled mount for optical element and stacked annuli assembly
US5383168A (en) * 1993-04-01 1995-01-17 Eastman Kodak Company Actively athermalized optical head assembly
US6341006B1 (en) 1995-04-07 2002-01-22 Nikon Corporation Projection exposure apparatus
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
US6312859B1 (en) 1996-06-20 2001-11-06 Nikon Corporation Projection exposure method with corrections for image displacement
JPH1054932A (ja) 1996-08-08 1998-02-24 Nikon Corp 投影光学装置及びそれを装着した投影露光装置
JPH10270333A (ja) 1997-03-27 1998-10-09 Nikon Corp 露光装置
JPH1114876A (ja) 1997-06-19 1999-01-22 Nikon Corp 光学構造体、その光学構造体を組み込んだ投影露光用光学系及び投影露光装置
JPH11274031A (ja) 1998-03-20 1999-10-08 Canon Inc 露光装置およびデバイス製造方法ならびに位置決め装置
EP1293832A1 (en) * 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
DE19825716A1 (de) * 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
US5986827A (en) 1998-06-17 1999-11-16 The Regents Of The University Of California Precision tip-tilt-piston actuator that provides exact constraint
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
DE19859634A1 (de) * 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
JP2000206389A (ja) * 1999-01-18 2000-07-28 Olympus Optical Co Ltd 光学系位置調整可能な鏡枠
DE19901295A1 (de) 1999-01-15 2000-07-20 Zeiss Carl Fa Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element
DE19905779A1 (de) * 1999-02-12 2000-08-17 Zeiss Carl Fa Vorrichtung zum Kippen eines Gegenstandes um wenigstens eine Achse, insbesondere eines optischen Elementes
DE19908554A1 (de) 1999-02-27 2000-08-31 Zeiss Carl Fa Verstellbare Baugruppe
DE19910947A1 (de) * 1999-03-12 2000-09-14 Zeiss Carl Fa Vorrichtung zum Verschieben eines optischen Elementes entlang der optischen Achse
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
JP2001035773A (ja) 1999-07-19 2001-02-09 Nikon Corp 照明光学装置及び露光装置
US6239924B1 (en) * 1999-08-31 2001-05-29 Nikon Corporation Kinematic lens mounting with distributed support and radial flexure
WO2001022480A1 (fr) 1999-09-20 2001-03-29 Nikon Corporation Mecanisme a attelages paralleles, systeme d'exposition et procede de fabrication, et procede de fabrication de dispositifs
US6257957B1 (en) * 1999-12-01 2001-07-10 Gerber Coburn Optical Inc. Tactile feedback system
WO2001075501A1 (fr) 2000-03-31 2001-10-11 Nikon Corporation Procede et dispositif de soutien d'un element optique, dispositif optique, appareil d'exposition, et procede de fabrication d'un dispositif
JP4945845B2 (ja) * 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
US6400516B1 (en) * 2000-08-10 2002-06-04 Nikon Corporation Kinematic optical mounting
JP4945864B2 (ja) * 2000-08-18 2012-06-06 株式会社ニコン 保持装置、光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
EP1744193A1 (en) * 2000-08-18 2007-01-17 Nikon Corporation Optical element holding device with drive mechanism allowing movement of the element along three coordinate axes
KR20030051619A (ko) 2000-11-10 2003-06-25 가부시키가이샤 니콘 광학장치, 노광장치 및 디바이스 제조방법
JP2002305140A (ja) * 2001-04-06 2002-10-18 Nikon Corp 露光装置及び基板処理システム
US6674584B2 (en) * 2001-07-03 2004-01-06 Pts Corporation Optical surface-mount lens cell
JP2003029116A (ja) * 2001-07-13 2003-01-29 Canon Inc レンズ保持装置、およびレンズ保持装置を組み込んだ投影露光装置
DE60219871T2 (de) * 2001-11-07 2008-01-17 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US7035056B2 (en) * 2001-11-07 2006-04-25 Asml Netherlands B.V. Piezoelectric actuator and a lithographic apparatus and a device manufacturing method
US20030234916A1 (en) * 2002-06-21 2003-12-25 Nikon Corporation Soft supports to reduce deformation of vertically mounted lens or mirror
WO2004086148A1 (de) * 2003-03-26 2004-10-07 Carl Zeiss Smt Ag Vorrichtung zur deformationsarmen austauschbaren lagerung eines optischen elements
US7477842B2 (en) * 2004-03-12 2009-01-13 Siimpel, Inc. Miniature camera
US7604359B2 (en) * 2004-05-04 2009-10-20 Carl Zeiss Smt Ag High positioning reproducible low torque mirror-actuator interface

Also Published As

Publication number Publication date
US20060139775A1 (en) 2006-06-29
EP1632799A1 (en) 2006-03-08
US7764447B2 (en) 2010-07-27
DE602004024302D1 (de) 2010-01-07
CN100576003C (zh) 2009-12-30
JPWO2004109357A1 (ja) 2006-07-20
KR20060021339A (ko) 2006-03-07
EP1632799B1 (en) 2009-11-25
KR101281357B1 (ko) 2013-07-02
EP1632799A4 (en) 2006-07-05
JP4665759B2 (ja) 2011-04-06
US20070279768A1 (en) 2007-12-06
ATE449978T1 (de) 2009-12-15
CN1826547A (zh) 2006-08-30
WO2004109357A1 (ja) 2004-12-16
EP1632799B2 (en) 2013-11-20

Similar Documents

Publication Publication Date Title
HK1084186A1 (en) Optical element holding device, lens barrel, exposing device, and device producing method
DE602004018852D1 (de) Herstellungsverfahren für ein Kameramodul
EP1845710A4 (en) Digital Image Stabilizer
WO2002093257A8 (de) Projektionsbelichtungsanlage der mikrolithographie,
EP1857850A3 (en) Monitoring lens apparatus and monitoring camera
CA2177787A1 (en) Production of optical module assembly
ATE393412T1 (de) Vorrichtung mit kameramodulen und damit ausgestattes fluggerät
US6995926B2 (en) Lens barrel and lens barrel system
EP1384462A3 (en) Prism based dynamic vision training device and method thereof
ATE465692T1 (de) Teleskopintraocularlinse
ATE307738T1 (de) Scheinwerfer für fahrzeuge
AU2003296244A8 (en) Optical subassembly and projection objective for semiconductor lithography
WO2003081337A3 (de) Vorrichtung zur manipulation der winkellage eines gegenstands gegenüber einer festen struktur
CA2444154A1 (en) Improved clip-on sunglasses
EP1270321A3 (de) Scheinwerfer fuer Fahrzeuge
NO307114B1 (no) Brilleinnfatning for filterlinser
WO2003087944A3 (de) Vorrichtung zur deformationsarmen lagerung eines nicht rotationssymmetrischen optischen elementes
CA2508518A1 (en) Fiber optic light bar
DE60011505D1 (de) Photozelle
EP1279987A3 (en) Binoculars
DE602004005926D1 (de) Vorrichtung zum Erkennen einer verminderten Wachsamkeitsbedingung
ATE453879T1 (de) Belichtungsvorrichtung
TW200601809A (en) Lens and the assembling process of an image sensor
ATE130150T1 (de) Videokamera mit integriertem licht.
ITNU20020003U1 (it) Apparecchiatura modulare di montature di lenti ottiche per la soluzione delle diverse esigenze di visibilita'

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20200607