WO2003081337A3 - Vorrichtung zur manipulation der winkellage eines gegenstands gegenüber einer festen struktur - Google Patents

Vorrichtung zur manipulation der winkellage eines gegenstands gegenüber einer festen struktur Download PDF

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Publication number
WO2003081337A3
WO2003081337A3 PCT/EP2003/002778 EP0302778W WO03081337A3 WO 2003081337 A3 WO2003081337 A3 WO 2003081337A3 EP 0302778 W EP0302778 W EP 0302778W WO 03081337 A3 WO03081337 A3 WO 03081337A3
Authority
WO
WIPO (PCT)
Prior art keywords
angular position
fixed structure
manipulation
object relative
support frame
Prior art date
Application number
PCT/EP2003/002778
Other languages
English (en)
French (fr)
Other versions
WO2003081337A2 (de
Inventor
Ulrich Weber
Hubert Holderer
Hartmut Muenker
Original Assignee
Zeiss Carl Smt Ag
Ulrich Weber
Hubert Holderer
Hartmut Muenker
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Ulrich Weber, Hubert Holderer, Hartmut Muenker filed Critical Zeiss Carl Smt Ag
Priority to AU2003209739A priority Critical patent/AU2003209739A1/en
Priority to JP2003579008A priority patent/JP4465194B2/ja
Priority to EP03744806A priority patent/EP1485762A2/de
Publication of WO2003081337A2 publication Critical patent/WO2003081337A2/de
Publication of WO2003081337A3 publication Critical patent/WO2003081337A3/de
Priority to US10/942,638 priority patent/US20050110447A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

Die Erfindung betrifft eine Vorrichtung zur Manipulation der Winkellage eines Gegenstands (1) gegenüber einer festen Struktur (4), in der der Gegenstand (1), insbesondere ein optisches Element in einem Objektiv für die Mikrolithographie eingebracht ist, um drei sich in einem Punkt schneidende Kippachsen (x, y, z). Der Gegenstand (1) kann auch in einem Tragrahmen (2) gefasst sein. Der Tragrahmen (2) mit dem Gegenstand (1) ist durch drei Anbindungsglieder (3a, b, c, …, n) mit jeweils drei Rotationsbeweglichkeiten und einer Translationsbeweglichkeit mit der festen Struktur (4) verbunden. Die Winkellage des Tragrahmens (2) ist durch jeweils eines der Anbindungsglieder (3a, b, c, …, n) um jeweils eine der drei Kippachsen (x, y, z) verstellbar.
PCT/EP2003/002778 2002-03-21 2003-03-18 Vorrichtung zur manipulation der winkellage eines gegenstands gegenüber einer festen struktur WO2003081337A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2003209739A AU2003209739A1 (en) 2002-03-21 2003-03-18 Device for manipulation of the angular position of an object relative to a fixed structure
JP2003579008A JP4465194B2 (ja) 2002-03-21 2003-03-18 固定構造体に対する物体の角方向位置を操るための装置
EP03744806A EP1485762A2 (de) 2002-03-21 2003-03-18 Vorrichtung zur manipulation der winkellage eines gegenstands gegen ber einer festen struktur
US10/942,638 US20050110447A1 (en) 2002-03-21 2004-09-16 Device for manipulating the angular position of an object relative to a fixed structure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002112547 DE10212547A1 (de) 2002-03-21 2002-03-21 Vorrichtung zur Manipulation der Winkellage eines Gegenstands gegenüber einer festen Struktur
DE10212547.3 2002-03-21

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/942,638 Continuation US20050110447A1 (en) 2002-03-21 2004-09-16 Device for manipulating the angular position of an object relative to a fixed structure

Publications (2)

Publication Number Publication Date
WO2003081337A2 WO2003081337A2 (de) 2003-10-02
WO2003081337A3 true WO2003081337A3 (de) 2004-02-05

Family

ID=27798007

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/002778 WO2003081337A2 (de) 2002-03-21 2003-03-18 Vorrichtung zur manipulation der winkellage eines gegenstands gegenüber einer festen struktur

Country Status (5)

Country Link
EP (1) EP1485762A2 (de)
JP (1) JP4465194B2 (de)
AU (1) AU2003209739A1 (de)
DE (1) DE10212547A1 (de)
WO (1) WO2003081337A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10216114A1 (de) * 2002-04-12 2003-10-23 Zeiss Carl Smt Ag Vorrichtung zur deformationsarmen Lagerung eines nicht rotationssymmetrischen optischen Elementes
TWI262363B (en) 2003-10-21 2006-09-21 Asml Netherlands Bv An assembly, a lithographic apparatus, and a device manufacturing method
US7515359B2 (en) 2004-04-14 2009-04-07 Carl Zeiss Smt Ag Support device for positioning an optical element
JP4532545B2 (ja) 2004-06-29 2010-08-25 カール・ツァイス・エスエムティー・アーゲー 光学素子のための位置決めユニット及び調節デバイス
DE102005057860A1 (de) * 2005-12-03 2007-06-06 Carl Zeiss Smt Ag Objektiv, insbesondere Projektionsobjektiv für die Halbleiterlithographie
DE102008036574A1 (de) * 2008-07-31 2010-02-04 Carl Zeiss Laser Optics Gmbh Vorrichtung zum Lagern eines optischen Elements
DE102009025309B4 (de) * 2009-06-15 2016-12-22 Toptica Photonics Ag Kinematischer Halter
DE102009037135B4 (de) 2009-07-31 2013-07-04 Carl Zeiss Laser Optics Gmbh Haltevorrichtung für ein optisches Element
CN102789144B (zh) * 2011-05-18 2014-09-17 上海微电子装备有限公司 光刻对准系统参考板的调整机构及调整方法
DE102014224993A1 (de) * 2014-12-05 2016-06-09 Carl Zeiss Smt Gmbh Verstellsystem-Bauelement, Spiegelanordnung und Projektionsbelichtungsanlage für die Mikrolithographie
CN109771853B (zh) * 2019-03-13 2021-01-01 上海联影医疗科技股份有限公司 一种偏转磁铁调节装置及直线加速器

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3766932A (en) * 1970-03-08 1973-10-23 Peret Co Collapsible reticular structures
US4445273A (en) * 1979-03-12 1984-05-01 Leuven Research And Development V.Z.W. Displacement control device
US5901936A (en) * 1997-08-25 1999-05-11 Sandia Corporation Six-degree-of-freedom multi-axes positioning apparatus
US6047610A (en) * 1997-04-18 2000-04-11 Stocco; Leo J Hybrid serial/parallel manipulator
US6327026B1 (en) * 1998-03-20 2001-12-04 Canon Kabushiki Kaisha Exposure apparatus and positioning apparatus
FR2835579A1 (fr) * 2002-02-04 2003-08-08 Commissariat Energie Atomique Dispositif de deplacement spherique d'element

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3766932A (en) * 1970-03-08 1973-10-23 Peret Co Collapsible reticular structures
US4445273A (en) * 1979-03-12 1984-05-01 Leuven Research And Development V.Z.W. Displacement control device
US6047610A (en) * 1997-04-18 2000-04-11 Stocco; Leo J Hybrid serial/parallel manipulator
US5901936A (en) * 1997-08-25 1999-05-11 Sandia Corporation Six-degree-of-freedom multi-axes positioning apparatus
US6327026B1 (en) * 1998-03-20 2001-12-04 Canon Kabushiki Kaisha Exposure apparatus and positioning apparatus
FR2835579A1 (fr) * 2002-02-04 2003-08-08 Commissariat Energie Atomique Dispositif de deplacement spherique d'element

Also Published As

Publication number Publication date
EP1485762A2 (de) 2004-12-15
JP2005521104A (ja) 2005-07-14
AU2003209739A8 (en) 2003-10-08
JP4465194B2 (ja) 2010-05-19
WO2003081337A2 (de) 2003-10-02
DE10212547A1 (de) 2003-10-02
AU2003209739A1 (en) 2003-10-08

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