HK1025842A1 - Electromagnetic alignment and scanning apparatus - Google Patents

Electromagnetic alignment and scanning apparatus

Info

Publication number
HK1025842A1
HK1025842A1 HK00103152A HK00103152A HK1025842A1 HK 1025842 A1 HK1025842 A1 HK 1025842A1 HK 00103152 A HK00103152 A HK 00103152A HK 00103152 A HK00103152 A HK 00103152A HK 1025842 A1 HK1025842 A1 HK 1025842A1
Authority
HK
Hong Kong
Prior art keywords
scanning apparatus
electromagnetic alignment
alignment
electromagnetic
scanning
Prior art date
Application number
HK00103152A
Other languages
English (en)
Inventor
Akimitsu Ebihara
Thomas Novak
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1025842A1 publication Critical patent/HK1025842A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Atmospheric Sciences (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Toxicology (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position Or Direction (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
HK00103152A 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus HK1025842A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26699994A 1994-06-27 1994-06-27

Publications (1)

Publication Number Publication Date
HK1025842A1 true HK1025842A1 (en) 2000-11-24

Family

ID=23016891

Family Applications (12)

Application Number Title Priority Date Filing Date
HK00103152A HK1025842A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101430A HK1032291A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103151A HK1026767A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101436A HK1035435A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Family Applications After (11)

Application Number Title Priority Date Filing Date
HK01101432A HK1035431A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101434A HK1035433A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101430A HK1032291A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103148A HK1025840A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103150A HK1026766A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103149A HK1025841A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK98115706A HK1017824A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101431A HK1035430A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101433A HK1035432A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK00103151A HK1026767A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus
HK01101436A HK1035435A1 (en) 1994-06-27 1998-12-24 Electromagnetic alignment and scanning apparatus

Country Status (4)

Country Link
JP (6) JP3800616B2 (ja)
KR (7) KR100281853B1 (ja)
GB (13) GB2290658B (ja)
HK (12) HK1025842A1 (ja)

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CN100514581C (zh) * 2002-12-09 2009-07-15 Acm研究公司 晶片卡盘和抛光/电镀托座之间的测量对准
KR101124179B1 (ko) 2003-04-09 2012-03-27 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI457712B (zh) 2003-10-28 2014-10-21 尼康股份有限公司 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US7982857B2 (en) 2003-12-15 2011-07-19 Nikon Corporation Stage apparatus, exposure apparatus, and exposure method with recovery device having lyophilic portion
JP4586367B2 (ja) * 2004-01-14 2010-11-24 株式会社ニコン ステージ装置及び露光装置
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WO2005098911A1 (ja) 2004-04-09 2005-10-20 Nikon Corporation 移動体の駆動方法、ステージ装置及び露光装置
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JP4779973B2 (ja) 2004-09-01 2011-09-28 株式会社ニコン 基板ホルダ及びステージ装置並びに露光装置
JP4541849B2 (ja) * 2004-11-22 2010-09-08 キヤノン株式会社 位置決め装置
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JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
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KR101693168B1 (ko) * 2009-05-15 2017-01-17 가부시키가이샤 니콘 이동체 장치, 용력 전달 장치, 및 노광 장치, 그리고 디바이스 제조 방법
JP5651035B2 (ja) * 2011-02-09 2015-01-07 株式会社ソディック 移動装置
CN102887341A (zh) * 2011-07-22 2013-01-23 大银微系统股份有限公司 悬臂式平台的横梁预拉模组
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US9878386B2 (en) 2013-10-31 2018-01-30 Foundation Of Soongsil University-Industry Cooperation Eccentric electrode for electric discharge machining, method of manufacturing the same, and micro electric discharge machining apparatus including the same
CN103824792A (zh) * 2014-02-28 2014-05-28 上海和辉光电有限公司 一种储藏柜及控制方法
JP5912143B2 (ja) 2014-03-04 2016-04-27 株式会社新川 ボンディング装置
JP6379612B2 (ja) * 2014-04-11 2018-08-29 株式会社ニコン 移動体装置及び露光装置、並びにデバイス製造方法
CN107664920B (zh) * 2016-07-29 2019-04-12 上海微电子装备（集团）股份有限公司 电磁导轨装置
JP2019529970A (ja) * 2016-09-09 2019-10-17 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィ装置及びサポート構造背景
CN110328405B (zh) * 2019-08-09 2020-09-22 佛山市镭科智能设备有限公司 一种型材的夹持控制方法
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Also Published As

Publication number Publication date
GB2329520A (en) 1999-03-24
GB9817491D0 (en) 1998-10-07
GB9817490D0 (en) 1998-10-07
HK1025841A1 (en) 2000-11-24
KR100281857B1 (ko) 2001-02-15
JP3804786B2 (ja) 2006-08-02
GB2329519A (en) 1999-03-24
GB2325563B (en) 1999-03-24
GB2329519B (en) 1999-06-02
GB2290658B (en) 1999-03-24
KR960002519A (ko) 1996-01-26
JPH0863231A (ja) 1996-03-08
KR100281853B1 (ko) 2001-04-02
GB2329518B (en) 1999-06-02
GB2325563A (en) 1998-11-25
HK1032291A1 (en) 2001-07-13
HK1026767A1 (en) 2000-12-22
KR100281856B1 (ko) 2001-02-15
JP2007242034A (ja) 2007-09-20
GB2329518A (en) 1999-03-24
JP2003197519A (ja) 2003-07-11
KR100281858B1 (ko) 2001-02-15
JP3804785B2 (ja) 2006-08-02
HK1035431A1 (en) 2001-11-23
GB2329521B (en) 1999-06-02
GB2325565A (en) 1998-11-25
GB2329517B (en) 1999-06-02
GB2325564B (en) 1999-03-24
JP3804787B2 (ja) 2006-08-02
GB2290658A (en) 1996-01-03
HK1017824A1 (en) 1999-11-26
JP4687911B2 (ja) 2011-05-25
GB9817492D0 (en) 1998-10-07
KR100281860B1 (ko) 2001-02-15
GB2329522B (en) 1999-06-02
JP3800616B2 (ja) 2006-07-26
GB2329067B (en) 1999-06-02
GB2329516B (en) 1999-06-02
KR100281855B1 (ko) 2001-02-15
HK1035433A1 (en) 2001-11-23
KR100281859B1 (ko) 2001-02-15
JP2003197518A (ja) 2003-07-11
GB9817493D0 (en) 1998-10-07
JP2003158073A (ja) 2003-05-30
GB2325566A (en) 1998-11-25
GB2329516A (en) 1999-03-24
GB2325565B (en) 1999-03-31
GB9825844D0 (en) 1999-01-20
GB2329521A (en) 1999-03-24
HK1026766A1 (en) 2000-12-22
GB2329067A (en) 1999-03-10
HK1035435A1 (en) 2001-11-23
GB9817494D0 (en) 1998-10-07
GB9512659D0 (en) 1995-08-23
GB2329520B (en) 1999-06-02
JP2006258817A (ja) 2006-09-28
GB2329522A (en) 1999-03-24
GB2325566B (en) 1999-03-31
GB2329517A (en) 1999-03-24
GB2325564A (en) 1998-11-25
HK1035430A1 (en) 2001-11-23
HK1035432A1 (en) 2001-11-23
JP4135188B2 (ja) 2008-08-20
HK1025840A1 (en) 2000-11-24

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