GB1535019A - Field effect devices - Google Patents

Field effect devices

Info

Publication number
GB1535019A
GB1535019A GB44409/77A GB4440977A GB1535019A GB 1535019 A GB1535019 A GB 1535019A GB 44409/77 A GB44409/77 A GB 44409/77A GB 4440977 A GB4440977 A GB 4440977A GB 1535019 A GB1535019 A GB 1535019A
Authority
GB
United Kingdom
Prior art keywords
substrate
igfet
applying
field effect
avalanche breakdown
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB44409/77A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1535019A publication Critical patent/GB1535019A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/69IGFETs having charge trapping gate insulators, e.g. MNOS transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Volatile Memory (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
GB44409/77A 1976-11-19 1977-10-25 Field effect devices Expired GB1535019A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/743,253 US4075653A (en) 1976-11-19 1976-11-19 Method for injecting charge in field effect devices

Publications (1)

Publication Number Publication Date
GB1535019A true GB1535019A (en) 1978-12-06

Family

ID=24988084

Family Applications (1)

Application Number Title Priority Date Filing Date
GB44409/77A Expired GB1535019A (en) 1976-11-19 1977-10-25 Field effect devices

Country Status (5)

Country Link
US (1) US4075653A (enExample)
JP (1) JPS5364482A (enExample)
DE (1) DE2749711A1 (enExample)
FR (1) FR2371692A1 (enExample)
GB (1) GB1535019A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100459A (ja) * 1981-12-10 1983-06-15 Nippon Telegr & Teleph Corp <Ntt> Mos型半導体装置の特性安定化処理方法
JPS6117836A (ja) * 1984-07-04 1986-01-25 Matsushita Electric Ind Co Ltd 電気コンロ
JP2794678B2 (ja) * 1991-08-26 1998-09-10 株式会社 半導体エネルギー研究所 絶縁ゲイト型半導体装置およびその作製方法
KR960001611B1 (ko) 1991-03-06 1996-02-02 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법
US6624450B1 (en) 1992-03-27 2003-09-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for forming the same
US5598009A (en) * 1994-11-15 1997-01-28 Advanced Micro Devices, Inc. Hot carrier injection test structure and testing technique for statistical evaluation
DE10224956A1 (de) * 2002-06-05 2004-01-08 Infineon Technologies Ag Verfahren zur Einstellung der Einsatzspannung eines Feldeffekttansistors, Feldeffekttransistor sowie integrierte Schaltung
JP4967476B2 (ja) * 2005-07-04 2012-07-04 株式会社デンソー 半導体装置の検査方法
WO2023012893A1 (ja) * 2021-08-03 2023-02-09 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体素子を用いたメモリ装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4844585B1 (enExample) * 1969-04-12 1973-12-25
NL7208026A (enExample) * 1972-06-13 1973-12-17

Also Published As

Publication number Publication date
US4075653A (en) 1978-02-21
JPS5548459B2 (enExample) 1980-12-05
FR2371692B1 (enExample) 1982-04-09
JPS5364482A (en) 1978-06-08
FR2371692A1 (fr) 1978-06-16
DE2749711A1 (de) 1978-05-24

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee