JPS5548459B2 - - Google Patents

Info

Publication number
JPS5548459B2
JPS5548459B2 JP11697477A JP11697477A JPS5548459B2 JP S5548459 B2 JPS5548459 B2 JP S5548459B2 JP 11697477 A JP11697477 A JP 11697477A JP 11697477 A JP11697477 A JP 11697477A JP S5548459 B2 JPS5548459 B2 JP S5548459B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11697477A
Other languages
Japanese (ja)
Other versions
JPS5364482A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5364482A publication Critical patent/JPS5364482A/ja
Publication of JPS5548459B2 publication Critical patent/JPS5548459B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/69IGFETs having charge trapping gate insulators, e.g. MNOS transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Volatile Memory (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
JP11697477A 1976-11-19 1977-09-30 Method of implanting carrier to fet device Granted JPS5364482A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/743,253 US4075653A (en) 1976-11-19 1976-11-19 Method for injecting charge in field effect devices

Publications (2)

Publication Number Publication Date
JPS5364482A JPS5364482A (en) 1978-06-08
JPS5548459B2 true JPS5548459B2 (enExample) 1980-12-05

Family

ID=24988084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11697477A Granted JPS5364482A (en) 1976-11-19 1977-09-30 Method of implanting carrier to fet device

Country Status (5)

Country Link
US (1) US4075653A (enExample)
JP (1) JPS5364482A (enExample)
DE (1) DE2749711A1 (enExample)
FR (1) FR2371692A1 (enExample)
GB (1) GB1535019A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6117836A (ja) * 1984-07-04 1986-01-25 Matsushita Electric Ind Co Ltd 電気コンロ

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100459A (ja) * 1981-12-10 1983-06-15 Nippon Telegr & Teleph Corp <Ntt> Mos型半導体装置の特性安定化処理方法
JP2794678B2 (ja) * 1991-08-26 1998-09-10 株式会社 半導体エネルギー研究所 絶縁ゲイト型半導体装置およびその作製方法
KR960001611B1 (ko) 1991-03-06 1996-02-02 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법
US6624450B1 (en) 1992-03-27 2003-09-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for forming the same
US5598009A (en) * 1994-11-15 1997-01-28 Advanced Micro Devices, Inc. Hot carrier injection test structure and testing technique for statistical evaluation
DE10224956A1 (de) * 2002-06-05 2004-01-08 Infineon Technologies Ag Verfahren zur Einstellung der Einsatzspannung eines Feldeffekttansistors, Feldeffekttransistor sowie integrierte Schaltung
JP4967476B2 (ja) * 2005-07-04 2012-07-04 株式会社デンソー 半導体装置の検査方法
WO2023012893A1 (ja) * 2021-08-03 2023-02-09 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体素子を用いたメモリ装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4844585B1 (enExample) * 1969-04-12 1973-12-25
NL7208026A (enExample) * 1972-06-13 1973-12-17

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6117836A (ja) * 1984-07-04 1986-01-25 Matsushita Electric Ind Co Ltd 電気コンロ

Also Published As

Publication number Publication date
US4075653A (en) 1978-02-21
GB1535019A (en) 1978-12-06
FR2371692B1 (enExample) 1982-04-09
JPS5364482A (en) 1978-06-08
FR2371692A1 (fr) 1978-06-16
DE2749711A1 (de) 1978-05-24

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