FR2371692A1 - Procede permettant d'injecter des charges dans des dispositifs a effet de champ et structure de test en resultant - Google Patents

Procede permettant d'injecter des charges dans des dispositifs a effet de champ et structure de test en resultant

Info

Publication number
FR2371692A1
FR2371692A1 FR7731530A FR7731530A FR2371692A1 FR 2371692 A1 FR2371692 A1 FR 2371692A1 FR 7731530 A FR7731530 A FR 7731530A FR 7731530 A FR7731530 A FR 7731530A FR 2371692 A1 FR2371692 A1 FR 2371692A1
Authority
FR
France
Prior art keywords
substrate
source
drain electrodes
test structure
bias
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7731530A
Other languages
English (en)
French (fr)
Other versions
FR2371692B1 (enExample
Inventor
Lowell F Howard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2371692A1 publication Critical patent/FR2371692A1/fr
Application granted granted Critical
Publication of FR2371692B1 publication Critical patent/FR2371692B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/69IGFETs having charge trapping gate insulators, e.g. MNOS transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Volatile Memory (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
FR7731530A 1976-11-19 1977-10-07 Procede permettant d'injecter des charges dans des dispositifs a effet de champ et structure de test en resultant Granted FR2371692A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/743,253 US4075653A (en) 1976-11-19 1976-11-19 Method for injecting charge in field effect devices

Publications (2)

Publication Number Publication Date
FR2371692A1 true FR2371692A1 (fr) 1978-06-16
FR2371692B1 FR2371692B1 (enExample) 1982-04-09

Family

ID=24988084

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7731530A Granted FR2371692A1 (fr) 1976-11-19 1977-10-07 Procede permettant d'injecter des charges dans des dispositifs a effet de champ et structure de test en resultant

Country Status (5)

Country Link
US (1) US4075653A (enExample)
JP (1) JPS5364482A (enExample)
DE (1) DE2749711A1 (enExample)
FR (1) FR2371692A1 (enExample)
GB (1) GB1535019A (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100459A (ja) * 1981-12-10 1983-06-15 Nippon Telegr & Teleph Corp <Ntt> Mos型半導体装置の特性安定化処理方法
JPS6117836A (ja) * 1984-07-04 1986-01-25 Matsushita Electric Ind Co Ltd 電気コンロ
JP2794678B2 (ja) * 1991-08-26 1998-09-10 株式会社 半導体エネルギー研究所 絶縁ゲイト型半導体装置およびその作製方法
KR960001611B1 (ko) 1991-03-06 1996-02-02 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법
US6624450B1 (en) 1992-03-27 2003-09-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for forming the same
US5598009A (en) * 1994-11-15 1997-01-28 Advanced Micro Devices, Inc. Hot carrier injection test structure and testing technique for statistical evaluation
DE10224956A1 (de) * 2002-06-05 2004-01-08 Infineon Technologies Ag Verfahren zur Einstellung der Einsatzspannung eines Feldeffekttansistors, Feldeffekttransistor sowie integrierte Schaltung
JP4967476B2 (ja) * 2005-07-04 2012-07-04 株式会社デンソー 半導体装置の検査方法
WO2023012893A1 (ja) * 2021-08-03 2023-02-09 ユニサンティス エレクトロニクス シンガポール プライベート リミテッド 半導体素子を用いたメモリ装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3646527A (en) * 1969-04-12 1972-02-29 Nippon Electric Co Electronic memory circuit employing semiconductor memory elements and a method for writing to the memory element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7208026A (enExample) * 1972-06-13 1973-12-17

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3646527A (en) * 1969-04-12 1972-02-29 Nippon Electric Co Electronic memory circuit employing semiconductor memory elements and a method for writing to the memory element

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EXBK/71 *

Also Published As

Publication number Publication date
US4075653A (en) 1978-02-21
GB1535019A (en) 1978-12-06
JPS5548459B2 (enExample) 1980-12-05
FR2371692B1 (enExample) 1982-04-09
JPS5364482A (en) 1978-06-08
DE2749711A1 (de) 1978-05-24

Similar Documents

Publication Publication Date Title
US3986198A (en) Introducing signal at low noise level to charge-coupled circuit
JP3987588B2 (ja) 標本化回路を形成する薄膜回路素子を有する電子装置
FR2371692A1 (fr) Procede permettant d&#39;injecter des charges dans des dispositifs a effet de champ et structure de test en resultant
KR930005247A (ko) 유기전계 효과형 소자
Darbandy et al. Characterization of the charge-trap dynamics in organic thin-film transistors
JPS5632764A (en) Charge coupled device
GB1434652A (en) Semiconductor devices
US4672408A (en) Non-volatile semiconductor memory device
JPS52117586A (en) Semiconductor device
Lemmi et al. The leakage currents of amorphous silicon thin-film transistors: Injection currents, back channel currents and stress effects
FR2316800A1 (fr) Circuit de polarisation de substrat avec regulation de la tension de seuil
ES374110A1 (es) Un metodo para reducir la dispersion de la luz producida por un cristal liquido neumatico.
JPS5228277A (en) Non-voltatile semiconductor memory device
JPS6489372A (en) Semiconductor device
KR890016752A (ko) 반도체 메모리 장치
Ng et al. Instability of MOSFET's due to redistribution of oxide charges
JPS5279881A (en) Production of gaas schottky barrier gate type field effect transistor
GB1454322A (en) Semiconductor device
JPS5291381A (en) Field effect type semiconductor device
Diaz Llorente et al. Charge Pumping in Ultrathin SOI Tunnel FETs: Impact of Back-Gate Voltage
JPS5458376A (en) Semiconductor memory unit and its writing method
Kanicki et al. Simple polysilicon thin film transistor structure for achieving high on/off current ratio independent of gate bias
Ciofi Contact effects, Stability and Noise Investigation in Organic Thin-Film Transistors
Shaban et al. Pulsed transport of electrons on liquid helium confined in narrow channels
Yoon et al. Very low off Current Behavior in high Performance a-Si: H TFT

Legal Events

Date Code Title Description
ST Notification of lapse