FR2950080B1 - Procede et dispositif de depot chimique en phase gazeuse d'un film polymere sur un substrat - Google Patents

Procede et dispositif de depot chimique en phase gazeuse d'un film polymere sur un substrat

Info

Publication number
FR2950080B1
FR2950080B1 FR0956386A FR0956386A FR2950080B1 FR 2950080 B1 FR2950080 B1 FR 2950080B1 FR 0956386 A FR0956386 A FR 0956386A FR 0956386 A FR0956386 A FR 0956386A FR 2950080 B1 FR2950080 B1 FR 2950080B1
Authority
FR
France
Prior art keywords
substrate
gas phase
polymer film
chemical deposition
phase chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0956386A
Other languages
English (en)
Other versions
FR2950080A1 (fr
Inventor
Claudine Biver
Francis Maury
Virginie Santucci
Francois Senocq
Sylvie Vinsonneau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
EssilorLuxottica SA
Original Assignee
Centre National de la Recherche Scientifique CNRS
Essilor International Compagnie Generale dOptique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Essilor International Compagnie Generale dOptique SA filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR0956386A priority Critical patent/FR2950080B1/fr
Priority to US13/496,304 priority patent/US20120177844A1/en
Priority to PCT/FR2010/051849 priority patent/WO2011033208A1/fr
Priority to EP10763819.9A priority patent/EP2477754B1/fr
Priority to CN201080041590.2A priority patent/CN102630188B/zh
Priority to JP2012529325A priority patent/JP5805090B2/ja
Publication of FR2950080A1 publication Critical patent/FR2950080A1/fr
Application granted granted Critical
Publication of FR2950080B1 publication Critical patent/FR2950080B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/002—Pretreatement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/062—Pretreatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2203/00—Other substrates
    • B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2203/00—Other substrates
    • B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
    • B05D2203/35—Glass
FR0956386A 2009-09-17 2009-09-17 Procede et dispositif de depot chimique en phase gazeuse d'un film polymere sur un substrat Active FR2950080B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR0956386A FR2950080B1 (fr) 2009-09-17 2009-09-17 Procede et dispositif de depot chimique en phase gazeuse d'un film polymere sur un substrat
US13/496,304 US20120177844A1 (en) 2009-09-17 2010-09-06 Method and device for chemical vapor deposition of polymer film onto a substrate
PCT/FR2010/051849 WO2011033208A1 (fr) 2009-09-17 2010-09-06 Procédé et dispositif de dépôt chimique en phase gazeuse d'un film polymère sur un substrat
EP10763819.9A EP2477754B1 (fr) 2009-09-17 2010-09-06 Procédé et dispositif de dépôt chimique en phase gazeuse d'un film polymère sur un substrat
CN201080041590.2A CN102630188B (zh) 2009-09-17 2010-09-06 聚合物膜在基底上的化学气相沉积方法及装置
JP2012529325A JP5805090B2 (ja) 2009-09-17 2010-09-06 基板上にポリマーフィルムを化学気相蒸着するための方法およびデバイス

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0956386A FR2950080B1 (fr) 2009-09-17 2009-09-17 Procede et dispositif de depot chimique en phase gazeuse d'un film polymere sur un substrat

Publications (2)

Publication Number Publication Date
FR2950080A1 FR2950080A1 (fr) 2011-03-18
FR2950080B1 true FR2950080B1 (fr) 2012-03-02

Family

ID=42138733

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0956386A Active FR2950080B1 (fr) 2009-09-17 2009-09-17 Procede et dispositif de depot chimique en phase gazeuse d'un film polymere sur un substrat

Country Status (6)

Country Link
US (1) US20120177844A1 (fr)
EP (1) EP2477754B1 (fr)
JP (1) JP5805090B2 (fr)
CN (1) CN102630188B (fr)
FR (1) FR2950080B1 (fr)
WO (1) WO2011033208A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010010819A1 (de) * 2010-03-10 2011-09-15 Osram Opto Semiconductors Gmbh Verfahren und Vorrichtung zur Herstellung einer Parylen-Beschichtung
WO2014172789A1 (fr) 2013-04-25 2014-10-30 Polyvalor, Limited Partnership Procédés d'application de revêtements par dépôt chimique en phase vapeur photo-amorcé (picvd) et revêtements obtenus par ces procédés
KR101809653B1 (ko) 2013-12-06 2017-12-15 주식회사 엘지화학 발수성 및 발유성을 갖는 고분자 박막 및 이의 제조 방법
CN104258473B (zh) * 2014-09-29 2016-01-13 上海交通大学 纺丝增强的聚对二甲苯复合薄膜及其制备方法
KR101793776B1 (ko) * 2014-11-20 2017-11-03 주식회사 엘지화학 iCVD층의 형성방법
US20170368866A1 (en) * 2016-06-27 2017-12-28 Viavi Solutions Inc. High chromaticity pigment flakes and foils
US11214689B2 (en) 2016-06-27 2022-01-04 Viavi Solutions Inc. High chroma flakes
JP2018028656A (ja) 2016-06-27 2018-02-22 ヴァイアヴィ・ソリューションズ・インコーポレイテッドＶｉａｖｉ Ｓｏｌｕｔｉｏｎｓ Ｉｎｃ． 磁性物品
EP3263649A1 (fr) 2016-06-27 2018-01-03 Viavi Solutions Inc. Dispositif optique
JP7110090B2 (ja) * 2018-12-28 2022-08-01 東京エレクトロン株式会社 基板処理方法および基板処理システム
CN114106711B (zh) * 2021-11-24 2023-06-27 中国工程物理研究院激光聚变研究中心 一种用于微小器件粘接的纳米胶连方法
CN115463803B (zh) * 2021-12-15 2023-09-22 上海交通大学 一种化学气相沉积装置以及高厚度Parylene-N膜的制备方法

Family Cites Families (15)

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Publication number Priority date Publication date Assignee Title
JPS60253212A (ja) * 1984-05-30 1985-12-13 Toshiba Mach Co Ltd 気相成長装置
JP2566914B2 (ja) * 1985-12-28 1996-12-25 キヤノン株式会社 薄膜半導体素子及びその形成法
US4919077A (en) * 1986-12-27 1990-04-24 Mitsubishi Denki Kabushiki Kaisha Semiconductor producing apparatus
JP3258439B2 (ja) * 1993-04-14 2002-02-18 株式会社半導体エネルギー研究所 気相反応装置
US5804259A (en) * 1996-11-07 1998-09-08 Applied Materials, Inc. Method and apparatus for depositing a multilayered low dielectric constant film
US5863327A (en) * 1997-02-10 1999-01-26 Micron Technology, Inc. Apparatus for forming materials
US6020458A (en) * 1997-10-24 2000-02-01 Quester Technology, Inc. Precursors for making low dielectric constant materials with improved thermal stability
US6503564B1 (en) * 1999-02-26 2003-01-07 3M Innovative Properties Company Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile
US20050145177A1 (en) * 2003-12-30 2005-07-07 Mcswiney Michael Method and apparatus for low temperature silicon nitride deposition
ES2286583T3 (es) * 2004-12-16 2007-12-01 Ecole D'ingenieurs Arc Procedimiento de realizacion de un dispositivo de membrana plastica y dispositivo obtenido.
US7514119B2 (en) * 2005-04-29 2009-04-07 Linde, Inc. Method and apparatus for using solution based precursors for atomic layer deposition
JP4690148B2 (ja) * 2005-09-01 2011-06-01 株式会社アルバック 有機薄膜製造方法および光ｃｖｄ装置
US7482289B2 (en) * 2006-08-25 2009-01-27 Battelle Memorial Institute Methods and apparatus for depositing tantalum metal films to surfaces and substrates
CA2670809A1 (fr) * 2007-02-27 2008-09-04 Sixtron Advanced Materials, Inc. Procede de formation d'un film sur un substrat
US7638441B2 (en) * 2007-09-11 2009-12-29 Asm Japan K.K. Method of forming a carbon polymer film using plasma CVD

Also Published As

Publication number Publication date
JP2013505354A (ja) 2013-02-14
EP2477754A1 (fr) 2012-07-25
CN102630188B (zh) 2016-01-13
CN102630188A (zh) 2012-08-08
FR2950080A1 (fr) 2011-03-18
WO2011033208A1 (fr) 2011-03-24
JP5805090B2 (ja) 2015-11-04
EP2477754B1 (fr) 2018-01-10
US20120177844A1 (en) 2012-07-12

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