FR2482285B1 - - Google Patents

Info

Publication number
FR2482285B1
FR2482285B1 FR8106950A FR8106950A FR2482285B1 FR 2482285 B1 FR2482285 B1 FR 2482285B1 FR 8106950 A FR8106950 A FR 8106950A FR 8106950 A FR8106950 A FR 8106950A FR 2482285 B1 FR2482285 B1 FR 2482285B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8106950A
Other versions
FR2482285A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2482285A1 publication Critical patent/FR2482285A1/fr
Application granted granted Critical
Publication of FR2482285B1 publication Critical patent/FR2482285B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
FR8106950A 1980-04-11 1981-04-07 Procede et dispositif d'alignement d'un masque et d'une tranche notamment pour la fabrication de circuits integres Granted FR2482285A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/139,544 US4326805A (en) 1980-04-11 1980-04-11 Method and apparatus for aligning mask and wafer members

Publications (2)

Publication Number Publication Date
FR2482285A1 FR2482285A1 (fr) 1981-11-13
FR2482285B1 true FR2482285B1 (fr) 1985-02-01

Family

ID=22487191

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8106950A Granted FR2482285A1 (fr) 1980-04-11 1981-04-07 Procede et dispositif d'alignement d'un masque et d'une tranche notamment pour la fabrication de circuits integres

Country Status (9)

Country Link
US (1) US4326805A (fr)
JP (1) JPS56157033A (fr)
BE (1) BE888344A (fr)
CA (1) CA1154175A (fr)
DE (1) DE3114682A1 (fr)
FR (1) FR2482285A1 (fr)
GB (1) GB2073950B (fr)
IT (1) IT1137326B (fr)
NL (1) NL189632C (fr)

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JP2623757B2 (ja) * 1988-09-05 1997-06-25 キヤノン株式会社 位置合わせ装置
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GB8806232D0 (en) * 1988-03-16 1988-04-13 Plessey Co Plc Vernier structure for flip chip bonded devices
US5294980A (en) * 1988-03-24 1994-03-15 Canon Kabushiki Kaisha Positioning detecting method and apparatus
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JP2546350B2 (ja) * 1988-09-09 1996-10-23 キヤノン株式会社 位置合わせ装置
JP2626076B2 (ja) * 1988-09-09 1997-07-02 キヤノン株式会社 位置検出装置
EP0358514B1 (fr) * 1988-09-09 2000-12-13 Canon Kabushiki Kaisha Méthode et dispositif de détection de position
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EP0358511B1 (fr) * 1988-09-09 2001-07-18 Canon Kabushiki Kaisha Dispositif de détection de la relation de position de deux objets
JP2704002B2 (ja) * 1989-07-18 1998-01-26 キヤノン株式会社 位置検出方法
JP2704001B2 (ja) * 1989-07-18 1998-01-26 キヤノン株式会社 位置検出装置
EP0411966B1 (fr) * 1989-08-04 1994-11-02 Canon Kabushiki Kaisha Méthode et dispositif de détection de position
US5225892A (en) * 1990-02-05 1993-07-06 Canon Kabushiki Kaisha Positional deviation detecting method
EP0455443B1 (fr) * 1990-05-01 1997-11-12 Canon Kabushiki Kaisha Méthode et apparatus pour la détection des écarts de position
US5200800A (en) * 1990-05-01 1993-04-06 Canon Kabushiki Kaisha Position detecting method and apparatus
EP0488798B1 (fr) * 1990-11-30 1998-07-08 Canon Kabushiki Kaisha Méthode de détection de position
US5495336A (en) * 1992-02-04 1996-02-27 Canon Kabushiki Kaisha Position detecting method for detecting a positional relationship between a first object and a second object
JP3008654B2 (ja) * 1992-02-21 2000-02-14 キヤノン株式会社 位置検出装置
US5455679A (en) * 1993-02-22 1995-10-03 Canon Kabushiki Kaisha Position detecting system
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JP3352286B2 (ja) * 1995-07-13 2002-12-03 キヤノン株式会社 位置制御方法及び装置並びにそれを使用した半導体製造装置
JP3292022B2 (ja) * 1996-01-17 2002-06-17 キヤノン株式会社 位置検出装置及びそれを用いた半導体素子の製造方法
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US5851701A (en) * 1997-04-01 1998-12-22 Micron Technology, Inc. Atom lithographic mask having diffraction grating and attenuated phase shifters
JPH11241908A (ja) 1997-12-03 1999-09-07 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
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US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
EP2264523A3 (fr) * 2000-07-16 2011-11-30 Board Of Regents, The University Of Texas System Procédé de formation d'un motif sur un substrat dans des procédés lithographiques d'empreinte
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JP2004505273A (ja) * 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
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KR101031528B1 (ko) * 2000-10-12 2011-04-27 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿
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US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
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US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
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JP5027468B2 (ja) * 2006-09-15 2012-09-19 日本ミクロコーティング株式会社 プローブクリーニング用又はプローブ加工用シート、及びプローブ加工方法
CN103091993B (zh) * 2011-11-02 2015-02-11 上海微电子装备有限公司 用于光刻机透镜热效应测量的测试标记及其测量方法
CN114217370A (zh) * 2021-12-16 2022-03-22 西安工业大学 宽带消色差聚焦与偏振调控的微结构波带片及设计方法

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Also Published As

Publication number Publication date
IT1137326B (it) 1986-09-10
IT8121022A0 (it) 1981-04-09
BE888344A (fr) 1981-07-31
GB2073950A (en) 1981-10-21
DE3114682C2 (fr) 1987-05-21
NL189632C (nl) 1993-06-01
US4326805A (en) 1982-04-27
NL8101776A (nl) 1981-11-02
FR2482285A1 (fr) 1981-11-13
JPH0132649B2 (fr) 1989-07-10
NL189632B (nl) 1993-01-04
CA1154175A (fr) 1983-09-20
DE3114682A1 (de) 1981-12-24
GB2073950B (en) 1984-04-18
JPS56157033A (en) 1981-12-04

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