FR2388411A1 - Dispositif semi-conducteur et son procede de fabrication - Google Patents

Dispositif semi-conducteur et son procede de fabrication

Info

Publication number
FR2388411A1
FR2388411A1 FR7739917A FR7739917A FR2388411A1 FR 2388411 A1 FR2388411 A1 FR 2388411A1 FR 7739917 A FR7739917 A FR 7739917A FR 7739917 A FR7739917 A FR 7739917A FR 2388411 A1 FR2388411 A1 FR 2388411A1
Authority
FR
France
Prior art keywords
manufacturing process
semiconductor device
gaa1as
gaas
creation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7739917A
Other languages
English (en)
Other versions
FR2388411B1 (fr
Inventor
Leroy L Chang
Leo Esaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2388411A1 publication Critical patent/FR2388411A1/fr
Application granted granted Critical
Publication of FR2388411B1 publication Critical patent/FR2388411B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/15—Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
    • H01L29/151—Compositional structures
    • H01L29/152—Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation
    • H01L29/155—Comprising only semiconductor materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Recrystallisation Techniques (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Bipolar Transistors (AREA)
  • Led Devices (AREA)

Abstract

Dispositif semi-conducteur et son procédé de fabrication. Ce dispositif est caractérisé en ce qu'il comporte des régions alternées de semi-conducteurs différents (ex. GaAs et GaA1As) de telle sorte que la hauteur et la largeur de la barrière, l'épaisseur de la région de conduction assurent par la création d'etats de liaison de porteurs, que le flux de courant se développe essentiellement selon deux dimensions. Application à l'industrie des semi-conducteurs.
FR7739917A 1977-04-20 1977-12-23 Dispositif semi-conducteur et son procede de fabrication Granted FR2388411A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/789,158 US4137542A (en) 1977-04-20 1977-04-20 Semiconductor structure

Publications (2)

Publication Number Publication Date
FR2388411A1 true FR2388411A1 (fr) 1978-11-17
FR2388411B1 FR2388411B1 (fr) 1980-09-05

Family

ID=25146758

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7739917A Granted FR2388411A1 (fr) 1977-04-20 1977-12-23 Dispositif semi-conducteur et son procede de fabrication

Country Status (5)

Country Link
US (1) US4137542A (fr)
JP (1) JPS596078B2 (fr)
DE (1) DE2801292A1 (fr)
FR (1) FR2388411A1 (fr)
GB (1) GB1590766A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0005059A2 (fr) * 1978-04-24 1979-10-31 Western Electric Company, Incorporated Dispositif semiconducteur ayant une structure en couches et procédé pour sa fabrication
EP0075367A2 (fr) * 1981-09-18 1983-03-30 Philips Electronics Uk Limited Dispositif de prise de vue infra-rouge

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4194935A (en) * 1978-04-24 1980-03-25 Bell Telephone Laboratories, Incorporated Method of making high mobility multilayered heterojunction devices employing modulated doping
USRE33671E (en) * 1978-04-24 1991-08-20 At&T Bell Laboratories Method of making high mobility multilayered heterojunction device employing modulated doping
US4205331A (en) * 1978-06-09 1980-05-27 The United States Of America As Represented By The Secretary Of The Army Infrared optical devices of layered structure
US4208667A (en) * 1978-06-09 1980-06-17 The United States Of America As Represented By The Secretary Of The Army Controlled absorption in heterojunction structures
US4250515A (en) * 1978-06-09 1981-02-10 The United States Of America As Represented By The Secretary Of The Army Heterojunction superlattice with potential well depth greater than half the bandgap
US4198644A (en) * 1978-06-09 1980-04-15 The United States Of America As Represented By The Secretary Of The Army Tunnel diode
IT1149814B (it) * 1979-11-26 1986-12-10 Ibm Struttura semiconduttrice
US4353081A (en) * 1980-01-29 1982-10-05 Bell Telephone Laboratories, Incorporated Graded bandgap rectifying semiconductor devices
US4348686A (en) * 1980-07-28 1982-09-07 The United States Of America As Represented By The Secretary Of The Army Microwave-infrared detector with semiconductor superlattice region
JPS57112086A (en) * 1980-12-29 1982-07-12 Fujitsu Ltd Luminescent element
US4553317A (en) * 1981-11-09 1985-11-19 Canon Kabushiki Kaisha Method of obtaining an impact ionization coefficient rate by junction of different kinds of semiconductors
US4860068A (en) * 1982-08-13 1989-08-22 American Telephone And Telegraph Company, At&T Bell Laboratories Semiconductor devices and methods of making such devices
JPS5976478A (ja) * 1982-10-26 1984-05-01 Nippon Telegr & Teleph Corp <Ntt> 電界効果トランジスタ及びその製法
JPS5999754A (ja) * 1982-11-29 1984-06-08 Agency Of Ind Science & Technol 半導体装置
US4695857A (en) * 1983-06-24 1987-09-22 Nec Corporation Superlattice semiconductor having high carrier density
JPS6127681A (ja) * 1984-07-17 1986-02-07 Res Dev Corp Of Japan 超格子構造のチヤネル部をもつ電界効果トランジスタ
US4591889A (en) * 1984-09-14 1986-05-27 At&T Bell Laboratories Superlattice geometry and devices
JPH077847B2 (ja) * 1984-12-17 1995-01-30 株式会社東芝 半導体発光素子
US4866488A (en) * 1985-03-29 1989-09-12 Texas Instruments Incorporated Ballistic transport filter and device
JPS6453570A (en) * 1987-08-25 1989-03-01 Mitsubishi Electric Corp Superlattice device
US4972246A (en) * 1988-03-22 1990-11-20 International Business Machines Corp. Effective narrow band gap base transistor
JPH07120668B2 (ja) * 1988-07-02 1995-12-20 光技術研究開発株式会社 ヘテロ接合バイポーラトランジスタ
US5113231A (en) * 1989-09-07 1992-05-12 California Institute Of Technology Quantum-effect semiconductor devices
US5036371A (en) * 1989-09-27 1991-07-30 The United States Of America As Represented By The Secretary Of The Navy Multiple quantum well device
US5598731A (en) * 1993-05-21 1997-02-04 Riviere, V.; Alfredo Continuous extrusion of complex articles
US5383347A (en) * 1993-05-21 1995-01-24 Riviere; Alfredo V. Continuous extrusion of complex articles
GB0506588D0 (en) * 2005-03-31 2005-05-04 E2V Tech Uk Ltd Gun diode

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1418613A (fr) * 1963-12-30 1965-11-19 Ibm Dispositif semi-conducteur à jonctions hétérogènes utilisant le transfert de porteurs majoritaires
US3267338A (en) * 1961-04-20 1966-08-16 Ibm Integrated circuit process and structure
DE2014677A1 (fr) * 1969-04-01 1970-10-15

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1266894B (de) * 1965-03-03 1968-04-25 Danfoss As Sperrschichtfreies Halbleiterschaltelement
US3626328A (en) * 1969-04-01 1971-12-07 Ibm Semiconductor bulk oscillator
DE2261527C2 (de) * 1972-12-15 1983-04-21 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Halbleiterkörper mit in einer vorgegebenen Richtung abwechselnd aufeinanderfolgenden n- und p-dotierten Zonen, Verfahren zu seiner Herstellung und Verwendungen des Halbleiterkörpers
US3893148A (en) * 1974-02-25 1975-07-01 Us Navy Layered superlattic switching and negative resistance devices

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3267338A (en) * 1961-04-20 1966-08-16 Ibm Integrated circuit process and structure
FR1418613A (fr) * 1963-12-30 1965-11-19 Ibm Dispositif semi-conducteur à jonctions hétérogènes utilisant le transfert de porteurs majoritaires
DE2014677A1 (fr) * 1969-04-01 1970-10-15

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NV2194/76 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0005059A2 (fr) * 1978-04-24 1979-10-31 Western Electric Company, Incorporated Dispositif semiconducteur ayant une structure en couches et procédé pour sa fabrication
EP0005059A3 (en) * 1978-04-24 1979-12-12 Western Electric Company, Incorporated A semiconductor device having a layered structure and a method of making it
EP0075367A2 (fr) * 1981-09-18 1983-03-30 Philips Electronics Uk Limited Dispositif de prise de vue infra-rouge
EP0075367A3 (en) * 1981-09-18 1985-05-15 Philips Electronic And Associated Industries Limited Infra-red radiation imaging devices

Also Published As

Publication number Publication date
GB1590766A (en) 1981-06-10
US4137542A (en) 1979-01-30
JPS53131779A (en) 1978-11-16
DE2801292A1 (de) 1978-10-26
JPS596078B2 (ja) 1984-02-08
FR2388411B1 (fr) 1980-09-05

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Legal Events

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ST Notification of lapse