FR2374726A1 - Memoire a acces aleatoire muni de transistor a effet de champ a jonction - Google Patents

Memoire a acces aleatoire muni de transistor a effet de champ a jonction

Info

Publication number
FR2374726A1
FR2374726A1 FR7737830A FR7737830A FR2374726A1 FR 2374726 A1 FR2374726 A1 FR 2374726A1 FR 7737830 A FR7737830 A FR 7737830A FR 7737830 A FR7737830 A FR 7737830A FR 2374726 A1 FR2374726 A1 FR 2374726A1
Authority
FR
France
Prior art keywords
random access
effect transistor
access memory
junction field
memory equipped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7737830A
Other languages
English (en)
Other versions
FR2374726B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from NL7613999A external-priority patent/NL7613999A/xx
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2374726A1 publication Critical patent/FR2374726A1/fr
Application granted granted Critical
Publication of FR2374726B1 publication Critical patent/FR2374726B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/39—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using thyristors or the avalanche or negative resistance type, e.g. PNPN, SCR, SCS, UJT
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/412—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using field-effect transistors only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0711—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors
    • H01L27/0716—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors in combination with vertical bipolar transistors and diodes, or capacitors, or resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/808—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a PN junction gate, e.g. PN homojunction gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices

Abstract

Mémoire à accès aléatoire présentant par élément un transistor à effet de champ à jonction comportant deux électrodes portes, qui peuvent être sélectionnées à l'aide d'une seule ligne à mot et d'une seule ligne à bit, alors qu'une électrode commune, notamment le substrat ou une zone de substrat commune aux éléments d'une mémoire fait office de l'une des électrodes principales du transistor à effet de champ à jonction. Application : mémoire à accès aléatoire.
FR7737830A 1976-12-17 1977-12-15 Memoire a acces aleatoire muni de transistor a effet de champ a jonction Granted FR2374726A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL7613999A NL7613999A (en) 1976-12-17 1976-12-17 RAM semiconductor device with conductor pattern selectors - has only two address conductors per cell allowing size redn.
NL7700880A NL7700880A (nl) 1976-12-17 1977-01-28 Naar willekeur toegankelijk geheugen met junctieveldeffekttransistoren.

Publications (2)

Publication Number Publication Date
FR2374726A1 true FR2374726A1 (fr) 1978-07-13
FR2374726B1 FR2374726B1 (fr) 1982-05-21

Family

ID=26645268

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7737830A Granted FR2374726A1 (fr) 1976-12-17 1977-12-15 Memoire a acces aleatoire muni de transistor a effet de champ a jonction

Country Status (12)

Country Link
US (1) US4126899A (fr)
JP (1) JPS5814748B2 (fr)
AU (1) AU509810B2 (fr)
BR (1) BR7708370A (fr)
DE (1) DE2755953C2 (fr)
ES (1) ES465088A1 (fr)
FR (1) FR2374726A1 (fr)
GB (1) GB1593435A (fr)
IT (1) IT1088593B (fr)
NL (1) NL7700880A (fr)
PL (1) PL115339B1 (fr)
SE (1) SE7714156L (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2726014A1 (de) * 1977-06-08 1978-12-21 Siemens Ag Dynamisches speicherelement
US5298787A (en) * 1979-08-10 1994-03-29 Massachusetts Institute Of Technology Semiconductor embedded layer technology including permeable base transistor
US4328511A (en) * 1979-12-10 1982-05-04 Texas Instruments Incorporated Taper isolated ram cell without gate oxide
US4706107A (en) * 1981-06-04 1987-11-10 Nippon Electric Co., Ltd. IC memory cells with reduced alpha particle influence
FR2566162B1 (fr) * 1984-06-13 1986-08-29 Thomson Csf Dispositif memoire d'image analogique utilisant le transfert de charge
AT380897B (de) * 1984-12-10 1986-07-25 Koller Anton Mischung zur pflege und reinigung von kontaktlinsen
EP0358668A1 (fr) * 1987-05-04 1990-03-21 University Of Waterloo Puce d'integration a tres grande echelle (vlsi)
TW289168B (fr) * 1991-12-16 1996-10-21 Philips Nv
JP2004235475A (ja) * 2003-01-30 2004-08-19 Nec Electronics Corp 半導体装置
US8014199B2 (en) * 2006-05-22 2011-09-06 Spansion Llc Memory system with switch element
US8547756B2 (en) 2010-10-04 2013-10-01 Zeno Semiconductor, Inc. Semiconductor memory device having an electrically floating body transistor
US7729149B2 (en) * 2007-05-01 2010-06-01 Suvolta, Inc. Content addressable memory cell including a junction field effect transistor
US20080273409A1 (en) * 2007-05-01 2008-11-06 Thummalapally Damodar R Junction field effect dynamic random access memory cell and applications therefor
US7692220B2 (en) * 2007-05-01 2010-04-06 Suvolta, Inc. Semiconductor device storage cell structure, method of operation, and method of manufacture
US8035139B2 (en) * 2007-09-02 2011-10-11 Suvolta, Inc. Dynamic random access memory having junction field effect transistor cell access device
US8130547B2 (en) 2007-11-29 2012-03-06 Zeno Semiconductor, Inc. Method of maintaining the state of semiconductor memory having electrically floating body transistor
SG10201700467UA (en) 2010-02-07 2017-02-27 Zeno Semiconductor Inc Semiconductor memory device having electrically floating body transistor, and having both volatile and non-volatile functionality and method
US10340276B2 (en) 2010-03-02 2019-07-02 Zeno Semiconductor, Inc. Method of maintaining the state of semiconductor memory having electrically floating body transistor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7208026A (fr) * 1972-06-13 1973-12-17
US3836992A (en) * 1973-03-16 1974-09-17 Ibm Electrically erasable floating gate fet memory cell
US3893152A (en) * 1973-07-25 1975-07-01 Hung Chang Lin Metal nitride oxide semiconductor integrated circuit structure

Also Published As

Publication number Publication date
AU3148777A (en) 1979-06-21
DE2755953A1 (de) 1978-06-22
AU509810B2 (en) 1980-05-22
SE7714156L (sv) 1978-06-18
US4126899A (en) 1978-11-21
PL115339B1 (en) 1981-03-31
NL7700880A (nl) 1978-08-01
DE2755953C2 (de) 1984-07-05
IT1088593B (it) 1985-06-10
BR7708370A (pt) 1979-07-17
JPS5814748B2 (ja) 1983-03-22
ES465088A1 (es) 1979-01-01
GB1593435A (en) 1981-07-15
PL202981A1 (pl) 1978-09-11
FR2374726B1 (fr) 1982-05-21
JPS5386590A (en) 1978-07-31

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