FR2359437A1 - Composition de photo-reserve amelioree - Google Patents

Composition de photo-reserve amelioree

Info

Publication number
FR2359437A1
FR2359437A1 FR7722422A FR7722422A FR2359437A1 FR 2359437 A1 FR2359437 A1 FR 2359437A1 FR 7722422 A FR7722422 A FR 7722422A FR 7722422 A FR7722422 A FR 7722422A FR 2359437 A1 FR2359437 A1 FR 2359437A1
Authority
FR
France
Prior art keywords
composition
photosensitizer
improved photo
reserve composition
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7722422A
Other languages
English (en)
Other versions
FR2359437B1 (fr
Inventor
Michael J Oddi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Publication of FR2359437A1 publication Critical patent/FR2359437A1/fr
Application granted granted Critical
Publication of FR2359437B1 publication Critical patent/FR2359437B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Abstract

L'invention décrit des compositions améliorées (plus souples) pour obtenir des photo-réserves. La composition comprend un photo-sensibilisateur, une matière polymère qui, par l'action d'un rayonnement sur le photo-sensibilisateur, est rendue développable et une matière résineuse colophanique (résine de colophane naturelle ou modifiée). Appliquée en solution et séchée, la composition peut servir à la production de plaques d'impression et pour la gravure et l'attaque sélective de métaux, notamment pour produire des circuits imprimés.
FR7722422A 1976-07-22 1977-07-21 Composition de photo-reserve amelioree Granted FR2359437A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/707,672 US4148654A (en) 1976-07-22 1976-07-22 Positive acting photoresist comprising diazide ester, novolak resin and rosin

Publications (2)

Publication Number Publication Date
FR2359437A1 true FR2359437A1 (fr) 1978-02-17
FR2359437B1 FR2359437B1 (fr) 1980-07-11

Family

ID=24842661

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7722422A Granted FR2359437A1 (fr) 1976-07-22 1977-07-21 Composition de photo-reserve amelioree

Country Status (7)

Country Link
US (1) US4148654A (fr)
JP (1) JPS6012621B2 (fr)
CA (1) CA1115586A (fr)
DE (1) DE2733267C2 (fr)
FR (1) FR2359437A1 (fr)
GB (1) GB1586586A (fr)
NL (1) NL7708170A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2510771A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations pour plaques lithographiques
FR2510770A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations, pour plaques lithographiques
BE1003337A3 (fr) * 1988-04-30 1992-03-03 Somar Corp Encre de reserve photodurcissable.

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532086A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photosensitive printing plate
US4247616A (en) * 1979-07-27 1981-01-27 Minnesota Mining And Manufacturing Company Positive-acting photoresist composition
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
EP0087262A1 (fr) * 1982-02-22 1983-08-31 Minnesota Mining And Manufacturing Company Compositions photosensibles à effet positif
JPS58187926A (ja) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd 放射線ネガ型レジストの現像方法
JPS59160139A (ja) * 1983-03-04 1984-09-10 Hitachi Ltd 感光性重合体組成物
EP0255989B1 (fr) * 1986-08-06 1990-11-22 Ciba-Geigy Ag Photoréserve négative à base de polyphénols et de composés époxydes ou de vinyléthers
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
JPH01501176A (ja) * 1986-10-20 1989-04-20 マクダーミッド，インコーポレーテッド 像反転可能なシステム及びプロセス
EP0280197A3 (fr) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Procédé de formation d'un patron formant photoréserve
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JPH0615587B2 (ja) * 1988-11-16 1994-03-02 ソマール株式会社 活性エネルギー線硬化型樹脂組成物
US5128232A (en) * 1989-05-22 1992-07-07 Shiply Company Inc. Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
US5210000A (en) * 1989-05-22 1993-05-11 Shipley Company Inc. Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
TW200739265A (en) * 2005-12-06 2007-10-16 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition and method of forming photoresist pattern using the same
US9583669B2 (en) * 2012-08-16 2017-02-28 Sun Chemical Corporation Inkjet printable etch resist
WO2019163286A1 (fr) * 2018-02-23 2019-08-29 富士フイルム株式会社 Précurseur positif de plaque d'impression lithographique et procédé de production d'une plaque d'impression lithographique

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78797C (fr) * 1949-07-23
NL87862C (fr) * 1951-08-20
US3025162A (en) * 1958-05-28 1962-03-13 Francis C Gilbert Dimension stabilized fixed photographic type emulsion and a method for producing same
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3634082A (en) * 1967-07-07 1972-01-11 Shipley Co Light-sensitive naphthoquinone diazide composition containing a polyvinyl ether
US3650754A (en) * 1969-07-31 1972-03-21 Keuffel & Esser Co Photoresist compositions containing limed rosin and photoactinator
US3713831A (en) * 1969-08-22 1973-01-30 Staley Mfg Co A E Coating composition comprising photoactivator and film-forming organic material for powder development
DE2622799A1 (de) * 1976-05-21 1977-12-08 Hoechst Ag Vorsensibilisierte flachdruckplatte

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2510771A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations pour plaques lithographiques
FR2510770A1 (fr) * 1981-06-15 1983-02-04 Polychrome Corp Composition sensible a l'exposition aux radiations, pour plaques lithographiques
BE1003337A3 (fr) * 1988-04-30 1992-03-03 Somar Corp Encre de reserve photodurcissable.

Also Published As

Publication number Publication date
DE2733267C2 (de) 1982-06-24
GB1586586A (en) 1981-03-18
CA1115586A (fr) 1982-01-05
DE2733267A1 (de) 1978-01-26
JPS6012621B2 (ja) 1985-04-02
FR2359437B1 (fr) 1980-07-11
US4148654A (en) 1979-04-10
NL7708170A (nl) 1978-01-24
JPS5340517A (en) 1978-04-13

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Legal Events

Date Code Title Description
ST Notification of lapse