BE1003337A3 - Encre de reserve photodurcissable. - Google Patents

Encre de reserve photodurcissable. Download PDF

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Publication number
BE1003337A3
BE1003337A3 BE8901152A BE8901152A BE1003337A3 BE 1003337 A3 BE1003337 A3 BE 1003337A3 BE 8901152 A BE8901152 A BE 8901152A BE 8901152 A BE8901152 A BE 8901152A BE 1003337 A3 BE1003337 A3 BE 1003337A3
Authority
BE
Belgium
Prior art keywords
weight
photosetting
acrylic
reserve ink
acrylic derivative
Prior art date
Application number
BE8901152A
Other languages
English (en)
Inventor
Osamu Ogitani
Takashi Shimizu
Ryuichi Fujii
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP63108503A priority Critical patent/JPH01278585A/ja
Priority to GB8923304A priority patent/GB2237887A/en
Application filed by Somar Corp filed Critical Somar Corp
Priority to BE8901152A priority patent/BE1003337A3/fr
Application granted granted Critical
Publication of BE1003337A3 publication Critical patent/BE1003337A3/fr

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

L'invention concerne une composition photodurcissable qui comprend les ingrédients (a)-(f) qui suivent : (a) 20-50% en poids d'une colophane modifiée; (b) 20 à 40% en poids d'un premier dérivé acrylique qui repond à la formule suivante: HOOC-Y-COO-CH2CH2OCO-CCH3=CH2, (c) 5-35% en poids d'un second dérivé acrylique choisi dans le groupe constitué par les acrylates d'hydroxyalkyle et les méthacrylates d'hydroxyalkyle; (d) 10 à 40% en poids d'un monomère autre que lesdits premier et second dérivés acryliques et possédant un radical à insaturation éthylénique; (e) 0,5 à 15% en poids d'un amorceur de photopolymérisation; et (f) 0,5-10% en poids d'un complexe organique de la montmorillonite.
BE8901152A 1988-04-30 1989-10-26 Encre de reserve photodurcissable. BE1003337A3 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP63108503A JPH01278585A (ja) 1988-04-30 1988-04-30 紫外線硬化性レジストインキ
GB8923304A GB2237887A (en) 1988-04-30 1989-10-16 Photocurable composition
BE8901152A BE1003337A3 (fr) 1988-04-30 1989-10-26 Encre de reserve photodurcissable.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63108503A JPH01278585A (ja) 1988-04-30 1988-04-30 紫外線硬化性レジストインキ
BE8901152A BE1003337A3 (fr) 1988-04-30 1989-10-26 Encre de reserve photodurcissable.

Publications (1)

Publication Number Publication Date
BE1003337A3 true BE1003337A3 (fr) 1992-03-03

Family

ID=25662482

Family Applications (1)

Application Number Title Priority Date Filing Date
BE8901152A BE1003337A3 (fr) 1988-04-30 1989-10-26 Encre de reserve photodurcissable.

Country Status (3)

Country Link
JP (1) JPH01278585A (fr)
BE (1) BE1003337A3 (fr)
GB (1) GB2237887A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0615587B2 (ja) * 1988-11-16 1994-03-02 ソマール株式会社 活性エネルギー線硬化型樹脂組成物
JP2743111B2 (ja) * 1990-05-31 1998-04-22 冨士薬品工業株式会社 光粘着化感光性組成物
US5258263A (en) * 1991-09-10 1993-11-02 Polaroid Corporation Printing plate and methods of making and use same
US5189090A (en) * 1991-11-22 1993-02-23 Westvaco Corporation Hydroxyacrylic modified grinding resins for water-based coatings
DE4416660A1 (de) * 1993-05-14 1994-11-17 Du Pont Verfahren zum Abscheiden eines Metalls auf einem Substrat aus einem Galvanisierbad
GB0221892D0 (en) 2002-09-20 2002-10-30 Avecia Ltd Process
JP7291727B2 (ja) * 2018-12-27 2023-06-15 株式会社カネカ レジストパターンの形成に用いられる樹脂組成物、及び半導体製品の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754920A (en) * 1971-04-30 1973-08-28 Du Pont Photopolymerizable elements of low optical density containing thickeners with discrete orderly orientation
FR2359437A1 (fr) * 1976-07-22 1978-02-17 Shipley Co Composition de photo-reserve amelioree
US4293636A (en) * 1980-06-27 1981-10-06 Tamura Kaken Co., Ltd. Photopolymerizable polyester containing compositions

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754920A (en) * 1971-04-30 1973-08-28 Du Pont Photopolymerizable elements of low optical density containing thickeners with discrete orderly orientation
FR2359437A1 (fr) * 1976-07-22 1978-02-17 Shipley Co Composition de photo-reserve amelioree
US4293636A (en) * 1980-06-27 1981-10-06 Tamura Kaken Co., Ltd. Photopolymerizable polyester containing compositions

Also Published As

Publication number Publication date
JPH01278585A (ja) 1989-11-08
GB8923304D0 (en) 1989-12-06
GB2237887A (en) 1991-05-15

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: SOMAR CORP.

Effective date: 19941031