FR2357931A1 - Compositions durcissables utilisables comme materiaux photoresistants - Google Patents

Compositions durcissables utilisables comme materiaux photoresistants

Info

Publication number
FR2357931A1
FR2357931A1 FR7721089A FR7721089A FR2357931A1 FR 2357931 A1 FR2357931 A1 FR 2357931A1 FR 7721089 A FR7721089 A FR 7721089A FR 7721089 A FR7721089 A FR 7721089A FR 2357931 A1 FR2357931 A1 FR 2357931A1
Authority
FR
France
Prior art keywords
curing compositions
photoresistant
materials
photoresistant materials
solvents
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7721089A
Other languages
English (en)
French (fr)
Other versions
FR2357931B1 (enExample
Inventor
James Vincent Crivello
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of FR2357931A1 publication Critical patent/FR2357931A1/fr
Application granted granted Critical
Publication of FR2357931B1 publication Critical patent/FR2357931B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
FR7721089A 1976-07-09 1977-07-08 Compositions durcissables utilisables comme materiaux photoresistants Granted FR2357931A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US73242176A 1976-10-14 1976-10-14

Publications (2)

Publication Number Publication Date
FR2357931A1 true FR2357931A1 (fr) 1978-02-03
FR2357931B1 FR2357931B1 (enExample) 1983-11-25

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7721089A Granted FR2357931A1 (fr) 1976-07-09 1977-07-08 Compositions durcissables utilisables comme materiaux photoresistants

Country Status (8)

Country Link
JP (1) JPS6035930B2 (enExample)
AU (1) AU517415B2 (enExample)
BR (1) BR7704527A (enExample)
DE (1) DE2730725A1 (enExample)
FR (1) FR2357931A1 (enExample)
GB (1) GB1554389A (enExample)
MX (2) MX145409A (enExample)
NL (1) NL183948C (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
ATE37242T1 (de) * 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
US7255926B2 (en) * 2002-02-01 2007-08-14 Shell Oil Company Barrier layer made of a curable resin containing polymeric polyol
IN2012DN03022A (enExample) 2009-10-01 2015-07-31 Hitachi Chemical Co Ltd
EP2562839A4 (en) 2010-04-22 2015-07-22 Hitachi Chemical Co Ltd ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND METHOD FOR PRODUCING THE SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATION DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE
KR20150127077A (ko) 2013-03-08 2015-11-16 히타치가세이가부시끼가이샤 이온성 화합물을 함유하는 처리액, 유기 일렉트로닉스 소자, 및 유기 일렉트로닉스 소자의 제조 방법

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
FR1082297A (fr) * 1952-08-19 1954-12-28 Philips Nv Procédé d'obtention d'images tannées
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR2269552A1 (enExample) * 1974-05-02 1975-11-28 Gen Electric
FR2269551A1 (enExample) * 1974-05-02 1975-11-28 Gen Electric
FR2270269A1 (enExample) * 1974-05-08 1975-12-05 Minnesota Mining & Mfg
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1512981A (en) * 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
FR1082297A (fr) * 1952-08-19 1954-12-28 Philips Nv Procédé d'obtention d'images tannées
DE972998C (de) * 1952-08-19 1959-11-12 Philips Nv Verfahren zur Herstellung von Gerbbildern aus Kunststoffen zur Verwendung als Druckformen
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
FR2269552A1 (enExample) * 1974-05-02 1975-11-28 Gen Electric
FR2269551A1 (enExample) * 1974-05-02 1975-11-28 Gen Electric
FR2270269A1 (enExample) * 1974-05-08 1975-12-05 Minnesota Mining & Mfg
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Also Published As

Publication number Publication date
NL7707609A (nl) 1978-01-11
AU517415B2 (en) 1981-07-30
GB1554389A (en) 1979-10-17
AU2553177A (en) 1978-11-30
FR2357931B1 (enExample) 1983-11-25
MX145409A (es) 1982-02-04
DE2730725C2 (enExample) 1990-08-16
BR7704527A (pt) 1978-04-25
DE2730725A1 (de) 1978-01-12
NL183948C (nl) 1989-03-01
MX159499A (es) 1989-06-20
JPS5322597A (en) 1978-03-02
JPS6035930B2 (ja) 1985-08-17
NL183948B (nl) 1988-10-03

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Legal Events

Date Code Title Description
ST Notification of lapse