ATE40482T1 - Lichtempfindliches material mit sichtbarer belichtungsindikation. - Google Patents
Lichtempfindliches material mit sichtbarer belichtungsindikation.Info
- Publication number
- ATE40482T1 ATE40482T1 AT84302956T AT84302956T ATE40482T1 AT E40482 T1 ATE40482 T1 AT E40482T1 AT 84302956 T AT84302956 T AT 84302956T AT 84302956 T AT84302956 T AT 84302956T AT E40482 T1 ATE40482 T1 AT E40482T1
- Authority
- AT
- Austria
- Prior art keywords
- sensitive material
- light sensitive
- compositions
- resin
- visible exposure
- Prior art date
Links
- 239000000203 mixture Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 150000003839 salts Chemical class 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Photoreceptors In Electrophotography (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB08312416A GB2139369B (en) | 1983-05-06 | 1983-05-06 | Photosensitive systems showing visible indication of exposure |
| EP84302956A EP0125102B1 (de) | 1983-05-06 | 1984-05-02 | Lichtempfindliches Material mit sichtbarer Belichtungsindikation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE40482T1 true ATE40482T1 (de) | 1989-02-15 |
Family
ID=10542261
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT84302956T ATE40482T1 (de) | 1983-05-06 | 1984-05-02 | Lichtempfindliches material mit sichtbarer belichtungsindikation. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4659649A (de) |
| EP (1) | EP0125102B1 (de) |
| AT (1) | ATE40482T1 (de) |
| DE (1) | DE3476472D1 (de) |
| GB (1) | GB2139369B (de) |
Families Citing this family (58)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4882245A (en) * | 1985-10-28 | 1989-11-21 | International Business Machines Corporation | Photoresist composition and printed circuit boards and packages made therewith |
| CA1301959C (en) * | 1986-12-04 | 1992-05-26 | Akisato Katanosaka | Dosimeter |
| US5439766A (en) * | 1988-12-30 | 1995-08-08 | International Business Machines Corporation | Composition for photo imaging |
| US6180317B1 (en) | 1988-12-30 | 2001-01-30 | International Business Machines Corporation | Composition for photoimaging |
| US5264325A (en) * | 1988-12-30 | 1993-11-23 | International Business Machines Corporation | Composition for photo imaging |
| US5026624A (en) * | 1989-03-03 | 1991-06-25 | International Business Machines Corporation | Composition for photo imaging |
| US5747223A (en) * | 1988-12-30 | 1998-05-05 | International Business Machines Corporation | Composition for photoimaging |
| US5304457A (en) * | 1989-03-03 | 1994-04-19 | International Business Machines Corporation | Composition for photo imaging |
| US5278010A (en) * | 1989-03-03 | 1994-01-11 | International Business Machines Corporation | Composition for photo imaging |
| US5391465A (en) * | 1989-06-20 | 1995-02-21 | Rohm And Haas Company | Method of using selected photoactive compounds in high resolution, acid hardening photoresists with near ultraviolet radiation wherein the photoresist comprise conventional deep UV photoacid generators |
| US5264329A (en) * | 1989-09-18 | 1993-11-23 | Dupont (U.K.) Limited | Radiation sensitive compositions |
| GB8921116D0 (en) * | 1989-09-18 | 1989-11-01 | Du Pont | Improvements in or relating to radiation sensitive compositions |
| US5212046A (en) * | 1989-10-17 | 1993-05-18 | Shipley Company Inc. | Near UV photoresist |
| JPH04113362A (ja) * | 1990-09-03 | 1992-04-14 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| JP2977265B2 (ja) * | 1990-11-19 | 1999-11-15 | 旭化成工業株式会社 | 感光性エラストマー構成体 |
| EP0711802B1 (de) * | 1990-12-28 | 1999-10-06 | Dow Corning Corporation | Verfahren zur Sichtbarmachung der Härtung einer UV-härtbaren Zusammensetzung durch Farbänderung |
| US5221590A (en) * | 1991-04-15 | 1993-06-22 | Eastman Kodak Company | Photoelectrographic imaging with dyes or pigments to effect a color density or hue shift |
| US5439779A (en) * | 1993-02-22 | 1995-08-08 | International Business Machines Corporation | Aqueous soldermask |
| US6020436A (en) * | 1993-03-09 | 2000-02-01 | The Chromaline Corporation | Photosensitive resin composition |
| US5314747A (en) * | 1993-03-19 | 1994-05-24 | Xerox Corporation | Recording sheets containing cationic sulfur compounds |
| GB2277382A (en) * | 1993-04-19 | 1994-10-26 | Pan Graphics Ind Limited | Photoresist composition |
| US5741630A (en) * | 1994-04-25 | 1998-04-21 | Polaroid Corporation | Process for fixing an image, and medium for use therein |
| US5885746A (en) * | 1994-12-29 | 1999-03-23 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate |
| AU710052B2 (en) * | 1995-09-09 | 1999-09-09 | Avecia Limited | Process for producing polymeric layers having selectively coloured regions |
| JPH0990621A (ja) * | 1995-09-21 | 1997-04-04 | Canon Inc | レジスト組成物、同組成物を用いるパターン形成方法、および半導体デバイスの製造方法 |
| US5942554A (en) * | 1996-02-20 | 1999-08-24 | Spectra Group Limited, Inc. | Method for forming highly colored polymeric bodies |
| TW460509B (en) | 1996-07-12 | 2001-10-21 | Ciba Sc Holding Ag | Curing process for cationically photocurable formulations |
| US6313188B1 (en) * | 1996-09-19 | 2001-11-06 | Nippon Soda Co., Ltd. | Photocationically polymerizable composition comprising a polycyclic aromatic compound |
| TW439016B (en) * | 1996-09-20 | 2001-06-07 | Sumitomo Chemical Co | Positive resist composition |
| US6432610B1 (en) * | 1998-09-08 | 2002-08-13 | Regents Of The University Of California | Dye precursor molecules chemically reactive with the light-altered form of light-sensitive molecules to form stable fluorescent dye, particularly for optical memories including two-photon three-dimensional optical memories |
| US6309797B1 (en) | 2000-04-26 | 2001-10-30 | Spectra Group Limited, Inc. | Selectively colorable polymerizable compositions |
| US6433035B1 (en) * | 2000-08-14 | 2002-08-13 | Spectra Group Limited, Inc. | Selectively colorable polymerizable compositions |
| US20030087178A1 (en) * | 2001-04-20 | 2003-05-08 | Adrian Lungu | Photopolymerizable element for use as a flexographic printing plate and a process for preparing the plate from the element |
| US7393623B2 (en) * | 2001-06-06 | 2008-07-01 | Spectra Systems Corporation | Incorporation of markings in optical media |
| US20050018595A1 (en) * | 2001-06-06 | 2005-01-27 | Spectra Systems Corporation | System for applying markings to optical media |
| EP1393311B1 (de) * | 2001-06-06 | 2011-03-16 | Spectra Systems Corporation | Markieren und authentisieren von artikeln |
| US20030073031A1 (en) * | 2001-08-16 | 2003-04-17 | Rentzepis Peter M. | Dye precursor molecules chemically reactive with the light-altered form of light-sensitive molecules to form stable fluorescent dye, particularly for optical memories including two-photon three-dimensional optical memories |
| US20030149124A1 (en) * | 2001-11-27 | 2003-08-07 | Thommes Glen A. | Radiation curable resin composition for making colored three dimensional objects |
| US7147801B2 (en) * | 2003-03-13 | 2006-12-12 | Videojet Technologies Inc. | Ink jet ink composition and method for security marking |
| US6924085B2 (en) * | 2003-03-18 | 2005-08-02 | Printing Developments, Inc. | Photoresist coatings for copper clad stainless steel printing plates |
| US7910223B2 (en) | 2003-07-17 | 2011-03-22 | Honeywell International Inc. | Planarization films for advanced microelectronic applications and devices and methods of production thereof |
| US7553603B2 (en) * | 2007-06-13 | 2009-06-30 | Xerox Corporation | Inkless printing paper and method |
| US7666558B2 (en) * | 2007-06-13 | 2010-02-23 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7718325B2 (en) * | 2007-06-13 | 2010-05-18 | Xerox Corporation | Photochromic material, inkless reimageable printing paper, and methods |
| US20080311493A1 (en) * | 2007-06-13 | 2008-12-18 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7655366B2 (en) | 2007-06-13 | 2010-02-02 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7572569B2 (en) * | 2007-06-13 | 2009-08-11 | Xerox Corporation | Inkless printing paper and method |
| US7572560B2 (en) * | 2007-06-13 | 2009-08-11 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7645558B2 (en) * | 2007-06-13 | 2010-01-12 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7569316B2 (en) * | 2007-06-13 | 2009-08-04 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7867672B2 (en) * | 2007-06-13 | 2011-01-11 | Xerox Corporation | Reimageable paper protected against UV light |
| US7852366B2 (en) * | 2007-06-13 | 2010-12-14 | Xerox Corporation | System and method for printing reimageable transient documents |
| US7588878B2 (en) * | 2007-06-13 | 2009-09-15 | Xerox Corporation | Inkless printing paper and method |
| US7582398B2 (en) * | 2007-06-13 | 2009-09-01 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7541119B2 (en) * | 2007-06-13 | 2009-06-02 | Xerox Corporation | Inkless reimageable printing paper and method |
| US7645560B1 (en) | 2008-09-08 | 2010-01-12 | Xerox Corporation | Inkless reimageable printing paper and method |
| US9658101B1 (en) | 2016-03-10 | 2017-05-23 | Jads International LLC | Multi-layer dosimeter usable with sunscreen and methods for preparation and use |
| EP3500636A4 (de) | 2016-08-19 | 2020-04-22 | Jads International LLC | Photochrome zusammensetzungen, marker damit sowie systeme und verfahren zu deren verwendung |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2066913A (en) * | 1936-08-10 | 1937-01-05 | John D Schmieg | Apparatus for removing foreign material from air |
| NL76649C (de) * | 1949-04-09 | |||
| GB844039A (en) * | 1959-02-20 | 1960-08-10 | Kalle & Co Ag | Improvements in or relating to photo-mechanical reproduction |
| NL292007A (de) * | 1962-04-27 | |||
| US3598592A (en) * | 1967-11-07 | 1971-08-10 | Du Pont | Storage-stable photosensitive aminotriarylmethane/selected organic photooxidant compositions |
| GB1386586A (en) * | 1970-12-30 | 1975-03-12 | Kodak Ltd | Preparation of resist images |
| US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| GB1516511A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Curable epoxide compositions |
| US4264703A (en) * | 1974-05-02 | 1981-04-28 | General Electric Company | Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts |
| US4026705A (en) * | 1975-05-02 | 1977-05-31 | General Electric Company | Photocurable compositions and methods |
| GB1556362A (en) * | 1975-06-28 | 1979-11-21 | Vickers Ltd | Radiation sensitive materials |
| AU517415B2 (en) * | 1976-07-09 | 1981-07-30 | General Electric Company | Curable polymer composition |
| US4193799A (en) * | 1976-07-09 | 1980-03-18 | General Electric Company | Method of making printing plates and printed circuit |
| DE2641099A1 (de) * | 1976-09-13 | 1978-03-16 | Hoechst Ag | Lichtempfindliche kopierschicht |
| GB2005855A (en) * | 1977-10-03 | 1979-04-25 | Polychrome Corp | Lithographic imaging composition having improved image visibility |
| CA1164710A (en) * | 1978-05-09 | 1984-04-03 | Edward J. Reardon, Jr. | Phototropic photosensitive compositions containing fluoran colorformer |
| JPS5555335A (en) * | 1978-10-19 | 1980-04-23 | Fuji Photo Film Co Ltd | Photosensitive composition |
| US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
| US4350753A (en) * | 1981-06-15 | 1982-09-21 | Polychrome Corporation | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff |
| GB2137626B (en) * | 1983-03-31 | 1986-10-15 | Sericol Group Ltd | Water based photopolymerisable compositions and their use |
-
1983
- 1983-05-06 GB GB08312416A patent/GB2139369B/en not_active Expired
-
1984
- 1984-04-30 US US06/605,252 patent/US4659649A/en not_active Expired - Fee Related
- 1984-05-02 EP EP84302956A patent/EP0125102B1/de not_active Expired
- 1984-05-02 DE DE8484302956T patent/DE3476472D1/de not_active Expired
- 1984-05-02 AT AT84302956T patent/ATE40482T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| GB8312416D0 (en) | 1983-06-08 |
| DE3476472D1 (en) | 1989-03-02 |
| GB2139369B (en) | 1987-01-21 |
| EP0125102A2 (de) | 1984-11-14 |
| GB2139369A (en) | 1984-11-07 |
| EP0125102B1 (de) | 1989-01-25 |
| US4659649A (en) | 1987-04-21 |
| EP0125102A3 (en) | 1985-11-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification | ||
| REN | Ceased due to non-payment of the annual fee | ||
| RZN | Patent revoked |