ES2017615B3 - Composicion de foto-resistencia y circuito impreso. - Google Patents

Composicion de foto-resistencia y circuito impreso.

Info

Publication number
ES2017615B3
ES2017615B3 ES86114201T ES86114201T ES2017615B3 ES 2017615 B3 ES2017615 B3 ES 2017615B3 ES 86114201 T ES86114201 T ES 86114201T ES 86114201 T ES86114201 T ES 86114201T ES 2017615 B3 ES2017615 B3 ES 2017615B3
Authority
ES
Spain
Prior art keywords
printed circuit
photo
resistance composition
photosensitizer
packages
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES86114201T
Other languages
English (en)
Inventor
Jeffrey Donald Gelorme
Robert James Cox
Sergio Adolfo Ruiz Gutierrez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of ES2017615B3 publication Critical patent/ES2017615B3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Epoxy Resins (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
ES86114201T 1985-10-28 1986-10-14 Composicion de foto-resistencia y circuito impreso. Expired - Lifetime ES2017615B3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79188685A 1985-10-28 1985-10-28

Publications (1)

Publication Number Publication Date
ES2017615B3 true ES2017615B3 (es) 1991-03-01

Family

ID=25155093

Family Applications (1)

Application Number Title Priority Date Filing Date
ES86114201T Expired - Lifetime ES2017615B3 (es) 1985-10-28 1986-10-14 Composicion de foto-resistencia y circuito impreso.

Country Status (7)

Country Link
EP (1) EP0222187B1 (es)
JP (1) JPH0778628B2 (es)
AT (1) ATE56828T1 (es)
BR (1) BR8604549A (es)
CA (1) CA1289803C (es)
DE (1) DE3674340D1 (es)
ES (1) ES2017615B3 (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62273226A (ja) * 1986-05-20 1987-11-27 Nippon Soda Co Ltd 無電解メッキ用光硬化性レジスト樹脂組成物
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
EP0255989B1 (de) * 1986-08-06 1990-11-22 Ciba-Geigy Ag Negativ-Photoresist auf Basis von Polyphenolen und Epoxidverbindungen oder Vinylethern
JPS6454442A (en) * 1987-08-25 1989-03-01 Nippon Soda Co Photocurable resist resin composition for chemical plating
US4927983A (en) * 1988-12-16 1990-05-22 International Business Machines Corporation Circuit board
US5026624A (en) * 1989-03-03 1991-06-25 International Business Machines Corporation Composition for photo imaging
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
US5229251A (en) * 1991-04-29 1993-07-20 International Business Machines Corp. Dry developable photoresist containing an epoxide, organosilicon and onium salt
JPH1041633A (ja) * 1996-07-25 1998-02-13 Hitachi Ltd 多層配線板とそれに用いる感光性樹脂組成物
US20050260522A1 (en) * 2004-02-13 2005-11-24 William Weber Permanent resist composition, cured product thereof, and use thereof
US20060188820A1 (en) * 2004-03-26 2006-08-24 Hiroki Maeda Photosensitive resin composition and method of forming a pattern using the composition
JP5039442B2 (ja) 2007-06-15 2012-10-03 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体、及びパターン形成方法
WO2011061708A2 (en) 2009-11-18 2011-05-26 Ecole Polytechnique Federale De Lausanne (Epfl) Carbon nanotubes/su-8 nanocomposites for microfabrication applications

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3483615A (en) * 1966-03-28 1969-12-16 Rca Corp Printed circuit boards
GB1539192A (en) * 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4245029A (en) * 1979-08-20 1981-01-13 General Electric Company Photocurable compositions using triarylsulfonium salts
US4319974A (en) * 1980-04-21 1982-03-16 General Electric Company UV Curable compositions and substrates treated therewith
CA1240439A (en) * 1983-02-07 1988-08-09 Union Carbide Corporation Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl content
JPS59147016A (ja) * 1983-02-07 1984-08-23 ユニオン，カ−バイド，コ−ポレ−シヨン エポキシ含有有機物質の混合物
CA1243147A (en) * 1983-02-07 1988-10-11 Union Carbide Corporation Photocopolymerizable compositions based on epoxy and hydroxyl containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents

Also Published As

Publication number Publication date
CA1289803C (en) 1991-10-01
EP0222187A3 (en) 1987-12-02
JPS62102242A (ja) 1987-05-12
EP0222187A2 (en) 1987-05-20
ATE56828T1 (de) 1990-10-15
JPH0778628B2 (ja) 1995-08-23
EP0222187B1 (en) 1990-09-19
BR8604549A (pt) 1987-05-26
DE3674340D1 (de) 1990-10-25

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