FR2269551B1 - - Google Patents

Info

Publication number
FR2269551B1
FR2269551B1 FR7513519A FR7513519A FR2269551B1 FR 2269551 B1 FR2269551 B1 FR 2269551B1 FR 7513519 A FR7513519 A FR 7513519A FR 7513519 A FR7513519 A FR 7513519A FR 2269551 B1 FR2269551 B1 FR 2269551B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7513519A
Other languages
French (fr)
Other versions
FR2269551A1 (enrdf_load_html_response
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of FR2269551A1 publication Critical patent/FR2269551A1/fr
Application granted granted Critical
Publication of FR2269551B1 publication Critical patent/FR2269551B1/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/68Arsenic compounds without As—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90Antimony compounds
    • C07F9/902Compounds without antimony-carbon linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Reinforced Plastic Materials (AREA)
FR7513519A 1974-05-02 1975-04-30 Expired FR2269551B1 (enrdf_load_html_response)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637474A 1974-05-02 1974-05-02

Publications (2)

Publication Number Publication Date
FR2269551A1 FR2269551A1 (enrdf_load_html_response) 1975-11-28
FR2269551B1 true FR2269551B1 (enrdf_load_html_response) 1978-09-01

Family

ID=23851510

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7513519A Expired FR2269551B1 (enrdf_load_html_response) 1974-05-02 1975-04-30

Country Status (5)

Country Link
JP (1) JPS5214278B2 (enrdf_load_html_response)
BE (1) BE828670A (enrdf_load_html_response)
DE (3) DE2559718C2 (enrdf_load_html_response)
FR (1) FR2269551B1 (enrdf_load_html_response)
GB (2) GB1516511A (enrdf_load_html_response)

Families Citing this family (111)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4108747A (en) * 1976-07-14 1978-08-22 General Electric Company Curable compositions and method for curing such compositions
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
US4102687A (en) * 1977-02-14 1978-07-25 General Electric Company UV Curable composition of a thermosetting condensation resin and Group VIa onium salt
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1604954A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
GB1596000A (en) * 1977-09-14 1981-08-19 Gen Electric Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4319974A (en) * 1980-04-21 1982-03-16 General Electric Company UV Curable compositions and substrates treated therewith
JPS57125212A (en) 1981-01-27 1982-08-04 Toshiba Corp Photo-polymerizable composition
US4387216A (en) 1981-05-06 1983-06-07 Ciba-Geigy Corporation Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants
DE3135636A1 (de) 1981-09-09 1983-03-17 Basf Ag, 6700 Ludwigshafen Haertbare epoxidharze
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
JPS61242615A (ja) * 1985-04-18 1986-10-28 Nippon Air Filter Kk 集塵方法及びその装置
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US5399596A (en) * 1988-03-03 1995-03-21 Sanshin Kagaku Kogyo Co., Ltd. Polyfluoride sulfonium compounds and polymerization initiator thereof
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
US4871786A (en) * 1988-10-03 1989-10-03 Minnesota Mining And Manufacturing Company Organic fluoride sources
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
DE3902114A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH0347573A (ja) * 1989-07-12 1991-02-28 Ishigaki Kiko Kk 微粉体の分級方法並びにその装置
DE3933420C1 (enrdf_load_html_response) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
JP2697937B2 (ja) * 1989-12-15 1998-01-19 キヤノン株式会社 活性エネルギー線硬化性樹脂組成物
KR960000980B1 (ko) * 1990-03-27 1996-01-15 가부시기가이샤 히다찌 세이사꾸쇼 무전해도금용 기재 접착제, 이 접착제를 사용한 프린트 회로판 및 이의 용도
US5108859A (en) * 1990-04-16 1992-04-28 Eastman Kodak Company Photoelectrographic elements and imaging method
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
EP0503774B1 (en) * 1991-02-16 1997-05-14 Canon Kabushiki Kaisha Optical recording medium
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
US5466845A (en) * 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
GB9309275D0 (en) * 1993-05-05 1993-06-16 Smith & Nephew Orthopaedic material
US5502083A (en) * 1993-06-18 1996-03-26 Nippon Kayaku Kabushiki Kaisha Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
EP0927726B1 (en) 1996-09-19 2004-11-10 Nippon Soda Co., Ltd. Photocatalytic composition
JPH1087963A (ja) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Jsr株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Jsr株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Jsr株式会社 光学的立体造形用光硬化性樹脂組成物
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
FR2794126B1 (fr) * 1999-05-26 2003-07-18 Gemplus Card Int Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur
JP2003073481A (ja) 2001-09-06 2003-03-12 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP2003105077A (ja) 2001-09-28 2003-04-09 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP4701231B2 (ja) * 2002-02-13 2011-06-15 富士フイルム株式会社 電子線、euv又はx線用ネガ型レジスト組成物及びそれを用いたパターン形成方法
WO2003074509A1 (fr) 2002-03-04 2003-09-12 Wako Pure Chemical Industries, Ltd. Sels d'onium comportant des heterocycles
EP1348727A3 (en) 2002-03-29 2003-12-03 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
JP4533639B2 (ja) * 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP2006335826A (ja) 2005-05-31 2006-12-14 Fujifilm Holdings Corp インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
JP2007254454A (ja) * 2006-02-23 2007-10-04 Fujifilm Corp スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
EP1955858B1 (en) 2007-02-06 2014-06-18 FUJIFILM Corporation Ink-jet recording method and device
EP1955850B1 (en) 2007-02-07 2011-04-20 FUJIFILM Corporation Ink-jet recording device having ink-jet head maintenance device and ink-jet head maintenance method
JP5227521B2 (ja) 2007-02-26 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、インクセット
JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
JP5306681B2 (ja) 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP5208573B2 (ja) * 2008-05-06 2013-06-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
JP2010077228A (ja) 2008-09-25 2010-04-08 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2010180330A (ja) 2009-02-05 2010-08-19 Fujifilm Corp 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
EP2399905B1 (en) 2009-02-20 2014-01-22 San-Apro Limited Sulfonium salt, photo-acid generator, and photosensitive resin composition
JP5349095B2 (ja) 2009-03-17 2013-11-20 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349097B2 (ja) 2009-03-19 2013-11-20 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5383289B2 (ja) 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
JP2010241948A (ja) 2009-04-06 2010-10-28 Shin-Etsu Chemical Co Ltd 放射線硬化性シリコーン組成物
JP5572026B2 (ja) 2009-09-18 2014-08-13 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5530141B2 (ja) 2009-09-29 2014-06-25 富士フイルム株式会社 インク組成物及びインクジェット記録方法
TWI498350B (zh) 2009-10-01 2015-09-01 Hitachi Chemical Co Ltd 有機電子用材料、有機電子元件、有機電激發光元件、及使用其之顯示元件、照明裝置、顯示裝置
KR101485470B1 (ko) 2010-04-22 2015-01-22 히타치가세이가부시끼가이샤 유기 일렉트로닉스 재료, 중합 개시제 및 열중합 개시제, 잉크 조성물, 유기 박막 및 그 제조 방법, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 조명 장치, 표시 소자, 및 표시 장치
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
EP2644664B1 (en) 2012-03-29 2015-07-29 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
WO2013172407A1 (ja) 2012-05-18 2013-11-21 シーメット株式会社 光学的立体造形用樹脂組成物
KR101959107B1 (ko) 2012-10-18 2019-03-15 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
US9465288B2 (en) 2012-12-07 2016-10-11 Dsp Gokyo Food & Chemical Co., Ltd. Sulfonium salt compound, method for producing the same, and photoacid generator
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
CN105027677B (zh) 2013-03-08 2018-05-25 日立化成株式会社 含有离子性化合物的处理液、有机电子元件和有机电子元件的制造方法
US20160368879A1 (en) 2013-07-05 2016-12-22 San-Apro Ltd. Photoacid generator, and resin composition for photolithography
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット
KR102290265B1 (ko) 2013-11-25 2021-08-13 후지필름 와코 준야쿠 가부시키가이샤 산 및 라디칼 발생제, 그리고 산 및 라디칼 발생 방법
TWI623519B (zh) * 2014-02-19 2018-05-11 日本化藥股份有限公司 新穎化合物、含有該化合物之光酸產生劑及含有該光酸產生劑之感光性樹脂組合物
JP6195413B2 (ja) 2014-03-05 2017-09-13 信越化学工業株式会社 放射線硬化性シリコーン組成物
CN113264856B (zh) 2014-09-26 2022-11-22 东京应化工业株式会社 锍盐、光产酸剂及感光性组合物
CN106795107B (zh) 2014-11-07 2021-05-28 三亚普罗股份有限公司 磺酸酯化合物、光酸产生剂及光刻用树脂组合物
JP6708382B2 (ja) 2015-09-03 2020-06-10 サンアプロ株式会社 硬化性組成物及びそれを用いた硬化体
KR102272225B1 (ko) 2016-06-09 2021-07-01 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
JP6924754B2 (ja) 2016-06-29 2021-08-25 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物、及びその硬化体
JP6902031B2 (ja) 2016-07-28 2021-07-14 サンアプロ株式会社 スルホニウム塩、熱又は光酸発生剤、熱又は光硬化性組成物及びその硬化体
KR102438543B1 (ko) 2016-12-12 2022-08-30 산아프로 가부시키가이샤 광산 발생제 및 포토리소그래피용 수지 조성물
US11926581B2 (en) 2018-05-25 2024-03-12 San-Apro Limited Sulfonium salt, photoacid generator, curable composition, and resist composition
JP7116669B2 (ja) 2018-11-22 2022-08-10 サンアプロ株式会社 光酸発生剤及びフォトリソグラフィー用樹脂組成物
KR102840667B1 (ko) 2019-01-10 2025-07-30 산아프로 가부시키가이샤 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물
WO2021186846A1 (ja) 2020-03-17 2021-09-23 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
JP7594374B2 (ja) 2020-07-08 2024-12-04 サンアプロ株式会社 ネガ型感光性樹脂組成物、パターン形成方法及び積層フィルム

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3412046A (en) 1965-07-01 1968-11-19 Dexter Corp Catalyzed polyepoxide-anhydride resin systems

Also Published As

Publication number Publication date
DE2559718A1 (de) 1977-08-18
JPS50151997A (enrdf_load_html_response) 1975-12-06
BE828670A (fr) 1975-09-01
GB1516511A (en) 1978-07-05
DE2559833C2 (de) 1983-12-22
GB1516512A (en) 1978-07-05
JPS5214278B2 (enrdf_load_html_response) 1977-04-20
DE2559718C2 (de) 1983-08-04
DE2518652C2 (de) 1983-05-11
DE2518652A1 (de) 1975-11-06
FR2269551A1 (enrdf_load_html_response) 1975-11-28

Similar Documents

Publication Publication Date Title
FR2269551B1 (enrdf_load_html_response)
FR2269552B1 (enrdf_load_html_response)
DK140600C (enrdf_load_html_response)
FI750111A7 (enrdf_load_html_response)
FR2257372B3 (enrdf_load_html_response)
DK161075A (enrdf_load_html_response)
AU471463B2 (enrdf_load_html_response)
AU474179B2 (enrdf_load_html_response)
CU34066A (enrdf_load_html_response)
AU6717074A (enrdf_load_html_response)
AR198999Q (enrdf_load_html_response)
AR198841Q (enrdf_load_html_response)
CS172149B1 (enrdf_load_html_response)
AU480247A (enrdf_load_html_response)
BG20682A1 (enrdf_load_html_response)
DD113339A1 (enrdf_load_html_response)
AU480308A (enrdf_load_html_response)
DD114105A1 (enrdf_load_html_response)
DD110682A1 (enrdf_load_html_response)
DD115152A1 (enrdf_load_html_response)
BG20468A1 (enrdf_load_html_response)
AU479777A (enrdf_load_html_response)
CH594767A5 (enrdf_load_html_response)
DD117135A1 (enrdf_load_html_response)
AU480660A (enrdf_load_html_response)

Legal Events

Date Code Title Description
ST Notification of lapse