FR2081017A2 - Fabrication of a semiconductor device - Google Patents
Fabrication of a semiconductor deviceInfo
- Publication number
- FR2081017A2 FR2081017A2 FR7105551A FR7105551A FR2081017A2 FR 2081017 A2 FR2081017 A2 FR 2081017A2 FR 7105551 A FR7105551 A FR 7105551A FR 7105551 A FR7105551 A FR 7105551A FR 2081017 A2 FR2081017 A2 FR 2081017A2
- Authority
- FR
- France
- Prior art keywords
- silicon
- layer
- semiconductor
- configuration
- conductivity type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W10/012—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
- H10D84/401—Combinations of FETs or IGBTs with BJTs
- H10D84/403—Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
-
- H10P14/61—
-
- H10W10/0121—
-
- H10W10/0126—
-
- H10W10/13—
Landscapes
- Element Separation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL666614016A NL153374B (nl) | 1966-10-05 | 1966-10-05 | Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze. |
| NL7002384.A NL159817B (nl) | 1966-10-05 | 1970-02-19 | Werkwijze ter vervaardiging van een halfgeleiderinrichting. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2081017A2 true FR2081017A2 (en) | 1971-11-26 |
| FR2081017B2 FR2081017B2 (OSRAM) | 1976-03-19 |
Family
ID=26644100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7105551A Granted FR2081017A2 (en) | 1966-10-05 | 1971-02-18 | Fabrication of a semiconductor device |
Country Status (5)
| Country | Link |
|---|---|
| AT (1) | AT339959B (OSRAM) |
| DE (1) | DE2105178C3 (OSRAM) |
| FR (1) | FR2081017A2 (OSRAM) |
| NL (1) | NL159817B (OSRAM) |
| SE (1) | SE372139B (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2132347A1 (OSRAM) * | 1971-04-03 | 1972-11-17 | Philips Nv | |
| FR2308204A1 (fr) * | 1975-04-16 | 1976-11-12 | Ibm | Procede de fabrication de regions de circuit integre definies par une isolation dielectrique encastree |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3254277A (en) * | 1963-02-27 | 1966-05-31 | United Aircraft Corp | Integrated circuit with component defining groove |
| US3411051A (en) * | 1964-12-29 | 1968-11-12 | Texas Instruments Inc | Transistor with an isolated region having a p-n junction extending from the isolation wall to a surface |
| FR1594694A (OSRAM) * | 1967-10-28 | 1970-07-17 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3386865A (en) * | 1965-05-10 | 1968-06-04 | Ibm | Process of making planar semiconductor devices isolated by encapsulating oxide filled channels |
| NL153374B (nl) * | 1966-10-05 | 1977-05-16 | Philips Nv | Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze. |
| US3488564A (en) * | 1968-04-01 | 1970-01-06 | Fairchild Camera Instr Co | Planar epitaxial resistors |
| US3649386A (en) * | 1968-04-23 | 1972-03-14 | Bell Telephone Labor Inc | Method of fabricating semiconductor devices |
-
1970
- 1970-02-19 NL NL7002384.A patent/NL159817B/xx unknown
-
1971
- 1971-02-04 DE DE2105178A patent/DE2105178C3/de not_active Expired
- 1971-02-16 AT AT130671A patent/AT339959B/de not_active IP Right Cessation
- 1971-02-16 SE SE7101978A patent/SE372139B/xx unknown
- 1971-02-18 FR FR7105551A patent/FR2081017A2/fr active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3254277A (en) * | 1963-02-27 | 1966-05-31 | United Aircraft Corp | Integrated circuit with component defining groove |
| US3411051A (en) * | 1964-12-29 | 1968-11-12 | Texas Instruments Inc | Transistor with an isolated region having a p-n junction extending from the isolation wall to a surface |
| FR1594694A (OSRAM) * | 1967-10-28 | 1970-07-17 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2132347A1 (OSRAM) * | 1971-04-03 | 1972-11-17 | Philips Nv | |
| FR2308204A1 (fr) * | 1975-04-16 | 1976-11-12 | Ibm | Procede de fabrication de regions de circuit integre definies par une isolation dielectrique encastree |
Also Published As
| Publication number | Publication date |
|---|---|
| NL7002384A (OSRAM) | 1971-08-23 |
| SE372139B (OSRAM) | 1974-12-09 |
| AT339959B (de) | 1977-11-25 |
| ATA130671A (de) | 1977-03-15 |
| DE2105178B2 (de) | 1979-07-12 |
| NL159817B (nl) | 1979-03-15 |
| DE2105178C3 (de) | 1983-12-22 |
| FR2081017B2 (OSRAM) | 1976-03-19 |
| DE2105178A1 (de) | 1971-09-02 |
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