FI87119B - Foerfarande foer framstaellning av genom fotopolymerisation tvaerbundna reliefplaotar. - Google Patents
Foerfarande foer framstaellning av genom fotopolymerisation tvaerbundna reliefplaotar. Download PDFInfo
- Publication number
- FI87119B FI87119B FI870010A FI870010A FI87119B FI 87119 B FI87119 B FI 87119B FI 870010 A FI870010 A FI 870010A FI 870010 A FI870010 A FI 870010A FI 87119 B FI87119 B FI 87119B
- Authority
- FI
- Finland
- Prior art keywords
- layers
- olefinically unsaturated
- developing solvent
- relief
- terpine
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Claims (4)
1. Förfarande för framställning av medelst foto-polymerisation tvärbundna reliefplätar genom att belysa 5 bildenligt medelst fotopolymerisation tvärbindbara skikt med aktiniskt ljus och tvätta de icke-tvärbundna delarna av skikten med framkallningslösningsmedel, varvid dessa skikt huvudsakligen innehäller A) ett eller flera bindemedel pä basis av elasto-10 merpolymerer, B) en eller flera monomerer kompatibla med detta bindemedel och C) en eller flera fotoinitiatorer, kännetecknat därav, att man använder ett 15 framkallningslösningsmedel, vilket som huvudsaklig be- ständsdel innehäller a) förgrenade eller oförgrenade, ett- tili trefal-digt olefiniskt omättade acykliska eller b) mättade eller ett- tili trefaldigt olefiniskt 20 omättade cykliska alifatiska kolväten, alkoholer eller ketoner med 8-15 kolatomer.
2. Förfarande enligt patentkravet 1, kännetecknat därav, att man använder ett framkallnings- 2. lösningsmedel, vilket som huvudsaklig beständsdel innehäl--· ler förgrenade, ett- tili trefaldigt olefiniskt omättade acykliska eller mättade eller ett- tili trefaldigt olefiniskt omättade cykliska alifatiska kolväten, alkoholer eller ketoner med 10 kolatomer. 30
3. Förfarande enligt patentkravet 2, känne tecknat därav, att man använder ett framkallningslösningsmedel, vilket som huvudsaklig beständsdel innehäl-ler monoterpener.
4. Förfarande enligt patentkravet 3, k ä n n e -35 tecknat därav, att man använder ett framkallnings- 12 k 7 -.: U / l i lösningsmedel, vilket sora huvudsaklig beständsdel innehäl-ler p-mentan, borneol, menton, D- och L-limonen, a-terpi neol, a-terpinen, Ύ-terpinen, terpinolen, a-, β- och Ύ-pirien och/eller citronellol.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3600116 | 1986-01-04 | ||
DE19863600116 DE3600116A1 (de) | 1986-01-04 | 1986-01-04 | Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen |
Publications (4)
Publication Number | Publication Date |
---|---|
FI870010A0 FI870010A0 (fi) | 1987-01-02 |
FI870010A FI870010A (fi) | 1987-07-05 |
FI87119B true FI87119B (fi) | 1992-08-14 |
FI87119C FI87119C (sv) | 1992-11-25 |
Family
ID=6291417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI870010A FI87119C (sv) | 1986-01-04 | 1987-01-02 | Förfarande för framställning av genom fotopolymerisation tvärbundna re liefplåtar |
Country Status (8)
Country | Link |
---|---|
US (1) | US4806452A (sv) |
EP (1) | EP0228676B2 (sv) |
JP (1) | JPH0769617B2 (sv) |
DE (2) | DE3600116A1 (sv) |
DK (1) | DK1187A (sv) |
ES (1) | ES2021586T5 (sv) |
FI (1) | FI87119C (sv) |
NO (1) | NO174604C (sv) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4847182A (en) * | 1987-09-03 | 1989-07-11 | W. R. Grace & Co. | Method for developing a photopolymer printing plate using a developer comprising terpene hydrocarbons |
DE3807929A1 (de) * | 1988-03-10 | 1989-09-28 | Basf Ag | Verfahren zur herstellung von reliefformen |
IL89372A0 (en) * | 1988-07-28 | 1989-09-10 | M & T Chemicals Inc | Aqueous developer composition for solvent developable photoresist coatings |
ATE136661T1 (de) * | 1988-08-23 | 1996-04-15 | Du Pont | Verfahren zur herstellung von flexographischen druckreliefs |
DE3836403A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
DE3836404A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
US5204227A (en) * | 1990-05-10 | 1993-04-20 | 3D Agency, Inc. | Method of developing photopolymerizable printing plates and composition therefor |
DE4020374A1 (de) * | 1990-06-27 | 1992-01-02 | Basf Ag | Verfahren zur herstellung photopolymerer flexographischer reliefdruckplatten |
US5252432A (en) * | 1990-06-27 | 1993-10-12 | Basf Aktiengesellschaft | Production of photopolymeric flexographic relief printing plates |
DE4022221A1 (de) * | 1990-07-12 | 1992-01-23 | Basf Magnetics Gmbh | Magnetband mit schleifmittel |
JP2692716B2 (ja) * | 1991-03-14 | 1997-12-17 | 東京応化工業株式会社 | フレキソ印刷版用現像液 |
JPH0566570A (ja) * | 1991-09-06 | 1993-03-19 | Nippon Telegr & Teleph Corp <Ntt> | レジスト現像液およびパタン形成方法 |
JPH05249695A (ja) * | 1991-11-15 | 1993-09-28 | Asahi Chem Ind Co Ltd | 感光性エラストマー組成物の現像剤及びそれを用いた製版方法 |
DE69917430D1 (de) | 1998-01-09 | 2004-06-24 | Nupro Technologies Inc | Verfahren zum entwickeln von photopolymer-druckplatten |
ITMI991378A1 (it) * | 1999-06-21 | 2000-12-21 | Chimeko S R L Trade Chimico Ec | Solvente di lavaggio per rimuovere da uno strato di fotopolimero esposto alla luce la parte non polimerizzata |
US6162593A (en) * | 1999-10-26 | 2000-12-19 | Wyatt; Marion F. | Diisopropylbenzene containing solvent and method of developing flexographic printing plates |
JP4623452B2 (ja) | 2000-02-09 | 2011-02-02 | 旭化成イーマテリアルズ株式会社 | 赤外線感受性層を形成する為の塗工液 |
US6582886B1 (en) | 2001-11-27 | 2003-06-24 | Nupro Technologies, Inc. | Developing solvent for photopolymerizable printing plates |
US7326353B2 (en) * | 2001-11-27 | 2008-02-05 | Nupro Technologies | Methods for reclaiming developing solvents |
US7413849B2 (en) * | 2004-09-10 | 2008-08-19 | Nupro Technologies | Substituted benzene developing solvent for photopolymerizable printing plates |
US20060040218A1 (en) * | 2004-08-18 | 2006-02-23 | Wyatt Marion F | Terpene ether solvents |
JP4980038B2 (ja) | 2006-09-20 | 2012-07-18 | 東京応化工業株式会社 | 保護膜形成用材料及びホトレジストパターンの形成方法 |
US20100068651A1 (en) * | 2008-09-16 | 2010-03-18 | Bradford David C | Developing solution for flexographic printing plates |
US8349185B2 (en) | 2010-10-20 | 2013-01-08 | E I Du Pont De Nemours And Company | Method for rebalancing a multicomponent solvent solution |
US9897921B2 (en) | 2014-08-22 | 2018-02-20 | Nsx Operating Co. Llc | Compositions comprising mineral spirits and methods related thereto |
US11175586B2 (en) | 2017-05-26 | 2021-11-16 | Nsx Managemen T Group, Llc | Platewash composition |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE62662C (de) * | J. NORTH in New-York, V. St. A | Herstellung von Photographien mittels Guajaretinsäure als lichtempfindlicher Substanz | ||
FR474142A (fr) * | 1913-11-05 | 1915-02-09 | Francisque Marius Rambaud | Procédé photolithographique, sans négatif, pour reports directs |
DE40774C (de) * | UniVERSAL-FARBEN-COMPAGNIE in New-York | Verfahren zur Herstellung von Photögraphie- und Lichtbildern | ||
US1574357A (en) * | 1922-03-08 | 1926-02-23 | Wadsworth Watch Case Co | Photographic media and process |
US1575143A (en) * | 1922-11-18 | 1926-03-02 | Wadsworth Watch Case Co | Photographic sensitizer |
BE332468A (sv) * | 1922-11-18 | |||
US1587272A (en) * | 1923-01-19 | 1926-06-01 | Wadsworth Watch Case Co | Synthetic resins, photographic process, photographic media, and method of preparing same |
US1587273A (en) * | 1923-01-19 | 1926-06-01 | Wadsworth Watch Case Co | Synthetic resins photographic process, media, and process of preparing same |
US1797211A (en) * | 1926-12-16 | 1931-03-17 | Keystone Watch Case Corp | Process of and product for photographic etching |
US1797210A (en) * | 1926-12-16 | 1931-03-17 | Keystone Watch Case Corp | Process of and product for photographic etching |
US1751908A (en) * | 1926-12-16 | 1930-03-25 | Keystone Watch Case Corp | Process of and product for photographic etching |
NL87862C (sv) * | 1951-08-20 | |||
JPS5151939A (ja) * | 1974-10-31 | 1976-05-07 | Canon Kk | Saisenpataanyohotorejisutogenzoeki |
JPS5182617A (ja) * | 1975-01-17 | 1976-07-20 | Canon Kk | Saisenpataanyohotorejisutogenzohoho |
JPS6021378B2 (ja) * | 1978-04-24 | 1985-05-27 | ジェイエスアール株式会社 | 現像液 |
DE2941960A1 (de) * | 1979-10-17 | 1981-04-30 | Hoechst Ag, 6000 Frankfurt | Entwicklergemisch und verfahren zum entwickeln von von belichteten lichtempfindlichen kopierschichten |
JPS57164736A (en) * | 1981-04-03 | 1982-10-09 | Canon Inc | Formation of pattern |
DE3246403A1 (de) * | 1982-12-15 | 1984-06-20 | Merck Patent Gmbh, 6100 Darmstadt | Verfahren zur entwicklung von reliefstrukturen auf der basis von strahlungsvernetzten polymervorstufen hochwaermebestaendiger polymere |
SU1113774A1 (ru) * | 1982-12-30 | 1984-09-15 | МГУ им.М.В.Ломоносова | Репрографический светочувствительный материал |
US4535054A (en) * | 1983-05-05 | 1985-08-13 | Hughes Aircraft Company | Wet process for developing styrene polymer resists for submicron lithography |
US4665009A (en) * | 1984-07-10 | 1987-05-12 | Hughes Aircraft Company | Method of developing radiation sensitive negative resists |
-
1986
- 1986-01-04 DE DE19863600116 patent/DE3600116A1/de not_active Withdrawn
- 1986-12-17 JP JP61299080A patent/JPH0769617B2/ja not_active Expired - Fee Related
- 1986-12-19 DE DE8686117726T patent/DE3678127D1/de not_active Expired - Lifetime
- 1986-12-19 ES ES86117726T patent/ES2021586T5/es not_active Expired - Lifetime
- 1986-12-19 EP EP86117726A patent/EP0228676B2/de not_active Expired - Lifetime
-
1987
- 1987-01-02 DK DK001187A patent/DK1187A/da not_active Application Discontinuation
- 1987-01-02 NO NO870012A patent/NO174604C/no not_active IP Right Cessation
- 1987-01-02 FI FI870010A patent/FI87119C/sv not_active IP Right Cessation
- 1987-01-05 US US07/000,425 patent/US4806452A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4806452A (en) | 1989-02-21 |
NO870012L (no) | 1987-07-06 |
ES2021586T5 (es) | 1995-08-16 |
JPH0769617B2 (ja) | 1995-07-31 |
FI87119C (sv) | 1992-11-25 |
NO174604B (no) | 1994-02-21 |
EP0228676A3 (en) | 1987-08-26 |
NO870012D0 (no) | 1987-01-02 |
DE3678127D1 (de) | 1991-04-18 |
FI870010A0 (fi) | 1987-01-02 |
DK1187A (da) | 1987-07-05 |
EP0228676B1 (de) | 1991-03-13 |
DK1187D0 (da) | 1987-01-02 |
EP0228676A2 (de) | 1987-07-15 |
NO174604C (no) | 1994-06-01 |
ES2021586B3 (es) | 1991-11-16 |
JPS62160446A (ja) | 1987-07-16 |
EP0228676B2 (de) | 1995-05-10 |
FI870010A (fi) | 1987-07-05 |
DE3600116A1 (de) | 1987-07-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Transfer of assignment of patent |
Owner name: BASF DRUCKSYSTEME GMBH |
|
MM | Patent lapsed |
Owner name: BASF DRUCKSYSTEME GMBH |