JPS5182617A - Saisenpataanyohotorejisutogenzohoho - Google Patents

Saisenpataanyohotorejisutogenzohoho

Info

Publication number
JPS5182617A
JPS5182617A JP751275A JP751275A JPS5182617A JP S5182617 A JPS5182617 A JP S5182617A JP 751275 A JP751275 A JP 751275A JP 751275 A JP751275 A JP 751275A JP S5182617 A JPS5182617 A JP S5182617A
Authority
JP
Japan
Prior art keywords
saisenpataanyohotore
jisutogenzohoho
saisenpataanyohotore jisutogenzohoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP751275A
Other languages
English (en)
Inventor
Tetsuo Hasegawa
Yasuo Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP751275A priority Critical patent/JPS5182617A/ja
Publication of JPS5182617A publication Critical patent/JPS5182617A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP751275A 1975-01-17 1975-01-17 Saisenpataanyohotorejisutogenzohoho Pending JPS5182617A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP751275A JPS5182617A (ja) 1975-01-17 1975-01-17 Saisenpataanyohotorejisutogenzohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP751275A JPS5182617A (ja) 1975-01-17 1975-01-17 Saisenpataanyohotorejisutogenzohoho

Publications (1)

Publication Number Publication Date
JPS5182617A true JPS5182617A (ja) 1976-07-20

Family

ID=11667824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP751275A Pending JPS5182617A (ja) 1975-01-17 1975-01-17 Saisenpataanyohotorejisutogenzohoho

Country Status (1)

Country Link
JP (1) JPS5182617A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS58137836A (ja) * 1982-02-10 1983-08-16 Toshiba Corp ゴム系レジストの処理剤
JPS606947A (ja) * 1983-06-27 1985-01-14 W R Gureesu:Kk エツチング組成物
JPS61179435A (ja) * 1985-02-04 1986-08-12 Mitsubishi Electric Corp 微細パタ−ン形成方法
JPS62160446A (ja) * 1986-01-04 1987-07-16 バスフ アクチェン ゲゼルシャフト 光重合により架橋されるレリ−フ版体の製造方法
JPH0566570A (ja) * 1991-09-06 1993-03-19 Nippon Telegr & Teleph Corp <Ntt> レジスト現像液およびパタン形成方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS58137836A (ja) * 1982-02-10 1983-08-16 Toshiba Corp ゴム系レジストの処理剤
JPS606947A (ja) * 1983-06-27 1985-01-14 W R Gureesu:Kk エツチング組成物
JPS61179435A (ja) * 1985-02-04 1986-08-12 Mitsubishi Electric Corp 微細パタ−ン形成方法
JPS62160446A (ja) * 1986-01-04 1987-07-16 バスフ アクチェン ゲゼルシャフト 光重合により架橋されるレリ−フ版体の製造方法
JPH0566570A (ja) * 1991-09-06 1993-03-19 Nippon Telegr & Teleph Corp <Ntt> レジスト現像液およびパタン形成方法

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