JPS5182617A - Saisenpataanyohotorejisutogenzohoho - Google Patents
SaisenpataanyohotorejisutogenzohohoInfo
- Publication number
- JPS5182617A JPS5182617A JP751275A JP751275A JPS5182617A JP S5182617 A JPS5182617 A JP S5182617A JP 751275 A JP751275 A JP 751275A JP 751275 A JP751275 A JP 751275A JP S5182617 A JPS5182617 A JP S5182617A
- Authority
- JP
- Japan
- Prior art keywords
- saisenpataanyohotore
- jisutogenzohoho
- saisenpataanyohotore jisutogenzohoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP751275A JPS5182617A (ja) | 1975-01-17 | 1975-01-17 | Saisenpataanyohotorejisutogenzohoho |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP751275A JPS5182617A (ja) | 1975-01-17 | 1975-01-17 | Saisenpataanyohotorejisutogenzohoho |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5182617A true JPS5182617A (ja) | 1976-07-20 |
Family
ID=11667824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP751275A Pending JPS5182617A (ja) | 1975-01-17 | 1975-01-17 | Saisenpataanyohotorejisutogenzohoho |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5182617A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS58137836A (ja) * | 1982-02-10 | 1983-08-16 | Toshiba Corp | ゴム系レジストの処理剤 |
JPS606947A (ja) * | 1983-06-27 | 1985-01-14 | W R Gureesu:Kk | エツチング組成物 |
JPS61179435A (ja) * | 1985-02-04 | 1986-08-12 | Mitsubishi Electric Corp | 微細パタ−ン形成方法 |
JPS62160446A (ja) * | 1986-01-04 | 1987-07-16 | バスフ アクチェン ゲゼルシャフト | 光重合により架橋されるレリ−フ版体の製造方法 |
JPH0566570A (ja) * | 1991-09-06 | 1993-03-19 | Nippon Telegr & Teleph Corp <Ntt> | レジスト現像液およびパタン形成方法 |
-
1975
- 1975-01-17 JP JP751275A patent/JPS5182617A/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS58137836A (ja) * | 1982-02-10 | 1983-08-16 | Toshiba Corp | ゴム系レジストの処理剤 |
JPS606947A (ja) * | 1983-06-27 | 1985-01-14 | W R Gureesu:Kk | エツチング組成物 |
JPS61179435A (ja) * | 1985-02-04 | 1986-08-12 | Mitsubishi Electric Corp | 微細パタ−ン形成方法 |
JPS62160446A (ja) * | 1986-01-04 | 1987-07-16 | バスフ アクチェン ゲゼルシャフト | 光重合により架橋されるレリ−フ版体の製造方法 |
JPH0566570A (ja) * | 1991-09-06 | 1993-03-19 | Nippon Telegr & Teleph Corp <Ntt> | レジスト現像液およびパタン形成方法 |
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