JPS57164736A - Formation of pattern - Google Patents

Formation of pattern

Info

Publication number
JPS57164736A
JPS57164736A JP5024181A JP5024181A JPS57164736A JP S57164736 A JPS57164736 A JP S57164736A JP 5024181 A JP5024181 A JP 5024181A JP 5024181 A JP5024181 A JP 5024181A JP S57164736 A JPS57164736 A JP S57164736A
Authority
JP
Japan
Prior art keywords
pattern
substrate
solvent
action
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5024181A
Other languages
Japanese (ja)
Inventor
Takashi Tanaka
Seiichi Takahashi
Hiroyuki Imataki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP5024181A priority Critical patent/JPS57164736A/en
Publication of JPS57164736A publication Critical patent/JPS57164736A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To normally form a pattern by using a solvent contg. an aliphatic hydrocarbon as a developer for a photoresist to reduce the dissolving power to a substrate and the action such as solvent shock. CONSTITUTION:A photoresist layer on a substrate of an org. substance such as acrylic resin, styrol resin or vinyl chloride resin is developed with a developer contg. an aliphatic hydrocarbon such as pentane, hexane or undecane. By reducing the dissolving power to the substrate and the action such as solvent shock, a pattern can be formed normally.
JP5024181A 1981-04-03 1981-04-03 Formation of pattern Pending JPS57164736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5024181A JPS57164736A (en) 1981-04-03 1981-04-03 Formation of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5024181A JPS57164736A (en) 1981-04-03 1981-04-03 Formation of pattern

Publications (1)

Publication Number Publication Date
JPS57164736A true JPS57164736A (en) 1982-10-09

Family

ID=12853494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5024181A Pending JPS57164736A (en) 1981-04-03 1981-04-03 Formation of pattern

Country Status (1)

Country Link
JP (1) JPS57164736A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055630A (en) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd Method for forming resist pattern
JPS62160446A (en) * 1986-01-04 1987-07-16 バスフ　アクチェン　ゲゼルシャフト Manufacture of releaf block body crosslinked by photopolymerization
JPH027056A (en) * 1988-03-10 1990-01-11 Basf Ag Making of relief printing plate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055630A (en) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd Method for forming resist pattern
JPH0335654B2 (en) * 1983-09-06 1991-05-29 Oki Electric Ind Co Ltd
JPS62160446A (en) * 1986-01-04 1987-07-16 バスフ　アクチェン　ゲゼルシャフト Manufacture of releaf block body crosslinked by photopolymerization
JPH027056A (en) * 1988-03-10 1990-01-11 Basf Ag Making of relief printing plate

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