JPS5151939A - Saisenpataanyohotorejisutogenzoeki - Google Patents

Saisenpataanyohotorejisutogenzoeki

Info

Publication number
JPS5151939A
JPS5151939A JP12601674A JP12601674A JPS5151939A JP S5151939 A JPS5151939 A JP S5151939A JP 12601674 A JP12601674 A JP 12601674A JP 12601674 A JP12601674 A JP 12601674A JP S5151939 A JPS5151939 A JP S5151939A
Authority
JP
Japan
Prior art keywords
saisenpataanyohotorejisutogenzoeki
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12601674A
Other languages
English (en)
Other versions
JPS543369B2 (ja
Inventor
Tetsuo Hasegawa
Yasuo Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP12601674A priority Critical patent/JPS5151939A/ja
Publication of JPS5151939A publication Critical patent/JPS5151939A/ja
Publication of JPS543369B2 publication Critical patent/JPS543369B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12601674A 1974-10-31 1974-10-31 Saisenpataanyohotorejisutogenzoeki Granted JPS5151939A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12601674A JPS5151939A (ja) 1974-10-31 1974-10-31 Saisenpataanyohotorejisutogenzoeki

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12601674A JPS5151939A (ja) 1974-10-31 1974-10-31 Saisenpataanyohotorejisutogenzoeki

Publications (2)

Publication Number Publication Date
JPS5151939A true JPS5151939A (ja) 1976-05-07
JPS543369B2 JPS543369B2 (ja) 1979-02-22

Family

ID=14924626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12601674A Granted JPS5151939A (ja) 1974-10-31 1974-10-31 Saisenpataanyohotorejisutogenzoeki

Country Status (1)

Country Link
JP (1) JPS5151939A (ja)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627143A (en) * 1979-08-14 1981-03-16 Japan Synthetic Rubber Co Ltd Polymer type photoresist developing method
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS57135946A (en) * 1981-02-16 1982-08-21 Canon Inc Photoresist material
JPS58137836A (ja) * 1982-02-10 1983-08-16 Toshiba Corp ゴム系レジストの処理剤
JPS58219549A (ja) * 1982-06-15 1983-12-21 Tokyo Ohka Kogyo Co Ltd ホトレジストの現像方法
JPS59181536A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS59181535A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd ネガレジストのパタ−ン形成方法
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS62160446A (ja) * 1986-01-04 1987-07-16 バスフ　アクチェン　ゲゼルシャフト 光重合により架橋されるレリ−フ版体の製造方法
JPH027056A (ja) * 1988-03-10 1990-01-11 Basf Ag 凸版印版の製法
JPH04500278A (ja) * 1988-08-23 1992-01-16 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー フレクソグラフ用印刷レリーフの作成方法
WO1993010484A1 (en) * 1991-11-15 1993-05-27 Asahi Kasei Kogyo Kabushiki Kaisha Developer for photosensitive elastomer composition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS496202A (ja) * 1972-03-21 1974-01-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS496202A (ja) * 1972-03-21 1974-01-19

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627143A (en) * 1979-08-14 1981-03-16 Japan Synthetic Rubber Co Ltd Polymer type photoresist developing method
JPH0145054B2 (ja) * 1979-08-14 1989-10-02 Japan Synthetic Rubber Co Ltd
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPH0128934B2 (ja) * 1981-02-16 1989-06-06 Canon Kk
JPS57135946A (en) * 1981-02-16 1982-08-21 Canon Inc Photoresist material
JPS58137836A (ja) * 1982-02-10 1983-08-16 Toshiba Corp ゴム系レジストの処理剤
JPS58219549A (ja) * 1982-06-15 1983-12-21 Tokyo Ohka Kogyo Co Ltd ホトレジストの現像方法
JPH0419544B2 (ja) * 1982-06-15 1992-03-30 Tokyo Ohka Kogyo Co Ltd
JPH0334054B2 (ja) * 1983-03-31 1991-05-21 Oki Electric Ind Co Ltd
JPS59181535A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd ネガレジストのパタ−ン形成方法
JPH0334053B2 (ja) * 1983-03-31 1991-05-21 Oki Electric Ind Co Ltd
JPS59181536A (ja) * 1983-03-31 1984-10-16 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS62160446A (ja) * 1986-01-04 1987-07-16 バスフ　アクチェン　ゲゼルシャフト 光重合により架橋されるレリ−フ版体の製造方法
JPH027056A (ja) * 1988-03-10 1990-01-11 Basf Ag 凸版印版の製法
JPH04500278A (ja) * 1988-08-23 1992-01-16 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー フレクソグラフ用印刷レリーフの作成方法
WO1993010484A1 (en) * 1991-11-15 1993-05-27 Asahi Kasei Kogyo Kabushiki Kaisha Developer for photosensitive elastomer composition

Also Published As

Publication number Publication date
JPS543369B2 (ja) 1979-02-22

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