JPS543369B2 - - Google Patents
Info
- Publication number
- JPS543369B2 JPS543369B2 JP12601674A JP12601674A JPS543369B2 JP S543369 B2 JPS543369 B2 JP S543369B2 JP 12601674 A JP12601674 A JP 12601674A JP 12601674 A JP12601674 A JP 12601674A JP S543369 B2 JPS543369 B2 JP S543369B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12601674A JPS5151939A (ja) | 1974-10-31 | 1974-10-31 | Saisenpataanyohotorejisutogenzoeki |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12601674A JPS5151939A (ja) | 1974-10-31 | 1974-10-31 | Saisenpataanyohotorejisutogenzoeki |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5151939A JPS5151939A (ja) | 1976-05-07 |
| JPS543369B2 true JPS543369B2 (ja) | 1979-02-22 |
Family
ID=14924626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12601674A Granted JPS5151939A (ja) | 1974-10-31 | 1974-10-31 | Saisenpataanyohotorejisutogenzoeki |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5151939A (ja) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5627143A (en) * | 1979-08-14 | 1981-03-16 | Japan Synthetic Rubber Co Ltd | Polymer type photoresist developing method |
| JPS5683740A (en) * | 1979-12-13 | 1981-07-08 | Japan Synthetic Rubber Co Ltd | Developer for polymer photoresist |
| JPS57135946A (en) * | 1981-02-16 | 1982-08-21 | Canon Inc | Photoresist material |
| JPS58137836A (ja) * | 1982-02-10 | 1983-08-16 | Toshiba Corp | ゴム系レジストの処理剤 |
| JPS58219549A (ja) * | 1982-06-15 | 1983-12-21 | Tokyo Ohka Kogyo Co Ltd | ホトレジストの現像方法 |
| JPS59181536A (ja) * | 1983-03-31 | 1984-10-16 | Oki Electric Ind Co Ltd | レジストパタ−ンの形成方法 |
| JPS59181535A (ja) * | 1983-03-31 | 1984-10-16 | Oki Electric Ind Co Ltd | ネガレジストのパタ−ン形成方法 |
| JPS6045243A (ja) * | 1983-08-23 | 1985-03-11 | Oki Electric Ind Co Ltd | レジストパタ−ンの形成方法 |
| DE3600116A1 (de) * | 1986-01-04 | 1987-07-09 | Basf Ag | Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen |
| DE3807929A1 (de) * | 1988-03-10 | 1989-09-28 | Basf Ag | Verfahren zur herstellung von reliefformen |
| WO1990002359A1 (en) * | 1988-08-23 | 1990-03-08 | E.I. Du Pont De Nemours And Company | Process for the production of flexographic printing reliefs |
| JPH05249695A (ja) * | 1991-11-15 | 1993-09-28 | Asahi Chem Ind Co Ltd | 感光性エラストマー組成物の現像剤及びそれを用いた製版方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS496202A (ja) * | 1972-03-21 | 1974-01-19 |
-
1974
- 1974-10-31 JP JP12601674A patent/JPS5151939A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS496202A (ja) * | 1972-03-21 | 1974-01-19 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5151939A (ja) | 1976-05-07 |