ES480802A1 - Procedimiento de fabricacion de articulos con capas protec- toras sensibles a la radiacion. - Google Patents
Procedimiento de fabricacion de articulos con capas protec- toras sensibles a la radiacion.Info
- Publication number
- ES480802A1 ES480802A1 ES480802A ES480802A ES480802A1 ES 480802 A1 ES480802 A1 ES 480802A1 ES 480802 A ES480802 A ES 480802A ES 480802 A ES480802 A ES 480802A ES 480802 A1 ES480802 A1 ES 480802A1
- Authority
- ES
- Spain
- Prior art keywords
- device processing
- properties
- utilizing same
- processing utilizing
- stability
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Procedimiento de fabricación de artículos con capas protectoras sensibles a la radiación, que comprende una operación durante la cual el artículo a fabricar incluye una superficie de artículo y una capa de elaboración actínica super yacente, consistiendo esencialmente dicha capa de elaboración en material polimérico, cuyo procedimiento comprende las etapas de (1) exponer selectivamente porciones de dicha capa de elaboración a radiación actínica para definir un modelo , con lo cual se aumenta la facilidad de separación de dichas porciones de la capa de elaboración por un agente de revelado, dependiendo dicha facilidad de separación de la disminución eficaz del peso molecular de dicho material polimérico resultante de la exposición por la citada radiación actínica (2) tratar dicha capa de elaboración con el agente de revelado para separar selectivamente material dentro de dichas porciones para producir una capa de elaboración modelada (3) tratar el artículo a fabricar con un agente de alteración que preferentemente altera regiones de la superficie del artículo correspondientes con las regiones expuestas de la capa de elaboración modelada, caracterizado porque dicho material polimérico consiste en al mensos 80% en peso de un copolímero que puede ser considerado como conteniendo al menos 50% en peso de poliacrilonitrilo alfa-sustituido junto con al menos 5% en peso de diluyente.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US90787478A | 1978-05-22 | 1978-05-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES480802A1 true ES480802A1 (es) | 1980-01-16 |
Family
ID=25424784
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES480802A Expired ES480802A1 (es) | 1978-05-22 | 1979-05-22 | Procedimiento de fabricacion de articulos con capas protec- toras sensibles a la radiacion. |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0007976A1 (es) |
JP (1) | JPS54153633A (es) |
AU (1) | AU4719279A (es) |
ES (1) | ES480802A1 (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2488417A1 (fr) * | 1980-08-06 | 1982-02-12 | Thomson Csf | Resine de masquage du type degradable sous l'effet d'un rayonnement, et procede d'utilisation de cette resine |
DE3036615A1 (de) * | 1980-09-29 | 1982-05-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von resiststrukturen |
KR900018743A (ko) * | 1988-05-24 | 1990-12-22 | 스즈끼 가즈오 | 포지티브(positive)형 전자선 레지스트 및 이를 이용한 레지스트 패턴 형성방법 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2892712A (en) * | 1954-04-23 | 1959-06-30 | Du Pont | Process for preparing relief images |
US4025348A (en) * | 1974-05-10 | 1977-05-24 | Hitachi Chemical Company, Ltd. | Photosensitive resin compositions |
US4011351A (en) * | 1975-01-29 | 1977-03-08 | International Business Machines Corporation | Preparation of resist image with methacrylate polymers |
JPS5349956A (en) * | 1976-10-18 | 1978-05-06 | Matsushita Electric Ind Co Ltd | Electron line resist |
JPS5352593A (en) * | 1976-10-26 | 1978-05-13 | Agency Of Ind Science & Technol | Electron rays-sensitive polymer |
JPS5381114A (en) * | 1976-12-25 | 1978-07-18 | Toshiba Corp | Radiation sensitive material |
-
1979
- 1979-05-18 AU AU47192/79A patent/AU4719279A/en not_active Abandoned
- 1979-05-21 EP EP79101528A patent/EP0007976A1/en not_active Withdrawn
- 1979-05-22 JP JP6316779A patent/JPS54153633A/ja active Pending
- 1979-05-22 ES ES480802A patent/ES480802A1/es not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS54153633A (en) | 1979-12-04 |
EP0007976A1 (en) | 1980-02-20 |
AU4719279A (en) | 1979-11-29 |
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