JPS5352593A - Electron rays-sensitive polymer - Google Patents

Electron rays-sensitive polymer

Info

Publication number
JPS5352593A
JPS5352593A JP12849676A JP12849676A JPS5352593A JP S5352593 A JPS5352593 A JP S5352593A JP 12849676 A JP12849676 A JP 12849676A JP 12849676 A JP12849676 A JP 12849676A JP S5352593 A JPS5352593 A JP S5352593A
Authority
JP
Japan
Prior art keywords
sensitive polymer
electron rays
affording
meth
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12849676A
Other languages
Japanese (ja)
Other versions
JPS5338193B2 (en
Inventor
Norinaga Fujishige
Susumu Ichikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP12849676A priority Critical patent/JPS5352593A/en
Publication of JPS5352593A publication Critical patent/JPS5352593A/en
Publication of JPS5338193B2 publication Critical patent/JPS5338193B2/ja
Granted legal-status Critical Current

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  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

PURPOSE: To prepare an electron rays-sensitive polymer of sparing solubility to organic solvents, and capable of affording a resist effecting sharp contrast, by heat treatment of a (meth) acrylic acid copolymer containing a specific monomer.
COPYRIGHT: (C)1978,JPO&Japio
JP12849676A 1976-10-26 1976-10-26 Electron rays-sensitive polymer Granted JPS5352593A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12849676A JPS5352593A (en) 1976-10-26 1976-10-26 Electron rays-sensitive polymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12849676A JPS5352593A (en) 1976-10-26 1976-10-26 Electron rays-sensitive polymer

Publications (2)

Publication Number Publication Date
JPS5352593A true JPS5352593A (en) 1978-05-13
JPS5338193B2 JPS5338193B2 (en) 1978-10-13

Family

ID=14986171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12849676A Granted JPS5352593A (en) 1976-10-26 1976-10-26 Electron rays-sensitive polymer

Country Status (1)

Country Link
JP (1) JPS5352593A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5983157A (en) * 1982-09-28 1984-05-14 エクソン・リサ−チ・アンド・エンジニアリング・カンパニ− Method of increasing sensitivity and contrast of positive type polymer resist

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4719279A (en) * 1978-05-22 1979-11-29 Western Electric Co. Inc. Lithographic resist and device processing utilizing same
JPS5795103U (en) * 1980-12-02 1982-06-11
JPH0345683Y2 (en) * 1986-11-17 1991-09-26

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915372A (en) * 1972-03-24 1974-02-09
JPS511971A (en) * 1974-06-25 1976-01-09 Meidensha Electric Mfg Co Ltd Kaiheikino sosasochi
US3984582A (en) * 1975-06-30 1976-10-05 Ibm Method for preparing positive resist image

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915372A (en) * 1972-03-24 1974-02-09
JPS511971A (en) * 1974-06-25 1976-01-09 Meidensha Electric Mfg Co Ltd Kaiheikino sosasochi
US3984582A (en) * 1975-06-30 1976-10-05 Ibm Method for preparing positive resist image

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5983157A (en) * 1982-09-28 1984-05-14 エクソン・リサ−チ・アンド・エンジニアリング・カンパニ− Method of increasing sensitivity and contrast of positive type polymer resist

Also Published As

Publication number Publication date
JPS5338193B2 (en) 1978-10-13

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