ES460405A1 - Sputtering device and method - Google Patents

Sputtering device and method

Info

Publication number
ES460405A1
ES460405A1 ES460405A ES460405A ES460405A1 ES 460405 A1 ES460405 A1 ES 460405A1 ES 460405 A ES460405 A ES 460405A ES 460405 A ES460405 A ES 460405A ES 460405 A1 ES460405 A1 ES 460405A1
Authority
ES
Spain
Prior art keywords
cathode
sputtering device
electron
electron traps
atomise
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES460405A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of ES460405A1 publication Critical patent/ES460405A1/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

An atomising device includes a cathode (1), the upper surface (3) of which consists of the material to be atomised, a magnetic device for generating one or more magnetic fields (2), by which at least one electron trap for the surface (3) of the cathode is determined, and an anode (5). These electron traps can be moved along the cathode surface (3). In this way, it is possible to atomise the cathode very evenly by continuous or periodic movement of the electron traps, so that the cathode material is very efficiently used.
ES460405A 1976-07-07 1977-07-05 Sputtering device and method Expired ES460405A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7607473A NL7607473A (en) 1976-07-07 1976-07-07 SPRAYING DEVICE AND METHOD FOR SPRAYING WITH SUCH A DEVICE

Publications (1)

Publication Number Publication Date
ES460405A1 true ES460405A1 (en) 1978-05-01

Family

ID=19826537

Family Applications (1)

Application Number Title Priority Date Filing Date
ES460405A Expired ES460405A1 (en) 1976-07-07 1977-07-05 Sputtering device and method

Country Status (14)

Country Link
JP (2) JPS536282A (en)
AT (1) AT352493B (en)
AU (1) AU506847B2 (en)
BR (1) BR7704375A (en)
CA (1) CA1081656A (en)
CH (1) CH618289A5 (en)
DE (1) DE2729286A1 (en)
ES (1) ES460405A1 (en)
FR (1) FR2358020A1 (en)
GB (1) GB1587566A (en)
IT (1) IT1076083B (en)
NL (1) NL7607473A (en)
SE (1) SE7707729L (en)
ZA (1) ZA773538B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2423065A1 (en) * 1978-04-12 1979-11-09 Battelle Memorial Institute PROCESS FOR MANUFACTURING ELECTRODES FOR FUEL CELLS, DEVICE FOR IMPLEMENTING THE PROCESS AND ELECTRODES RESULTING FROM THIS PROCESS
CA1141704A (en) * 1978-08-21 1983-02-22 Charles F. Morrison, Jr. Magnetically enhanced sputtering device
GB2051877B (en) * 1979-04-09 1983-03-02 Vac Tec Syst Magnetically enhanced sputtering device and method
JPS584923Y2 (en) * 1979-04-20 1983-01-27 株式会社 徳田製作所 Horizontal sputtering equipment
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
JPS59116375A (en) * 1982-11-26 1984-07-05 Kawasaki Heavy Ind Ltd Sputtering device
DE3316548C2 (en) * 1983-03-25 1985-01-17 Flachglas AG, 8510 Fürth Process for coating a transparent substrate
JPS59179782A (en) * 1983-03-31 1984-10-12 Kawasaki Heavy Ind Ltd Structure in electrode part of sputtering device
DE3406953C2 (en) * 1983-04-19 1986-03-13 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Method for heating material to be heated in a vacuum recipient
JPS59169352U (en) * 1983-04-25 1984-11-13 川崎重工業株式会社 Electrode structure of sputtering equipment
CH659346A5 (en) * 1983-05-10 1987-01-15 Balzers Hochvakuum DEVICE FOR TREATING THE INTERNAL WALL OF A TUBE.
CH668565A5 (en) * 1986-06-23 1989-01-13 Balzers Hochvakuum METHOD AND ARRANGEMENT FOR SPRAYING A MATERIAL AT HIGH FREQUENCY.
AT392291B (en) * 1987-09-01 1991-02-25 Miba Gleitlager Ag Rod-shaped magnetron or sputtering cathode arrangement, sputtering process and apparatus for carrying out the process
DE4018914C1 (en) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
DE4042417C2 (en) * 1990-07-17 1993-11-25 Balzers Hochvakuum Etching or coating system and method for igniting or intermittent operation
DE4022708A1 (en) * 1990-07-17 1992-04-02 Balzers Hochvakuum ETCHING OR COATING PLANTS
DE4107505A1 (en) * 1991-03-08 1992-09-10 Leybold Ag METHOD FOR OPERATING A SPUTTER, AND DEVICE FOR CARRYING OUT THE METHOD
WO1995032517A1 (en) * 1994-05-24 1995-11-30 Rossiisko-Shveitsarskoe Aktsionernoe Obschestvo Zakrytogo Tipa 'nova' Method of producing an electrical discharge and a device for carrying out said method
DE19623359A1 (en) * 1995-08-17 1997-02-20 Leybold Ag Device for coating a substrate by vaporisation of a rotary tubular target
DE19652634C2 (en) * 1996-09-13 2002-12-19 Euromat Ges Fuer Werkstofftech Process for the internal coating of a metallic component, in particular a component with a cylindrical cavity, a device for carrying it out and the use of the method
DE19727647A1 (en) * 1997-06-12 1998-12-17 Leybold Ag Cathodic sputtering apparatus with adjustable target
JP5781408B2 (en) * 2011-09-07 2015-09-24 株式会社アルバック Magnetron sputter cathode
US20150114828A1 (en) * 2013-10-31 2015-04-30 General Electric Company Systems and method of coating an interior surface of an object
US9111734B2 (en) 2013-10-31 2015-08-18 General Electric Company Systems and method of coating an interior surface of an object
JP2022178656A (en) * 2021-05-20 2022-12-02 大学共同利用機関法人 高エネルギー加速器研究機構 Non-evaporation type getter coating device, manufacturing methods for non-evaporation type getter coating vessel and pipeline, and non-evaporation type getter coating vessel and pipeline

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884793A (en) * 1971-09-07 1975-05-20 Telic Corp Electrode type glow discharge apparatus
JPS516017B2 (en) * 1972-09-08 1976-02-24
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus

Also Published As

Publication number Publication date
CA1081656A (en) 1980-07-15
JPS5947654U (en) 1984-03-29
DE2729286C2 (en) 1988-05-11
AU2668877A (en) 1979-01-04
NL7607473A (en) 1978-01-10
BR7704375A (en) 1978-05-16
GB1587566A (en) 1981-04-08
IT1076083B (en) 1985-04-22
FR2358020B1 (en) 1982-11-12
FR2358020A1 (en) 1978-02-03
ATA482777A (en) 1979-02-15
CH618289A5 (en) 1980-07-15
ZA773538B (en) 1979-01-31
JPS6028689Y2 (en) 1985-08-30
JPS536282A (en) 1978-01-20
SE7707729L (en) 1978-01-08
DE2729286A1 (en) 1978-01-12
AT352493B (en) 1979-09-25
AU506847B2 (en) 1980-01-24

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