AT352493B - SPRAYING DEVICE FOR SPRAYING MATERIAL - Google Patents

SPRAYING DEVICE FOR SPRAYING MATERIAL

Info

Publication number
AT352493B
AT352493B AT482777A AT482777A AT352493B AT 352493 B AT352493 B AT 352493B AT 482777 A AT482777 A AT 482777A AT 482777 A AT482777 A AT 482777A AT 352493 B AT352493 B AT 352493B
Authority
AT
Austria
Prior art keywords
spraying
spraying device
spraying material
Prior art date
Application number
AT482777A
Other languages
German (de)
Other versions
ATA482777A (en
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of ATA482777A publication Critical patent/ATA482777A/en
Application granted granted Critical
Publication of AT352493B publication Critical patent/AT352493B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT482777A 1976-07-07 1977-07-06 SPRAYING DEVICE FOR SPRAYING MATERIAL AT352493B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7607473A NL7607473A (en) 1976-07-07 1976-07-07 SPRAYING DEVICE AND METHOD FOR SPRAYING WITH SUCH A DEVICE

Publications (2)

Publication Number Publication Date
ATA482777A ATA482777A (en) 1979-02-15
AT352493B true AT352493B (en) 1979-09-25

Family

ID=19826537

Family Applications (1)

Application Number Title Priority Date Filing Date
AT482777A AT352493B (en) 1976-07-07 1977-07-06 SPRAYING DEVICE FOR SPRAYING MATERIAL

Country Status (14)

Country Link
JP (2) JPS536282A (en)
AT (1) AT352493B (en)
AU (1) AU506847B2 (en)
BR (1) BR7704375A (en)
CA (1) CA1081656A (en)
CH (1) CH618289A5 (en)
DE (1) DE2729286A1 (en)
ES (1) ES460405A1 (en)
FR (1) FR2358020A1 (en)
GB (1) GB1587566A (en)
IT (1) IT1076083B (en)
NL (1) NL7607473A (en)
SE (1) SE7707729L (en)
ZA (1) ZA773538B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4275126A (en) * 1978-04-12 1981-06-23 Battelle Memorial Institute Fuel cell electrode on solid electrolyte substrate
GB2028377B (en) * 1978-08-21 1982-12-08 Vac Tec Syst Magnetically-enhanced sputtering device
GB2051877B (en) * 1979-04-09 1983-03-02 Vac Tec Syst Magnetically enhanced sputtering device and method
JPS584923Y2 (en) * 1979-04-20 1983-01-27 株式会社 徳田製作所 Horizontal sputtering equipment
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
JPS59116375A (en) * 1982-11-26 1984-07-05 Kawasaki Heavy Ind Ltd Sputtering device
DE3316548C2 (en) * 1983-03-25 1985-01-17 Flachglas AG, 8510 Fürth Process for coating a transparent substrate
JPS59179782A (en) * 1983-03-31 1984-10-12 Kawasaki Heavy Ind Ltd Structure in electrode part of sputtering device
DE3406953C2 (en) * 1983-04-19 1986-03-13 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Method for heating material to be heated in a vacuum recipient
JPS59169352U (en) * 1983-04-25 1984-11-13 川崎重工業株式会社 Electrode structure of sputtering equipment
CH659346A5 (en) * 1983-05-10 1987-01-15 Balzers Hochvakuum DEVICE FOR TREATING THE INTERNAL WALL OF A TUBE.
CH668565A5 (en) * 1986-06-23 1989-01-13 Balzers Hochvakuum METHOD AND ARRANGEMENT FOR SPRAYING A MATERIAL AT HIGH FREQUENCY.
AT392291B (en) * 1987-09-01 1991-02-25 Miba Gleitlager Ag Rod-shaped magnetron or sputtering cathode arrangement, sputtering process and apparatus for carrying out the process
DE4018914C1 (en) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
DE4042417C2 (en) * 1990-07-17 1993-11-25 Balzers Hochvakuum Etching or coating system and method for igniting or intermittent operation
DE4022708A1 (en) * 1990-07-17 1992-04-02 Balzers Hochvakuum ETCHING OR COATING PLANTS
DE4107505A1 (en) * 1991-03-08 1992-09-10 Leybold Ag METHOD FOR OPERATING A SPUTTER, AND DEVICE FOR CARRYING OUT THE METHOD
WO1995032517A1 (en) * 1994-05-24 1995-11-30 Rossiisko-Shveitsarskoe Aktsionernoe Obschestvo Zakrytogo Tipa 'nova' Method of producing an electrical discharge and a device for carrying out said method
DE19623359A1 (en) * 1995-08-17 1997-02-20 Leybold Ag Device for coating a substrate by vaporisation of a rotary tubular target
DE19652633A1 (en) * 1996-09-13 1998-03-19 Euromat Gmbh Method and device for internally coating metallic components
DE19727647A1 (en) * 1997-06-12 1998-12-17 Leybold Ag Cathodic sputtering apparatus with adjustable target
JP5781408B2 (en) * 2011-09-07 2015-09-24 株式会社アルバック Magnetron sputter cathode
US9111734B2 (en) 2013-10-31 2015-08-18 General Electric Company Systems and method of coating an interior surface of an object
US20150114828A1 (en) * 2013-10-31 2015-04-30 General Electric Company Systems and method of coating an interior surface of an object
JP2022178656A (en) * 2021-05-20 2022-12-02 大学共同利用機関法人 高エネルギー加速器研究機構 Non-evaporation type getter coating device, manufacturing methods for non-evaporation type getter coating vessel and pipeline, and non-evaporation type getter coating vessel and pipeline

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884793A (en) * 1971-09-07 1975-05-20 Telic Corp Electrode type glow discharge apparatus
JPS516017B2 (en) * 1972-09-08 1976-02-24
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus

Also Published As

Publication number Publication date
NL7607473A (en) 1978-01-10
FR2358020A1 (en) 1978-02-03
IT1076083B (en) 1985-04-22
ES460405A1 (en) 1978-05-01
CA1081656A (en) 1980-07-15
ATA482777A (en) 1979-02-15
JPS6028689Y2 (en) 1985-08-30
DE2729286C2 (en) 1988-05-11
JPS5947654U (en) 1984-03-29
CH618289A5 (en) 1980-07-15
ZA773538B (en) 1979-01-31
DE2729286A1 (en) 1978-01-12
BR7704375A (en) 1978-05-16
FR2358020B1 (en) 1982-11-12
GB1587566A (en) 1981-04-08
SE7707729L (en) 1978-01-08
AU506847B2 (en) 1980-01-24
JPS536282A (en) 1978-01-20
AU2668877A (en) 1979-01-04

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee