JPS59116375A - Sputtering device - Google Patents

Abstract

PURPOSE:To provide a titled device which stabilizes magnetron discharge and improves the efficiency in forming a film by the constitution wherein a bar-shaped magnet body disposed alternately with permanent magnets and yokes each having an oblique cylindrical shape is rotated to form an averaged magnetic field near the target. CONSTITUTION:A bar-shaped magnet body 10 and an electromagnet 29 are provided on the inside and outside of a vacuum vessel 2 provided with an evacuation device 6, thereby forming a magnetic field forming means. A target 3 disposed in the vessel 2 and a substrate 4 are connected to the cathode and anode of a power source device 8. A sputtering device 1 which impresses a voltage between the target and substrate to induce magnetron discharge and forms a sputtering film on the substrate 4 is thus formed. The above-mentioned magnet body 10 in such sputtering device is constituted by disposing alternately permanent magnets 19 and yokes 20 each having an oblique cylindrical shape, and is rotated by a rotating device 11 connected, via a revolving shaft 18, to said magnet body. The intensity of the magnetic field formed by a magnetic field forming means 9 is thus changed and averaged with time whereby the electric discharge is stabilized and the sputtering film having a uniform thickness distribution is formed.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a spackling device that forms a film by using discharge in a magnetic field. A sputtering apparatus using four magnetron discharges has been proposed, which increases efficiency, generates high-drop plasma to increase the film formation rate, and suppresses the rise in substrate temperature.

As an example, both ends are N in the target.

S (7 permanent magnets (or electromagnets) for sale
There are also systems in which an electromagnet is installed outside the vacuum device to generate a magnetic field near the target. However, in the structure described above, due to the edge effect of the permanent magnet (or 'electromagnet), the magnetic field near the edges N, S, 1iQj is strong, and the magnetic field in the center is weak, resulting in non-uniform magnetic field distribution. Become. As a result, the target surface is locally eroded and consumed by non-uniform ion bombardment, and the forward direction of the target is determined by the amount of local erosion, resulting in the problem that the expensive target cannot be used effectively.

In addition, the difference in the degree of erosion of the target due to the above magnetic field distribution is
This affects the thickness distribution of the sputtered film on the substrate side facing the target, and the parts with a high degree of erosion receive strong ion bombardment, so the film formed is thicker at the position facing the part with a high degree of erosion, and the film as a whole The problem is that the thickness is uneven.

-Record: -In order to eliminate one point, several permanent magnets (or electromagnets) are arranged alternately to disperse the edge effect and reduce the thickness of the sputter link film. It is possible to try to make the distribution uniform, but basically the non-uniformity of the magnetic field distribution is not affected by IE, and this one magnetic field is
As for the erosion and wear and tear of the target affected by I-Konoguki-P, the non-uniformity remains unresolved.

On the other hand, as mentioned above, the stability of discharge using a magnetic field A depends on the strength of the magnetic field, and the stronger the magnetic field, the wider the vacuum reaction (/θ-4 to 1O-2 Torr) where the sputter link is flapped. Discharge can be stably generated within this range.

Therefore, the present invention addresses this point, and aims to uniformly and strongly inject the surface of the substrate, to average the magnetic field distribution so that the target is uniformly consumed, and to
-The sputtering fractured film formed on 1/) makes the thickness distribution uniform, and the magnetic field generated from the permanent magnet acts effectively to obtain a large fj magnetic field strength and stabilize the Macui/Ron discharge. It is an object of the present invention to provide a sputtering apparatus that improves film formation efficiency.

To achieve the above object, the present invention provides a sputter link apparatus comprising a target disposed in a vacuum container and a magnetic field forming means for forming a magnetic field in the vicinity of the target, wherein the magnetic field forming means has an oblique cylindrical shape. It has a bar-shaped magnet body in which permanent magnets and iron cores are arranged alternately, and is equipped with a rotating device that rotates the bar-shaped magnet body, so that the magnetic field strength is varied over time and is averaged. It is.

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows the basic structure of a magnetron-type spantal link sa i, in which 2 is a vacuum vessel, and the vacuum vessel 2 consists of a base plate 2a at the bottom and a furnace body 2b at the top. A cylindrical tube 1-3 is disposed in the section, while a substrate 4, which is connected to the object to be processed, is disposed on the outer periphery of the cuget 6 via an electrode 5. of course,
The upper target 6 and the electrode 5 are arranged so as to be insulated from each other and from the vacuum vessel 2.

In addition, the vacuum container 2 has an A empty container 2 in a predetermined vacuum 1.
(/θ-' ~ 1O-2TorrJ) Exhaust device 6 equipped with exhaust through vacuum boss etc., Ar in vacuum vessel 2, +
12. a gas introduction device 67 for introducing a processing gas such as N2;
A superposition device 8 is provided which uses the target 6 as a cathode and the substrate 4 as a positive electrode and applies a voltage between them.

Sara(ko, -ni Manki Shinso container 21 Koha, target 60
A sputter link device 1 is constructed by attaching magnetic field forming means 9 for forming a magnetic field around the periphery.

J2. The magnetic field forming means 9 is provided with a bar-shaped magnet 10 made of a permanent stone on the inner circumference of the target 3, and further provided with a rotation device 11 for rotating the outer magnet 10.
On the other hand, the apparatus 1 in which an electromagnet 29 is disposed outside the vacuum vessel 2 is also in a state where a magnetic field is formed around the target 6, and an electric field is created between the target 6 and the substrate 4. When the voltage is applied by FIJ using the ivy fitting 8,
The space between the two is the father N (macnetron discharge) or the light source,
This discharge ionizes the residue, and the positive ions collide with the target 6, which is a cathode, and the metal atoms of the target material fly out and adhere to the surface of the substrate 4 to form a sputter link film.

FIG. 2 shows the structure of the dovetail magnet 10 and rotating device 11 of the magnetic field forming means 9 (FIG. 1). The storage tube 12 having a flange 12a is installed to the base plate 2a of the vacuum container 2 (FIG. 7) by penetrating it from the -F direction. For tightening, the base plate 2d is fixed to the lower surface of the base plate 2d with bolts 14, and a vacuum seal is provided between the flange 12a and the base plates 1 and 2a using a seal 15.

"1. At the lower part of the outer periphery of the storage pipe 12, there is a base plate 2a.
A support base 16 made of an insulating material is disposed on the support base 16, while a cylinder body 17 made of an insulating material is disposed on the support base 16'' to surround the storage tube 12, and the outer periphery of the cylinder body 17 is made of titanium. ,
A circular target 6 made of a desired metal such as chromium is attached to the support base 76.

In addition, in the support plate 1-13 that closes the lower end of the i'riJ record storage part 12, ('if 4ξ(IR stone fi 1
0 is rotatably supported. This one shuttle-shaped magnet]
0 is the tubular rotation: iqt+ 1 s-, whereas,'
An oblique cylindrical 1. U number of permanent magnets ('j 19 (see Figure 3) (arranged with dispersion of q and between these permanent magnets 79), and 20 or more magnets (iron) are placed in the father's cup. ' = ++2 and fixed at 11.1 by the fixture 21, and is supported so as to rotate continuously in the axial direction. - is fitted into the bearing 22 provided on the end inner surface 1, while the lower part of the rotating shaft 18 is inserted into the flange 18.
Water seal body 26 rotatably supported on the supporting plate 1-13.4 and disposed on the supporting plate 16;
There are some rules. The lower end of this rotary shaft 18 is passed through the supporting plate 16, and a rotary joint 24 is installed at the tip, and is connected to a cooling outlet 4 (W 25).

A cooling water supply port 13a opened in the support plate 16
The cooling water supplied 716 is rotated through the storage pipe 12 and from the drain D13c at the upper end of the rotating shaft 18. I
It is configured such that the inside of the magnet 18 is tilted and flows out from the cooling water drainage port 25, thereby cooling the arrayed magnet body 1U and preventing the permanent magnet 19 from being demagnetized by the heat accompanying the dispersion. r
, [O, expropriation is Furanone 12d゛ and supporting play) 1
A water seal body 60 is provided between the water seal body 3 and the water seal body 60 .

-J, a rotating device β that rotates the two rod-shaped magnets 10;
11 is mounted on the outer periphery of the rotation 11'llll 1 g, and the driving southeast 26 is fixed, while the drive 26 is fitted to the moving gear 26 and rotated by the motor 27 (see Fig. 1). 1B) J gear 28 is provided.

On the other hand, it is necessary to devise the thickness of the permanent magnet 19 and the iron knife 20 in the -2 magnet body 10.
Also, it is preferable to set the point a as shown in the diagram j. In other words, a half turn (9 turns of 78'θ degrees) from the rotational position shown in FIG. 7 is the state shown in FIG. The high points on the -F and -F surfaces rotate on the same circumference, and the two-face high point a of the lower permanent 7F8 stone 19 and the upper permanent magnet 19
It is formed so that the low point b on the lower surface of is rotated by 1 ``eyebrow-circumference'' 2.

-1-2 The rotation of one stirring-shaped magnet 1a of the packaging? From this, the strength of its magnetic field and the degree of erosion of the target 6 1j are shown in Figure 5; Rotation position I to figure
It shows the strength of the magnetic field generated 11 times to the right of I and the degree of erosion of the hole, and also,
The broken line indicates the strength of the IID field formed on the right side of the rotation position in Figure 7B in the regression and the degree of erosion of target 6, and the strength distribution of both is completely opposite, and C When the target 6 is continuously rotated, the average magnetic field strength within a predetermined period of time is uniformly blown, as shown by the dashed line, and the erodibility (strength of ion bombardment) of the target 6 is also averaged accordingly. (The thickness distribution of the sputtered film formed on the substrate 4 is constant.) The size, number, angle/f, etc. of the permanent magnets 19 are as shown in the second memorial diagram. As shown in (1141), the design is not limited to old models and can be changed at any time, but as the number (number of divisions) increases, the magnetic field becomes weaker.

In addition, when it comes to AA I>2LJ, the higher the magnetic permeability, the more effective it is.

For reference, in contrast to the relationship between the form of the permanent magnet 19 and the associated magnetic field strength and degree of erosion in FIGS. 7 and 5, FIGS. show,
The distribution of the magnetic field is strongly non-uniform at both ends due to the end effect of the magnet M. Accordingly, the distribution of the strength of the ion bombardment fj of the target 6, that is, the degree of erosion, is shallow at both ends;
In addition, Fig. 2 and Fig. 2 show the case where a plurality of permanent magnets M are arranged with alternating polarity, and in this case also, due to the end effect of the permanent magnets M, 4D The field distribution and the distribution of the degree of erosion of the target 6 are non-uniform.

Furthermore, FIG. 70 and FIG. 1/FIG. 70 show the case where the iron core C is placed between the permanent magnets M in FIG. The target 6
Equation 1 of erosion is also large.

As explained below, the sputter link device 11q of the present invention
The magnetic field forming means that forms the magnetic field near the target is made of oblique cylindrical permanent magnets and iron! When a bar-shaped magnet body in which A and J are arranged alternately is provided, a rotating device 7 is provided to rotate this bar-shaped magnet body, and the magnetic field strength is varied over time and averaged. Target f! It is becoming old to reduce processing costs by making the surface of the target uniform and making the surface of the target wear evenly, making effective use of expensive targets. The magnetic field of the permanent magnet can be effectively used to generate a strong magnetic field. It is possible to obtain an eccentricity with a low current density and a high current density, and it is possible to improve the film formation efficiency, which has excellent advantages in combination with the uniformity of the Spanotalisig film described in IJ.

[Brief explanation of the drawing]

7 to 5 illustrate an 18th embodiment of the present invention, in which FIG. 7 is a basic configuration diagram of a sputter link device, FIG.
The figure is a perspective view of a permanent magnet, Figures A and B are explanatory diagrams showing one rotational position of a bar-shaped magnet body, and Figure 5 is a distribution of magnetic field strength and target erosion degree in response to changes in rotational position. Figure 3 is an explanatory diagram showing a permanent magnet of a reference example, Figure 7 is a curve diagram showing the distribution of magnetic field strength and target erosion degree in Figure 3, Figure 2 is another reference example. FIG. 2 is an explanatory diagram showing the distribution of magnetic field strength and target erosion degree in FIG. 2. FIG. 70 is an explanatory diagram showing a permanent magnet of another reference example. /Figure is number 70
FIG. 3 is a curve diagram showing the distribution of magnetic field strength and target erosion degree in the figure. DESCRIPTION OF SYMBOLS 1...Sputtering device, 2...Vacuum container, 6...Target, 4...Substrate, 6...
...Exhaust device, 7...Gas introduction device, 8
...Power supply device, 9...Magnetic field forming means, 1
0... Bar-shaped magnet body, 11゛°・°°゛rotating device, 1
2... Storage pipe, 18... Rotating shaft, 19...
...Permanent magnet, 20... Iron core 乍県(n'J 小(nri procedural amendment February 1, 1980) Mr. Kazuo Wakasugi, Commissioner of the Japan Patent Office 1 Indication of the case n (1981 Patent Application No. 207939 No. 2 Name of the invention Sputtering device 3 Relationship with the case of the person making the amendment Patent applicant address 3-1 Higashiyosaki-cho, Chuo-ku, Kobe, Hyogo Prefecture @ 1 Name (097) Kawasaki Ju] Representative of Nigyo Co., Ltd. For Hase J1e Ko4 Agent Postal code 530 Address Umegae Chuo Building, 4-4-18 Nishitenma, Kita-ku, Osaka-shi, Osaka Prefecture (voluntary amendment) 6 Subject of amendment (1) Scope of claims in the statement of claim (2) ) Column for detailed explanation of the invention in the specification (3) Column 7 for brief explanation of drawings in the specification Contents of amendment (1) The scope of claims is amended as shown in the attached sheet. (2) Specification No. 4 Page 7, line 7, page 7, lines 7 to 8, page 8, line 13, page 9, line 20, page 10, line 15, page 16, page 11, line 2, Same page, line 10 and 1
Correct "iron core" in line 20 of page 2 to "yoke." 8 Attachment A” List of documents (1) Document stating the entire text of the amended scope of claims
One document containing the entire text of the amended scope of claims (
1) In a sputtering apparatus equipped with a targeter 1 disposed in a vacuum container and a magnetic field forming means for forming a magnetic field in the vicinity of the targeter 1, the magnetic field forming means comprises an oblique cylindrical permanent magnet. A sputtering process characterized by having a bar-shaped magnet body in which circles are arranged alternately and a rotating device for rotating the bar-shaped magnet body, and which is characterized by temporally varying the magnetic field strength and averaging it. Device.

Claims (1)

[Claims] (1) In a battering apparatus, the magnetic field forming means includes an oblique cylindrical permanent magnet and an iron core. The present invention is characterized in that it has bar-shaped magnet bodies in which magnetic poles are arranged one after the other, and a rotating device that rotates the child-like magnet bodies, and that the magnetic field strength is temporally adjusted and averaged. Spackling equipment.