AU506847B2 - Sputtering device and method - Google Patents

Sputtering device and method

Info

Publication number
AU506847B2
AU506847B2 AU26688/77A AU2668877A AU506847B2 AU 506847 B2 AU506847 B2 AU 506847B2 AU 26688/77 A AU26688/77 A AU 26688/77A AU 2668877 A AU2668877 A AU 2668877A AU 506847 B2 AU506847 B2 AU 506847B2
Authority
AU
Australia
Prior art keywords
sputtering device
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU26688/77A
Other versions
AU2668877A (en
Inventor
J. and Berghult C. W Visser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of AU2668877A publication Critical patent/AU2668877A/en
Application granted granted Critical
Publication of AU506847B2 publication Critical patent/AU506847B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
AU26688/77A 1976-07-07 1977-07-01 Sputtering device and method Expired AU506847B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NLNL7607473 1976-07-07
NL7607473A NL7607473A (en) 1976-07-07 1976-07-07 SPRAYING DEVICE AND METHOD FOR SPRAYING WITH SUCH A DEVICE

Publications (2)

Publication Number Publication Date
AU2668877A AU2668877A (en) 1979-01-04
AU506847B2 true AU506847B2 (en) 1980-01-24

Family

ID=19826537

Family Applications (1)

Application Number Title Priority Date Filing Date
AU26688/77A Expired AU506847B2 (en) 1976-07-07 1977-07-01 Sputtering device and method

Country Status (14)

Country Link
JP (2) JPS536282A (en)
AT (1) AT352493B (en)
AU (1) AU506847B2 (en)
BR (1) BR7704375A (en)
CA (1) CA1081656A (en)
CH (1) CH618289A5 (en)
DE (1) DE2729286A1 (en)
ES (1) ES460405A1 (en)
FR (1) FR2358020A1 (en)
GB (1) GB1587566A (en)
IT (1) IT1076083B (en)
NL (1) NL7607473A (en)
SE (1) SE7707729L (en)
ZA (1) ZA773538B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1113873B (en) * 1978-04-12 1986-01-27 Battelle Memorial Institute PROCEDURE FOR THE MANUFACTURE OF FUEL BATTERY ELECTRODES, DEVICE FOR THE IMPLEMENTATION OF THE ELECTRODES PROCESS OBTAINED THROUGH THAT PROCEDURE
CA1141704A (en) * 1978-08-21 1983-02-22 Charles F. Morrison, Jr. Magnetically enhanced sputtering device
GB2051877B (en) * 1979-04-09 1983-03-02 Vac Tec Syst Magnetically enhanced sputtering device and method
JPS584923Y2 (en) * 1979-04-20 1983-01-27 株式会社 徳田製作所 Horizontal sputtering equipment
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
JPS59116375A (en) * 1982-11-26 1984-07-05 Kawasaki Heavy Ind Ltd Sputtering device
DE3316548C2 (en) * 1983-03-25 1985-01-17 Flachglas AG, 8510 Fürth Process for coating a transparent substrate
JPS59179782A (en) * 1983-03-31 1984-10-12 Kawasaki Heavy Ind Ltd Structure in electrode part of sputtering device
DE3406953C2 (en) * 1983-04-19 1986-03-13 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Method for heating material to be heated in a vacuum recipient
JPS59169352U (en) * 1983-04-25 1984-11-13 川崎重工業株式会社 Electrode structure of sputtering equipment
CH659346A5 (en) * 1983-05-10 1987-01-15 Balzers Hochvakuum DEVICE FOR TREATING THE INTERNAL WALL OF A TUBE.
CH668565A5 (en) * 1986-06-23 1989-01-13 Balzers Hochvakuum METHOD AND ARRANGEMENT FOR SPRAYING A MATERIAL AT HIGH FREQUENCY.
AT392291B (en) * 1987-09-01 1991-02-25 Miba Gleitlager Ag Rod-shaped magnetron or sputtering cathode arrangement, sputtering process and apparatus for carrying out the process
DE4018914C1 (en) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
DE4042417C2 (en) * 1990-07-17 1993-11-25 Balzers Hochvakuum Etching or coating system and method for igniting or intermittent operation
DE4022708A1 (en) * 1990-07-17 1992-04-02 Balzers Hochvakuum ETCHING OR COATING PLANTS
DE4107505A1 (en) * 1991-03-08 1992-09-10 Leybold Ag METHOD FOR OPERATING A SPUTTER, AND DEVICE FOR CARRYING OUT THE METHOD
WO1995032517A1 (en) * 1994-05-24 1995-11-30 Rossiisko-Shveitsarskoe Aktsionernoe Obschestvo Zakrytogo Tipa 'nova' Method of producing an electrical discharge and a device for carrying out said method
DE19623359A1 (en) * 1995-08-17 1997-02-20 Leybold Ag Device for coating a substrate by vaporisation of a rotary tubular target
DE19652634C2 (en) * 1996-09-13 2002-12-19 Euromat Ges Fuer Werkstofftech Process for the internal coating of a metallic component, in particular a component with a cylindrical cavity, a device for carrying it out and the use of the method
DE19727647A1 (en) * 1997-06-12 1998-12-17 Leybold Ag Cathodic sputtering apparatus with adjustable target
JP5781408B2 (en) * 2011-09-07 2015-09-24 株式会社アルバック Magnetron sputter cathode
US9111734B2 (en) 2013-10-31 2015-08-18 General Electric Company Systems and method of coating an interior surface of an object
US20150114828A1 (en) * 2013-10-31 2015-04-30 General Electric Company Systems and method of coating an interior surface of an object
JP2022178656A (en) * 2021-05-20 2022-12-02 大学共同利用機関法人 高エネルギー加速器研究機構 Non-evaporation type getter coating device, manufacturing methods for non-evaporation type getter coating vessel and pipeline, and non-evaporation type getter coating vessel and pipeline

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884793A (en) * 1971-09-07 1975-05-20 Telic Corp Electrode type glow discharge apparatus
JPS516017B2 (en) * 1972-09-08 1976-02-24
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus

Also Published As

Publication number Publication date
FR2358020B1 (en) 1982-11-12
SE7707729L (en) 1978-01-08
AU2668877A (en) 1979-01-04
FR2358020A1 (en) 1978-02-03
ZA773538B (en) 1979-01-31
AT352493B (en) 1979-09-25
IT1076083B (en) 1985-04-22
NL7607473A (en) 1978-01-10
CH618289A5 (en) 1980-07-15
DE2729286A1 (en) 1978-01-12
JPS536282A (en) 1978-01-20
GB1587566A (en) 1981-04-08
CA1081656A (en) 1980-07-15
JPS6028689Y2 (en) 1985-08-30
JPS5947654U (en) 1984-03-29
ES460405A1 (en) 1978-05-01
BR7704375A (en) 1978-05-16
DE2729286C2 (en) 1988-05-11
ATA482777A (en) 1979-02-15

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