ES2139631T3 - Poliuretano-metacrilato fotosensible revelable en medio acuoso. - Google Patents

Poliuretano-metacrilato fotosensible revelable en medio acuoso.

Info

Publication number
ES2139631T3
ES2139631T3 ES93306070T ES93306070T ES2139631T3 ES 2139631 T3 ES2139631 T3 ES 2139631T3 ES 93306070 T ES93306070 T ES 93306070T ES 93306070 T ES93306070 T ES 93306070T ES 2139631 T3 ES2139631 T3 ES 2139631T3
Authority
ES
Spain
Prior art keywords
plate
aqueous medium
meth
photopolymer
reacting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES93306070T
Other languages
English (en)
Inventor
Truc-Chi Thi Huynh-Tran
Ronald James Kumpfmiller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
P T Sub Inc
Original Assignee
P T Sub Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by P T Sub Inc filed Critical P T Sub Inc
Application granted granted Critical
Publication of ES2139631T3 publication Critical patent/ES2139631T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/08Processes
    • C08G18/10Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
    • C08G18/12Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step using two or more compounds having active hydrogen in the first polymerisation step
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/4009Two or more macromolecular compounds not provided for in one single group of groups C08G18/42 - C08G18/64
    • C08G18/4018Mixtures of compounds of group C08G18/42 with compounds of group C08G18/48
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/48Polyethers
    • C08G18/4804Two or more polyethers of different physical or chemical nature
    • C08G18/4808Mixtures of two or more polyetherdiols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen
    • C08G18/671Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/92Polyurethane having terminal ethylenic unsaturation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

SE PREPARA UN FOTOPOLIMERO USADO PARA PREPARAR PLACAS DE IMPRESION SOLIDAS, DESARROLLABLES EN AGUA, MEDIANTE LA PREPARACION DE UN PREPOLIMERO DE URETANO, POR MEDIO DE LA REACCION DE DIOLS DE POLIOXIALQUILENO O DIOLS DE POLIESTERES, O UNA MEZCLA DE LOS MISMOS, CON UN EXCESO DE DISOCIANATO, SEGUIDO POR CADENA QUE EXTIENDE LA MEZCLA RESULTANTE DE PREPOLIMERO CON UNA ALQUILDIALCANOLAMINA, REACCIONANDO A CONTINUACION EL PRODUCTO EXTENDIDO EN CADENA CON UN HIDROALQUILO(METH)ACRILATO. EL PREPOLIMERO RESULTANTE SE FORMULA ADECUADAMENTE CON MONOMEROS DE (METH)ACRILATO FOTOACTIVOS ADICIONALES O BIEN CON OLIGOMEROS Y FOTOINICIADOR, PARA COLADA O EXTRUSION SOBRE UN SUBSTRATO, PARA FORMAR UNA PLACA DE IMPRESION FLEXOGRAFICA. A CONTINUACION DE LA EXPOSICION A UV DE LA PLACA A TRAVES DE UN NEGATIVO, PUEDEN EXTRAERSE ZONAS NO EXPUESTAS MEDIANTE LAVADO CON UN MEDIO ACUOSO LIGERAMENTE ACIDICO, PARA DAR A LA PLACA UNA IMAGEN DE REALCE DESEABLE. EL USO DE LA SOLUCION DE LAVADO ACUOSA, AL CONTRARIO QUE LOS DISOLVENTES ORGANICOS, REDUCE AL MINIMO LOS PROBLEMAS DE LA POLUCION.
ES93306070T 1992-08-28 1993-07-30 Poliuretano-metacrilato fotosensible revelable en medio acuoso. Expired - Lifetime ES2139631T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/924,264 US5328805A (en) 1992-08-28 1992-08-28 Aqueous developable photosensitive polyurethane-(meth)acrylate

Publications (1)

Publication Number Publication Date
ES2139631T3 true ES2139631T3 (es) 2000-02-16

Family

ID=25449975

Family Applications (1)

Application Number Title Priority Date Filing Date
ES93306070T Expired - Lifetime ES2139631T3 (es) 1992-08-28 1993-07-30 Poliuretano-metacrilato fotosensible revelable en medio acuoso.

Country Status (12)

Country Link
US (3) US5328805A (es)
EP (1) EP0584970B1 (es)
JP (1) JPH0841151A (es)
CN (2) CN1039018C (es)
AT (1) ATE184999T1 (es)
AU (1) AU672205B2 (es)
BR (1) BR9303216A (es)
CA (1) CA2100279A1 (es)
DE (1) DE69326514T2 (es)
ES (1) ES2139631T3 (es)
SG (1) SG76467A1 (es)
ZA (1) ZA935031B (es)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5663212A (en) * 1993-02-05 1997-09-02 Fuji Photo Film Co., Ltd. Light-sensitive resin composition
US5362605A (en) * 1993-05-10 1994-11-08 W. R. Grace & Co.-Conn. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
US5496685A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5514522A (en) * 1993-11-01 1996-05-07 Polaroid Corporation Synthesis of photoreactive polymeric binders
EP0691357A1 (en) * 1994-06-17 1996-01-10 Polyfibron Technologies, Inc. Liquid polyurethane (meth)acrylate photopolymer useful for flexographic printing plate
JP3117394B2 (ja) * 1994-11-29 2000-12-11 帝人製機株式会社 光学的立体造形用樹脂組成物
EP0797791A4 (en) * 1994-12-13 1999-06-23 Hercules Inc PHOTO SENSITIVE COMPOUNDS AND DURASU MADE THROUGH CLEANING CLEANING PHOTOPOLYMER PRINTING PLATES
EP0830552A4 (en) * 1995-06-02 2000-02-09 Napp Systems Inc PROCESS FOR DECREASING THE LEVEL OF DILUENT IN RESINS CONTAINING A DILUENT USING MICROWAVE ENERGY
US5763503A (en) * 1995-06-07 1998-06-09 Esschem, Inc. Radiation-curable, moldable material, methods for curing it and molded articles obtained therefrom
EP0838045A4 (en) * 1995-07-13 1998-10-28 Polyfibron Technologies Inc PRODUCTION OF A PHOTOPOLYMER PRINT PLATE
EP0875022A4 (en) * 1996-01-12 2000-07-12 Hanna Mining Co COMPOSITION FOR THE MANUFACTURE OF FLEXOGRAPHIC PRINTING PLATES
US5851731A (en) * 1996-09-09 1998-12-22 M. A. Hanna Company Composition for the manufacture of flexographic printing plates
DE19611812A1 (de) * 1996-03-26 1997-10-02 Herberts Gmbh Wasserverdünnbare Dispersion, Verfahren zu ihrer Herstellung und Überzugsmittel
EP0975749A2 (en) * 1996-05-28 2000-02-02 THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES Cc chemokine receptor 5, antibodies thereto, transgenic animals
US6066436A (en) * 1996-09-09 2000-05-23 Polyfibron Technologies, Inc. Aqueous developable photosensitive polyurethane-methacrylate
US5965460A (en) * 1997-01-29 1999-10-12 Mac Dermid, Incorporated Polyurethane composition with (meth)acrylate end groups useful in the manufacture of polishing pads
DE19714514A1 (de) * 1997-04-08 1998-10-15 Basf Ag Aminogruppen tragende Polyurethane
US6166127A (en) * 1997-06-27 2000-12-26 The Sherwin-Williams Company Interpenetrating networks of polymers
US5945462A (en) * 1997-10-02 1999-08-31 Loctite Corporation Temporary protective coatings for precision surfaces
DE19818312A1 (de) * 1998-04-23 1999-10-28 Bayer Ag Wäßriges Beschichtungssytem aus UV-härtenden Isocyanatgruppen aufweisenden Urethan(meth)acrylatisocyanaten
US6214522B1 (en) * 1998-08-28 2001-04-10 Macdermid, Incorporated Photosensitive resin composition useful in fabricating printing plates
US5976765A (en) * 1998-09-04 1999-11-02 Polyfibron Technologies, Inc. Solid-capped liquid photopolymer printing elements
US6350823B1 (en) 1998-10-05 2002-02-26 3M Innovative Properties Company Pavement marking composition
US6107436A (en) * 1998-10-05 2000-08-22 3M Innovative Properties Company Polyfunctional polymer
FR2789347B1 (fr) * 1999-02-04 2001-04-06 Rollin Sa Blanchet a proprietes de surface variables pour machine a imprimer
US6232364B1 (en) * 1999-02-18 2001-05-15 Shimizu Co., Ltd. Ultraviolet curable coating compositions for cationic electrodeposition applicable to metallic materials and electrically conductive plastic materials
US6110653A (en) * 1999-07-26 2000-08-29 International Business Machines Corporation Acid sensitive ARC and method of use
US6265132B1 (en) 1999-10-20 2001-07-24 Rohm And Haas Company Photoimageable composition containing flexible oligomer
US6436540B1 (en) 2000-02-18 2002-08-20 Omnova Solutions Inc. Co-mingled polyurethane-polyvinyl ester polymer compositions and laminates
US20030173716A1 (en) * 2002-02-13 2003-09-18 Pang-Chia Lu Digital printing system for printing colored polyolefin films
US6829362B1 (en) * 2002-02-22 2004-12-07 Henkel Corporation Soft molding compound
US7495034B2 (en) * 2002-02-22 2009-02-24 Henkel Corporation Deformable soft molding compositions
US6806018B2 (en) 2002-03-25 2004-10-19 Macdermid Graphic Arts, Inc. Processless digitally imaged printing plate using microspheres
US6989220B2 (en) 2002-03-25 2006-01-24 Macdermid Printing Solutions, Llc Processless digitally imaged photopolymer elements using microspheres
DE10338560A1 (de) * 2003-08-22 2005-03-17 Degussa Ag Strahlenhärtbare Harze auf Basis hydrierter Keton- und Phenol-Aldehydharze und ein Verfahren zu ihrer Herstellung
US7226959B2 (en) * 2003-11-06 2007-06-05 Sun Chemical Corporation Water soluble energy curable stereo-crosslinkable ionomer compositions
WO2005114331A1 (ja) * 2004-05-21 2005-12-01 Mitsubishi Gas Chemical Company, Inc. レジスト化合物およびレジスト組成物
CA2574143A1 (en) 2004-07-28 2006-02-02 Novartis Ag Water-based inks for hydrogel lenses
US7318994B2 (en) * 2004-10-14 2008-01-15 Donald Long Compressible flexographic printing plate construction
TWI340161B (en) * 2005-01-19 2011-04-11 Lg Chemical Ltd Acrylic pressure-sensitive adhesive composition with good re-workability,adhesive sheet,and method of preparing the sheet
CN101657478B (zh) * 2007-03-08 2011-07-27 Dic株式会社 活性能量射线固化型树脂组合物、活性能量射线固化型涂料及保护层的形成方法
CN100491431C (zh) * 2007-06-18 2009-05-27 上海市合成树脂研究所 一种微生物载体用水性聚氨酯预聚体的合成方法
US20090012202A1 (en) * 2007-07-03 2009-01-08 Henkel Corporation Acrylated Urethanes, Processes for Making the Same and Curable Compositions Including the Same
US20100021844A1 (en) * 2008-07-22 2010-01-28 Jianfei Yu Negative-working imageable elements and method of use
CN101392048B (zh) * 2008-09-27 2011-04-27 清华大学 一种显影性聚氨酯的制备方法
KR101720807B1 (ko) * 2008-10-01 2017-03-28 코베스트로 도이칠란드 아게 홀로그래피 매체의 제조를 위한 예비중합체-기재 폴리우레탄 제제
CN101519480B (zh) * 2009-01-22 2011-11-30 广东天银化工实业有限公司 自交联型水性丙烯酸树脂-聚氨酯杂化体的制备方法
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US9340704B2 (en) * 2014-04-08 2016-05-17 Dymax Corporation Sunlight curable coating compositions
CN105646830B (zh) * 2014-11-10 2018-10-26 Tcl集团股份有限公司 一种光敏性聚氨酯及其制备方法和应用
JP6286085B1 (ja) * 2017-03-30 2018-02-28 第一工業製薬株式会社 ポリウレタン樹脂組成物および封止物
CN107325246B (zh) * 2017-07-27 2020-05-05 浙江理工大学 一种改性聚氨酯低聚物、其制备方法及其在光固化数码喷墨印花中的应用
CN114127145A (zh) * 2019-07-17 2022-03-01 阿科玛法国公司 (甲基)丙烯酸酯官能化低聚物以及制备和使用这样的低聚物的方法
CN114015014B (zh) * 2021-12-09 2023-05-05 南雄市沃太化工有限公司 一种弹性拉丝光固化树脂及其制备方法,以及弹性拉丝胶
CN114395121B (zh) * 2021-12-29 2023-11-10 山东一诺威新材料有限公司 环氧丙烯酸酯改性聚醚多元醇及其制备方法
CN116396604B (zh) * 2023-06-02 2023-08-18 山东奥德美高分子材料有限公司 一种食品包装用水性聚氨酯高阻隔树脂及其制备方法

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL101499C (es) * 1951-08-20
GB1159504A (en) * 1966-11-16 1969-07-30 Kurashiki Rayon Kk Process for the production of improved Polyurethane Elastomer
US3864133A (en) * 1970-08-11 1975-02-04 Dainippon Ink & Chemicals Photo-polymerizable compositions
GB1441108A (en) * 1973-01-23 1976-06-30 Redfarn C A Cross linked polymers
US4210713A (en) * 1973-02-01 1980-07-01 Nippon Paint Co., Ltd. Photo-curable composition for coating containing an unsaturated urethane modified polymer
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
US4006024A (en) * 1973-02-21 1977-02-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
AU476446B2 (en) * 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
US4003751A (en) * 1974-09-05 1977-01-18 Union Carbide Corporation Coating and ink compositions
US4113592A (en) * 1975-04-14 1978-09-12 Celanese Corporation Trihalogenated hydrocarbons as co-photoinitiators
US4116786A (en) * 1976-06-08 1978-09-26 Union Carbide Corporation Radiation curable coating compositions containing an acrylate-capped, polyether urethane and a polysiloxane
US4221646A (en) * 1978-05-01 1980-09-09 The Goodyear Tire & Rubber Company Treated polyetherurethane photopolymer composition containing triaryl phosphine
US4254230A (en) * 1979-12-10 1981-03-03 Lord Corporation Actinic radiation-curable formulations of unsaturated polyetherester urethane
US4360438A (en) * 1980-06-06 1982-11-23 R. T. Vanderbilt Company, Inc. Organomolybdenum based additives and lubricating compositions containing same
DE3047026A1 (de) * 1980-12-13 1982-07-22 Basf Ag, 6700 Ludwigshafen Photopolymerisierbares aufzeichnungsmaterial und verfahren zur herstellung von reliefformen mittels dieses aufzeichnungsmaterials
JPS59113430A (ja) * 1982-12-18 1984-06-30 Toyo Tire & Rubber Co Ltd 水溶性感光性組成物
DE3328285A1 (de) * 1983-08-05 1985-02-21 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von lichtgehaerteten schichten mit definierter haerte
JPS60191237A (ja) * 1984-03-13 1985-09-28 Asahi Chem Ind Co Ltd 露光硬化後非粘着性感光性樹脂組成物
DE3437918A1 (de) * 1984-10-17 1986-04-17 Bayer Ag, 5090 Leverkusen Waessrige oligourethan-dispersionen mit eingebauten, ungesaettigten gruppen und ihre verwendung zur herstellung von hochglaenzenden lacken auf leder aus waessriger phase
US4622361A (en) * 1985-03-29 1986-11-11 Union Carbide Corporation Flame retarded high modulus polyurethane elastomers and method of making same
IT1186774B (it) * 1985-10-10 1987-12-16 Resem Spa Procedimento per la preparazione di adesivi poliuretanici per imballaggio e prodotti cosi' ottenuti
DE3602472A1 (de) * 1986-01-28 1987-07-30 Basf Ag Polymeranalog modifizierte polymerisate
DE3622612A1 (de) * 1986-07-05 1988-01-14 Bayer Ag Waermesensible polyurethandispersionen
JPS6321859A (ja) * 1986-07-16 1988-01-29 Toshiba Corp 半導体装置
JP2557214B2 (ja) * 1986-07-17 1996-11-27 富士写真フイルム株式会社 カラ−写真感光材料
PT85756A (pt) * 1986-09-22 1988-10-14 Napp Systems Inc Processo para a preparacao de chapas fotossensiveis e revelaveis com agua
JPH07113767B2 (ja) * 1986-10-02 1995-12-06 旭化成工業株式会社 段ボ−ル印刷用感光性樹脂印刷版
JPS63246460A (ja) * 1987-03-31 1988-10-13 Agency Of Ind Science & Technol ガスエンジンの出力制御装置
JPH0655493B2 (ja) * 1988-02-29 1994-07-27 帝人株式会社 易接着性ポリエステルフイルム及びその製造方法
DE68926974T2 (de) * 1988-03-31 1997-04-03 Asahi Chemical Ind Photolack-Reliefdruckplatte
JPH021859A (ja) * 1988-06-13 1990-01-08 Toyobo Co Ltd 感光性樹脂組成物
JP3035740B2 (ja) * 1988-06-22 2000-04-24 東洋紡績株式会社 感光性樹脂組成物
DE3824146A1 (de) * 1988-07-16 1990-02-22 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von flexodruckplatten
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
JPH0246460U (es) * 1988-09-27 1990-03-29
DE3837324A1 (de) * 1988-11-03 1990-05-10 Basf Ag Lichtempfindliches aufzeichnungsmaterial
DE3843506A1 (de) * 1988-12-23 1990-06-28 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
JPH03161753A (ja) * 1989-11-20 1991-07-11 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
JPH0470660A (ja) * 1990-07-06 1992-03-05 Nippon Zeon Co Ltd 水溶性感光性フレキソ版用組成物
US5716094A (en) * 1997-03-06 1998-02-10 General Motors Corporation Vehicle seat with pusher block

Also Published As

Publication number Publication date
ATE184999T1 (de) 1999-10-15
CN1083493A (zh) 1994-03-09
EP0584970B1 (en) 1999-09-22
US5364741A (en) 1994-11-15
ZA935031B (en) 1994-03-08
CN1230703A (zh) 1999-10-06
SG76467A1 (en) 2000-11-21
US5328805A (en) 1994-07-12
DE69326514D1 (de) 1999-10-28
BR9303216A (pt) 1994-03-08
JPH0841151A (ja) 1996-02-13
US5554712A (en) 1996-09-10
EP0584970A2 (en) 1994-03-02
DE69326514T2 (de) 2000-01-05
EP0584970A3 (en) 1994-09-28
CA2100279A1 (en) 1994-02-04
AU4180293A (en) 1994-03-03
AU672205B2 (en) 1996-09-26
CN1039018C (zh) 1998-07-08

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