ES2036253T3 - Metodo para tratar superficies de sustratos con ayuda de un plasma y un reactor para realizar el metodo. - Google Patents

Metodo para tratar superficies de sustratos con ayuda de un plasma y un reactor para realizar el metodo.

Info

Publication number
ES2036253T3
ES2036253T3 ES198888201112T ES88201112T ES2036253T3 ES 2036253 T3 ES2036253 T3 ES 2036253T3 ES 198888201112 T ES198888201112 T ES 198888201112T ES 88201112 T ES88201112 T ES 88201112T ES 2036253 T3 ES2036253 T3 ES 2036253T3
Authority
ES
Spain
Prior art keywords
plasma
substrate surfaces
reactor
help
perform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES198888201112T
Other languages
English (en)
Spanish (es)
Inventor
Daniel Cornelis Schram
Gerardus Maria Wilhelmus Kroesen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eindhoven Technical University
Original Assignee
Eindhoven Technical University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eindhoven Technical University filed Critical Eindhoven Technical University
Application granted granted Critical
Publication of ES2036253T3 publication Critical patent/ES2036253T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder or liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
ES198888201112T 1987-06-30 1988-06-02 Metodo para tratar superficies de sustratos con ayuda de un plasma y un reactor para realizar el metodo. Expired - Lifetime ES2036253T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8701530A NL8701530A (nl) 1987-06-30 1987-06-30 Werkwijze voor het behandelen van oppervlakken van substraten met behulp van een plasma en reactor voor het uitvoeren van die werkwijze.

Publications (1)

Publication Number Publication Date
ES2036253T3 true ES2036253T3 (es) 1993-05-16

Family

ID=19850226

Family Applications (1)

Application Number Title Priority Date Filing Date
ES198888201112T Expired - Lifetime ES2036253T3 (es) 1987-06-30 1988-06-02 Metodo para tratar superficies de sustratos con ayuda de un plasma y un reactor para realizar el metodo.

Country Status (10)

Country Link
US (1) US4871580A (OSRAM)
EP (1) EP0297637B1 (OSRAM)
JP (1) JP2705029B2 (OSRAM)
AT (1) ATE82460T1 (OSRAM)
AU (1) AU596935B2 (OSRAM)
CA (1) CA1324979C (OSRAM)
DE (1) DE3875815T2 (OSRAM)
ES (1) ES2036253T3 (OSRAM)
GR (1) GR3007016T3 (OSRAM)
NL (1) NL8701530A (OSRAM)

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US5356672A (en) * 1990-05-09 1994-10-18 Jet Process Corporation Method for microwave plasma assisted supersonic gas jet deposition of thin films
JP2706861B2 (ja) * 1991-07-23 1998-01-28 動力炉・核燃料開発事業団 クラスター生成装置
US5565247A (en) * 1991-08-30 1996-10-15 Canon Kabushiki Kaisha Process for forming a functional deposited film
US5525392A (en) * 1992-12-10 1996-06-11 International Business Machines Corporation Magnetic recording medium having a fluorinated polymeric protective layer formed by an ion beam
JPH0822945A (ja) * 1994-07-07 1996-01-23 Fujitsu Ltd 半導体装置の製造方法
SE9403988L (sv) * 1994-11-18 1996-04-01 Ladislav Bardos Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning
US5571332A (en) * 1995-02-10 1996-11-05 Jet Process Corporation Electron jet vapor deposition system
US6258287B1 (en) * 1996-08-28 2001-07-10 Georgia Tech Research Corporation Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment
DE19648999C2 (de) * 1996-11-27 2000-08-03 Afs Entwicklungs & Vertriebs G Vorrichtung zur Reinigung, Beschichtung und/oder Aktivierung von Kunststoffoberflächen
US6213049B1 (en) 1997-06-26 2001-04-10 General Electric Company Nozzle-injector for arc plasma deposition apparatus
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
KR100265289B1 (ko) * 1998-01-26 2000-09-15 윤종용 플라즈마식각장치의 캐소우드 제조방법 및 이에 따라 제조되는 캐소우드
US6122050A (en) * 1998-02-26 2000-09-19 Cornell Research Foundation, Inc. Optical interface for a radially viewed inductively coupled argon plasma-Optical emission spectrometer
US6420032B1 (en) 1999-03-17 2002-07-16 General Electric Company Adhesion layer for metal oxide UV filters
US6517687B1 (en) 1999-03-17 2003-02-11 General Electric Company Ultraviolet filters with enhanced weatherability and method of making
US6426125B1 (en) 1999-03-17 2002-07-30 General Electric Company Multilayer article and method of making by ARC plasma deposition
US6365016B1 (en) 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6261694B1 (en) 1999-03-17 2001-07-17 General Electric Company Infrared reflecting coatings
TW588222B (en) * 2000-02-10 2004-05-21 Asml Netherlands Bv Cooling of voice coil motors in lithographic projection apparatus
NL1017849C2 (nl) * 2001-04-16 2002-10-30 Univ Eindhoven Tech Werkwijze en inrichting voor het deponeren van een althans ten dele kristallijne siliciumlaag op een substraat.
WO2003017737A2 (en) * 2001-08-16 2003-02-27 Dow Global Technologies Inc. Cascade arc plasma and abrasion resistant coatings made therefrom
US6948448B2 (en) 2001-11-27 2005-09-27 General Electric Company Apparatus and method for depositing large area coatings on planar surfaces
US6681716B2 (en) * 2001-11-27 2004-01-27 General Electric Company Apparatus and method for depositing large area coatings on non-planar surfaces
ATE402277T1 (de) * 2002-02-05 2008-08-15 Dow Global Technologies Inc Chemische dampfphasenabscheidung auf einem substrat mittels eines korona-plasmas
RU2200058C1 (ru) * 2002-02-12 2003-03-10 Открытое акционерное общество "ТВЭЛ" Способ проведения гомогенных и гетерогенных химических реакций с использованием плазмы
US6743524B2 (en) 2002-05-23 2004-06-01 General Electric Company Barrier layer for an article and method of making said barrier layer by expanding thermal plasma
NL1020923C2 (nl) * 2002-06-21 2003-12-23 Otb Group Bv Werkwijze alsmede inrichting voor het vervaardigen van een katalysator.
NL1021185C2 (nl) * 2002-07-30 2004-02-03 Fom Inst Voor Plasmafysica Inrichting voor het behandelen van een oppervlak van een substraat en een plasmabron.
US20040229051A1 (en) 2003-05-15 2004-11-18 General Electric Company Multilayer coating package on flexible substrates for electro-optical devices
JP2006508346A (ja) * 2002-11-28 2006-03-09 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 光学検査システム及び当該検査システムに用いられる放射源
NL1022155C2 (nl) * 2002-12-12 2004-06-22 Otb Group Bv Werkwijze, alsmede inrichting voor het behandelen van een oppervlak van ten minste één substraat.
US6969953B2 (en) * 2003-06-30 2005-11-29 General Electric Company System and method for inductive coupling of an expanding thermal plasma
US7282244B2 (en) * 2003-09-05 2007-10-16 General Electric Company Replaceable plate expanded thermal plasma apparatus and method
NL1025096C2 (nl) * 2003-12-21 2005-06-23 Otb Group Bv Werkwijze alsmede inrichting voor het vervaardigen van een functionele laag bestaande uit ten minste twee componenten.
US20050139256A1 (en) * 2003-12-31 2005-06-30 Korman Charles S. Solar cell assembly for use in an outer space environment or a non-earth environment
US20050139253A1 (en) * 2003-12-31 2005-06-30 Korman Charles S. Solar cell assembly for use in an outer space environment or a non-earth environment
US20050139255A1 (en) * 2003-12-31 2005-06-30 Korman Charles S. Solar cell assembly for use in an outer space environment or a non-earth environment
EP2261392B1 (en) * 2004-03-09 2018-10-03 Exatec, LLC. Expanding thermal plasma deposition system
US7354845B2 (en) 2004-08-24 2008-04-08 Otb Group B.V. In-line process for making thin film electronic devices
US7703413B2 (en) * 2004-06-28 2010-04-27 Sabic Innovative Plastics Ip B.V. Expanded thermal plasma apparatus
WO2006126133A2 (en) * 2005-05-26 2006-11-30 Koninklijke Philips Electronics N.V. Cascade arc radiation source with oxygen scavenging means
WO2008007944A1 (en) * 2006-07-12 2008-01-17 Technische Universiteit Eindhoven Method and device for treating a substrate by means of a plasma
EP1895818B1 (en) * 2006-08-30 2015-03-11 Sulzer Metco AG Plasma spraying device and a method for introducing a liquid precursor into a plasma gas system
ES2534215T3 (es) 2006-08-30 2015-04-20 Oerlikon Metco Ag, Wohlen Dispositivo de pulverización de plasma y un método para la introducción de un precursor líquido en un sistema de gas de plasma
DE102006042501B4 (de) * 2006-09-07 2010-11-25 Eisenmann Anlagenbau Gmbh & Co. Kg Verfahren und Anlage zum Trocknen von Gegenständen
CA2658210A1 (en) 2008-04-04 2009-10-04 Sulzer Metco Ag Method and apparatus for the coating and for the surface treatment of substrates by means of a plasma beam
NL2003514C2 (en) 2009-09-18 2011-03-21 Otb Solar Bv Thin film deposition apparatus and method for the same.

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2245779B1 (OSRAM) * 1973-09-28 1978-02-10 Cit Alcatel

Also Published As

Publication number Publication date
NL8701530A (nl) 1989-01-16
AU1822288A (en) 1989-01-05
ATE82460T1 (de) 1992-11-15
DE3875815T2 (de) 1993-04-29
EP0297637A1 (en) 1989-01-04
CA1324979C (en) 1993-12-07
US4871580A (en) 1989-10-03
AU596935B2 (en) 1990-05-17
EP0297637B1 (en) 1992-11-11
JP2705029B2 (ja) 1998-01-26
JPH01208450A (ja) 1989-08-22
DE3875815D1 (de) 1992-12-17
GR3007016T3 (OSRAM) 1993-07-30

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