EP3743546A1 - Vorrichtung zum verbinden eines suszeptors mit einer antriebswelle - Google Patents
Vorrichtung zum verbinden eines suszeptors mit einer antriebswelleInfo
- Publication number
- EP3743546A1 EP3743546A1 EP19702036.5A EP19702036A EP3743546A1 EP 3743546 A1 EP3743546 A1 EP 3743546A1 EP 19702036 A EP19702036 A EP 19702036A EP 3743546 A1 EP3743546 A1 EP 3743546A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- susceptor
- drive shaft
- base plate
- support plate
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003780 insertion Methods 0.000 claims description 14
- 230000037431 insertion Effects 0.000 claims description 14
- 238000007789 sealing Methods 0.000 claims description 14
- 108090000623 proteins and genes Proteins 0.000 claims 1
- 239000007789 gas Substances 0.000 description 61
- 238000000034 method Methods 0.000 description 21
- 239000000758 substrate Substances 0.000 description 12
- 239000011261 inert gas Substances 0.000 description 5
- 239000000969 carrier Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000010079 rubber tapping Methods 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
Definitions
- the invention relates to a device for fastening a susceptor of a CVD reactor to a drive shaft, comprising a support plate having a support surface on which a support surface of the susceptor can be placed, and a base plate which is connectable to the drive shaft is and from the support plate is supported position adjustable.
- the invention further relates to a CVD reactor having a reactor housing, a susceptor and a drive shaft connected to a susceptor carrier.
- a CVD reactor is known from US Pat. No. 9,765,427 B2, in the reactor housing of which a susceptor is arranged.
- the susceptor carries a plurality of substrate carriers which are rotatable about an axis.
- the susceptor is connected to a susceptor carrier with the end face of a shaft. Means are provided for adjusting the position of the susceptor relative to the shaft.
- a CVD reactor of the generic type is used for depositing III-V layers and in particular for depositing Galliumnitrit harshen on substrates.
- the diameter of a susceptor of a generic CVD reactor can be 30 cm and more.
- the distance between a process chamber ceiling and the bottom of the process chamber formed by the susceptor is about 10 to 50 mm, preferably 30 to 40 mm.
- the gas is fed into the process chamber through a gas inlet element arranged in the center of the process chamber, with which a hydride of the V main group and an organometallic compound of the III main group are fed separately into the process chamber.
- a gas inlet element arranged in the center of the process chamber, with which a hydride of the V main group and an organometallic compound of the III main group are fed separately into the process chamber.
- the wafers produced in a batch which are arranged in a circle around the center of the process chamber on the susceptor, must be coated in a uniform manner.
- the coating takes place in that the process gases introduced into the process chamber decompose pyrolytically, in particular on the heated surface of the substrates.
- an as exact as possible parallel position of susceptor surface and underside of a reactor ceiling is required.
- the reactor cover preferably extends in a plane of rotation of the drive shaft, which rotates the susceptor.
- a susceptor of a generic CVD reactor has a support surface facing down and resting on a support surface of a susceptor support carried by the drive shaft. Due to manufacturing tolerances, the support surface usually does not run exactly parallel to the top side of the susceptor, which forms the bottom of the process chamber. The Suszeptorley must therefore have means to adjust the inclination of the susceptor relative to the drive shaft can.
- the invention has for its object to further develop a generic Suszeptoris nutzsvorteilhaft. [0008]
- the object is achieved by the invention specified in the claims, wherein the subclaims represent not only advantageous developments of the independent claims 1 and 16, but also independent solutions to the problem.
- the susceptor carrier have three elements arranged axially one after the other with respect to the axis of the drive shaft.
- a lower element is attached to the drive shaft.
- This lower element carries a central element, which rests in particular on a plane surface of the lower element.
- the central element in turn carries an upper element, which forms the support surface on which the susceptor is supported.
- Means are provided to be able to adjust at least the inclination position of the upper element with respect to the central element.
- the lower element is preferably a flange element which can be fastened to the drive shaft.
- the drive element can also be attached to the drive shaft.
- the flange is in particular permanently attached to the drive shaft.
- the central element which forms a base plate and the associated, formed by a support plate upper element can be removed from the flange and detachably connected to the Flanschele- ment.
- the support plate can be positionally adjusted relative to the base plate by means of the adjusting elements outside of the CVD reactor housing. It is thus possible to perform a pre-adjustment outside the reactor housing, in which, for example, the support surface of the support plate is brought into a parallel position to a contact surface of the base plate, with which the base plate rests on the support surface of the flange element.
- the position of the support plate relative to the base plate can thus be pre-adjusted in a first step.
- the ensemble consisting of support plate and base plate can be used as a unit in the process chamber, wherein the bearing surface of the base plate lies on the support surface of the flange element. Subsequently, the sus- With its support surface, the zeptor can be placed on the support surface of the support plate. But it is also possible to connect the existing support plate and base plate ensemble outside with the susceptor and then introduce the module so formed in the CVD reactor and set up on the support surface of the support element. Before the final position adjustment takes place, the base plate can be connected to the flange element. For this purpose, fastening means are provided. These are releasable fasteners.
- the fastening means may have a plurality of screws which are inserted into fixing holes of the base plate and are screwed into threaded bores of the flange element.
- the fastening screws can have heads which are inserted in enlarged-diameter sections of the fastening bores.
- the fastening bores are thus in particular stepped bores within the base plate.
- the fastening bores and the threaded bores preferably extend parallel to the axis of the drive shaft.
- One of the base plate pioneering end face of the support plate may have a central region, which is in particular of the support surface to give.
- Through-openings may be arranged in this central region through which the fastening screws can be inserted, if they are to be inserted into the fastening bores and screwed into the threaded bores of the flange element.
- the diameter-enlarged sections of the fastening bores preferably have such an axial depth that the screw heads find complete acceptance there.
- the means for adjusting the inclination of the support surface relative to the support surface of the base plate, which rests on the bearing surface of the flange, may preferably be accessible from the central region forth.
- the means for adjusting the inclination can preferably be actuated with a tool which acts in the direction of the drive axle.
- the inclination adjustment means may be screws whose threaded engagement holes are accessible from the central area.
- These screws preferably extend parallel to the axis of the drive shaft. It may be grub screws. It may be provided a leverage to make the position adjustment sensitive. In order to avoid static overdeterminations, three means for tilt adjustment arranged at an angular distance of 120 ° are provided, these means in particular having levers extending in the radial direction.
- the levers form adjustment levers, which are preferably supported on the base plate.
- a short lever arm can be directed in the radial outward direction.
- a long lever arm may be directed radially inward. The short lever arm engages in the radially outer region on the underside of the support plate.
- the long lever arm preferably acts an adjusting screw, which is in particular formed by a grub screw and which is screwed into a threaded bore of the central region.
- the adjusting screw which acts on the long lever arm, preferably has a frontally rounded shaft, which rests in a recess of the long lever arm.
- the support plate is subjected to force in the direction of the baseplate.
- tension elements may be screws that are screwed into sliding blocks that can move in a bearing recess of the base plate in the axial direction.
- the flange element can be connected by means of suitable fastening means, in particular with an end section of the drive shaft.
- the flange is connected via clamping elements with the drive shaft.
- the clamping elements can act on an outer lateral surface of the drive shaft.
- Two clamping jaws can be provided, which can be displaced toward each other with a clamping element, for example a clamping screw. In a clamping position, the jaws act clampingly together with the drive shaft. It can be in Radially extending screws, in particular grub screws, which perform the function of clamping screws, which can be brought against the outer lateral surface of the drive shaft.
- the susceptor is a carrier of a multiplicity of substrate carriers.
- Each substrate carrier carries one or more substrates and is located in a pocket of the susceptor.
- In the bottom of the bag opens a gas supply line through which a carrier gas can be fed into the bag.
- the carrier gas forms a gas bearing on which the Suszeptorlie rests rotatably.
- the gas outlet nozzle in the bottom of the pocket has such a direction that the gas emerging from it causes the substrate carrier to rotate.
- the gas supply lines extend in the radial direction from a central opening of the susceptor to the gas outlet openings at the bottom of the pockets.
- the support plate has gas passages extending in the radial direction, which open into the supporting surface.
- the gas ducts may open into a cylinder shell wall of the support plate. They are aligned with the flow channels in the susceptor, through which the gas is transported to the pockets.
- the gas channels within the support plate have gas inlet openings which lie on the underside of the support plate. It is provided, in particular, that there is an extension on the underside of the support plate, which forms an axial end face in which open the gas ducts. Gas inlet openings are formed in one plane, through which the inert gas can be fed into the gas channels and subsequently the flow channels.
- the plane in which the gas inlet openings lie is preferably a bottom plane of a cavity.
- a seal having gas passage openings which is aligned with the gas inlet openings of the gas channels.
- the seal lies between the plane in which the gas inlet openings are located and an end face of the drive shaft, which has an axial cavity through which the gas into the gas passage openings of the seal and then into the gas passages can flow.
- the seal is made of a flexible material.
- the extension formed by the underside of the support plate engages in a central bore of the baseplate.
- the underside of the support plate is spaced from an upper surface of the base plate by a gap.
- the outer edge of the underside of the support plate rests on upwardly facing extensions of the short lever arms of the adjustment lever.
- the upper side of the support plate has an annular ridge along the outer edge following a circular contour line. This ring land can engage in an annular recess of the underside of the susceptor.
- An orientation element for example an orientation pin, is preferably provided, which is assigned to the upper side of the support plate and which corresponds to a counter-orientation element, for example an orientation opening on the underside of the susceptor. This ensures that the susceptor can be assigned to the susceptor carrier only in a single rotational position.
- the flange element, the base plate and the support plate are preferably made of metal. They can be made of stainless steel. But they can also be made of another metal and be coated.
- the seal is preferably made of rubber, so that it is a rubber seal.
- the flange assembly ie the support plate, relative to the base plate or the drive shaft or the shaft to which the flange is attached, can be repeatedly adjusted without the rubber seal wears.
- the rubber seal is thus clamped between the support plate, base plate or flange element or shaft or drive shaft such that gas-tightness exists.
- the shaft or the drive shaft may be open at the top.
- the drive shaft or the shaft may be closed at the end, the closure plate closing the end face having openings which are aligned with the gas inlet openings of the flow channel in the support plate.
- a flexible seal such as a polymer seal, which can develop a restoring force, but can also plastically deformable seal, for example a graphite seal, be used.
- At least one adjustment lever is provided which is mounted on a bearing point and starting from the bearing point has a long lever arm and a short lever arm, wherein the long Lever arm an adjusting element, for example, an adjusting screw engages, with which a gap between the base plate and the support plate is adjustable gap width, wherein the bearing point of either the support plate or the base plate is assigned net, and the short lever arm engages the other plate, on wel cher other plate preferably also the actuator is attached.
- the invention further relates to a device for attaching a susceptor of a CVD reactor to a drive shaft, with a connectable to the drive shaft via a screw base plate and a spaced from the base plate by a gap support plate which carries the susceptor and the opposite the base plate is positionally variable, wherein the support plate has a with a mounting hole of the base plate for the passage of the screw aligned through opening.
- Such a device can carry the susceptor in particular with the interposition of an annular support element, the support element being supported on a bottom surface of a central region of the support plate.
- a support piece associated with the susceptor can support, which carries an annular susceptor plate.
- the edge region of a clamping piece can be supported, which is connected to a clamping element, in particular a pull rod, with the drive shaft or traction unit.
- the annular support element forms a cavity, which is connected via the insertion opening and the gap with a space below the susceptor, in which a heating device is located.
- closure means are provided which close the insertion opening.
- the insertion opening is preferably detachably closed by a closure means.
- a plug in each of the one or more insertion openings a plug is inserted, which closes the insertion opening sealing.
- the plug can have a cylinder-shaped sealing surface, which bears sealingly against the cylinder inner surface of the insertion opening.
- a sealing element for example an O-ring, is arranged between the jacket wall of the plug and the inner wall of the push-through opening.
- the jacket wall of the plug can also have an external thread which is screwed into an internal thread of the wall of the insertion opening or which has self-tapping threads.
- the plug may also have a head whose diameter is larger than the diameter of the Through opening, so that the plug can be supported with the head on a bottom surface of the central region of the support plate.
- the support element having a tubular shape has a wall thickness such that the underside of the support element completely closes the insertion opening. The underside of the support element then forms a sealing surface.
- the extending through the support plate gas channels Mün each in an axial gas channel extending through the support member to the Mün in the gas channels of the susceptor or the support piece to.
- the support element is in particular releasably connected to the support plate.
- the screw with which the base plate is connected to the drive shaft may be screwed into an internal thread of a flange, which is fixed to the drive shaft.
- FIG. 1 is a perspective view of a susceptor
- FIG. 2 shows the susceptor carrier shown in FIG. 1 in the view
- FIG. 3 shows the section according to the line III-III in FIG. 2
- FIG. 3a shows a cutaway perspective view according to FIG. 3
- FIG. 4 shows a broken perspective view of the susceptor carrier 1,
- 5 is a first exploded view
- 6 is a second exploded view
- FIG. 7 shows an overview in cross section through a reactor housing 30, in which a susceptor carrier 1 connects a drive shaft 40 to a susceptor 31,
- Fig. 11 shows a second embodiment of the invention in the form of a
- FIG. 12 shows a representation according to FIG. 11 of a third exemplary embodiment
- FIG. 13 shows a representation according to FIG. 11 of a fourth exemplary embodiment.
- a CVD reactor according to the invention has a reactor housing 30 which closes a process chamber arranged inside the reactor housing 30 in a gas-tight manner to the outside.
- a gas inlet element 37 is provided, with which process gases can be fed into the process chamber. Exhaust gases can emerge from the process chamber through a gas outlet 39. through a pump connected to the gas outlet 39 can evacuate the process chamber.
- a hollow drive shaft 40 Through which an inert gas can flow.
- a susceptor carrier 1 On an upper end of the drive shaft 40, a susceptor carrier 1 is fixed, which carries the susceptor 31.
- the susceptor 31 has a central opening made of graphite, in particular coated graphite or a metal, has in the radial direction away from the central opening extending flow channels 35 and one or more arranged around the center of the susceptor 31 substrate carrier 36. Die Substrate carriers 36 rest on a bearing surface, which may be the bottom of a pocket.
- the flow channels 35 open into the bearing surface in such a way that the inert gas emerging from flow channels 35 on the one hand forms a gas cushion on which the substrate carriers rest and on the other hand causes the substrate carrier to rotate.
- the susceptor 31 can be rotated by rotating the drive shaft 40.
- the gas inlet member 37 has a plurality of gas inlet channels for introducing mutually different process gases into the process chamber, which extends between an upper side of the susceptor 31 and an underside of a ceiling plate 38.
- the process chamber height a between the lower side of the ceiling panel 38 and the upper side of the susceptor 31 is 20 to 50 mm, preferably 30 to 40 mm, in the exemplary embodiment about 32 to 35 mm.
- the diameter of the top plate 38 and the diameter of the susceptor 31 are greater than 30 cm.
- the susceptor support 1 has means with which the inclination position of the susceptor 31 can be adjusted relative to the axis of the drive shaft 40, so that the process chamber height a can be standardized over the entire circumference of the susceptor 31.
- the Suszeptorlie 1 has a flange 4, which can be connected to the upwardly facing end of the drive shaft 40.
- the flange element 4 is an annular body with a radial slot 26 which cuts through the ring.
- the two opposing halves of the ring of the flange element 4 formed by the slot form clamping jaws 41, which can be displaced towards one another by means of a clamping screw 25, wherein the gap 26 is reduced.
- clamping screws 28 which can be screwed in the radial direction into threaded bores of the flange element 4.
- the threaded holes are assigned to the two clamping jaws 41.
- the tips of the clamping screws 28 may be supported on an outer circumferential surface of the drive shaft 40. But it is also envisaged that the rounded clamping jaws 41 lie flat against the outer circumferential surface of the drive shaft 40 and are held in a clamping fit by means of the clamping screw 25.
- the grub screws 28 are then used essentially for axial securing.
- An upwardly facing surface of the flange element 4 forms a bearing surface 4 ', which preferably lies exactly in a plane of rotation of the drive shaft 40. From the bearing surface 4 'go out three threaded holes 7, in the fastening screws 8 can be screwed.
- a base plate 3 has a bearing surface 3 ", which can be placed flat on the bearing surface 4 '.
- the base plate 3 can be connected to the flange element 4 by means of the fastening screws 8.
- the base plate 3 is provided for this purpose Mounting holes extending in the axial direction of the drive shaft 40, which have an upper, enlarged diameter portion 9 'The shaft of the screw 8 penetrates the mounting hole 9, so that the head 8' of the screw 8 completely in the upper portion 9 'of Mounting hole 9 is located.
- the base plate 3 has a central cavity through which an upper portion of the drive shaft 40 can protrude. While the drive shaft 40 projects from below into the central opening of the base plate, an extension 42 of a support plate 2 projects from above into the central cavity.
- the extension 42 forms a downwardly open cavity, on the bottom of a seal 21 is located.
- the other side of the seal 21 is acted upon by the end face of the drive shaft 40.
- the drive shaft 40 has a plurality of flow channels 45 extending in its axial direction.
- tension members 11 are provided, which apply force to the support plate 2 in the direction of the base plate 3.
- tension members 11 There are three particular in gleichze- FLOWING scope V grant to a center of the support plate 2 or the base plate 3 arranged pulling elements 11 is provided.
- the tension elements 11 generate a force with which the seal 21 is acted upon.
- the seal 21 has a plurality of gas passage openings 22 which are aligned with gas inlet openings of gas channels 23 which extend within the support plate 2. These gas inlet openings connect the gas channels 23 to gas outlet openings 24.
- the gas channels 23 have first sections which extend in the axial direction and which open into second sections which extend in the radial direction. The second sections are sealed to the cylinder jacket outer wall of the support plate 2 with plugs. The second sections open into third sections, which extend in the axial direction and form the gas outlet openings 24, which lie in an end face of the support plate 2, through which an inert gas can flow into the flow channels 35 of the susceptor 31.
- the flow channels 45 are aligned with the gas passage openings 22, so that a gas can be fed into the support plate 2 through the flow channels 45.
- the tension element 11 is formed by a threaded screw which is inserted in a bore 22 of the support element 2 and which projects through a bore 13 of the base plate 3 and which ends in a subsequent to the bore 13 bearing recess 13 '.
- the end of the screw is screwed into a non-circular sliding block 14, which can move in the bearing recess 13 'in the axial direction.
- the bearing recess 13 ' has a bottom, on which a spring element 15 is supported.
- the spring element 15 is acted upon by sliding stone 14.
- the spring element 15 is formed by a compression spring element. The latter are stacked disc springs.
- the adjustment lever 16 has a downwardly directed bearing portion 16 'which is mounted on a Bottom of Lagerausneh- mung 20 is stored.
- Three bearing recesses 20 are provided, which are each formed by a radial cut in the upper side 3 '.
- the bearing recess 20 is a rectangular cross-section groove which extends in the radial direction.
- the adjusting lever 16 has a radially outwardly pointing short lever arm 17, the upwardly facing extension engages the edge of the bottom 2 below.
- At the pointing radially inward long lever arm 18 engages an adjusting screw 19.
- the adjustment screw 19 is a grub screw which is screwed into a threaded bore of a central region 6 of the support plate 2.
- the central region 6 is surrounded by a bearing surface 5, which lies opposite the underside 2.
- the support surface 5 is in turn surrounded by a ring land 34. On the support surface 5 rests a support surface 32 of the susceptor 31.
- the gas outlet openings 24 lie in the support surface 5 and are aligned with gas inlet openings of the flow channel 35, which extends through the susceptor 31.
- the susceptor 31 is shown in several parts in the drawings. But it can also be integrally formed.
- the adjustment means 19 for adjusting the tilt position of the support plate 2 opposite to the base plate 3 can by means of a suitable tool, examples game as a screw W erkzeuges, be adjusted. They are accessible in particular through the central opening of the susceptor 31.
- the susceptor support 1 When replacing a susceptor removed, for example for the purpose of cleaning or replacement, from the reactor housing 30, the susceptor support 1 can first be pre-adjusted outside the CVD reactor housing 30 by bringing the underside of the base plate 3 into a parallel position to the support surface 5 becomes. Subsequently, the ensemble consisting of support plate 2 and base plate 3 can be inserted into the reactor housing 30. In this case, the bearing surface 3 "is placed on the bearing surface 4 'of the flange element 4.
- the bearing surface 4' preferably extends exactly in the plane of rotation of the drive shaft 40, so that the pre-adjusted bearing surface 5 is likewise in a plane of rotation of the drive shaft 40
- the fastening of the base plate 3 with the flange element 4 takes place by means of the screws 8 which are accessible from the central region 6 and are screwed into threaded bores 7 of the flange element 4.
- the assignment of the fastening screws 8 takes place through the through-openings 10 of the support plate 2, which engage with the mounting Holes 9 of the base plate 3 and the threaded holes 7 of the flange 4 are aligned.
- Fine adjustment takes place after placement of the susceptor 31 on the support plate 2.
- the downwardly facing support surface 32 of the susceptor 31 is supported on the support surface 5 from.
- the adjusting element that is, in particular the adjusting screw 19
- the central hollow of the susceptor 31 so that the inclination position of the susceptor 31 changes such that its upper side lies in the plane of rotation and in particular parallel to the bottom of the process chamber ceiling 8.
- FIGS. 11, 12 and 13 show a second aspect of the invention.
- a drive shaft 40 is connected to a base plate 3.
- the base plate 3 carries a support plate 2, wherein the measures already described above are provided to te the support plate 2 relative to the Grundplat- 3 to adjust.
- adjusting means are provided with which the inclination position of the support plate 2 relative to the base plate 3 is adjustable.
- the support plate 2 is spaced from the base plate 3 by a gap 53.
- This gap 53 extends in a horizontal plane and opens into an annular gap 54 which surrounds the support plate 2 and opens into a space extending below the susceptor 31.
- Heating element 51 with which a susceptor plate of the susceptor 31 is heated, which is annular and supports on a support piece 49.
- the support piece 49 is again supported by a tubular support element 47, which is supported on a bottom surface 6 'of the support plate 2.
- the support element 7 forms an annular cavity into which through-openings 10 open, which are flow-connected to the gap 53, so that the central cavity is flow-connected to the space below the susceptor 31 ,
- the annular edge of a clamping piece 48 which is connected to a tensioning element 50 with the drive shaft 40 or with a tensioning means arranged below the drive shaft 40, rests on an annular edge of the susceptor plate in order to apply tension to the tensioning element 50 exercise.
- the clamping piece 48 is formed in the embodiment of a pull plate.
- the stopper 46 shown in FIG. 11 which is the through-opening 10, which is aligned with a fastening bore 9 in which a fastening screw 8 is inserted, the flow connection between the central cavity and the space below the susceptor 31 closed.
- the fastening screw 8 can be inserted through the insertion opening 10 into the fastening opening 9.
- the threaded portion of the fastening screw 8 is then screwed into a threaded bore 7 of a flange 4, which is fixed to the drive shaft 40.
- the closure means shown in the drawings seal the through-openings 10 detachably.
- the plug 10 has a cylindrical sealing area which engages in the through opening 10.
- the sealing area is located on the wall of the cylindrical through-opening 10 with an elastic contact pressure.
- a head of the plug 46 has areas that project radially beyond the sealing surface and can rest on the bottom surface 6 'in order to hold the plug 10 axially in the fastening bore 9 ,
- the embodiment shown in Figure 13 differs from the embodiment shown in Figure 11 essentially in that the sealing means is an O-ring 52 which rests in an annular groove of the cylindrical lateral surface of the plug 46.
- the compressed O-ring 52 can be sealingly supported on the wall of the insertion opening 10.
- the tubular support element 47 has a wall thickness such that an underside of the support element 47 forms a sealing surface 47 'which completely closes the through-opening 10.
- the radial extension of the central opening below the clamping piece 48, through which the clamping element 50 extends, that is to say the diameter thereof, is smaller in the exemplary embodiment shown in FIG. 12 than in the exemplary embodiments illustrated in FIGS. 11 and 13.
- the plug can have alternative designs.
- it can have an external thread, which is screwed into an internal thread of the wall of the through-opening 10. It can be a self-sealing thread.
- the stopper may also have a self-tapping thread which, when the stopper is screwed in, fens 46 digs into the smooth-walled wall of the insertion opening 10.
- the diameter-enlarged edge of the head can form a sealing surface.
- a device which is characterized by a flange element 4 carried by the drive shaft 40 and / or attachable to the drive shaft 40, to which the base plate 3 can be fastened or fastened with releasable fastening means 7, 8, 9.
- a device which is characterized in that the fastening means 7, 8, 9 have a plurality of screws 8, which are inserted into fastening bores 9 of the base plate 3 and are screwed into threaded bores 7 of the flange element 4.
- Base plate 4 cybersecurity end face of the support plate 2 has a central region 6, in the through-openings 10 for passing through the fastening screws 8 are arranged.
- a device which is characterized in that the support surface 5 surrounds the central region 6.
- a device which is characterized by adjusting means 16, 17, 18, 19 for adjusting the inclination of the support surface 5 with respect to a bearing surface 3 "of the base plate 3 resting on a bearing surface 4 'of the flange element and / or can be placed.
- a device which is characterized in that the flange element 4 has one or more clamping screws 28 which can be brought radially against the outer circumferential surface of the drive shaft 4.
- a device characterized in that the adjustment means are adjustment levers 16, which are supported on the base plate 3 and engage with a short lever arm 17 on the underside 2 'of the support plate 2 and the one long lever arm 18 have, on which a screwed into a threaded bore of the central portion 6 screw 19 acts.
- a device which is characterized by the support plate 2 in the direction of the base plate 3 kraftbeier tode tension elements 11, 14, 15th
- a device which is characterized by gas channels 23 arranged in the support plate 2 which connect gas inlet openings with gas outlet openings 24 assigned to a lower side 2 'of the support plate 2.
- a device which is characterized by a flexible seal 21 which is located in a recess 43 of the extension 2 associated with the underside 2 'of the support plate 2 and which has gas passage openings 22 aligned with the gas inlet openings and which projects onto the end face of the drive shaft - le 40 can be placed.
- a device which is characterized by a ring web 34 surrounding the support surface 5.
- a device which is characterized by a position-adjusting element 33 arranged in the region of the bearing surface 5, in particular in the form of an orientation tapping pin.
- a CVD reactor characterized in that the susceptor 31 is connected to the drive shaft 40 by a device according to any of claims 1 to 15, the susceptor 31 having a central opening defined by the Support surface 32 is surrounded and whose diameter corresponds approximately to the diameter of the central region 6.
- a device which is characterized by the attachment of a susceptor 31 of a CVD reactor to a drive shaft 40 with three in the axial direction of the drive shaft 40 superimposed elements, wherein a lower element is connected to the drive shaft 40 and carries a central element and the middle element is arranged between the lower and an upper element, the upper element being opposite to the middle one Element is positionally adjustable and has means for fixing the susceptor 31 up.
- a device which is characterized by at least one closure means 46, 47 ', with which the insertion opening 10 is closed.
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- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Replacement Of Web Rolls (AREA)
- Chair Legs, Seat Parts, And Backrests (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE202018100363.1U DE202018100363U1 (de) | 2018-01-23 | 2018-01-23 | Vorrichtung zum Verbinden eines Suszeptors mit einer Antriebswelle |
PCT/EP2019/051433 WO2019145271A1 (de) | 2018-01-23 | 2019-01-22 | Vorrichtung zum verbinden eines suszeptors mit einer antriebswelle |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3743546A1 true EP3743546A1 (de) | 2020-12-02 |
Family
ID=65237011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19702036.5A Pending EP3743546A1 (de) | 2018-01-23 | 2019-01-22 | Vorrichtung zum verbinden eines suszeptors mit einer antriebswelle |
Country Status (8)
Country | Link |
---|---|
US (1) | US11959190B2 (de) |
EP (1) | EP3743546A1 (de) |
JP (1) | JP7266608B2 (de) |
KR (1) | KR102671770B1 (de) |
CN (1) | CN111788338B (de) |
DE (1) | DE202018100363U1 (de) |
TW (1) | TWI814772B (de) |
WO (1) | WO2019145271A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE202018100363U1 (de) | 2018-01-23 | 2019-04-24 | Aixtron Se | Vorrichtung zum Verbinden eines Suszeptors mit einer Antriebswelle |
DE102019116460A1 (de) * | 2019-06-18 | 2020-12-24 | Aixtron Se | Vorrichtung und Verfahren zum Bestimmen und Einstellen der Neigungslage eines Suszeptors |
JP7504000B2 (ja) * | 2020-10-28 | 2024-06-21 | 東京エレクトロン株式会社 | 基板処理装置 |
USD980813S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD981973S1 (en) * | 2021-05-11 | 2023-03-28 | Asm Ip Holding B.V. | Reactor wall for substrate processing apparatus |
USD980814S1 (en) * | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
CN113731685B (zh) * | 2021-09-26 | 2022-04-19 | 山东省建设建工(集团)有限责任公司 | 一种适用于大面积耐磨防腐金刚砂抗裂楼地面的施工装置及施工方法 |
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US4821674A (en) * | 1987-03-31 | 1989-04-18 | Deboer Wiebe B | Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment |
JP3050716B2 (ja) * | 1993-02-20 | 2000-06-12 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US5762544A (en) * | 1995-10-27 | 1998-06-09 | Applied Materials, Inc. | Carrier head design for a chemical mechanical polishing apparatus |
US6035101A (en) * | 1997-02-12 | 2000-03-07 | Applied Materials, Inc. | High temperature multi-layered alloy heater assembly and related methods |
JP2001230307A (ja) * | 2000-02-17 | 2001-08-24 | Rohm Co Ltd | 半導体製造装置 |
US6592675B2 (en) * | 2001-08-09 | 2003-07-15 | Moore Epitaxial, Inc. | Rotating susceptor |
JP2004278973A (ja) * | 2003-03-18 | 2004-10-07 | Koike Sanso Kogyo Co Ltd | 排ガス処理装置 |
JP2005142200A (ja) * | 2003-11-04 | 2005-06-02 | Sharp Corp | 気相成長装置および気相成長方法 |
TWI387667B (zh) * | 2004-12-21 | 2013-03-01 | Applied Materials Inc | 用於自化學氣相蝕刻處理室移除副產物沉積的原位處理室清潔製程 |
DE102005042352A1 (de) * | 2005-09-07 | 2007-03-15 | Zf Friedrichshafen Ag | Vorrichtung und Verfahren zur Reduzierung einer Zugkraftunterbrechung bei Antriebssträngen mit automatisierten Schaltgetrieben |
DE102005056324A1 (de) | 2005-11-25 | 2007-06-06 | Aixtron Ag | CVD-Reaktor mit auswechselbarer Prozesskammerdecke |
JP2007258449A (ja) * | 2006-03-23 | 2007-10-04 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2007258585A (ja) | 2006-03-24 | 2007-10-04 | Tokyo Electron Ltd | 基板載置機構および基板処理装置 |
JP4977864B2 (ja) * | 2006-04-21 | 2012-07-18 | 株式会社アルバック | 同軸型真空アーク蒸着源及びこれを用いた蒸着装置 |
US20080017117A1 (en) | 2006-07-18 | 2008-01-24 | Jeffrey Campbell | Substrate support with adjustable lift and rotation mount |
JP5613159B2 (ja) | 2009-06-19 | 2014-10-22 | 大陽日酸株式会社 | 気相成長装置 |
TW201437421A (zh) * | 2013-02-20 | 2014-10-01 | Applied Materials Inc | 用於旋轉料架原子層沉積之裝置以及方法 |
WO2016011180A1 (en) * | 2014-07-17 | 2016-01-21 | Santhanam Kalathur S V | Electrochemical process for producing graphene, graphene oxide, metal composites and coated substrates |
US10186450B2 (en) | 2014-07-21 | 2019-01-22 | Asm Ip Holding B.V. | Apparatus and method for adjusting a pedestal assembly for a reactor |
US9765433B2 (en) | 2014-09-25 | 2017-09-19 | Yung-Chiu Huang | Structure of sextant rotary disk |
JP6330630B2 (ja) * | 2014-11-13 | 2018-05-30 | 東京エレクトロン株式会社 | 成膜装置 |
US10533251B2 (en) * | 2015-12-31 | 2020-01-14 | Lam Research Corporation | Actuator to dynamically adjust showerhead tilt in a semiconductor processing apparatus |
US10501844B2 (en) * | 2016-07-25 | 2019-12-10 | Applied Materials, Inc. | Fine leveling of large carousel based susceptor |
DE202018100363U1 (de) | 2018-01-23 | 2019-04-24 | Aixtron Se | Vorrichtung zum Verbinden eines Suszeptors mit einer Antriebswelle |
-
2018
- 2018-01-23 DE DE202018100363.1U patent/DE202018100363U1/de active Active
-
2019
- 2019-01-22 US US16/964,152 patent/US11959190B2/en active Active
- 2019-01-22 EP EP19702036.5A patent/EP3743546A1/de active Pending
- 2019-01-22 CN CN201980014128.4A patent/CN111788338B/zh active Active
- 2019-01-22 JP JP2020539820A patent/JP7266608B2/ja active Active
- 2019-01-22 WO PCT/EP2019/051433 patent/WO2019145271A1/de unknown
- 2019-01-22 KR KR1020207024005A patent/KR102671770B1/ko active IP Right Grant
- 2019-01-23 TW TW108102563A patent/TWI814772B/zh active
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US11959190B2 (en) | 2024-04-16 |
CN111788338A (zh) | 2020-10-16 |
TWI814772B (zh) | 2023-09-11 |
TW201936983A (zh) | 2019-09-16 |
JP2021511666A (ja) | 2021-05-06 |
KR102671770B1 (ko) | 2024-05-31 |
KR20200110781A (ko) | 2020-09-25 |
CN111788338B (zh) | 2023-08-08 |
US20210032771A1 (en) | 2021-02-04 |
JP7266608B2 (ja) | 2023-04-28 |
WO2019145271A1 (de) | 2019-08-01 |
DE202018100363U1 (de) | 2019-04-24 |
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