EP3373331A1 - Halbleitergehäuse mit versteifungsring - Google Patents

Halbleitergehäuse mit versteifungsring Download PDF

Info

Publication number
EP3373331A1
EP3373331A1 EP18154712.6A EP18154712A EP3373331A1 EP 3373331 A1 EP3373331 A1 EP 3373331A1 EP 18154712 A EP18154712 A EP 18154712A EP 3373331 A1 EP3373331 A1 EP 3373331A1
Authority
EP
European Patent Office
Prior art keywords
semiconductor die
semiconductor
interposer
top surface
stiffener ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP18154712.6A
Other languages
English (en)
French (fr)
Other versions
EP3373331B1 (de
Inventor
Tai-Yu Chen
Wen-Sung Hsu
Sheng-Liang Kuo
Chi-Wen Pan
Jen-Chuan Chen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MediaTek Inc
Original Assignee
MediaTek Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MediaTek Inc filed Critical MediaTek Inc
Publication of EP3373331A1 publication Critical patent/EP3373331A1/de
Application granted granted Critical
Publication of EP3373331B1 publication Critical patent/EP3373331B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/42Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
    • H01L23/433Auxiliary members in containers characterised by their shape, e.g. pistons
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • H01L23/3128Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/16Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/367Cooling facilitated by shape of device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/367Cooling facilitated by shape of device
    • H01L23/3675Cooling facilitated by shape of device characterised by the shape of the housing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/367Cooling facilitated by shape of device
    • H01L23/3677Wire-like or pin-like cooling fins or heat sinks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49822Multilayer substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5385Assembly of a plurality of insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/562Protection against mechanical damage
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0652Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0655Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16227Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16235Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a via metallisation of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06517Bump or bump-like direct electrical connections from device to substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06541Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3736Metallic materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49827Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5384Conductive vias through the substrate with or without pins, e.g. buried coaxial conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • H01L2924/143Digital devices
    • H01L2924/1433Application-specific integrated circuit [ASIC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • H01L2924/143Digital devices
    • H01L2924/1434Memory
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • H01L2924/143Digital devices
    • H01L2924/1434Memory
    • H01L2924/1435Random access memory [RAM]
    • H01L2924/1436Dynamic random-access memory [DRAM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15192Resurf arrangement of the internal vias
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/156Material
    • H01L2924/157Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Definitions

  • the present invention relates generally to semiconductor packaging and, more particularly, to improvements in dissipation of heat from semiconductor devices in such packages.
  • an IC chip During operation of an integrated circuit (IC), an IC chip generates heat, thus heating the entire electronics package that contains the chip. Because the performance of the IC chip degrades as its temperature increases, and because high thermal stresses degrade the structural integrity of the electronics package, this heat must be dissipated.
  • IC integrated circuit
  • electronic packages use a metal lid to dissipate heat.
  • the heat from the chip is transferred to the metal lid via a thermally conductive chip/lid interface.
  • the heat is then transferred from the lid to the ambient atmosphere via convection or to a heat sink mounted on the lid.
  • a semiconductor package is defined in claim 1 and includes a package substrate having a top surface and a bottom surface, an interposer mounted on the top surface of the package substrate, a first semiconductor die and a second semiconductor die mounted on the interposer in a side-by-side manner, and a stiffener ring secured to the top surface of the package substrate.
  • the stiffener ring encircles the first semiconductor die and the second semiconductor die.
  • the stiffener ring comprises a reinforcement rib striding across the interposer.
  • the heat sink is preferably directly bonded to the rear surface of the first semiconductor die and the rear surface of the second semiconductor die through a thermal interface material (TIM) layer.
  • the reinforcement rib is preferably integrally connected to the stiffener ring through a downset portion.
  • a semiconductor package is defined in claim 8 and includes a package substrate having a top surface and a bottom surface, an interposer mounted on the top surface of the package substrate, a first semiconductor die and a second semiconductor die mounted on the interposer in a side-by-side manner, a molding compound encapsulating the first semiconductor die and the second semiconductor die, and a stiffener ring secured to the top surface of the package substrate, wherein the stiffener ring comprises a reinforcement rib striding across the molding compound.
  • a heat sink is directly bonded to the rear surface of the first semiconductor die, the rear surface of the second semiconductor die, and a top surface of the reinforcement rib through a thermal interface material (TIM) layer.
  • TIM thermal interface material
  • a semiconductor package is defined in claim 15 and includes a package substrate having a top surface and a bottom surface, an interposer mounted on the top surface of the package substrate, a first semiconductor die mounted on the interposer, a stiffener ring secured to the top surface of the package substrate, wherein the stiffener ring encircles the first semiconductor die and a heat sink directly bonded to a rear surface of the first semiconductor die.
  • a stiffener ring is provided that is secured to the top surface of the package substrate together with at least two further features to achieve that the structural rigidity of the electronics package is improved when high thermal stresses occur.
  • these features are that the stiffener ring encircles the first semiconductor die and the second semiconductor die and comprises a reinforcement rib striding across the interposer
  • these features are that a molding compound encapsulating the first semiconductor die and the second semiconductor die is provided and the stiffener ring comprises a reinforcement rib striding across the molding compound
  • these features are that the stiffener ring encircles the first semiconductor die and a heat sink is directly bonded to a rear surface of the first semiconductor die.
  • a stiffener ring secured to the top surface of the package substrate is provided together with two further features that enhance the structural rigidity of the package.
  • a semiconductor package 1a is provided.
  • the semiconductor package 1a may be a 2.5D semiconductor package.
  • the semiconductor package 1a comprises a package substrate 10 having a top surface 10a and a bottom surface 10b.
  • An interposer 20 is mounted on the top surface 10a of the package substrate 10.
  • the interposer 20 may comprise a silicon interposer or an RDL (re-distribution layer) interposer, but is not limited thereto.
  • a plurality of connecting elements 102 may be provided on the bottom surface 10b.
  • the plurality of connecting elements 102 may be sober balls. Through the plurality of connecting elements 102, the semiconductor package 1a may be mounted to a printed circuit board or system board, but is not limited thereto.
  • a first semiconductor die 31 and a second semiconductor die 32 are mounted on a top surface 20a of the interposer 20 in a side-by-side manner.
  • the first semiconductor die 31 and the second semiconductor die 32 may be flip chips with their active surfaces 31a and 32a facing down to the interposer 20.
  • the first semiconductor die 31 and the second semiconductor die 32 may be connected to the interposer 20 through the bumps 310 and bumps 320 on their active surfaces 31a and 32a, respectively.
  • the interposer 20 provides electrical connections between the dies 31, 32 and the package substrate 10, and possibly between the dies 31, 32 themselves.
  • the number of the semiconductor dies in the figures are for illustration purposes only. The number of the semiconductor dies is not limited to two and may exceed two.
  • a plurality of connecting elements 202 are provided on the bottom surface 20b of the interposer 20, a plurality of connecting elements 202 are provided. Through the connecting elements 202, the interposer 20 is electrically connected to the package substrate 10. The first semiconductor die 31 and the second semiconductor die 32 are electrically connected to the package substrate 10 through the interposer 20. In some embodiments, the first semiconductor die 31 and the second semiconductor die 32 may be electrically connected to each other through the interposer 20. According to one embodiment, a stiffener ring 40 is secured to the top surface 10a of the package substrate 10. The stiffener ring 40 may be disposed along the perimeter of the package substrate 10 so as to form a rectangular shape, for example. The stiffener ring 40 encircles the first semiconductor die 31 and the second semiconductor die 32.
  • the stiffener ring 40 may be secured to the top surface 10a of the package substrate 10 by using an adhesive layer, but is not limited thereto.
  • the stiffener ring 40 may be composed of copper, but is not limited thereto.
  • the stiffener ring 40 comprises a reinforcement rib 401 striding across the interposer 20.
  • the reinforcement rib 401 is integrally connected to the stiffener ring 40 through a downset portion 401b.
  • the reinforcement rib 401 extends through a space between the first semiconductor die 31 and the second semiconductor die 32.
  • the reinforcement rib 401 is in direct contact with the top surface 20a of the interposer 20.
  • no molding compound is used to cover the interposer 20, the first semiconductor die 31, and the second semiconductor die 32.
  • the reinforcement rib 401 is interposed between the first semiconductor die 31 and the second semiconductor die 32 from the top view of this embodiment.
  • the reinforcement rib 401 is coplanar with the first semiconductor die 31 and the second semiconductor die 32
  • the semiconductor package 1a may further comprise a heat sink 50.
  • the heat sink 50 may be directly bonded to a rear surface 31b of the first semiconductor die 31, a rear surface 32b of the second semiconductor die 32, and/or a top surface 401a of the reinforcement rib 401 through a thermal interface material (TIM) layer 510.
  • TIM thermal interface material
  • the heat sink 50 is not shown in FIG. 1 .
  • FIG. 4 , FIG. 5, and FIG. 6 illustrate another embodiment of the invention, wherein like numeral numbers designate like regions, layers, or elements.
  • FIG. 4 is a schematic, top view of a semiconductor package according to another embodiment of the invention.
  • FIG. 5 is a schematic, cross-sectional diagram taken alone line I-I' in FIG. 4 .
  • FIG. 6 is a schematic, cross-sectional diagram taken alone line II-II' in FIG. 4 .
  • a semiconductor package 1b is provided.
  • the semiconductor package 1b may be a 2.5D semiconductor package.
  • the semiconductor package 1b comprises a package substrate 10 having a top surface 10a and a bottom surface 10b.
  • An interposer 20 is mounted on the top surface 10a of the package substrate 10.
  • the interposer 20 may comprise a silicon interposer or an RDL interposer.
  • a plurality of connecting elements 102 may be provided on the bottom surface 10b.
  • the plurality of connecting elements 102 may be sober balls.
  • the semiconductor package 1b may be mounted to a printed circuit board or system board.
  • a first semiconductor die 31 and a second semiconductor die 32 are mounted on a top surface 20a of the interposer 20 in a side-by-side manner.
  • the first semiconductor die 31 and the second semiconductor die 32 may be flip chips with their active surfaces 31a and 32a facing down to the interposer 20.
  • the first semiconductor die 31 and the second semiconductor die 32 may be connected to the interposer 20 through the bumps 310 and bumps 320 on their active surfaces 31a and 32a, respectively.
  • the first semiconductor die 31 may comprise an application-specific integrated chip (ASIC) or a microprocessor, but is not limited thereto.
  • the second semiconductor die 32 may comprise a high bandwidth memory (HBM) chip in which a plurality of memory chips having through silicon vias (TSVs) are stacked.
  • the first semiconductor die 31 is disposed in close proximity to the second semiconductor die 32. For example, typically, a gap between first semiconductor die 31 and the second semiconductor die 32 may be smaller than 100 micrometers.
  • a plurality of connecting elements 202 are provided on the bottom surface 20b of the interposer 20, a plurality of connecting elements 202 are provided. Through the connecting elements 202, the interposer 20 is electrically connected to the package substrate 10.
  • the first semiconductor die 31 and the second semiconductor die 32 are electrically connected to the package substrate 10 through the interposer 20.
  • the first semiconductor die 31 and the second semiconductor die 32 may be electrically connected to each other through the interposer 20.
  • a stiffener ring 40 is secured to the top surface 10a of the package substrate 10.
  • the stiffener ring 40 may be disposed along the perimeter of the package substrate 10 so as to form a rectangular shape, for example.
  • the stiffener ring 40 encircles the first semiconductor die 31 and the second semiconductor die 32.
  • the stiffener ring 40 may be secured to the top surface 10a of the package substrate 10 by using an adhesive layer, but is not limited thereto.
  • the stiffener ring 40 may be composed of copper, but is not limited thereto.
  • the stiffener ring 40 comprises two reinforcement ribs 401 striding across the interposer 20.
  • the two reinforcement ribs 401 circumvent the first semiconductor die 31 and the second semiconductor die 32.
  • the reinforcement ribs 401 are integrally connected to the stiffener ring 40 through downset portions 401b.
  • the reinforcement ribs 401 extend along the two opposite side edges of the interposer 20.
  • the reinforcement ribs 401 are in direct contact with the top surface 20a of the interposer 20.
  • no molding compound is used to cover the interposer 20, the first semiconductor die 31, and the second semiconductor die 32.
  • the semiconductor package 1b may further comprise a heat sink 50.
  • the heat sink 50 may be directly bonded to a rear surface 31b of the first semiconductor die 31, a rear surface 32b of the second semiconductor die 32 through a thermal interface material (TIM) layer 510.
  • TIM thermal interface material
  • the heat sink 50 is not shown in FIG. 4 .
  • the heat sink 50 may be also bonded to the reinforcement rib 401 between the first semiconductor die 31 and the second semiconductor die 32, which helps to dissipate heat.
  • the first semiconductor die 31 and/or the second semiconductor die 32 may be in thermal contact with the reinforcement rib 401.
  • the two reinforcement ribs 401 may extend along a direction that is different from the vertical direction as shown in FIG. 4 .
  • the two reinforcement ribs 401 may extend along a horizontal direction along two opposite sides of the each of the first semiconductor die 31 and the second semiconductor die 32.
  • FIG. 7 and FIG. 8 show another embodiment of the invention, wherein like numeral numbers designate like regions, layers, or elements.
  • FIG. 7 is a schematic, top view of a semiconductor package according to another embodiment of the invention.
  • FIG. 8 is a schematic, cross-sectional diagram taken alone line I-I' in FIG. 7 .
  • the semiconductor package 1c may be a 2.5D semiconductor package.
  • the semiconductor package 1c comprises a package substrate 10 having a top surface 10a and a bottom surface 10b.
  • An interposer 20 is mounted on the top surface 10a of the package substrate 10.
  • the interposer 20 may comprise a silicon interposer or an RDL interposer, but is not limited thereto.
  • the stiffener ring 40 comprises three reinforcement ribs 401 striding across the interposer 20.
  • the reinforcement ribs 401 are integrally connected to the stiffener ring 40 through downset portions 401b. Two of the three reinforcement ribs 401 extend along the two opposite side edges of the interposer 20. One of the three reinforcement ribs 401 extends through a space between the first semiconductor die 31 and the second semiconductor die 32. The reinforcement ribs 401 are in direct contact with the top surface 20a of the interposer 20.
  • no molding compound is used to cover the interposer 20, the first semiconductor die 31, and the second semiconductor die 32.
  • the semiconductor package 1c may further comprise a heat sink 50.
  • the heat sink 50 may be directly bonded to a rear surface 31b of the first semiconductor die 31, a rear surface 32b of the second semiconductor die 32 through a thermal interface material (TIM) layer 510.
  • TIM thermal interface material
  • the heat sink 50 is not shown in FIG. 7 .
  • FIG. 9 and FIG. 10 show another embodiment of the invention, wherein like numeral numbers designate like regions, layers, or elements.
  • FIG. 9 is a schematic, top view of a semiconductor package according to another embodiment of the invention.
  • FIG. 10 is a schematic, cross-sectional diagram taken alone line I-I' in FIG. 9 .
  • the stiffener ring 40 comprises multiple reinforcement ribs 401 striding across the interposer 20.
  • the multiple reinforcement ribs 401 may be shaped into frames that encircle the first semiconductor die 31 and the second semiconductor die 32.
  • the reinforcement ribs 401 are integrally connected to the stiffener ring 40 through downset portions 401b.
  • the reinforcement ribs 401 are in direct contact with the top surface 20a of the interposer 20.
  • no molding compound is used to cover the interposer 20, the first semiconductor die 31, and the second semiconductor die 32.
  • the semiconductor package 1d may further comprise a heat sink 50.
  • the heat sink 50 may be directly bonded to a rear surface 31b of the first semiconductor die 31, a rear surface 32b of the second semiconductor die 32 through a thermal interface material (TIM) layer 510.
  • TIM thermal interface material
  • the heat sink 50 is not shown in FIG. 9 .
  • FIG. 11, FIG. 12 , and FIG. 13 show another embodiment of the invention, wherein like numeral numbers designate like regions, layers, or elements.
  • FIG. 11 is a schematic, top view of a semiconductor package according to another embodiment of the invention.
  • FIG. 12 is a schematic, cross-sectional diagram taken alone line I-I' in FIG. 11 .
  • FIG. 13 is a schematic, cross-sectional diagram taken alone line II-II' in FIG. 11 .
  • the semiconductor package If may be a 2.5D semiconductor package.
  • the semiconductor package If comprises a package substrate 10 having a top surface 10a and a bottom surface 10b.
  • An interposer 20 is mounted on the top surface 10a of the package substrate 10.
  • the interposer 20 may comprise a silicon interposer or an RDL interposer, but is not limited thereto.
  • a plurality of connecting elements 102 may be provided on the bottom surface 10b.
  • the plurality of connecting elements 102 may be sober balls.
  • the semiconductor package If may be mounted to a printed circuit board or system board, but is not limited thereto.
  • a first semiconductor die 31 and a second semiconductor die 32 are mounted on a top surface 20a of the interposer 20 in a side-by-side manner.
  • the first semiconductor die 31 and the second semiconductor die 32 may be flip chips with their active surfaces 31a and 32a facing down to the interposer 20.
  • the first semiconductor die 31 and the second semiconductor die 32 may be connected to the interposer 20 through the bumps 310 and bumps 320 on their active surfaces 31a and 32a, respectively.
  • the first semiconductor die 31 may comprise an application-specific integrated chip (ASIC) or a microprocessor, but is not limited thereto.
  • the second semiconductor die 32 may comprise a high bandwidth memory (HBM) chip in which a plurality of memory chips having through silicon vias (TSVs) are stacked. It is understood that the first semiconductor die 31 and the second semiconductor die 32 may be both ASIC or both System-on-Chip (SoC) chip.
  • the first semiconductor die 31 and the second semiconductor die 32 may comprise a SoC and a DRAM die.
  • the first semiconductor die 31 and the second semiconductor die 32 may comprise an ASIC and an HBM chip.Although only two semiconductor dies are illustrated in the figures, it is understood that the semiconductor package may comprise more than two semiconductor dies in other embodiments.
  • a plurality of connecting elements 202 are provided on the bottom surface 20b of the interposer 20, a plurality of connecting elements 202 are provided. Through the connecting elements 202, the interposer 20 is electrically connected to the package substrate 10. The first semiconductor die 31 and the second semiconductor die 32 are electrically connected to the package substrate 10 through the interposer 20. In some embodiments, the first semiconductor die 31 and the second semiconductor die 32 may be electrically connected to each other through the interposer 20. According to one embodiment, a molding compound 60 is provided to encapsulate the first semiconductor die 31 and the second semiconductor die 32. The rear surface 31b of the first semiconductor die 31 and the rear surface 32b of the second semiconductor die 32 are not covered by the molding compound 60.
  • a stiffener ring 40 is secured to the top surface 10a of the package substrate 10.
  • the stiffener ring 40 may be disposed along the perimeter of the package substrate 10 so as to form a rectangular shape, for example.
  • the stiffener ring 40 encircles the first semiconductor die 31 and the second semiconductor die 32.
  • the stiffener ring 40 may be secured to the top surface 10a of the package substrate 10 by using an adhesive layer, but is not limited thereto.
  • the stiffener ring 40 may be composed of copper, but is not limited thereto.
  • the stiffener ring 40 comprises two reinforcement ribs 401 striding across the molding compound 60.
  • the reinforcement ribs 401 are integrally connected to the stiffener ring 40 through downset portions 401b.
  • the reinforcement ribs 401 extend along the two opposite side edges of the interposer 20.
  • the reinforcement ribs 401 are in direct contact with the top surface 20a of the molding compound 60.
  • the semiconductor package If may further comprise a heat sink 50.
  • the heat sink 50 may be directly bonded to a rear surface 31b of the first semiconductor die 31, a rear surface 32b of the second semiconductor die 32, and a top surface 401a of the reinforcement rib 401 through a thermal interface material (TIM) layer 510.
  • TIM thermal interface material
  • the reinforcement ribs 401 may partially overlap with the rear surface of the first semiconductor die 31 or the second semiconductor die 32.
  • the heat sink 50 is not shown in FIG. 11 .
  • the reinforcement ribs 401 may be in direct contact with the rear surface of the first semiconductor die 31 or the second semiconductor die 32.
  • the reinforcement ribs 401 may be a straight-line shaped rib across the molding compound 60 when viewed from the above. However, it is understood that the reinforcement ribs 401 may have other shapes. For example, in FIG. 19 , the reinforcement ribs 401 are bent so as to form an octagonal structure with the surrounding stiffener ring 40. Such octagonal structure may provide better structural rigidity for the semiconductor package.
  • FIG. 14 and FIG. 15 show another embodiment of the invention, wherein like numeral numbers designate like regions, layers, or elements.
  • FIG. 14 is a schematic, top view of a semiconductor package according to another embodiment of the invention.
  • FIG. 15 is a schematic, cross-sectional diagram taken alone line I-I' in FIG. 14 .
  • a semiconductor package 1g is provided.
  • the semiconductor package 1g may be a 2.5D semiconductor package.
  • the semiconductor package 1g comprises a package substrate 10 having a top surface 10a and a bottom surface 10b.
  • An interposer 20 is mounted on the top surface 10a of the package substrate 10.
  • the interposer 20 may comprise a silicon interposer or an RDL interposer, but is not limited thereto.
  • the molding compound 60 is provided to encapsulate the first semiconductor die 31 and the second semiconductor die 32.
  • the rear surface 31b of the first semiconductor die 31 and the rear surface 32b of the second semiconductor die 32 are not covered by the molding compound 60.
  • the stiffener ring 40 comprises two reinforcement ribs 401' and 401" striding across the molding compound 60.
  • the reinforcement ribs 401' and 401" are integrally connected to the stiffener ring 40 through downset portions 401b.
  • An asymmetric reinforcement rib configuration may be employed.
  • the three reinforcement rib 401' has a greater width (or surface area) than that of the reinforcement rib 401".
  • the reinforcement rib 401' may completely overlap with the rear surface 31b of the first semiconductor die 31.
  • the reinforcement rib 401" may extend along a side edge of the interposer 20 and may not overlap with the second semiconductor die 32 when viewed from the above.
  • FIG. 16 and FIG. 17 show another embodiment of the invention, wherein like numeral numbers designate like regions, layers, or elements.
  • FIG. 16 is a schematic, top view of a semiconductor package according to another embodiment of the invention.
  • FIG. 17 is a schematic, cross-sectional diagram taken alone line I-I' in FIG. 16 .
  • a semiconductor package 1h is provided.
  • the semiconductor package 1h may be a 2.5D semiconductor package.
  • the semiconductor package 1h comprises a package substrate 10 having a top surface 10a and a bottom surface 10b.
  • An interposer 20 is mounted on the top surface 10a of the package substrate 10.
  • the interposer 20 may comprise a silicon interposer or an RDL interposer, but is not limited thereto.
  • the molding compound 60 is provided to encapsulate the first semiconductor die 31 and the second semiconductor die 32.
  • the rear surface 31b of the first semiconductor die 31 and the rear surface 32b of the second semiconductor die 32 are not covered by the molding compound 60.
  • the stiffener ring 40 comprises two reinforcement ribs 401 striding across the interposer 20.
  • the reinforcement ribs 401 are integrally connected to the stiffener ring 40 through downset portions 401b.
  • the reinforcement ribs 401 are in direct contact with the top surface 20a of the interposer 20 and the peripheral sidewalls of the molding compound 60.
  • the reinforcement rib 401, the first semiconductor die 31 and the second semiconductor die 32 may be in thermal contact with the heat sink 50 through the thermal interface material (TIM) layer 510.
  • TIM thermal interface material
  • FIG. 21 and FIG. 22 show another embodiment of the invention, wherein like numeral numbers designate like regions, layers, or elements.
  • FIG. 21 is a schematic, top view of a semiconductor package according to yet another embodiment of the invention.
  • FIG. 22 is a schematic, cross-sectional diagram taken alone line I-I' in FIG. 21 .
  • a semiconductor package 1i is provided.
  • the semiconductor package 1i may comprise a 2. 5D fan-out semiconductor package 3.
  • the semiconductor package 1i comprises a package substrate 10 having a top surface 10a and a bottom surface 10b.
  • the 2.5D fan-out semiconductor package 3 is mounted on the top surface 10a.
  • the first semiconductor die 31 and the second semiconductor die 32 are interconnected through a re-distribution layer (RDL) structure 21.
  • the RDL structure 21 is formed on the molding compound 60 and the active surfaces 31a and 32a of the first semiconductor die 31 and the second semiconductor die 32 to directly connect to the bond pads of the first semiconductor die 31 and the second semiconductor die 32.
  • the first semiconductor die 31 may comprise an application-specific integrated chip (ASIC) or a microprocessor, but is not limited thereto.
  • the second semiconductor die 32 may comprise a high bandwidth memory (HBM) chip in which a plurality of memory chips having through silicon vias (TSVs) are stacked.
  • HBM high bandwidth memory
  • TSVs through silicon vias
  • a plurality of connecting elements 202 are provided on the bottom surface 20b of the RDL structure 21, a plurality of connecting elements 202 are provided. Through the connecting elements 202, the RDL structure 21 is electrically connected to the package substrate 10.
  • the molding compound 60 is provided to encapsulate the first semiconductor die 31 and the second semiconductor die 32.
  • the rear surface 31b of the first semiconductor die 31 and the rear surface 32b of the second semiconductor die 32 are not covered by the molding compound 60.
  • a stiffener ring 40 is secured to the top surface 10a of the package substrate 10.
  • the stiffener ring 40 may be disposed along the perimeter of the package substrate 10 so as to form a rectangular shape, for example.
  • the stiffener ring 40 encircles the first semiconductor die 31 and the second semiconductor die 32.
  • the stiffener ring 40 may be secured to the top surface 10a of the package substrate 10 by using an adhesive layer, but is not limited thereto.
  • the stiffener ring 40 may be composed of copper, but is not limited thereto.
  • the stiffener ring 40 may comprise two reinforcement ribs 401 striding across the molding compound 60. As can be seen in FIG. 21 , the reinforcement ribs 401 are integrally connected to the stiffener ring 40 through downset portions 401b. The reinforcement ribs 401 extend along the two opposite side edges of the 2.5D fan-out semiconductor package 3. The reinforcement ribs 401 are in direct contact with the top surface 20a of the molding compound 60.
  • the heat sink 50 may be directly bonded to a rear surface 31b of the first semiconductor die 31, a rear surface 32b of the second semiconductor die 32, and a top surface 401a of the reinforcement rib 401 through the thermal interface material layer 510.
  • the reinforcement ribs 401 may partially overlap with the rear surface of the first semiconductor die 31 or the second semiconductor die 32.
  • the heat sink 50 is not shown in FIG. 21 .
  • the reinforcement ribs 401 may be in direct contact with the rear surface of the first semiconductor die 31 or the second semiconductor die 32.
  • the reinforcement ribs 401 may be a straight-line shaped rib across the molding compound 60 when viewed from the above. However, it is understood that the reinforcement ribs 401 may have other shapes.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
EP18154712.6A 2017-03-08 2018-02-01 Halbleitergehäuse mit versteifungsring Active EP3373331B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762468431P 2017-03-08 2017-03-08
US15/863,984 US10573579B2 (en) 2017-03-08 2018-01-08 Semiconductor package with improved heat dissipation

Publications (2)

Publication Number Publication Date
EP3373331A1 true EP3373331A1 (de) 2018-09-12
EP3373331B1 EP3373331B1 (de) 2020-11-04

Family

ID=61132315

Family Applications (1)

Application Number Title Priority Date Filing Date
EP18154712.6A Active EP3373331B1 (de) 2017-03-08 2018-02-01 Halbleitergehäuse mit versteifungsring

Country Status (4)

Country Link
US (1) US10573579B2 (de)
EP (1) EP3373331B1 (de)
CN (1) CN108573936B (de)
TW (1) TWI685082B (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3693991A1 (de) * 2019-02-08 2020-08-12 Marvell Asia Pte, Ltd. Kühlkörperdesign für flip-chip-kugelgitteranordnung
WO2021001757A1 (en) * 2019-07-03 2021-01-07 Landa Labs (2012) Ltd. Method and apparatus for mounting and cooling a circuit component
TWI722687B (zh) * 2019-05-24 2021-03-21 美商谷歌有限責任公司 具環形熱點區及多向冷卻之積體電路
US11640934B2 (en) * 2018-03-30 2023-05-02 Intel Corporation Lithographically defined vertical interconnect access (VIA) in dielectric pockets in a package substrate
US11929298B2 (en) 2020-11-13 2024-03-12 Infineon Technologies Ag Molded semiconductor package with dual integrated heat spreaders

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11302592B2 (en) 2017-03-08 2022-04-12 Mediatek Inc. Semiconductor package having a stiffener ring
US10403599B2 (en) * 2017-04-27 2019-09-03 Invensas Corporation Embedded organic interposers for high bandwidth
US11322456B2 (en) * 2017-06-30 2022-05-03 Intel Corporation Die back side structures for warpage control
KR102404058B1 (ko) * 2017-12-28 2022-05-31 삼성전자주식회사 반도체 패키지
US10971425B2 (en) * 2018-09-27 2021-04-06 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device
US10629547B1 (en) * 2018-10-30 2020-04-21 Micron Technology, Inc. Redistribution-layer fanout package stiffener
US10720377B2 (en) * 2018-11-09 2020-07-21 Xilinx, Inc. Electronic device apparatus with multiple thermally conductive paths for heat dissipation
CN111211059B (zh) * 2018-11-22 2023-07-04 矽品精密工业股份有限公司 电子封装件及其制法与散热件
CN109887900B (zh) * 2019-03-08 2020-09-15 中国科学院微电子研究所 带有软硬结合板的大尺寸芯片系统封装结构及其制作方法
US11508707B2 (en) 2019-05-15 2022-11-22 Mediatek Inc. Semiconductor package with dummy MIM capacitor die
US11728282B2 (en) * 2019-10-17 2023-08-15 Advanced Semiconductor Engineering, Inc. Package structure, assembly structure and method for manufacturing the same
CN114787990A (zh) * 2019-12-16 2022-07-22 华为技术有限公司 芯片封装及其制作方法
US11282765B2 (en) * 2020-03-11 2022-03-22 Mellanox Technologies, Ltd. Stiffener ring
US11239217B2 (en) * 2020-03-30 2022-02-01 Nanya Technology Corporation Semiconductor package including a first sub-package stacked atop a second sub-package
EP3923318A1 (de) 2020-05-29 2021-12-15 Google LLC Verfahren und wärmeverteilungsvorrichtungen zur thermischen verwaltung von chipanordnungen
US11569145B2 (en) 2020-06-03 2023-01-31 Samsung Electronics Co., Ltd. Semiconductor package with thermal interface material for improving package reliability
KR20220022288A (ko) * 2020-08-18 2022-02-25 삼성전자주식회사 스티프너를 구비하는 반도체 패키지
US20220156879A1 (en) * 2020-11-18 2022-05-19 Intel Corporation Multi-tile graphics processing unit
TWI736488B (zh) * 2020-12-11 2021-08-11 欣興電子股份有限公司 晶片封裝結構及其製造方法
CN116868331A (zh) * 2021-02-24 2023-10-10 华为技术有限公司 芯片封装结构及其制作方法、电子设备
TWI746391B (zh) * 2021-03-15 2021-11-11 群豐科技股份有限公司 積體電路封裝系統
US11721644B2 (en) * 2021-05-03 2023-08-08 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor package with riveting structure between two rings and method for forming the same
US11694941B2 (en) * 2021-05-12 2023-07-04 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die package with multi-lid structures and method for forming the same
KR20220164946A (ko) * 2021-06-07 2022-12-14 삼성전자주식회사 반도체 패키지
KR20220166644A (ko) 2021-06-10 2022-12-19 삼성전자주식회사 보강 구조물을 가지는 반도체 패키지
TWI791342B (zh) * 2021-11-30 2023-02-01 財團法人工業技術研究院 異質整合半導體封裝結構

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004207415A (ja) * 2002-12-25 2004-07-22 Seiko Epson Corp 半導体モジュール、電子機器および半導体モジュールの製造方法
US20140048951A1 (en) * 2012-08-14 2014-02-20 Bridge Semiconductor Corporation Semiconductor assembly with dual connecting channels between interposer and coreless substrate
US20140134804A1 (en) * 2012-11-15 2014-05-15 Michael G. Kelly Method And System For A Semiconductor For Device Package With A Die-To-Packaging Substrate First Bond
US20160260680A1 (en) * 2015-03-05 2016-09-08 Renesas Electronics Corporation Method for manufacturing semiconductor device

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3616742B2 (ja) * 1996-07-31 2005-02-02 シャープ株式会社 半導体パッケージ用チップ支持基板
US6111313A (en) 1998-01-12 2000-08-29 Lsi Logic Corporation Integrated circuit package having a stiffener dimensioned to receive heat transferred laterally from the integrated circuit
JP4863032B2 (ja) * 2000-11-02 2012-01-25 日立化成工業株式会社 薄板状物品の加工方法とその加工方法を用いた接続基板の製造方法と接続基板と多層配線板の製造方法と多層配線板と半導体パッケージ用基板の製造方法と半導体パッケージ用基板と半導体パッケージの製造方法と半導体パッケージ
TWI301660B (en) * 2004-11-26 2008-10-01 Phoenix Prec Technology Corp Structure of embedding chip in substrate and method for fabricating the same
TWI340446B (en) * 2005-12-30 2011-04-11 Advanced Semiconductor Eng Method and device for preventing warpage of a substrate strip during semiconductor packaging and the substrate strip
TWI311366B (en) * 2006-06-30 2009-06-21 Advanced Semiconductor Eng A flip-chip package structure with stiffener
US7985621B2 (en) * 2006-08-31 2011-07-26 Ati Technologies Ulc Method and apparatus for making semiconductor packages
US8115303B2 (en) * 2008-05-13 2012-02-14 International Business Machines Corporation Semiconductor package structures having liquid coolers integrated with first level chip package modules
JP5120342B2 (ja) * 2009-06-18 2013-01-16 ソニー株式会社 半導体パッケージの製造方法
JP5152601B2 (ja) * 2010-06-01 2013-02-27 日立化成工業株式会社 薄板状物品を用いた接続基板の製造方法と多層配線板の製造方法
US9257364B2 (en) 2012-06-27 2016-02-09 Intel Corporation Integrated heat spreader that maximizes heat transfer from a multi-chip package
US20140048326A1 (en) 2012-08-14 2014-02-20 Bridge Semiconductor Corporation Multi-cavity wiring board for semiconductor assembly with internal electromagnetic shielding
US8921994B2 (en) 2012-09-14 2014-12-30 Freescale Semiconductor, Inc. Thermally enhanced package with lid heat spreader
KR101440339B1 (ko) * 2012-11-27 2014-09-15 앰코 테크놀로지 코리아 주식회사 원레이어 리드프레임 기판을 이용한 반도체 패키지 및 이의 제조 방법
US9496199B2 (en) * 2012-12-04 2016-11-15 General Electric Company Heat spreader with flexible tolerance mechanism
WO2014129976A1 (en) * 2013-02-21 2014-08-28 Advanpack Solutions Pte Ltd Semiconductor structure and method of fabricating the same
US9111912B2 (en) * 2013-05-30 2015-08-18 Taiwan Semiconductor Manufacturing Company, Ltd. 3D packages and methods for forming the same
WO2015030060A1 (ja) * 2013-08-28 2015-03-05 日産化学工業株式会社 レジスト下層膜を適用したパターン形成方法
US9627288B2 (en) 2015-05-29 2017-04-18 Taiwan Semiconductor Manufacturing Co., Ltd. Package structures and methods of forming the same
US9875988B2 (en) 2015-10-29 2018-01-23 Semtech Corporation Semiconductor device and method of forming DCALGA package using semiconductor die with micro pillars
TWI567882B (zh) 2015-12-15 2017-01-21 財團法人工業技術研究院 半導體元件及其製造方法
US9859262B1 (en) * 2016-07-08 2018-01-02 Globalfoundries Inc. Thermally enhanced package to reduce thermal interaction between dies

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004207415A (ja) * 2002-12-25 2004-07-22 Seiko Epson Corp 半導体モジュール、電子機器および半導体モジュールの製造方法
US20140048951A1 (en) * 2012-08-14 2014-02-20 Bridge Semiconductor Corporation Semiconductor assembly with dual connecting channels between interposer and coreless substrate
US20140134804A1 (en) * 2012-11-15 2014-05-15 Michael G. Kelly Method And System For A Semiconductor For Device Package With A Die-To-Packaging Substrate First Bond
US20160260680A1 (en) * 2015-03-05 2016-09-08 Renesas Electronics Corporation Method for manufacturing semiconductor device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11640934B2 (en) * 2018-03-30 2023-05-02 Intel Corporation Lithographically defined vertical interconnect access (VIA) in dielectric pockets in a package substrate
EP3693991A1 (de) * 2019-02-08 2020-08-12 Marvell Asia Pte, Ltd. Kühlkörperdesign für flip-chip-kugelgitteranordnung
US11282762B2 (en) 2019-02-08 2022-03-22 Marvell Asia Pte, Ltd. Heat sink design for flip chip ball grid array
TWI722687B (zh) * 2019-05-24 2021-03-21 美商谷歌有限責任公司 具環形熱點區及多向冷卻之積體電路
TWI741947B (zh) * 2019-05-24 2021-10-01 美商谷歌有限責任公司 具環形熱點區及多向冷卻之積體電路
US11158566B2 (en) 2019-05-24 2021-10-26 Google Llc Integrated circuit with a ring-shaped hot spot area and multidirectional cooling
WO2021001757A1 (en) * 2019-07-03 2021-01-07 Landa Labs (2012) Ltd. Method and apparatus for mounting and cooling a circuit component
US11764540B2 (en) 2019-07-03 2023-09-19 Landa Labs (2012) Ltd. Method and apparatus for mounting and cooling a circuit component
US11929298B2 (en) 2020-11-13 2024-03-12 Infineon Technologies Ag Molded semiconductor package with dual integrated heat spreaders

Also Published As

Publication number Publication date
CN108573936B (zh) 2020-08-21
CN108573936A (zh) 2018-09-25
US20180261528A1 (en) 2018-09-13
TWI685082B (zh) 2020-02-11
EP3373331B1 (de) 2020-11-04
US10573579B2 (en) 2020-02-25
TW201843806A (zh) 2018-12-16

Similar Documents

Publication Publication Date Title
EP3373331B1 (de) Halbleitergehäuse mit versteifungsring
US11728232B2 (en) Semiconductor package having a stiffener ring
US11239095B2 (en) Stacked semiconductor die assemblies with high efficiency thermal paths and molded underfill
EP3509097A1 (de) Halbleitergehäuse mit einem versteifungsring
US7061079B2 (en) Chip package structure and manufacturing method thereof
US9818625B2 (en) Stacked semiconductor die assemblies with thermal spacers and associated systems and methods
US7875971B2 (en) Semiconductor device having improved heat sink
US9966362B1 (en) Integrated circuit package with inter-die thermal spreader layers
US11862578B2 (en) Semiconductor package structure
KR102342690B1 (ko) 밑에 놓인 인터포저를 통해 확장되는 히트 스프레더를 갖는 반도체 다이 조립체 및 관련 기술
EP3671831B1 (de) Halbleiterpaketstruktur
US10622314B2 (en) Chip package structure
CN107123633B (zh) 封装结构
KR101234164B1 (ko) 방열성을 향상시킨 반도체 패키지

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20190311

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIC1 Information provided on ipc code assigned before grant

Ipc: H01L 23/367 20060101ALI20200414BHEP

Ipc: H01L 23/498 20060101ALN20200414BHEP

Ipc: H01L 23/16 20060101AFI20200414BHEP

Ipc: H01L 25/065 20060101ALI20200414BHEP

Ipc: H01L 25/18 20060101ALI20200414BHEP

Ipc: H01L 23/538 20060101ALN20200414BHEP

Ipc: H01L 23/36 20060101ALI20200414BHEP

RIC1 Information provided on ipc code assigned before grant

Ipc: H01L 23/16 20060101AFI20200427BHEP

Ipc: H01L 23/498 20060101ALN20200427BHEP

Ipc: H01L 23/36 20060101ALI20200427BHEP

Ipc: H01L 25/065 20060101ALI20200427BHEP

Ipc: H01L 23/367 20060101ALI20200427BHEP

Ipc: H01L 25/18 20060101ALI20200427BHEP

Ipc: H01L 23/538 20060101ALN20200427BHEP

INTG Intention to grant announced

Effective date: 20200518

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: MEDIATEK INC.

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1331916

Country of ref document: AT

Kind code of ref document: T

Effective date: 20201115

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602018009240

Country of ref document: DE

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20201104

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1331916

Country of ref document: AT

Kind code of ref document: T

Effective date: 20201104

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210205

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210204

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210304

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210204

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210304

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG9D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602018009240

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

26N No opposition filed

Effective date: 20210805

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20210228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210201

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210228

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20210304

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210228

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230607

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20180201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20240228

Year of fee payment: 7

Ref country code: GB

Payment date: 20240227

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20240226

Year of fee payment: 7

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20201104