EP3295139A1 - Jauge de contrainte à facteur de jauge élevé - Google Patents

Jauge de contrainte à facteur de jauge élevé

Info

Publication number
EP3295139A1
EP3295139A1 EP16736283.9A EP16736283A EP3295139A1 EP 3295139 A1 EP3295139 A1 EP 3295139A1 EP 16736283 A EP16736283 A EP 16736283A EP 3295139 A1 EP3295139 A1 EP 3295139A1
Authority
EP
European Patent Office
Prior art keywords
strain
gage
strain gage
metallic element
weight basis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP16736283.9A
Other languages
German (de)
English (en)
Other versions
EP3295139B1 (fr
Inventor
Thomas P. Kieffer
Robert B. Watson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vishay Measurements Group Inc
Original Assignee
Vishay Measurements Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vishay Measurements Group Inc filed Critical Vishay Measurements Group Inc
Publication of EP3295139A1 publication Critical patent/EP3295139A1/fr
Application granted granted Critical
Publication of EP3295139B1 publication Critical patent/EP3295139B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/16—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge
    • G01B7/18—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge using change in resistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/18—Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C1/00—Details
    • H01C1/16—Resistor networks not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C13/00—Resistors not provided for elsewhere

Definitions

  • the present invention relates generally to strain gages, and, more particularly to metal resistance strain gages having a high gage factor, which sometimes is referred to resistance-strain sensitivity.
  • Metal strain gages are used for sensing strain at a surface to which the strain gage is mounted. The amount of strain is determined on basis of the change in the electrical resistance of an electrical circuit in the strain gage. Typically, the circuit is formed by a thin metal foil or a thin metal conductor arranged in a serpentine pattern. As the surface under investigation is strained, deformation in the strain gage causes a change in the electrical resistance of the circuit. Strain gages are said to have a strain factor, resistance-strain sensitivity or a gage factor (GF).
  • GF gage factor
  • the GF is the ratio of fractional change in electrical resistance to the mechanical strain.
  • the GF can be represented by:
  • AR is the change in resistance caused by the strain sensed by the strain gage
  • R is the resistance of the unstrained strain gage
  • 8 is the strain.
  • the GF is no more than
  • a metal resistance strain gage with a GF greater than 5.
  • gages made from copper, nickel and manganese have a GF of approximately 2; gages made from iron, nickel, and chromium (Fe-36Ni-7Cr) have a GF of approximately 3; and, gages made from platinum and tungsten (Pt-8W) have a GF of approximately 4.
  • Metal resistance strain gages with a GF greater than about 4 have not been available; however, there are non- metal resistance strain gages available with a GF greater than 4, but they have disadvantages such as high resistance-temperature sensitivity (thermal output) and non-uniform properties from gage-to-gage. Furthermore these non-metal resistance strain gages are brittle and must be handled carefully to avoid breakage.
  • the present invention provides a high gage factor strain gage with a GF of at least 5.
  • the strain sensitive metallic element of the gage has a composition, on a weight basis, in the range of approximately 63% to 84% Ni and approximately 16% to 37% Fe.
  • a preferred composition is 75% Ni and 25% Fe (a stoichiometric composition); and a more preferred composition of the Ni-Fe alloy corresponds with the binary NieFe composition found in the LI2 region of the NiFe phase diagram illustrated in Figure 2.
  • an alloying component is present in an amount that is less than about 10% of the chemical composition of the strain sensitive metallic element on a weight basis.
  • the alloying component is preferably selected from among the group consisting of manganese, tungsten, molybdenum, chromium, and combinations thereof.
  • Figure 1 illustrated a metal resistance strain gage in a configuration compatible with the present invention
  • Figure 2 is a phase diagram for a nickel iron alloy suitable for use with the present invention.
  • Figure 3 illustrated a face-centered-cubic lattice structure suitable for use with the present invention.
  • Figure 1 illustrates a strain gage 100 in a configuration suitable for use with the present inventions.
  • the strain gage 100 includes a serpentine strain sensitive metallic element 102 on an optional backing 104.
  • the strain gage 100 includes connecting pads 106a, 106b for electrically the strain gage 100 to first ends of electrical leads 108a, 108b. Second ends of the electrical leads 110a, 110b are connected to known measurement instrumentation which applies an input signal to the strain gage and receives an output signal from the strain gage that corresponds with the strain induced in the strain gage 100.
  • the metallic element 102 of gage 100 may be formed as a wire, a foil and etched or cut into the desired shape, or a metal applied to a backing as a thin film, for example by thin film deposition.
  • the metallic element 102 is a metal with a chemical composition on a weight basis of approximately 63% to 84% Ni and approximately 16% to 37% Fe.
  • the nominal chemical composition is 75% Ni and 25% Fe on a weight basis (a stoichiometric composition).
  • the Ni-Fe alloy corresponds with the binary NieFe composition found in the LI2 region of the NiFe phase diagram 200 illustrated in Figure 2.
  • the LI2 region 204 in Figure 2 is a Ni-Fe alloy that forms a face-centered-cubic crystal lattice 300 with nickel atoms 302 occupying face positions and iron atoms 304 occupying the corner positions as illustrated in Fig. 3.
  • Some characteristics of this alloy such as, strength, magnetism, corrosion resistance, and electrical resistance are well known.
  • a commercially available alloy comprising approximately 70% Ni and 30% Fe is used for resistance temperature detectors (RTDs) because of its predictable change in electrical resistance as a function of temperature.
  • RTDs resistance temperature detectors
  • Ni-Fe alloys were found to have characteristics, for example resistance-strain sensitivity (i.e., GF), that made them desirable for use in a strain gage and were unknown prior to the inventors' work.
  • GF resistance-strain sensitivity
  • the inventors found that alloys with a nominal composition by weight of 75% Ni and 25% Fe could provide strain gages with a GF higher than that of known metal resistance strain gages.
  • the inventors also established that binary Ni-Fe alloys within the LI2 region 204 in figure 2 provided resistance strain gages with higher gage factors (i.e., a GF greater than 5).
  • the strain gage may be formed by drawing the alloy into a wire or metal film vapor deposition of the alloy in accordance with known techniques for forming strain gages.
  • these strain gages have an enhanced signal to noise ratio, which may advantageously enhance the ability to measure low levels of strain previously difficult to measure with an electrical resistance strain gage.
  • the high gage factor (GF) makes it possible to achieve the same level of fractional resistance change (AR/R) as a conventional prior art strain gage such as Cu-44Ni-2Mn but at substantially lower applied strain level ( ⁇ ). This can provide several advantages including robustness and stability of the measurement system further comprised of the transducer spring element to which the high gage factor strain gage is attached.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Measurement Of Force In General (AREA)

Abstract

L'invention concerne une jauge de contrainte à résistance métallique ayant un facteur de jauge élevé. La jauge de contrainte à résistance électrique comprend un élément métallique sensible à la contrainte et présente une composition chimique, sur une base pondérale, d'environ 63 % à 84 % de Ni et d'environ 16 % à 37 % de Fe et un facteur de jauge supérieur à 5.
EP16736283.9A 2015-05-14 2016-05-16 Jauge de contrainte à facteur de jauge élevé Active EP3295139B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/712,602 US9933321B2 (en) 2015-05-14 2015-05-14 High gage factor strain gage
PCT/US2016/032666 WO2016183569A1 (fr) 2015-05-14 2016-05-16 Jauge de contrainte à facteur de jauge élevé

Publications (2)

Publication Number Publication Date
EP3295139A1 true EP3295139A1 (fr) 2018-03-21
EP3295139B1 EP3295139B1 (fr) 2019-10-16

Family

ID=56369169

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16736283.9A Active EP3295139B1 (fr) 2015-05-14 2016-05-16 Jauge de contrainte à facteur de jauge élevé

Country Status (7)

Country Link
US (1) US9933321B2 (fr)
EP (1) EP3295139B1 (fr)
JP (1) JP6799008B2 (fr)
CN (1) CN107810383B (fr)
HK (1) HK1245878A1 (fr)
IL (1) IL255548B (fr)
WO (1) WO2016183569A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019066454A (ja) 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ、センサモジュール
JP2019066313A (ja) * 2017-09-29 2019-04-25 ミネベアミツミ株式会社 ひずみゲージ
JP6793103B2 (ja) * 2017-09-29 2020-12-02 ミネベアミツミ株式会社 ひずみゲージ
JP2019184344A (ja) 2018-04-05 2019-10-24 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
WO2020085247A1 (fr) 2018-10-23 2020-04-30 ミネベアミツミ株式会社 Pédale d'accélérateur, appareil de direction, capteur à 6 axes, moteur, pare-chocs et similaires
CN109883316B (zh) * 2019-03-22 2021-01-29 中国科学院力学研究所 一种电阻式应变传感器及应变测量方法
CN110095054B (zh) * 2019-04-03 2020-06-30 中国科学院力学研究所 一种电阻式应变片
JP1669298S (fr) * 2019-07-17 2020-10-05
JP1661600S (ja) * 2019-07-17 2020-06-15 ひずみゲージ
LU102298B1 (en) * 2020-12-16 2022-06-20 Univ Luxembourg Abrasive waterjet cutting nozzle with a resistive strain gauge sensor

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
US2899658A (en) * 1959-08-11 Leaf-type electrical resistance strain gage
US3134953A (en) * 1952-08-28 1964-05-26 Technograph Printed Circuits L Electric resistance devices
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US3922628A (en) * 1970-08-03 1975-11-25 Gen Electric Strain gage
US4325048A (en) * 1980-02-29 1982-04-13 Gould Inc. Deformable flexure element for strain gage transducer and method of manufacture
US4696188A (en) * 1981-10-09 1987-09-29 Honeywell Inc. Semiconductor device microstructure
JPS6017058A (ja) * 1983-07-06 1985-01-28 Toshiba Corp 高照射領域内機器用合金
JPH066774B2 (ja) 1989-07-24 1994-01-26 財団法人電気磁気材料研究所 ストレインゲージ用合金およびその製造方法
US5184516A (en) * 1991-07-31 1993-02-09 Hughes Aircraft Company Conformal circuit for structural health monitoring and assessment
FR2693795B1 (fr) * 1992-07-15 1994-08-19 Commissariat Energie Atomique Jauge de contrainte sur support souple et capteur muni de ladite jauge.
US5915285A (en) * 1993-01-21 1999-06-22 Optical Coating Laboratory, Inc. Transparent strain sensitive devices and method
JP2000235911A (ja) * 1998-12-14 2000-08-29 Fujitsu Ltd 磁性材料およびそれを用いた磁気ヘッド並びに磁気記録装置
CN100477025C (zh) * 2004-05-28 2009-04-08 金重勋 三元及多元铁基块状非晶合金及纳米晶合金
JP2007271285A (ja) * 2006-03-30 2007-10-18 Millenium Gate Technology Co Ltd ひずみゲージの製造方法
CN102243058B (zh) * 2011-04-15 2013-03-27 中国船舶重工集团公司第七○二研究所 应变传感器灵敏度系数的标定装置和方法
GB2491806B (en) * 2011-05-25 2013-07-10 Microvisk Ltd Apparatus and method for measuring properties of a fluid
US9771642B2 (en) * 2012-07-04 2017-09-26 Apple Inc. BMG parts having greater than critical casting thickness and method for making the same

Also Published As

Publication number Publication date
US20160334289A1 (en) 2016-11-17
IL255548B (en) 2021-07-29
CN107810383A (zh) 2018-03-16
IL255548A (en) 2018-01-31
JP2018518665A (ja) 2018-07-12
JP6799008B2 (ja) 2020-12-09
HK1245878A1 (zh) 2018-08-31
WO2016183569A1 (fr) 2016-11-17
EP3295139B1 (fr) 2019-10-16
CN107810383B (zh) 2020-08-11
US9933321B2 (en) 2018-04-03

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