EP3196330A4 - Film de revêtement, son procédé de fabrication, et dispositif de dépôt physique en phase vapeur - Google Patents

Film de revêtement, son procédé de fabrication, et dispositif de dépôt physique en phase vapeur Download PDF

Info

Publication number
EP3196330A4
EP3196330A4 EP14902022.4A EP14902022A EP3196330A4 EP 3196330 A4 EP3196330 A4 EP 3196330A4 EP 14902022 A EP14902022 A EP 14902022A EP 3196330 A4 EP3196330 A4 EP 3196330A4
Authority
EP
European Patent Office
Prior art keywords
manufacturing
same
coating film
pvd device
pvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP14902022.4A
Other languages
German (de)
English (en)
Other versions
EP3196330A1 (fr
EP3196330B1 (fr
Inventor
Hideki Moriguchi
Tadashi Saito
Yoshikazu Tanaka
Tetsumi ARAHI
Katsuaki Ogawa
Takahiro Okazaki
Hiroyuki Sugiura
Yoshihiro Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Piston Ring Co Ltd
Original Assignee
Nippon Piston Ring Co Ltd
Nippon ITF Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Piston Ring Co Ltd, Nippon ITF Inc filed Critical Nippon Piston Ring Co Ltd
Publication of EP3196330A1 publication Critical patent/EP3196330A1/fr
Publication of EP3196330A4 publication Critical patent/EP3196330A4/fr
Application granted granted Critical
Publication of EP3196330B1 publication Critical patent/EP3196330B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
EP14902022.4A 2014-09-17 2014-09-17 Film de revêtement et son procédé de fabrication Active EP3196330B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2014/074599 WO2016042630A1 (fr) 2014-09-17 2014-09-17 Film de revêtement, son procédé de fabrication, et dispositif de dépôt physique en phase vapeur

Publications (3)

Publication Number Publication Date
EP3196330A1 EP3196330A1 (fr) 2017-07-26
EP3196330A4 true EP3196330A4 (fr) 2018-03-28
EP3196330B1 EP3196330B1 (fr) 2023-07-05

Family

ID=55532696

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14902022.4A Active EP3196330B1 (fr) 2014-09-17 2014-09-17 Film de revêtement et son procédé de fabrication

Country Status (5)

Country Link
US (1) US10428416B2 (fr)
EP (1) EP3196330B1 (fr)
JP (1) JP6311175B2 (fr)
CN (1) CN106795619B (fr)
WO (1) WO2016042630A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6534123B2 (ja) * 2016-03-23 2019-06-26 日本アイ・ティ・エフ株式会社 被覆膜とその製造方法およびｐｖｄ装置
JP6653851B2 (ja) * 2016-03-23 2020-02-26 日本アイ・ティ・エフ株式会社 被覆膜とその製造方法およびｐｖｄ装置
US10697552B2 (en) * 2017-01-26 2020-06-30 Toto Ltd. Faucet valve
JP6855863B2 (ja) * 2017-03-22 2021-04-07 日本製鉄株式会社 チタン板のプレス用金型及びチタン板のプレス成形方法
JP2018158356A (ja) * 2017-03-22 2018-10-11 新日鐵住金株式会社 金属管成形ロール、金属管成形装置、金属管成形方法
JP6357607B1 (ja) * 2017-03-31 2018-07-11 株式会社リケン 摺動部材及びピストンリング
EP3604782A4 (fr) * 2017-03-31 2020-12-23 Kabushiki Kaisha Riken Élément coulissant et segment de piston
JP6357606B1 (ja) * 2017-03-31 2018-07-11 株式会社リケン 摺動部材及びピストンリング
US10883601B2 (en) 2017-03-31 2021-01-05 Kabushiki Kaisha Riken Sliding member and piston ring
WO2018235750A1 (fr) * 2017-06-20 2018-12-27 日本ピストンリング株式会社 Élément coulissant et film de revêtement
JP7115849B2 (ja) * 2017-12-27 2022-08-09 株式会社リケン 摺動部材
CN110923631B (zh) * 2019-10-31 2021-12-28 维达力实业（赤壁）有限公司 镀膜治具、渐变色镀膜方法、装饰盖板及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
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US20020114756A1 (en) * 1991-11-25 2002-08-22 Dieter M. Gruen Tailoring nanocrystalline diamond film properties
US20070074664A1 (en) * 2005-09-30 2007-04-05 Kochi Industrial Promotion Center Plasma CVD apparatus and plasma surface treatment method
US20070251815A1 (en) * 2006-04-28 2007-11-01 Tatung Company Method for manufacturing diamond-like carbon film
JP2011001598A (ja) * 2009-06-18 2011-01-06 Jtekt Corp 摺動部材

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JPH06195691A (ja) * 1992-10-28 1994-07-15 Fuji Electric Co Ltd 磁気記録媒体およびその製造方法
JPH08124149A (ja) * 1994-10-25 1996-05-17 Matsushita Electric Ind Co Ltd 磁気記録媒体
JP3826453B2 (ja) 1996-09-10 2006-09-27 住友電気工業株式会社 硬質炭素膜
JPH1149506A (ja) * 1997-07-31 1999-02-23 Kyocera Corp 装飾部材
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020114756A1 (en) * 1991-11-25 2002-08-22 Dieter M. Gruen Tailoring nanocrystalline diamond film properties
US20070074664A1 (en) * 2005-09-30 2007-04-05 Kochi Industrial Promotion Center Plasma CVD apparatus and plasma surface treatment method
US20070251815A1 (en) * 2006-04-28 2007-11-01 Tatung Company Method for manufacturing diamond-like carbon film
JP2011001598A (ja) * 2009-06-18 2011-01-06 Jtekt Corp 摺動部材

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Title
See also references of WO2016042630A1 *

Also Published As

Publication number Publication date
EP3196330A1 (fr) 2017-07-26
WO2016042630A1 (fr) 2016-03-24
JPWO2016042630A1 (ja) 2017-04-27
JP6311175B2 (ja) 2018-04-18
EP3196330B1 (fr) 2023-07-05
US20170283935A1 (en) 2017-10-05
CN106795619B (zh) 2019-10-01
CN106795619A (zh) 2017-05-31
US10428416B2 (en) 2019-10-01

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