EP2526563B1 - Procédé de fabrication d'une électrode pour une lampe à décharge à haute pression et lampe à décharge à haute pression comprenant au moins une électrode ainsi fabriquée - Google Patents

Procédé de fabrication d'une électrode pour une lampe à décharge à haute pression et lampe à décharge à haute pression comprenant au moins une électrode ainsi fabriquée Download PDF

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Publication number
EP2526563B1
EP2526563B1 EP11778853.9A EP11778853A EP2526563B1 EP 2526563 B1 EP2526563 B1 EP 2526563B1 EP 11778853 A EP11778853 A EP 11778853A EP 2526563 B1 EP2526563 B1 EP 2526563B1
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EP
European Patent Office
Prior art keywords
electrode
laser beam
discharge lamp
tungsten
pressure discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP11778853.9A
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German (de)
English (en)
Other versions
EP2526563A1 (fr
Inventor
Wolfgang Seitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osram GmbH
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Osram GmbH
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Filing date
Publication date
Application filed by Osram GmbH filed Critical Osram GmbH
Publication of EP2526563A1 publication Critical patent/EP2526563A1/fr
Application granted granted Critical
Publication of EP2526563B1 publication Critical patent/EP2526563B1/fr
Not-in-force legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H01J9/042—Manufacture, activation of the emissive part
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/19—Thermionic cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/02—Manufacture of cathodes

Definitions

  • the present invention relates to a method for producing an electrode for a high-pressure discharge lamp according to claim 1.
  • the emissivity of electrodes of discharge lamps has a decisive influence on the performance and geometrical design of such discharge lamps.
  • the prior art is the pasting with metal powders or mixtures by means of an organic binder and the subsequent sintering or baking to the electrode body.
  • the pasted and sintered layer is mechanically less stable, which can lead to partial crumbling on contact.
  • a method of processing an electrode of a discharge lamp is known.
  • the electrode is oxidized in the region in which it is pinched gas-tight in the neck of a discharge space formed of glass.
  • the oxidation is carried out by chemical routes in normal air atmosphere and ambient air pressure at a temperature between 700 and 1300 K.
  • the oxide layer is then sublimated in a vacuum environment, the temperature during the sublimation between 1450 K and 1900 K is.
  • the electrode obtains a surface of fine roughness in the above-mentioned range, whereby the adhesion of the surface of this electrode portion to the discharge vessel material is reduced. This reduces the risk of cracking in the sealed area of the discharge vessel.
  • the oxide layer also removes any contaminants from the surface of the electrode portion, thereby also reducing adhesion.
  • a discharge lamp in which a rod-shaped electrode made of tungsten is partially introduced into a neck of a discharge vessel by a gas-tight pinch and extends in regions in a discharge space of the discharge vessel.
  • the surface of the electrode is processed.
  • an oxide layer is first produced on the surface. In this case, for example, a tungsten trioxide layer can be produced.
  • the oxidized electrode is then heated at about 1200 ° C in a hydrogen furnace in which hydrogen is bubbled into water.
  • the EP 1 251 548 A1 teaches a method to improve the thermal radiation characteristics of electrodes in a high-pressure discharge lamp of the short arc type.
  • gutters are in the surface of the electrodes brought in.
  • the grooves have a depth that is less than or equal to 12% of the electrode diameter, with the ratio of the depth and spacing of the grooves being greater than or equal to two.
  • a laser device can be used.
  • the grooves may be angular or curved, wherein the surface is ground to produce curved grooves and then electrolytically polished in a 10% sodium hydroxide solution.
  • curved grooves can also be produced by heating to a high temperature in a vacuum, for example by heating the surface at 2000 ° C for 120 minutes.
  • the object of the present invention is to provide a method for producing an electrode for a high-pressure discharge lamp, with which the highest possible emissivity for the electrodes can be achieved.
  • the surface of the electrode should be as mechanically resistant as possible.
  • the object further consists in providing a high-pressure discharge lamp with at least one electrode produced in this way.
  • the present invention is based on the finding that a high emissivity is basically feasible when the electrode has an improved thermal Has radiation behavior.
  • the thermal radiation behavior can be improved by enlarging the surface of the electrode. However, it must be ensured that despite increased surface area of the electrode, the conductivity of the electrode is not affected.
  • the electrode surface for generating an oxide layer is coated with a suitable high-energy beam, for example an electromagnetic beam, in particular a laser beam, or an electron or ion beam.
  • a suitable high-energy beam for example an electromagnetic beam, in particular a laser beam, or an electron or ion beam.
  • EP 1 251 548 A1 can be generated by the inventive method a much larger surface and thus realize a much higher emissivity.
  • step a) the coating is carried out at least on a part of the electrode which is not embedded in the glass of the glass bulb after mounting the electrode in the glass bulb of the high-pressure discharge lamp.
  • the machining can be limited to the part of the electrode which is important for the emission results in a time saving and thus a reduction in the production costs.
  • step a) is carried out on the atmosphere, in particular oxygen-enriched atmosphere. Since the electrode is usually made predominantly of tungsten, i. In particular from doped tungsten, and tungsten is very reactive to oxygen, so can easily generate tungsten oxide.
  • step b) is carried out at the same time as step a).
  • step b) is carried out at the same time as step a).
  • Step c) is preferably carried out in a hydrogen-containing atmosphere, in particular in an argon-hydrogen mixture.
  • a preferred argon-hydrogen mixture is known as VARIGON®. This provides particularly easy the possibility that the oxygen from the tungsten oxide with the hydrogen from the atmosphere in which step c) is performed, connects to water. The pure metal remains on the electrode surface.
  • the electrode preferably comprises tungsten, wherein in step c) tungsten oxide is reduced to pure tungsten.
  • the coating is preferably carried out in step a) by means of a laser beam device.
  • a laser beam device precisely that part of the electrode surface which is important for the emissivity can be processed with particular precision.
  • different areas of the electrode surface can be painted over differently.
  • Scanning by means of a laser beam device allows a precise adjustment of a desired emissivity with regard to the adjustable parameters such as energy density, line spacing, focus, and the like.
  • the laser beam device is designed, in particular, to release an energy density which makes it possible to melt, oxidize and sublime at least part of the electrode surface.
  • step a) the laser beam device with a frequency between 1 kHz and 100 kHz, in particular 10 kHz, are clocked.
  • step a) preferably rows with a line spacing between two adjacent lines are preferably interposed on the electrode surface 0.01 and 0.2 mm, in particular 0.1 mm generated.
  • the laser beam device is preferably operated with a laser beam focus between 0.01 and 0.1 mm, in particular 0.02 mm. In this way, the electrode surface can be maximized, whereby at the same time the emissivity of the electrode becomes maximum.
  • the overcoating can also be done with other suitable blasting devices, e.g. Electron or ion beam devices
  • step c) is carried out at a temperature between 700 ° C. and 2500 ° C., in particular 2200 ° C.
  • Step a) is preferably carried out at ambient temperature, in particular a temperature between 15 ° C and 30 ° C, and ambient pressure.
  • Fig. 1 schematically a section of a high-pressure discharge lamp 10 is shown.
  • the high-pressure discharge lamp 10 comprises a discharge vessel 12 having a discharge space 14.
  • a first electrode 16 anode
  • a second electrode 18 cathode
  • At the oval in cross-section formed central part of the discharge vessel 12 close two diametrically opposite necks 20, 22 at.
  • the electrode 16 is melted in the neck 22, the electrode 18 in the neck 20th
  • the electrodes 16, 18 are arranged on rods 24, 26, which are preferably formed from tungsten or a tungsten alloy.
  • the electrodes 16, 18 themselves consist of doped tungsten.
  • step 120 at least part of the surface of the electrode 16 is swept over by means of a laser beam device.
  • the energy density is so high that a part of the electrode surface melts, oxidizes and sublimates. This means that a part of the resulting tungsten oxide goes into the gaseous state, another part of the tungsten oxide remains on the electrode surface.
  • Step 120 is preferably carried out in an oxygen-enriched atmosphere.
  • the laser beam device can be clocked at a frequency between 1 kHz and 100 kHz, in particular 10 kHz.
  • lines with a line spacing between two adjacent lines between 0.01 and 0.2 mm, in particular 0.1 mm are produced on the electrode surface.
  • the laser beam device is operated with a laser beam focus between 0.01 and 0.1 mm, in particular 0.02 mm.
  • the laser beam device for example, a power between 50 W and 200 W, preferably about 120 W, leave.
  • the sweeping can, for example, at a speed between 10 mm / s and 100 mm / s, in particular 30 mm / s, take place.
  • the temperature can be ambient temperature; the pressure is preferably ambient pressure.
  • a preferred laser beam device is known under the name rofin rsmarker and is operated with Galvo head.
  • the power in this embodiment is about 120 W, whereby a current of about 38 A flows.
  • the sweeping speed is approx. 30 mm / s.
  • the electrode 16 is rotatably mounted, so that the entire circumference can be structured by the laser beam device.
  • the step 120 creates a very rough oxidic surface. This is not defined geometrically, as will be explained in more detail below with reference to the other figures.
  • the electrode 16 is preferably inductively heated in a VARIGON atmosphere.
  • the oxidized parts of the surface are reduced by the existing hydrogen to metallic tungsten and water.
  • the result is a metallic, very rough electrode surface with an emissivity that can be adjusted by the degree of treatment.
  • the surface is free from contamination since, in contrast to the prior art, no binder has to be used in a pasting process.
  • the electrode has a very good coupling-in behavior during inductive heating and is mechanically stable, ie the electrode surface shows no tendency to decay.
  • Step 140 is preferably carried out at a temperature between 700 ° C and 2500 ° C, in particular 2200 ° C, performed.
  • step 160 ends in step 160.
  • Fig. 3 shows an enlarged view of the area of the surface of the electrode 16 of FIG Fig. 1 in which the shape changes from cylindrical to conical.
  • the magnification is 10: 1.
  • Fig. 4 shows an enlarged view of a section of Fig. 3 in the transition region cylindrical cone-shaped.
  • the magnification is 1: 30.
  • Fig. 5 a section of Fig. 3 in the cylindrical area.
  • This illustration emphasizes the high roughness of the tungsten surface of the electrode.

Claims (12)

  1. Procédé de fabrication d'une électrode (16) au tungstène pour une lampe à décharge haute pression (10), comprenant les étapes suivantes :
    a) irradier au moins une partie de la surface de l'électrode avec un faisceau riche en énergie pour produire une couche d'oxyde (étape 120) ;
    b) sublimer au moins partiellement la couche d'oxyde qui se crée à l'étape a) (étape 120) ; et
    c) réduire la couche d'oxyde résiduelle (140).
  2. Procédé selon la revendication 1, caractérisé en ce que l'étape a) est effectuée sous atmosphère, et plus particulièrement sous une atmosphère enrichie en oxygène (étape 120).
  3. Procédé selon l'une des revendications précédentes, caractérisé en ce que l'étape b) est effectuée en même temps que l'étape a) (étape 120).
  4. Procédé selon l'une des revendications précédentes, caractérisé en ce que l'étape c) est effectuée sous une atmosphère contenant de l'hydrogène, et plus particulièrement dans un mélange d'hydrogène et d'argon (étape 140).
  5. Procédé selon l'une des revendications précédentes, caractérisé en ce que, à l'étape c), de l'oxyde de tungstène est réduit en tungstène pur (étape 140).
  6. Procédé selon l'une des revendications précédentes, caractérisé en ce que l'irradiation prévue à l'étape a) s'effectue au moyen d'un dispositif à faisceau laser, à faisceau électronique ou à faisceau ionique (étape 120).
  7. Procédé selon la revendication 6, caractérisé en ce que le dispositif à faisceau laser, à faisceau électronique ou à faisceau ionique est conçu pour dégager une densité d'énergie qui permet de fondre, d'oxyder et de sublimer au moins une partie de la surface de l'électrode.
  8. Procédé selon l'une des revendications 6 ou 7, caractérisé en ce que, à l'étape a), le dispositif à faisceau laser est cadencé à une fréquence comprise entre 1 kHz et 100 kHz, et plus particulièrement de 10 kHz (étape 120).
  9. Procédé selon l'une des revendications 6 à 8, caractérisé en ce que sont créées, à l'étape a), sur la surface de l'électrode, des lignes présentant, entre deux lignes voisines, un interligne compris entre 0,01 et 0,2 mm, et plus particulièrement de 0,1 mm (étape 120).
  10. Procédé selon l'une des revendications 6 à 9, caractérisé en ce que le dispositif à faisceau laser fonctionne avec un foyer du faisceau laser compris entre 0,01 et 0,1 mm, et plus particulièrement de 0,02 mm.
  11. Procédé selon l'une des revendications précédentes, caractérisé en ce que l'étape c) est effectuée à une température comprise entre 700 °C et 2 500 °C, et plus particulièrement de 2 200 °C (étape 140).
  12. Procédé selon l'une des revendications précédentes, caractérisé en ce que l'étape a) est effectuée à température ambiante, et plus particulièrement à une température comprise entre 15 °C et 30 °C, et à pression ambiante (étape 120).
EP11778853.9A 2010-11-05 2011-10-28 Procédé de fabrication d'une électrode pour une lampe à décharge à haute pression et lampe à décharge à haute pression comprenant au moins une électrode ainsi fabriquée Not-in-force EP2526563B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010043463A DE102010043463A1 (de) 2010-11-05 2010-11-05 Verfahren zum Herstellen einer Elektrode für eine Hochdruckentladungslampe und Hochdruckentladungslampe mit mindestens einer derart hergestellten Elektrode
PCT/EP2011/069030 WO2012059435A1 (fr) 2010-11-05 2011-10-28 Procédé de fabrication d'une électrode pour une lampe à décharge à haute pression et lampe à décharge à haute pression comprenant au moins une électrode ainsi fabriquée

Publications (2)

Publication Number Publication Date
EP2526563A1 EP2526563A1 (fr) 2012-11-28
EP2526563B1 true EP2526563B1 (fr) 2014-10-08

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EP11778853.9A Not-in-force EP2526563B1 (fr) 2010-11-05 2011-10-28 Procédé de fabrication d'une électrode pour une lampe à décharge à haute pression et lampe à décharge à haute pression comprenant au moins une électrode ainsi fabriquée

Country Status (6)

Country Link
US (1) US8876570B2 (fr)
EP (1) EP2526563B1 (fr)
JP (1) JP5693740B2 (fr)
CN (1) CN103189958B (fr)
DE (1) DE102010043463A1 (fr)
WO (1) WO2012059435A1 (fr)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE721503C (de) 1940-03-14 1942-06-08 Aeg Hochdruckentladungslampe mit Wasserstoffuellung
DE4206002A1 (de) 1992-02-27 1993-09-02 Philips Patentverwaltung Verfahren zum erzeugen eines musters in der oberflaeche eines werkstuecks
JP3283116B2 (ja) 1993-08-31 2002-05-20 株式会社東芝 酸化物陰極の製造方法
EP0903771B1 (fr) * 1997-09-19 2004-03-03 Matsushita Electric Industrial Co., Ltd. Lampe à décharge à haute pression et son procédé de fabrication
US6626725B1 (en) 2000-05-08 2003-09-30 Welch Allyn, Inc Electrode treatment surface process for reduction of a seal cracks in quartz
JP4512968B2 (ja) * 2000-08-03 2010-07-28 ウシオ電機株式会社 ショートアーク型高圧放電ランプ
AT5322U1 (de) * 2001-05-11 2002-05-27 Plansee Ag Verfahren zur herstellung einer hochdruck-entladungslampe
JP3648184B2 (ja) * 2001-09-07 2005-05-18 株式会社小糸製作所 放電ランプアークチューブおよび同アークチューブの製造方法
JP4427391B2 (ja) 2003-09-24 2010-03-03 東芝ライテック株式会社 高圧放電ランプおよび高圧放電ランプの製造方法
DE10360545A1 (de) 2003-12-22 2005-07-14 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Elektrode für eine Hochdruckentladungslampe
JP4453487B2 (ja) * 2004-08-24 2010-04-21 岩崎電気株式会社 高圧放電ランプの酸素封入方法
JP4509754B2 (ja) * 2004-12-02 2010-07-21 株式会社小糸製作所 放電ランプ装置用アークチューブおよび同アークチューブの製造方法
JP4815839B2 (ja) * 2005-03-31 2011-11-16 ウシオ電機株式会社 高負荷高輝度放電ランプ
DE102007003486A1 (de) * 2007-01-24 2008-07-31 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Verfahren zum Bearbeiten einer Elektrode einer Entladungslampe
DE102007015243A1 (de) * 2007-03-29 2008-10-02 Osram Gesellschaft mit beschränkter Haftung Glühlampe mit strukturiertem Leuchtkörper
JP4636156B2 (ja) 2008-10-01 2011-02-23 ウシオ電機株式会社 ショートアーク型放電ランプ
JP4872999B2 (ja) 2008-12-01 2012-02-08 ウシオ電機株式会社 高圧放電ランプ

Also Published As

Publication number Publication date
JP2014500585A (ja) 2014-01-09
US8876570B2 (en) 2014-11-04
WO2012059435A1 (fr) 2012-05-10
CN103189958B (zh) 2016-08-03
JP5693740B2 (ja) 2015-04-01
US20130221842A1 (en) 2013-08-29
CN103189958A (zh) 2013-07-03
DE102010043463A1 (de) 2012-05-10
EP2526563A1 (fr) 2012-11-28

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