EP2373722A4 - Silsesquioxanharze - Google Patents

Silsesquioxanharze

Info

Publication number
EP2373722A4
EP2373722A4 EP09832278A EP09832278A EP2373722A4 EP 2373722 A4 EP2373722 A4 EP 2373722A4 EP 09832278 A EP09832278 A EP 09832278A EP 09832278 A EP09832278 A EP 09832278A EP 2373722 A4 EP2373722 A4 EP 2373722A4
Authority
EP
European Patent Office
Prior art keywords
silsesquioxane resins
silsesquioxane
resins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP09832278A
Other languages
English (en)
French (fr)
Other versions
EP2373722A1 (de
Inventor
Peng-Fei Fu
Eric Moyer
Craig Yeakle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of EP2373722A1 publication Critical patent/EP2373722A1/de
Publication of EP2373722A4 publication Critical patent/EP2373722A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
EP09832278A 2008-12-10 2009-10-19 Silsesquioxanharze Withdrawn EP2373722A4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12135208P 2008-12-10 2008-12-10
PCT/US2009/061125 WO2010068336A1 (en) 2008-12-10 2009-10-19 Silsesquioxane resins

Publications (2)

Publication Number Publication Date
EP2373722A1 EP2373722A1 (de) 2011-10-12
EP2373722A4 true EP2373722A4 (de) 2013-01-23

Family

ID=42243018

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09832278A Withdrawn EP2373722A4 (de) 2008-12-10 2009-10-19 Silsesquioxanharze

Country Status (7)

Country Link
US (1) US8809482B2 (de)
EP (1) EP2373722A4 (de)
JP (1) JP5662338B2 (de)
KR (1) KR20110096063A (de)
CN (1) CN102245674B (de)
TW (1) TWI490655B (de)
WO (1) WO2010068336A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4488709B2 (ja) 2003-09-29 2010-06-23 三洋電機株式会社 有機ｅｌパネル
CN101910253B (zh) 2008-01-15 2013-04-10 陶氏康宁公司 倍半硅氧烷树脂
KR20100134578A (ko) * 2008-03-04 2010-12-23 다우 코닝 코포레이션 실세스퀴옥산 수지
JP5662338B2 (ja) 2008-12-10 2015-01-28 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ シルセスキオキサン樹脂
US20110236835A1 (en) * 2008-12-10 2011-09-29 Peng-Fei Fu Silsesquioxane Resins
WO2010068338A1 (en) * 2008-12-10 2010-06-17 Dow Corning Corporation Switchable antireflective coatings
TWI567497B (zh) * 2012-04-06 2017-01-21 Ａｚ電子材料盧森堡有限公司 負型感光性矽氧烷組成物
TWI567498B (zh) 2012-04-06 2017-01-21 Ａｚ電子材料盧森堡有限公司 負型感光性矽氧烷組成物
US8999625B2 (en) 2013-02-14 2015-04-07 International Business Machines Corporation Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
JP6503630B2 (ja) * 2014-04-01 2019-04-24 Jsr株式会社 ケイ素含有膜形成組成物及びパターン形成方法
US9442377B1 (en) 2015-06-15 2016-09-13 Rohm And Haas Electronic Materials Llc Wet-strippable silicon-containing antireflectant
KR101956830B1 (ko) 2015-08-18 2019-03-12 주식회사 엘지화학 저굴절층 및 이를 포함하는 반사 방지 필름
WO2017218286A1 (en) * 2016-06-16 2017-12-21 Dow Corning Corporation Silicon-rich silsesquioxane resins
US10514605B2 (en) 2017-08-04 2019-12-24 International Business Machines Corporation Resist multilayer film-attached substrate and patterning process
US11042090B2 (en) 2017-08-04 2021-06-22 Shin-Etsu Chemical Co., Ltd. Composition for forming organic film
FI129480B (en) * 2018-08-10 2022-03-15 Pibond Oy Silanol-containing organic-inorganic hybrid coatings for high-resolution patterning
FI128886B (en) * 2019-02-25 2021-02-26 Pibond Oy Functional hydrogen silicon oxane polymers and their uses

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006065321A1 (en) * 2004-12-17 2006-06-22 Dow Corning Corporation Method for forming anti-reflective coating

Family Cites Families (92)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4587138A (en) 1984-11-09 1986-05-06 Intel Corporation MOS rear end processing
US5010159A (en) 1989-09-01 1991-04-23 Dow Corning Corporation Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol
US5100503A (en) 1990-09-14 1992-03-31 Ncr Corporation Silica-based anti-reflective planarizing layer
US5210168A (en) 1992-04-02 1993-05-11 Dow Corning Corporation Process for forming siloxane bonds
EP0568476B1 (de) 1992-04-30 1995-10-11 International Business Machines Corporation Silikon enthaltendes positives Photoresistmaterial und dessen Verwendung in Dünnfilm-Verpackung-Technologie
US5412053A (en) 1993-08-12 1995-05-02 The University Of Dayton Polymers containing alternating silsesquioxane and bridging group segments and process for their preparation
US5484867A (en) 1993-08-12 1996-01-16 The University Of Dayton Process for preparation of polyhedral oligomeric silsesquioxanes and systhesis of polymers containing polyhedral oligomeric silsesqioxane group segments
US5441765A (en) 1993-09-22 1995-08-15 Dow Corning Corporation Method of forming Si-O containing coatings
JP3542185B2 (ja) 1995-02-02 2004-07-14 ダウ コーニング アジア株式会社 シリコーンレジン、これを含む組成物およびその硬化方法
JP3499032B2 (ja) 1995-02-02 2004-02-23 ダウ コーニング アジア株式会社 放射線硬化性組成物、その硬化方法及びパターン形成方法
JP3324360B2 (ja) 1995-09-25 2002-09-17 信越化学工業株式会社 ポリシロキサン化合物及びポジ型レジスト材料
JPH09124794A (ja) 1995-11-06 1997-05-13 Dow Corning Asia Ltd 有機光機能材を含有するポリシロキサン樹脂組成物及びそれから得られる透明な光機能素子
JP3192947B2 (ja) 1995-11-16 2001-07-30 東京応化工業株式会社 シリカ系被膜形成用塗布液の製造方法
US5939236A (en) 1997-02-07 1999-08-17 Shipley Company, L.L.C. Antireflective coating compositions comprising photoacid generators
US6143855A (en) 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6057239A (en) 1997-12-17 2000-05-02 Advanced Micro Devices, Inc. Dual damascene process using sacrificial spin-on materials
US6344284B1 (en) 1998-04-10 2002-02-05 Organic Display Technology Organic electroluminescent materials and devices made from such materials
US6156640A (en) 1998-07-14 2000-12-05 United Microelectronics Corp. Damascene process with anti-reflection coating
US6087064A (en) 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
US6177143B1 (en) 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US6461955B1 (en) 1999-04-29 2002-10-08 Texas Instruments Incorporated Yield improvement of dual damascene fabrication through oxide filling
US6281285B1 (en) 1999-06-09 2001-08-28 Dow Corning Corporation Silicone resins and process for synthesis
US6509259B1 (en) 1999-06-09 2003-01-21 Alliedsignal Inc. Process of using siloxane dielectric films in the integration of organic dielectric films in electronic devices
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6890448B2 (en) 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US6329118B1 (en) 1999-06-21 2001-12-11 Intel Corporation Method for patterning dual damascene interconnects using a sacrificial light absorbing material
US6982006B1 (en) 1999-10-19 2006-01-03 Boyers David G Method and apparatus for treating a substrate with an ozone-solvent solution
US6359096B1 (en) 1999-10-25 2002-03-19 Dow Corning Corporation Silicone resin compositions having good solution solubility and stability
KR100355604B1 (ko) 1999-12-23 2002-10-12 주식회사 하이닉스반도체 난반사 방지막용 중합체와 그 제조방법
JP3795333B2 (ja) 2000-03-30 2006-07-12 東京応化工業株式会社 反射防止膜形成用組成物
US6420088B1 (en) 2000-06-23 2002-07-16 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer
US6420084B1 (en) 2000-06-23 2002-07-16 International Business Machines Corporation Mask-making using resist having SIO bond-containing polymer
US20030176614A1 (en) 2000-06-30 2003-09-18 Nigel Hacker Organohydridosiloxane resins with high organic content
US6368400B1 (en) 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
JP4141625B2 (ja) 2000-08-09 2008-08-27 東京応化工業株式会社 ポジ型レジスト組成物およびそのレジスト層を設けた基材
WO2002025374A2 (en) 2000-09-19 2002-03-28 Shipley Company, L.L.C. Antireflective composition
EP1197511A1 (de) 2000-10-10 2002-04-17 Shipley Company LLC Antireflex Zusammensetzung
EP1197998A3 (de) 2000-10-10 2005-12-21 Shipley Company LLC Antireflektiver Schaumstoff
JP3931951B2 (ja) 2001-03-13 2007-06-20 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP2002299441A (ja) 2001-03-30 2002-10-11 Jsr Corp デュアルダマシン構造の形成方法
US6589711B1 (en) 2001-04-04 2003-07-08 Advanced Micro Devices, Inc. Dual inlaid process using a bilayer resist
JP5225528B2 (ja) 2001-05-30 2013-07-03 株式会社Ａｄｅｋａ ケイ素含有重合体の製造方法
JP2003025510A (ja) 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
US6746530B2 (en) 2001-08-02 2004-06-08 Chunghwa Pictures Tubes, Ltd. High contrast, moisture resistant antistatic/antireflective coating for CRT display screen
KR100436220B1 (ko) 2001-08-30 2004-06-12 주식회사 네패스 바닥 반사방지막용 유기 중합체, 그의 제조방법 및 그를함유하는 조성물
US20030096090A1 (en) 2001-10-22 2003-05-22 Boisvert Ronald Paul Etch-stop resins
US6844131B2 (en) 2002-01-09 2005-01-18 Clariant Finance (Bvi) Limited Positive-working photoimageable bottom antireflective coating
US7261997B2 (en) 2002-01-17 2007-08-28 Brewer Science Inc. Spin bowl compatible polyamic acids/imides as wet developable polymer binders for anti-reflective coatings
US6730454B2 (en) 2002-04-16 2004-05-04 International Business Machines Corporation Antireflective SiO-containing compositions for hardmask layer
US6872506B2 (en) 2002-06-25 2005-03-29 Brewer Science Inc. Wet-developable anti-reflective compositions
US7294732B2 (en) 2002-08-07 2007-11-13 Chisso Corporation Silicon compound
WO2004044025A2 (en) 2002-11-12 2004-05-27 Honeywell International Inc Anti-reflective coatings for photolithography and methods of preparation thereof
DE10393808T5 (de) 2002-12-02 2005-10-13 Tokyo Ohka Kogyo Co., Ltd., Kawasaki Zusammensetzung zur Bildung einer Antireflexionsbeschichtung
TW200505966A (en) 2003-04-02 2005-02-16 Dow Global Technologies Inc Organosilicate resin formulation for use in microelectronic devices
JP2004361692A (ja) 2003-04-07 2004-12-24 Dow Corning Asia Ltd 光伝送部材用硬化性オルガノポリシロキサン樹脂組成物、オルガノポリシロキサン樹脂硬化物からなる光伝送部材および光伝送部材の製造方法
JP4796498B2 (ja) 2003-05-23 2011-10-19 ダウ コーニング コーポレーション 高い湿式エッチング速度を持つシロキサン樹脂系反射防止被覆組成物
US7202013B2 (en) 2003-06-03 2007-04-10 Shin-Etsu Chemical Co., Ltd. Antireflective film material, and antireflective film and pattern formation method using the same
US7604866B2 (en) 2003-06-18 2009-10-20 Asahi Kasei Kabushiki Kaisha Antireflection film
WO2005005238A1 (en) 2003-07-02 2005-01-20 Keith Gilstrap Seatpost mounted bicycle wheel holding device
JP4819676B2 (ja) * 2003-07-03 2011-11-24 ダウ・コーニング・コーポレイション 感光性シルセスキオキサン樹脂
AU2003272401A1 (en) 2003-09-15 2005-04-27 Sunco Products, Inc. Sheeting system
EP1668698A1 (de) 2003-09-29 2006-06-14 Siemens Aktiengesellschaft Plastisch verformbarer kühlkörper für elektrische und/oder elektronische bauelemente
JP5348843B2 (ja) 2003-10-07 2013-11-20 ハネウエル・インターナシヨナル・インコーポレーテツド 集積回路用途の被覆およびハードマスク組成物、これらの製造方法および使用
SG119201A1 (en) 2003-10-13 2006-02-28 Sportiv Tech Lab Pte Ltd Utility garment
DE602005001341T2 (de) 2004-04-14 2008-02-21 Rohm and Haas Electronic Materials, L.L.C., Marlborough Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
EP1769018B1 (de) 2004-07-16 2007-11-21 Dow Corning Corporation Strahlungsempfindliche silikonharzzusammensetzung
JP2006117867A (ja) 2004-10-25 2006-05-11 Takemoto Oil & Fat Co Ltd 有機シリコーン微粒子、有機シリコーン微粒子の製造方法、高分子材料改質剤及び化粧品原料
CN101072813B (zh) 2004-12-17 2011-06-08 陶氏康宁公司 硅氧烷树脂涂料
CN101073038B (zh) * 2004-12-17 2010-05-05 陶氏康宁公司 形成抗反射涂层的方法
EP1825329B1 (de) 2004-12-17 2015-04-08 Dow Corning Corporation Verfahren zur bildung einer antireflexbeschichtung
JP2006292929A (ja) 2005-04-08 2006-10-26 Teijin Chem Ltd 電子写真感光体バインダー用樹脂
TWI336716B (en) 2005-11-14 2011-02-01 Rohm & Haas Elect Mat Silicon-containing polymers and optical waveguides formed therefrom
WO2007066653A1 (ja) 2005-12-05 2007-06-14 Jsr Corporation ポリシロキサン及び感放射線性樹脂組成物
JP2007154047A (ja) * 2005-12-05 2007-06-21 Jsr Corp ポリシロキサン及び感放射線性樹脂組成物
WO2007094849A2 (en) 2006-02-13 2007-08-23 Dow Corning Corporation Antireflective coating material
CN101371196B (zh) 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
US20070212886A1 (en) * 2006-03-13 2007-09-13 Dong Seon Uh Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositions
DE602007000498D1 (de) 2006-04-11 2009-03-12 Shinetsu Chemical Co Siliziumhaltige, folienbildende Zusammensetzung, siliziumhaltige Folie, siliziumhaltiges, folientragendes Substrat und Strukturierungsverfahren
US7855043B2 (en) 2006-06-16 2010-12-21 Shin-Etsu Chemical Co., Ltd. Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
US20070298349A1 (en) 2006-06-22 2007-12-27 Ruzhi Zhang Antireflective Coating Compositions Comprising Siloxane Polymer
JP4574595B2 (ja) 2006-06-23 2010-11-04 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP5000250B2 (ja) * 2006-09-29 2012-08-15 東京応化工業株式会社 パターン形成方法
US8026035B2 (en) 2007-03-30 2011-09-27 Cheil Industries, Inc. Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same
JP5587791B2 (ja) 2008-01-08 2014-09-10 東レ・ダウコーニング株式会社 シルセスキオキサン樹脂
CN101910253B (zh) 2008-01-15 2013-04-10 陶氏康宁公司 倍半硅氧烷树脂
KR20100134578A (ko) 2008-03-04 2010-12-23 다우 코닝 코포레이션 실세스퀴옥산 수지
EP2250215B1 (de) 2008-03-05 2020-03-25 Dow Silicones Corporation Silsesquioxanharze
JP5662338B2 (ja) 2008-12-10 2015-01-28 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ シルセスキオキサン樹脂
WO2010068338A1 (en) * 2008-12-10 2010-06-17 Dow Corning Corporation Switchable antireflective coatings
US20110236835A1 (en) * 2008-12-10 2011-09-29 Peng-Fei Fu Silsesquioxane Resins

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006065321A1 (en) * 2004-12-17 2006-06-22 Dow Corning Corporation Method for forming anti-reflective coating

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
KAMYAR RAHIMIAN ET AL: "Soluble, High Molecular Weight Polysilsesquioxanes with Carboxylate Functionalities", MACROMOLECULES, vol. 35, no. 7, 1 March 2002 (2002-03-01), pages 2452 - 2454, XP055009463, ISSN: 0024-9297, DOI: 10.1021/ma0121215 *
See also references of WO2010068336A1 *

Also Published As

Publication number Publication date
JP5662338B2 (ja) 2015-01-28
US20110233489A1 (en) 2011-09-29
US8809482B2 (en) 2014-08-19
JP2012511619A (ja) 2012-05-24
EP2373722A1 (de) 2011-10-12
CN102245674B (zh) 2014-12-10
TW201024924A (en) 2010-07-01
WO2010068336A1 (en) 2010-06-17
CN102245674A (zh) 2011-11-16
KR20110096063A (ko) 2011-08-26
TWI490655B (zh) 2015-07-01

Similar Documents

Publication Publication Date Title
EP2250213A4 (de) Silsesquioxanharze
EP2238198A4 (de) Silsesquioxanharze
EP2373722A4 (de) Silsesquioxanharze
EP2250215A4 (de) Silsesquioxanharze
TWI367207B (en) Substituted pyrrolidine-2-carboxamides
EP2246377A4 (de) Harzzusammensetzung
EP2303378A4 (de) Schnittstelle
PL2918172T3 (pl) Połączenia środków kontroli biologicznej i fungicydów
HUE038140T2 (hu) Módosított fenolgyanták
EP2280616A4 (de) Babybody
EP2258532A4 (de) Harzlüfter
EP2257170A4 (de) Tetrahydrofuropyridone
EP2233506A4 (de) Modifiziertes propylenharz
EP2240534A4 (de) Silsesquioxanharze
EP2285758A4 (de) Dünger-pestizid-paket
IL208281A0 (en) Substituted cyclohexyldiamines
EP2313147A4 (de) Quetschzange
EP2305755A4 (de) Harzzusammensetzung
IL209175A0 (en) Substituted qunazolines
GB0921666D0 (en) Resins
EP2233305A4 (de) Graphikdrucker
HK1148763A1 (en) Resin composition
EP2285375A4 (de) Spiroazaindole
GB0800161D0 (en) Rota-board
AU3977P (en) PARV01 Myoporum parvifolium

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20110707

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20121221

RIC1 Information provided on ipc code assigned before grant

Ipc: C08G 77/04 20060101AFI20121217BHEP

Ipc: C09D 183/04 20060101ALI20121217BHEP

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN

18W Application withdrawn

Effective date: 20150616