EP2054626A1 - Verfahren zur abreaktion selbstentzündlicher stäube in einer vakuumpumpvorrichtung - Google Patents
Verfahren zur abreaktion selbstentzündlicher stäube in einer vakuumpumpvorrichtungInfo
- Publication number
- EP2054626A1 EP2054626A1 EP07788296A EP07788296A EP2054626A1 EP 2054626 A1 EP2054626 A1 EP 2054626A1 EP 07788296 A EP07788296 A EP 07788296A EP 07788296 A EP07788296 A EP 07788296A EP 2054626 A1 EP2054626 A1 EP 2054626A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- oxygen
- supply
- dusts
- vacuum pump
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/28—Safety arrangements; Monitoring
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
- F04C29/0092—Removing solid or liquid contaminants from the gas under pumping, e.g. by filtering or deposition; Purging; Scrubbing; Cleaning
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D3/00—Axial-flow pumps
- F04D3/02—Axial-flow pumps of screw type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
- F04C18/16—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/10—Vacuum
- F04C2220/12—Dry running
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2280/00—Arrangements for preventing or removing deposits or corrosion
- F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/85978—With pump
- Y10T137/85986—Pumped fluid control
Definitions
- the invention relates to a method for the reaction of self-igniting dusts in a dry-compressing vacuum pumping device and a corresponding vacuum pump.
- particles or fine dusts are often formed which, due to their chemical composition and their large surface, are so reactive that they ignite spontaneously on contact with ambient air, whereby they react with atmospheric oxygen.
- Such processes are, for example, the Czochalsky process for the production of silicon single crystals or the melting and Degassing of steels.
- silicon oxide (SiO) is formed and in the second case, metallic fine dusts, such as. B. magnesium dust.
- the dust particles are sucked into the vacuum pump, which generates the vacuum required for the process.
- the dust particles are absorbed by the lubricant and not discharged from the pump.
- the dusts also pose a safety risk for the maintenance personnel of the systems, as in the event of faulty operation or unplanned system ventilation, ignition of the dusts can not be ruled out. Such inflammation can even occur in the filter or in the piping.
- the invention has for its object to provide a method for Abresure redesigner dusts in a dry-compressing vacuum pump, in which a continuous Oxidat ⁇ on the reactive dusts within the vacuum pump, whereby the vacuum pump as such simplifies and the work on the vacuum pump is made safer.
- the inventive method is defined in claim 1. Thereafter, the vacuum pumping device during operation continuously metered oxygen is supplied, whereby an oxidation of the dust is effected.
- the invention provides a targeted Abreakt ⁇ on oxidizable dusts in the vacuum pump.
- silicon oxide (SiO 2 ) is oxidized to silicon dioxide (SiO 2 ) and metals are oxidized to metal oxides. Since gas is essentially conveyed by the vacuum pump and the absolute mass flow of dust per unit of time is relatively low, this method represents a possibility of allowing the reactive dusts to react continuously and in a controlled manner. An uncontrolled inflammation of the dusts is reliably prevented.
- the oxygen supply can be in the form of pure oxygen or in the form of air.
- the supplied oxygen-containing gas can be introduced at a suitable point in the vacuum pump device, for example in the pump chamber at the pump inlet, in the course of the compression chamber or at the Pumpenaustr ⁇ tt.
- the invention further relates to a dry-compacting vacuum pumping device having at least one driven compression member and a housing with pump inlet and pump outlet.
- the vacuum pump is characterized in that the housing has at least one oxygen inlet with a throttle valve for regulating the inlet cross-section.
- a dry compressing vacuum pumping apparatus is contemplated; Screw pumps, claw pumps, Roots pumps, turbocompressors, side hydraulic compressors, dry compacting rotary vane pumps and others.
- the vacuum pumping device may consist of a single vacuum pump or of a plurality of pumps connected in series, each of which forms a pump stage.
- the oxygen may also be introduced into a reaction chamber located between two pump stages. In this case, a reaction space is provided. As a reaction space can also serve a pipe.
- temperature or pressure sensors are provided for monitoring the reaction in the vacuum pumping device.
- a method for cleaning the vacuum pumping device and the dusts of dust may be that after the end of the process, the supply of process gas is stopped and further an oxygen-containing gas mixture, for. As air is conveyed by the pumping device.
- the oxygen required for the oxidation may also be contained in the sealing gas of a shaft seal.
- the oxygen flows metered out of the shaft seal into a pump chamber or a line of the pumping device.
- Fig. 2 is a section along the line I ⁇ -II of Figure 1 and
- Fig. 3 is a schematic representation of the principle of the present
- a vacuum pump is provided in the form of a screw pump.
- This has an elongated housing 10, in which two screw rotors 12, 14 are rotatably mounted in opposite directions to each other.
- Each screw rotor has a helically arranged tooth 16, 18, the pitch of which continuously decreases from the pump inlet 20 to the pump outlet 22, as can be seen in FIG.
- the working chamber which migrates in the axial direction when the screw rotors rotate, decreases from the pump inlet 20 to the pump outlet 22.
- the compression chamber 24th Between the pump inlet and the pump outlet is the compression chamber 24th
- the pump inlet 20 forms the suction chamber, which is connected to the device to be evacuated.
- the process gas 38 is sucked. It contains particles 40 in the form of non-oxided dusts.
- the pump inlet 20 is connected to a laterally attached to the housing 10 oxygen inlet 26 which is provided with a throttle valve 28.
- the throttle valve 28 may be set to different throttle areas to regulate the oxygen supply.
- the oxygen may be pure oxygen or be part of a gas mixture, e.g. B. of air.
- the dusts react in the pump housing 10 in a controlled manner with the supplied oxygen as soon as an oxygen partial pressure required for the reaction is established during the compression.
- An alternative embodiment of the oxygen inlet is designated 26a.
- the oxygen inlet 26a is located in the middle region of the length of the Compression space 24, and in the middle between the two intermeshing helical teeth 16, 18th
- a third alternative is the oxygen inlet 26b, which is arranged at the pump outlet 22.
- FIG. 3 shows a schematic representation of the pump with the Pumpeneiniass 20, in which the process gas 38 is sucked.
- the oxygen inlet 26 is here at the intake of the pump inlet 20th
- the full beads represent the unoxidized particles in Figure 3 and the hollow beads represent the oxidized particles.
- the oxidation takes place in the compression space 24 depending on which of the oxygen inlets 26, 26a, 26b is open.
- the shafts for rotating the screw rotors are designated 30 in FIG.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200610039529 DE102006039529A1 (de) | 2006-08-23 | 2006-08-23 | Verfahren zur Abreaktion selbstentzündlicher Stäube in einer Vakuumpumpvorrichtung |
PCT/EP2007/058199 WO2008022916A1 (de) | 2006-08-23 | 2007-08-07 | Verfahren zur abreaktion selbstentzündlicher stäube in einer vakuumpumpvorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2054626A1 true EP2054626A1 (de) | 2009-05-06 |
EP2054626B1 EP2054626B1 (de) | 2012-12-05 |
Family
ID=38792066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20070788296 Not-in-force EP2054626B1 (de) | 2006-08-23 | 2007-08-07 | Verfahren zur abreaktion selbstentzündlicher stäube in einer vakuumpumpvorrichtung |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100086883A1 (de) |
EP (1) | EP2054626B1 (de) |
JP (1) | JP2010501766A (de) |
CN (1) | CN101535651B (de) |
DE (1) | DE102006039529A1 (de) |
RU (1) | RU2009110263A (de) |
WO (1) | WO2008022916A1 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0406748D0 (en) * | 2004-03-26 | 2004-04-28 | Boc Group Plc | Vacuum pump |
DE102007043350B3 (de) * | 2007-09-12 | 2009-05-28 | Oerlikon Leybold Vacuum Gmbh | Vakuumpumpe sowie Verfahren zur Steuerung einer Gasballastzufuhr zu einer Vakuumpumpe |
DE102008030788A1 (de) * | 2008-06-28 | 2009-12-31 | Oerlikon Leybold Vacuum Gmbh | Verfahren zum Reinigen von Vakuumpumpen |
DE102008053522A1 (de) * | 2008-10-28 | 2010-04-29 | Oerlikon Leybold Vacuum Gmbh | Verfahren zum Reinigen einer Vakuumpumpe |
DE102011005464B4 (de) * | 2011-03-11 | 2014-07-17 | Fmp Technology Gmbh Fluid Measurements & Projects | Vorrichtung zur Erzeugung eines Unterdrucks |
JP6100038B2 (ja) * | 2013-03-14 | 2017-03-22 | 株式会社荏原製作所 | 真空ポンプ |
DE102015118022B4 (de) * | 2015-10-22 | 2024-05-29 | Pfeiffer Vacuum Gmbh | Rotationsverdrängervakuumpumpe |
DE102015121143B4 (de) * | 2015-12-04 | 2023-02-02 | Pfeiffer Vacuum Gmbh | Mehrwellige Vakuumpumpe |
DE202016005209U1 (de) | 2016-08-30 | 2017-12-01 | Leybold Gmbh | Schraubenvakuumpumpe |
DE102016216279A1 (de) | 2016-08-30 | 2018-03-01 | Leybold Gmbh | Vakuumpumpen-Schraubenrotor |
JP7072417B2 (ja) * | 2018-03-27 | 2022-05-20 | 株式会社日立産機システム | スクリュー圧縮機 |
CN108775286A (zh) * | 2018-08-03 | 2018-11-09 | 深圳市石金科技股份有限公司 | 一种干式真空泵的清洁装置 |
KR102119071B1 (ko) * | 2018-11-22 | 2020-06-04 | (주)엘오티베큠 | 마모 발생을 방지하는 진공펌프 |
JP2021060003A (ja) * | 2019-10-07 | 2021-04-15 | 株式会社日立産機システム | スクリュー圧縮機 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2835260A1 (de) * | 1978-08-11 | 1980-02-14 | Pfeiffer Vakuumtechnik | Verfahren und einrichtung zum schutz der vakuumpumpe gegen reaktionsprodukte beim lpcvd-verfahren |
DD143172A1 (de) * | 1979-05-17 | 1980-08-06 | Rainer Moeller | Verfahren zum abpumpen von hochreaktiven oder toxischen gasen oder daempfen mittels drehschiebervakuumpumpen |
EP0344345B1 (de) * | 1988-06-01 | 1991-09-18 | Leybold Aktiengesellschaft | Pumpsystem für ein Lecksuchgerät |
NL9200076A (nl) * | 1992-01-16 | 1993-08-16 | Leybold B V | Werkwijze, droge meertrapspomp en plasmascrubber voor het omvormen van reactieve gassen. |
JP3402039B2 (ja) * | 1995-12-25 | 2003-04-28 | 信越半導体株式会社 | 単結晶製造装置 |
JP3603578B2 (ja) * | 1997-12-27 | 2004-12-22 | 信越半導体株式会社 | 単結晶引上げ装置の不活性ガス回収装置 |
FR2783883B1 (fr) | 1998-09-10 | 2000-11-10 | Cit Alcatel | Procede et dispositif pour eviter les depots dans une pompe turbomoleculaire a palier magnetique ou gazeux |
DE19854235A1 (de) * | 1998-11-24 | 2000-05-25 | Wacker Siltronic Halbleitermat | Oxidationsvorrichtung und Verfahren zur Passivierung von Stäuben |
DE29904411U1 (de) * | 1999-03-10 | 2000-07-20 | GHH-RAND Schraubenkompressoren GmbH & Co. KG, 46145 Oberhausen | Schraubenkompressor |
JP2002316889A (ja) * | 2001-04-18 | 2002-10-31 | Sumitomo Mitsubishi Silicon Corp | 排ガス配管内付着物の除去方法、及び単結晶引き上げ装置 |
US6685803B2 (en) * | 2001-06-22 | 2004-02-03 | Applied Materials, Inc. | Plasma treatment of processing gases |
EP2267313B1 (de) * | 2002-10-14 | 2014-10-01 | Edwards Limited | Reinigungsverfaren einer drehkolbenvakuumpumpe |
KR20060087599A (ko) | 2003-10-21 | 2006-08-02 | 나부테스코 가부시키가이샤 | 회전식 드라이 진공 펌프 |
FR2863103B1 (fr) * | 2003-12-01 | 2006-07-14 | Cit Alcatel | Systeme de traitement des gaz par plasma integre dans une pompe a vide |
GB0406748D0 (en) * | 2004-03-26 | 2004-04-28 | Boc Group Plc | Vacuum pump |
DE102004063058A1 (de) * | 2004-12-22 | 2006-07-13 | Leybold Vacuum Gmbh | Verfahren zum Reinigen einer Vakuum-Schraubenpumpe |
GB0525136D0 (en) * | 2005-12-09 | 2006-01-18 | Boc Group Plc | Method of inhibiting a deflagration in a vacuum pump |
-
2006
- 2006-08-23 DE DE200610039529 patent/DE102006039529A1/de not_active Withdrawn
-
2007
- 2007-08-07 RU RU2009110263/06A patent/RU2009110263A/ru not_active Application Discontinuation
- 2007-08-07 EP EP20070788296 patent/EP2054626B1/de not_active Not-in-force
- 2007-08-07 JP JP2009525006A patent/JP2010501766A/ja active Pending
- 2007-08-07 CN CN200780031239.3A patent/CN101535651B/zh not_active Expired - Fee Related
- 2007-08-07 US US12/438,220 patent/US20100086883A1/en not_active Abandoned
- 2007-08-07 WO PCT/EP2007/058199 patent/WO2008022916A1/de active Application Filing
Non-Patent Citations (1)
Title |
---|
See references of WO2008022916A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2008022916A1 (de) | 2008-02-28 |
DE102006039529A1 (de) | 2008-03-06 |
CN101535651B (zh) | 2014-05-14 |
RU2009110263A (ru) | 2010-09-27 |
CN101535651A (zh) | 2009-09-16 |
JP2010501766A (ja) | 2010-01-21 |
US20100086883A1 (en) | 2010-04-08 |
EP2054626B1 (de) | 2012-12-05 |
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