JP2010501766A - 真空ポンプ装置で自己点火する粉塵を反応させるための方法 - Google Patents
真空ポンプ装置で自己点火する粉塵を反応させるための方法 Download PDFInfo
- Publication number
- JP2010501766A JP2010501766A JP2009525006A JP2009525006A JP2010501766A JP 2010501766 A JP2010501766 A JP 2010501766A JP 2009525006 A JP2009525006 A JP 2009525006A JP 2009525006 A JP2009525006 A JP 2009525006A JP 2010501766 A JP2010501766 A JP 2010501766A
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- JP
- Japan
- Prior art keywords
- vacuum pump
- pump device
- oxygen
- supply
- dust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
- F04C28/28—Safety arrangements; Monitoring
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
- F04C29/0092—Removing solid or liquid contaminants from the gas under pumping, e.g. by filtering or deposition; Purging; Scrubbing; Cleaning
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D3/00—Axial-flow pumps
- F04D3/02—Axial-flow pumps of screw type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
- F04C18/16—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/10—Vacuum
- F04C2220/12—Dry running
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2280/00—Arrangements for preventing or removing deposits or corrosion
- F04C2280/02—Preventing solid deposits in pumps, e.g. in vacuum pumps with chemical vapour deposition [CVD] processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/85978—With pump
- Y10T137/85986—Pumped fluid control
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims (9)
- ドライ真空ポンプ装置で自己点火する粉塵を完全に反応させるための方法において、
前記真空ポンプ装置の作動中に、酸素を前記真空ポンプ装置に一回分ずつに分けて連続的に供給し、それによって前記粉塵(40)の酸化を生じさせることを特徴とする方法。 - 前記酸素の供給を、前記真空ポンプ装置の入口(20)で、又は前記真空ポンプ装置の供給ラインで行うことを特徴とする請求項1に記載の方法。
- 前記酸素の供給を、前記真空ポンプ装置の圧縮室(24)に沿って行うことを特徴とする請求項1又は2に記載の方法。
- 前記酸素の供給を、少なくとも2室の圧縮室に沿って、又は該圧縮室の間で行うことを特徴とする請求項1又は2に記載の方法。
- 前記酸素の供給を、前記真空ポンプ装置の出口(22)又は排出ラインで行うことを特徴とする請求項1乃至4のいずれかに記載の方法。
- 前記酸素の供給を、設定可能な又は制御可能な絞り弁(28)を通して行うことを特徴とする請求項1乃至5のいずれかに記載の方法。
- 前記真空ポンプ装置及び前記供給ラインを洗浄して粉塵を除去し、粉塵を完全に反応させるために、凝縮用の処理ガス(38)の供給を終了し、前記ポンプ装置による酸素含有気体混合物、例えば空気の供給を継続することを特徴とする請求項1乃至6のいずれかに記載の方法。
- 少なくとも1つの従動圧縮部材と、ポンプ入口(20)及びポンプ出口(22)を有するハウジング(10)とを備えたドライ真空ポンプ装置において、
前記ハウジング(10)又は該ハウジングに接続されているラインのいずれかは、その断面積を調整するための絞り弁(28)を備えた少なくとも1つの気体及び酸素吸込口(26,26a,26b)を含むことを特徴とする真空ポンプ装置。 - 酸化の反応を監視するための手段を備え、該手段は、好ましくは酸化が行なわれる室の温度センサ又は圧力センサの形であることを特徴とする請求項8に記載の真空ポンプ装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200610039529 DE102006039529A1 (de) | 2006-08-23 | 2006-08-23 | Verfahren zur Abreaktion selbstentzündlicher Stäube in einer Vakuumpumpvorrichtung |
PCT/EP2007/058199 WO2008022916A1 (de) | 2006-08-23 | 2007-08-07 | Verfahren zur abreaktion selbstentzündlicher stäube in einer vakuumpumpvorrichtung |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2010501766A true JP2010501766A (ja) | 2010-01-21 |
Family
ID=38792066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009525006A Pending JP2010501766A (ja) | 2006-08-23 | 2007-08-07 | 真空ポンプ装置で自己点火する粉塵を反応させるための方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100086883A1 (ja) |
EP (1) | EP2054626B1 (ja) |
JP (1) | JP2010501766A (ja) |
CN (1) | CN101535651B (ja) |
DE (1) | DE102006039529A1 (ja) |
RU (1) | RU2009110263A (ja) |
WO (1) | WO2008022916A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014177891A (ja) * | 2013-03-14 | 2014-09-25 | Ebara Corp | 真空ポンプ |
JP2019173590A (ja) * | 2018-03-27 | 2019-10-10 | 株式会社日立産機システム | スクリュー圧縮機 |
KR20200060267A (ko) * | 2018-11-22 | 2020-05-29 | (주)엘오티베큠 | 마모 발생을 방지하는 진공펌프 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0406748D0 (en) * | 2004-03-26 | 2004-04-28 | Boc Group Plc | Vacuum pump |
DE102007043350B3 (de) * | 2007-09-12 | 2009-05-28 | Oerlikon Leybold Vacuum Gmbh | Vakuumpumpe sowie Verfahren zur Steuerung einer Gasballastzufuhr zu einer Vakuumpumpe |
DE102008030788A1 (de) * | 2008-06-28 | 2009-12-31 | Oerlikon Leybold Vacuum Gmbh | Verfahren zum Reinigen von Vakuumpumpen |
DE102008053522A1 (de) * | 2008-10-28 | 2010-04-29 | Oerlikon Leybold Vacuum Gmbh | Verfahren zum Reinigen einer Vakuumpumpe |
DE102011005464B4 (de) * | 2011-03-11 | 2014-07-17 | Fmp Technology Gmbh Fluid Measurements & Projects | Vorrichtung zur Erzeugung eines Unterdrucks |
DE102015118022B4 (de) * | 2015-10-22 | 2024-05-29 | Pfeiffer Vacuum Gmbh | Rotationsverdrängervakuumpumpe |
DE102015121143B4 (de) * | 2015-12-04 | 2023-02-02 | Pfeiffer Vacuum Gmbh | Mehrwellige Vakuumpumpe |
DE202016005209U1 (de) | 2016-08-30 | 2017-12-01 | Leybold Gmbh | Schraubenvakuumpumpe |
DE102016216279A1 (de) | 2016-08-30 | 2018-03-01 | Leybold Gmbh | Vakuumpumpen-Schraubenrotor |
CN108775286A (zh) * | 2018-08-03 | 2018-11-09 | 深圳市石金科技股份有限公司 | 一种干式真空泵的清洁装置 |
JP2021060003A (ja) * | 2019-10-07 | 2021-04-15 | 株式会社日立産機システム | スクリュー圧縮機 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH09175881A (ja) * | 1995-12-25 | 1997-07-08 | Shin Etsu Handotai Co Ltd | 単結晶製造装置 |
JPH11199388A (ja) * | 1997-12-27 | 1999-07-27 | Shin Etsu Handotai Co Ltd | 単結晶引上げ装置の不活性ガス回収装置 |
JP2000159597A (ja) * | 1998-11-24 | 2000-06-13 | Wacker Siltronic G Fuer Halbleitermaterialien Ag | 燃焼性の冶金粉末の不動態化のための方法および酸化装置 |
JP2002316889A (ja) * | 2001-04-18 | 2002-10-31 | Sumitomo Mitsubishi Silicon Corp | 排ガス配管内付着物の除去方法、及び単結晶引き上げ装置 |
Family Cites Families (13)
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DE2835260A1 (de) * | 1978-08-11 | 1980-02-14 | Pfeiffer Vakuumtechnik | Verfahren und einrichtung zum schutz der vakuumpumpe gegen reaktionsprodukte beim lpcvd-verfahren |
DD143172A1 (de) * | 1979-05-17 | 1980-08-06 | Rainer Moeller | Verfahren zum abpumpen von hochreaktiven oder toxischen gasen oder daempfen mittels drehschiebervakuumpumpen |
EP0344345B1 (de) * | 1988-06-01 | 1991-09-18 | Leybold Aktiengesellschaft | Pumpsystem für ein Lecksuchgerät |
NL9200076A (nl) * | 1992-01-16 | 1993-08-16 | Leybold B V | Werkwijze, droge meertrapspomp en plasmascrubber voor het omvormen van reactieve gassen. |
FR2783883B1 (fr) * | 1998-09-10 | 2000-11-10 | Cit Alcatel | Procede et dispositif pour eviter les depots dans une pompe turbomoleculaire a palier magnetique ou gazeux |
DE29904411U1 (de) * | 1999-03-10 | 2000-07-20 | GHH-RAND Schraubenkompressoren GmbH & Co. KG, 46145 Oberhausen | Schraubenkompressor |
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KR101151954B1 (ko) * | 2002-10-14 | 2012-06-01 | 에드워즈 리미티드 | 진공 펌프, 화학 증착 장치, 진공 펌프 내의 퇴적물 관리 방법, 진공 펌프 기구 내의 퇴적물 관리 방법 및 컴퓨터 판독가능한 저장 매체 |
KR20060087599A (ko) | 2003-10-21 | 2006-08-02 | 나부테스코 가부시키가이샤 | 회전식 드라이 진공 펌프 |
FR2863103B1 (fr) * | 2003-12-01 | 2006-07-14 | Cit Alcatel | Systeme de traitement des gaz par plasma integre dans une pompe a vide |
GB0406748D0 (en) * | 2004-03-26 | 2004-04-28 | Boc Group Plc | Vacuum pump |
DE102004063058A1 (de) * | 2004-12-22 | 2006-07-13 | Leybold Vacuum Gmbh | Verfahren zum Reinigen einer Vakuum-Schraubenpumpe |
GB0525136D0 (en) * | 2005-12-09 | 2006-01-18 | Boc Group Plc | Method of inhibiting a deflagration in a vacuum pump |
-
2006
- 2006-08-23 DE DE200610039529 patent/DE102006039529A1/de not_active Withdrawn
-
2007
- 2007-08-07 WO PCT/EP2007/058199 patent/WO2008022916A1/de active Application Filing
- 2007-08-07 RU RU2009110263/06A patent/RU2009110263A/ru not_active Application Discontinuation
- 2007-08-07 JP JP2009525006A patent/JP2010501766A/ja active Pending
- 2007-08-07 CN CN200780031239.3A patent/CN101535651B/zh not_active Expired - Fee Related
- 2007-08-07 EP EP20070788296 patent/EP2054626B1/de not_active Not-in-force
- 2007-08-07 US US12/438,220 patent/US20100086883A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH09175881A (ja) * | 1995-12-25 | 1997-07-08 | Shin Etsu Handotai Co Ltd | 単結晶製造装置 |
JPH11199388A (ja) * | 1997-12-27 | 1999-07-27 | Shin Etsu Handotai Co Ltd | 単結晶引上げ装置の不活性ガス回収装置 |
JP2000159597A (ja) * | 1998-11-24 | 2000-06-13 | Wacker Siltronic G Fuer Halbleitermaterialien Ag | 燃焼性の冶金粉末の不動態化のための方法および酸化装置 |
JP2002316889A (ja) * | 2001-04-18 | 2002-10-31 | Sumitomo Mitsubishi Silicon Corp | 排ガス配管内付着物の除去方法、及び単結晶引き上げ装置 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014177891A (ja) * | 2013-03-14 | 2014-09-25 | Ebara Corp | 真空ポンプ |
JP2019173590A (ja) * | 2018-03-27 | 2019-10-10 | 株式会社日立産機システム | スクリュー圧縮機 |
JP7072417B2 (ja) | 2018-03-27 | 2022-05-20 | 株式会社日立産機システム | スクリュー圧縮機 |
KR20200060267A (ko) * | 2018-11-22 | 2020-05-29 | (주)엘오티베큠 | 마모 발생을 방지하는 진공펌프 |
KR102119071B1 (ko) * | 2018-11-22 | 2020-06-04 | (주)엘오티베큠 | 마모 발생을 방지하는 진공펌프 |
Also Published As
Publication number | Publication date |
---|---|
RU2009110263A (ru) | 2010-09-27 |
CN101535651B (zh) | 2014-05-14 |
DE102006039529A1 (de) | 2008-03-06 |
CN101535651A (zh) | 2009-09-16 |
EP2054626B1 (de) | 2012-12-05 |
EP2054626A1 (de) | 2009-05-06 |
US20100086883A1 (en) | 2010-04-08 |
WO2008022916A1 (de) | 2008-02-28 |
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