EP2009648B1 - Dispositif de chauffage et/ou de refroidissement doté de plusieurs couches - Google Patents

Dispositif de chauffage et/ou de refroidissement doté de plusieurs couches Download PDF

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Publication number
EP2009648B1
EP2009648B1 EP20080015360 EP08015360A EP2009648B1 EP 2009648 B1 EP2009648 B1 EP 2009648B1 EP 20080015360 EP20080015360 EP 20080015360 EP 08015360 A EP08015360 A EP 08015360A EP 2009648 B1 EP2009648 B1 EP 2009648B1
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EP
European Patent Office
Prior art keywords
electrically conductive
spraying
layer
resistive layer
heated plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
EP20080015360
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German (de)
English (en)
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EP2009648A1 (fr
Inventor
Elias Russegger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Watlow Electric Manufacturing Co
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Watlow Electric Manufacturing Co
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Application filed by Watlow Electric Manufacturing Co filed Critical Watlow Electric Manufacturing Co
Publication of EP2009648A1 publication Critical patent/EP2009648A1/fr
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/01—Selective coating, e.g. pattern coating, without pre-treatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/14—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying for coating elongate material
    • C23C4/16—Wires; Tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H1/00—Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters
    • F24H1/10—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium
    • F24H1/12—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium
    • F24H1/14—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium by tubes, e.g. bent in serpentine form
    • F24H1/142—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium by tubes, e.g. bent in serpentine form using electric energy supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/245—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by mechanical means, e.g. sand blasting, cutting, ultrasonic treatment
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/42—Heating elements having the shape of rods or tubes non-flexible
    • H05B3/46—Heating elements having the shape of rods or tubes non-flexible heating conductor mounted on insulating base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49083—Heater type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base

Definitions

  • the invention initially relates to a tubular water heater and a heating plate.
  • a heating element which is produced by applying band-shaped layers of an electrically conductive and a resistance-forming material on surfaces of a substrate by means of arc sputtering or by plasma spraying.
  • a release liner is previously applied to the substrate by means of a printing process.
  • the separating layer is made of such a material that, at those points of the substrate on which the separating layer is present, the electrically conductive material not clinging.
  • the known method has the disadvantage that it is relatively complicated and therefore the parts with the electrically conductive resistance layers are relatively expensive. In addition, only more or less flat parts can be provided with an electrically conductive layer with the known method.
  • a rotating cylindrical heating roller known as part of a copying machine to thermally fix copied pages.
  • a heating element is produced by means of a laser ablation from an initially fully cylindrical resistive layer, which receives a spiral structure.
  • the electrically conductive material of which the resistance layer is made is applied flat and generally uniformly on the non-conductive substrate.
  • the application by means of thermal spraying ensures a high adhesion of the electrically conductive material on the non-conductive surface.
  • a variety of materials can be applied quickly and very evenly in this way on the non-conductive substrate.
  • the instantaneous water heater according to the invention and the heating plate according to the invention are particularly inexpensive to produce and white on a small thickness.
  • their heating layers may have a complex geometry which is adapted to the individual conditions of use, in particular to the fluid or part to be heated.
  • the invention is advantageously also suitable for heating those parts or media which do not tolerate uniform heating on their surface or which are dependent on particularly uniform heating.
  • the partial removal of the material layer can be effected by means of laser radiation or by means of a water jet or by means of a powder sandblast.
  • the material When using laser radiation, the material is heated so much that it evaporates.
  • the use of a laser beam has the advantage that with him very quickly very high energies can be coupled into the electrically conductive material, so that it evaporates immediately.
  • This instantaneous evaporation of the electrically conductive material ensures that only comparatively little heat is coupled into the substrate present under the electrically conductive material. This is therefore not damaged in the method according to the invention.
  • the evaporation has the advantage over incineration that essentially no residues in the evaporated areas on the ground remain so their insulation is very good.
  • the electrical resistance of the electrically conductive resistance layer can be detected at least indirectly. In this way, a precise quality control is already possible during the production of the electrically conductive layer.
  • an actual value of the electrical resistance of the electrically conductive resistance layer can be compared with a setpoint value, and the electrical resistance of the electrically conductive layer can be changed in such a way by removal of additional electrically conductive material in regions. that the difference between the actual value and the setpoint is reduced.
  • Such deviations may, for example, be caused by the fact that different amounts of the electrically conductive material reach the substrate during spraying of the thermally conductive material so that the resulting electrically conductive layer has a different thickness at one point than at another location.
  • deviations of the actual value of the electrical resistance of the electrically conductive layer from the desired value can be compensated for with an accuracy of +/- 1%.
  • the partial removal of additional electrically conductive material may include a shortening or lengthening of the electrically conductive layer and / or the variation of the width of the electrically conductive layer.
  • the detection of the actual value of the electrical resistance of the electrically conductive resistance layer and the reduction of the difference between the actual value and the desired value can take place in parallel. This is possible since the electrical resistance of the electrically conductive layer can already be measured during the processing of the electrically conductive layer by means of laser radiation. If this method according to the invention is used, time and thus money can be saved in the production of the electrically conductive resistance layer.
  • the material layer can be removed in such a way that At least one point of the electrically conductive layer is formed a desired melting point in the sense of a fuse.
  • Such an integrated fuse increases the safety when using the electrically conductive resistance layer.
  • the fuse can be integrated into the electrically conductive resistance layer virtually without additional costs and additional time.
  • the material layer can be removed in such a way that the electrically conductive resistance layer is at least partially meandering. This allows the formation of the longest electrically conductive resistive layer on a small area.
  • a non-conductive intermediate layer may be applied thereto, then an electrically conductive material may be applied by means of thermal spraying to the non-conductive intermediate layer in such a way that a material layer formed therefrom substantially initially still has no desired shape, and then the material layer are partially removed by means of laser radiation such that a second electrically conductive layer is formed, which has the desired shape.
  • an electrically conductive material may be applied by means of thermal spraying to the non-conductive intermediate layer in such a way that a material layer formed therefrom substantially initially still has no desired shape, and then the material layer are partially removed by means of laser radiation such that a second electrically conductive layer is formed, which has the desired shape.
  • the electrically conductive material preferably comprises bismuth, tellurium, germanium, silicon and / or gallium arsenide. These materials have proved to be particularly favorable for the application by means of thermal spraying and the subsequent processing by means of laser radiation. In addition, with these materials, the relevant known technical effects can be realized.
  • the local electrical resistance of the electrically conductive resistance layer can be adjusted by a local heat treatment. By heating locally oxides can be registered in the layer, which has an effect on the local electrical conductivity of the material. This allows a special precise and fine adjustment of the electrical resistance.
  • the electrically conductive resistance layer is sealed.
  • This has advantages in particular with a porous substrate (for example metal with Al 2 O 3 intermediate layer). Sealing reduces the risk of electrical breakdown due to humidity, especially at high voltage.
  • a material for sealing silicone, polyimide, or water glass the latter on sodium or potassium-based. The application can be done by dipping, spraying, brushing, etc. The seal of the seal is best when the sealant layer is applied under vacuum.
  • non-conductive substrate is also glass or glass ceramic in question.
  • the electrical resistance layer can be applied permanently, especially by plasma spraying.
  • the good insulating effect of glass makes grounding in the operation of the resistive layer superfluous.
  • special high-temperature glass such as Ceranglas (R).
  • FIG. 1 and 2 shows the production of a tubular water heater:
  • an electrically conductive material layer 14 is applied to a tube 12 made of a high-temperature resistant and an electrical insulator material ( Fig. 1 ).
  • the application takes place in the present exemplary embodiment by means of a device 16, with which germanium particles 18 are sprayed onto the tube 12.
  • the application is carried out by cold gas spraying (also "gas-dynamic Powder coatings called ").
  • the unmelted germanium particles are accelerated to speeds of about 300 - 1,200 m / s and sprayed onto the tube 12.
  • the germanium particles 18 and also the surface of the tube 12 deform.
  • the impact breaks up surface oxides on the surface of the tube 12. Micro-friction due to the impact increases the temperature at the contact surface and leads to micro-welds.
  • the acceleration of the germanium particles 18 takes place by means of a delivery gas, the temperature of which can be slightly increased.
  • the germanium powder 18 never reaches its melting temperature, the temperatures arising on the surface of the tube 12 are relatively moderate, so that, for example, a comparatively inexpensive plastic material can be used for the tube 12.
  • plasma spraying, high-speed flame spraying, arc spraying, autogenous spraying or laser spraying for applying the electrically conductive material to the substrate can also be used instead of the cold gas spraying.
  • germanium, bismuth, tellurium, silicon and / or gallium arsenide are also suitable, depending on the desired technical effect.
  • the coating of the tube 12 with the germanium particles 18 is carried out initially so that gradually the entire surface of the tube 12 is covered with the germanium material layer 14 (see. Fig.1 ).
  • this material layer 14 does not yet have the desired shape:
  • an electrically conductive resistance layer must be made, which extends in the manner of a spiral in the circumferential direction around the tube 12. This will, as out Fig. 2 It can be seen, by means of a laser device 20, a laser beam 22 so directed to the still "shapeless" material layer 14 that a spirally around the tube 12 extending portion 24 is created in which the sprayed electrically conductive material 14 is no longer present.
  • the laser device 20 on the one hand and a device, not shown in the figure, with which the tube 12 is held, are thereby moved so that a continuous working process by the laser device 20 is possible.
  • the actual electrical resistance WIST (see. Fig. 5 ) of the electrically conductive resistance layer 26 is less than the desired per se electrical resistance WSOLL.
  • the in Fig. 4 The lower connecting region 34 of the electrically conductive resistance layer 26 is therefore processed by the laser beam so that its width decreases, so that additional material is evaporated.
  • the electrically conductive resistance layer 26 extends by a dimension d1 (cf. Fig. 4 and 5 ) and, as a result, the actual electrical resistance WIST increases until it approximately corresponds to the desired resistance WSOLL.
  • the final position of the boundary line of the lower electrical connection 34 carries in Fig. 4 the reference numeral 42.
  • the electrically insulating intermediate layer 46 is applied in the further course of the manufacturing process. Then the process described above is repeated, i. H. again electrically conductive material is applied by means of thermal spraying onto the non-conductive intermediate layer 46 in such a way that a second material layer formed therefrom substantially does not yet have the desired shape. This is then processed by laser radiation and partially evaporated (reference numeral 24b) such that a second electrically conductive resistance layer (26b) is formed in the desired shape.
  • the material of the electrically conductive layer is selected such that instead of an electrical heating layer, an electrical cooling layer is formed.
  • the temperature of the heating layer is monitored by a ceramic switch.
  • a ceramic switch This is understood to mean a non-mechanical switch which has an element whose conductivity depends to a considerable extent on its temperature.
  • a bimetal switch can be used.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • General Engineering & Computer Science (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Resistance Heating (AREA)
  • Laser Beam Processing (AREA)
  • Conductive Materials (AREA)

Claims (12)

  1. Dispositif de chauffage tubulaire à écoulement libre (28), comportant plusieurs couches qui ont été déposées par projection thermique, lesdites couches comportant un substrat (12) tubulaire non conducteur, une couche résistive (26; 26a; 26b) électroconductrice et une couche électro-isolante (46), la couche résistive (26; 26a; 26b) électroconductrice étant déposée sur le substrat (12) tubulaire non conducteur et comportant un matériau électroconducteur (14), qui est d'abord appliqué par projection plasma, projection par flamme supersonique, projection à l'arc électrique, projection autogène, projection laser ou projection à froid et qui est éliminé ensuite par zones pour réaliser une forme souhaitée, et la couche électro-isolante (46) est déposée sur la couche résistive (26; 26a; 26b) électroconductrice.
  2. Plaque chauffante (28) comportant plusieurs couches qui ont été déposées par projection thermique, lesdites couches comportant un substrat (12) non conducteur, une couche résistive (26; 26a; 26b) électroconductrice et une couche électro-isolante (46), la couche résistive (26; 26a; 26b) électroconductrice étant déposée sur le substrat (12) non conducteur et comportant un matériau électroconducteur (14), qui est d'abord appliqué par projection plasma, projection par flamme supersonique, projection à l'arc électrique, projection autogène, projection laser ou projection à froid et qui est éliminé ensuite par zones pour réaliser une forme souhaitée, et la couche électro-isolante (46) est déposée sur la couche résistive (26; 26a; 26b) électroconductrice.
  3. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon la revendication 1, caractérisé en ce qu'il/elle comporte plusieurs couches résistives (26; 26a; 26b) électroconductrices, qui sont séparées par un nombre correspondant de couches intermédiaires (46) non conductrices.
  4. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce que le substrat (12) non conducteur est un matériau en verre.
  5. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce que la couche résistive (26; 26a 26b) électroconductrice est réalisée dans un matériau contenant du bismuth, du tellure, du germanium, du silicium et/ou de l'arséniure de gallium.
  6. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce que les zones de matériau électroconducteur (14) ont été éliminées au moyen d'un laser et/ou d'un jet d'eau et/ou d'un jet de sable et poudre.
  7. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce que les zones de matériau électroconducteur (14) ont été éliminées au moyen d'un laser, de telle sorte qu'il ne subsiste aucun résidu dans les zones éliminées.
  8. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce que la couche résistive (26) électroconductrice comporte, sur la surface de contact, des microsoudures des particules déposées par projection thermique, qui ont été générées par une montée de la température due à l'impact.
  9. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce que la taille de la zone (24) de la couche résistive (26; 26a; 26b) électroconductrice éliminée est agrandie pour définir une densité de flux thermique.
  10. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce qu'il/elle comporte un commutateur céramique qui contrôle la température de la couche résistive (26; 26a; 26b) électroconductrice.
  11. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce que l'épaisseur de la couche résistive (26; 26a; 26b) électroconductrice obtenue varie d'un emplacement à l'autre.
  12. Dispositif de chauffage tubulaire à écoulement libre ou plaque chauffante (28) selon l'une quelconque des revendications précédentes, caractérisé en ce qu'au moins une zone de la couche résistive électroconductrice comporte une zone destinée à la fusion dans le sens d'un coupe-circuit.
EP20080015360 2001-12-19 2002-12-16 Dispositif de chauffage et/ou de refroidissement doté de plusieurs couches Revoked EP2009648B1 (fr)

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DE10162276.7A DE10162276C5 (de) 2001-12-19 2001-12-19 Rohrförmiger Durchlauferhitzer und Heizplatte sowie Verfahren zu deren Herstellung
EP02796639A EP1459332B1 (fr) 2001-12-19 2002-12-16 Procede pour produire une couche resistive electroconductrice et dispositif de chauffage et/ou de refroidissement

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DE10162276B4 (de) 2015-07-16
DE10162276A1 (de) 2003-07-17
WO2003052776A3 (fr) 2004-03-04
US9029742B2 (en) 2015-05-12
US20050025470A1 (en) 2005-02-03
EP2009648A1 (fr) 2008-12-31
US20130260048A1 (en) 2013-10-03
PT2009648E (pt) 2014-03-25
US9758854B2 (en) 2017-09-12
ES2314125T3 (es) 2009-03-16
EP1459332B1 (fr) 2008-11-12
CA2471268C (fr) 2007-07-17
EP1459332A2 (fr) 2004-09-22
US7361869B2 (en) 2008-04-22
ATE414321T1 (de) 2008-11-15
DE10162276C5 (de) 2019-03-14
CA2471268A1 (fr) 2003-06-26
US20060108354A1 (en) 2006-05-25
ES2452325T3 (es) 2014-03-31
DE50213016D1 (de) 2008-12-24
PT1459332E (pt) 2008-12-29
WO2003052776A2 (fr) 2003-06-26
US20150267288A1 (en) 2015-09-24

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