EP1947705A4 - LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME - Google Patents

LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME

Info

Publication number
EP1947705A4
EP1947705A4 EP06798408A EP06798408A EP1947705A4 EP 1947705 A4 EP1947705 A4 EP 1947705A4 EP 06798408 A EP06798408 A EP 06798408A EP 06798408 A EP06798408 A EP 06798408A EP 1947705 A4 EP1947705 A4 EP 1947705A4
Authority
EP
European Patent Office
Prior art keywords
light
emitting device
manufacturing same
manufacturing
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06798408A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1947705A1 (en
Inventor
Ryo Sakamoto
Masatoshi Iwata
Susumu Tsujikawa
Yoshiyuki Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Electronics Materials Co Ltd
Original Assignee
Dowa Electronics Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Electronics Materials Co Ltd filed Critical Dowa Electronics Materials Co Ltd
Publication of EP1947705A1 publication Critical patent/EP1947705A1/en
Publication of EP1947705A4 publication Critical patent/EP1947705A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
    • H01L33/145—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure with a current-blocking structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/025—Physical imperfections, e.g. particular concentration or distribution of impurities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/10—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
    • H01L33/105—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector with a resonant cavity structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26—Materials of the light emitting region
    • H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
    • H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0282—Passivation layers or treatments

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)
  • Semiconductor Lasers (AREA)
EP06798408A 2005-10-03 2006-09-28 LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME Withdrawn EP1947705A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005290591A JP4839478B2 (ja) 2005-10-03 2005-10-03 垂直共振器型発光ダイオード及びその製造方法
PCT/JP2006/319360 WO2007040149A1 (ja) 2005-10-03 2006-09-28 発光素子及びその製造方法

Publications (2)

Publication Number Publication Date
EP1947705A1 EP1947705A1 (en) 2008-07-23
EP1947705A4 true EP1947705A4 (en) 2012-10-10

Family

ID=37906191

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06798408A Withdrawn EP1947705A4 (en) 2005-10-03 2006-09-28 LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME

Country Status (7)

Country Link
US (1) US8044439B2 (ko)
EP (1) EP1947705A4 (ko)
JP (1) JP4839478B2 (ko)
KR (2) KR101201377B1 (ko)
CN (1) CN101322256B (ko)
TW (1) TWI390763B (ko)
WO (1) WO2007040149A1 (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009021323A (ja) * 2007-07-11 2009-01-29 Dowa Electronics Materials Co Ltd 半導体発光素子
US8692286B2 (en) 2007-12-14 2014-04-08 Philips Lumileds Lighing Company LLC Light emitting device with bonded interface
JP2009246056A (ja) * 2008-03-30 2009-10-22 Dowa Electronics Materials Co Ltd 発光素子
CN101990714B (zh) * 2008-04-30 2012-11-28 Lg伊诺特有限公司 发光器件和用于制造发光器件的方法
JP4697272B2 (ja) 2008-07-18 2011-06-08 住友電気工業株式会社 Ｉｉｉ−ｖ族化合物半導体基板の製造方法およびエピタキシャルウエハの製造方法
JP2011009641A (ja) * 2009-06-29 2011-01-13 Toshiba Corp 半導体装置の製造方法及びインプリント用テンプレート
JP2011061083A (ja) * 2009-09-11 2011-03-24 Sony Corp 半導体レーザ
KR101798231B1 (ko) * 2010-07-05 2017-11-15 엘지이노텍 주식회사 발광 소자
DE102011117381A1 (de) * 2011-10-28 2013-05-02 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips
CN102709420B (zh) * 2012-06-21 2014-07-30 安徽三安光电有限公司 一种氮化镓基发光二极管
CN102709421B (zh) * 2012-06-21 2014-11-05 安徽三安光电有限公司 一种具有双反射层的氮化镓基发光二极管
TWI618268B (zh) 2012-12-07 2018-03-11 晶元光電股份有限公司 發光裝置
CN103872206B (zh) * 2012-12-14 2019-10-25 晶元光电股份有限公司 形成发光装置的制造方法及其所制成的发光装置
CN104064642B (zh) * 2014-07-04 2017-01-25 映瑞光电科技(上海)有限公司 垂直型led的制作方法
JP6527695B2 (ja) * 2014-12-22 2019-06-05 スタンレー電気株式会社 半導体発光装置
CN112151646B (zh) * 2019-06-28 2021-12-21 隆达电子股份有限公司 发光元件

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030001162A1 (en) * 2001-06-29 2003-01-02 Showa Denko K.K. Boron phosphide-based semiconductor device and production method thereof
JP2003198061A (ja) * 2001-12-27 2003-07-11 Ricoh Co Ltd 面発光型レーザ素子および面発光型レーザアレイおよび光インターコネクションシステムおよび光通信システム
US6735230B1 (en) * 1998-09-10 2004-05-11 Rohm, Co., Ltd Semiconductor luminous elements and semiconductor laser

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3406907B2 (ja) 1990-08-20 2003-05-19 株式会社東芝 半導体発光ダイオード
JP2738194B2 (ja) 1991-12-25 1998-04-08 日本電気株式会社 面発光集積素子とその製造方法
US5717226A (en) * 1996-09-18 1998-02-10 Industrial Technology Research Institute Light-emitting diodes and method of manufacturing the same
JP3783411B2 (ja) * 1997-08-15 2006-06-07 富士ゼロックス株式会社 表面発光型半導体レーザ
JP3499749B2 (ja) * 1998-06-30 2004-02-23 株式会社東芝 半導体発光素子及びその製造方法
JP2001044501A (ja) 1999-07-26 2001-02-16 Daido Steel Co Ltd 電流狭窄型面発光ダイオードおよびその製造方法
JP3638515B2 (ja) 2000-09-29 2005-04-13 株式会社東芝 垂直共振器型半導体発光素子
US6900069B2 (en) * 2001-03-09 2005-05-31 Seiko Epson Corporation Method of fabricating surface-emission type light-emitting device, surface-emitting semiconductor laser, method of fabricating the same, optical module and optical transmission device
JP2003008142A (ja) 2001-06-26 2003-01-10 Furukawa Electric Co Ltd:The 面発光型半導体レーザ素子
JP2004207586A (ja) * 2002-12-26 2004-07-22 Furukawa Electric Co Ltd:The 面発光型半導体レーザ素子及びその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6735230B1 (en) * 1998-09-10 2004-05-11 Rohm, Co., Ltd Semiconductor luminous elements and semiconductor laser
US20030001162A1 (en) * 2001-06-29 2003-01-02 Showa Denko K.K. Boron phosphide-based semiconductor device and production method thereof
JP2003198061A (ja) * 2001-12-27 2003-07-11 Ricoh Co Ltd 面発光型レーザ素子および面発光型レーザアレイおよび光インターコネクションシステムおよび光通信システム

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2007040149A1 *

Also Published As

Publication number Publication date
US8044439B2 (en) 2011-10-25
WO2007040149A1 (ja) 2007-04-12
KR20080074870A (ko) 2008-08-13
EP1947705A1 (en) 2008-07-23
JP2007103613A (ja) 2007-04-19
KR101201377B1 (ko) 2012-11-14
KR20110003588A (ko) 2011-01-12
CN101322256B (zh) 2011-08-31
CN101322256A (zh) 2008-12-10
TWI390763B (zh) 2013-03-21
JP4839478B2 (ja) 2011-12-21
US20090278163A1 (en) 2009-11-12
TW200723569A (en) 2007-06-16

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