EP1422725A3 - Reflektor für Röntgenstrahlung - Google Patents

Reflektor für Röntgenstrahlung Download PDF

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Publication number
EP1422725A3
EP1422725A3 EP03020837A EP03020837A EP1422725A3 EP 1422725 A3 EP1422725 A3 EP 1422725A3 EP 03020837 A EP03020837 A EP 03020837A EP 03020837 A EP03020837 A EP 03020837A EP 1422725 A3 EP1422725 A3 EP 1422725A3
Authority
EP
European Patent Office
Prior art keywords
reflector
cross
section
along
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP03020837A
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English (en)
French (fr)
Other versions
EP1422725B1 (de
EP1422725A2 (de
Inventor
Carsten Michaelsen
Michael Dahms
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
InCoaTec GmbH
Original Assignee
InCoaTec GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by InCoaTec GmbH filed Critical InCoaTec GmbH
Publication of EP1422725A2 publication Critical patent/EP1422725A2/de
Publication of EP1422725A3 publication Critical patent/EP1422725A3/de
Application granted granted Critical
Publication of EP1422725B1 publication Critical patent/EP1422725B1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Ein Reflektor (5) für Röntgenstrahlung (2, 3, 10, 11), welcher entlang eines ersten Querschnitts (13) in einer eine x-Richtung enthaltenden Ebene (XZ) nicht-kreisbogenförmig gekrümmt ist, wobei der Reflektor (5) auch entlang eines zweiten Querschnitts (14) in einer zur x-Richtung senkrechten Ebene (YZ) gekrümmt ist, ist dadurch gekennzeichnet, dass der Reflektor (5) entlang des zweiten Querschnitts (14) ebenfalls eine von einem Kreisbogen abweichende Krümmung aufweist. Dadurch wird das Design von Röntgenspiegeln und das Strahlprofil von reflektierter Röntgenstrahlung flexibilisiert, die Fertigung von Röntgenspiegeln erleichtert und dabei gleichzeitig ein hohes Reflexionsvermögen und gute Fokussierungseigenschaften von Röntgenspiegeln verfügbar.
EP03020837.5A 2002-11-20 2003-09-13 Reflektor für Röntgenstrahlung Expired - Fee Related EP1422725B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10254026 2002-11-20
DE10254026A DE10254026C5 (de) 2002-11-20 2002-11-20 Reflektor für Röntgenstrahlung

Publications (3)

Publication Number Publication Date
EP1422725A2 EP1422725A2 (de) 2004-05-26
EP1422725A3 true EP1422725A3 (de) 2009-04-29
EP1422725B1 EP1422725B1 (de) 2014-11-05

Family

ID=32185854

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03020837.5A Expired - Fee Related EP1422725B1 (de) 2002-11-20 2003-09-13 Reflektor für Röntgenstrahlung

Country Status (3)

Country Link
US (2) US20040096034A1 (de)
EP (1) EP1422725B1 (de)
DE (1) DE10254026C5 (de)

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US6825978B2 (en) * 2002-04-04 2004-11-30 Hypervision, Inc. High sensitivity thermal radiation detection with an emission microscope with room temperature optics
AU2003264670A1 (en) * 2002-06-19 2004-01-06 Xenocs Optical device for x-ray applications
WO2007016484A2 (en) * 2005-08-01 2007-02-08 The Research Foundation Of State University Of New York X-ray imaging systems employing point-focusing, curved monochromating optics
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US7706503B2 (en) * 2007-11-20 2010-04-27 Rigaku Innovative Technologies, Inc. X-ray optic with varying focal points
DE102009047179B8 (de) * 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
JP6322172B2 (ja) * 2015-09-11 2018-05-09 株式会社リガク Ｘ線小角光学系装置
CN116914228B (zh) * 2023-09-13 2024-04-12 厦门海辰储能科技股份有限公司 电芯、电池和用电设备

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EP0339713A1 (de) * 1988-04-20 1989-11-02 Koninklijke Philips Electronics N.V. Röntgen-Spektralphotometer mit zweifach gebogenem Kristall
WO1999043009A1 (en) * 1998-02-19 1999-08-26 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
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WO2002025258A1 (en) * 2000-09-22 2002-03-28 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
WO2002103710A2 (en) * 2001-06-19 2002-12-27 X-Ray Optical Systems, Inc. Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection

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DE4027285A1 (de) * 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
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US5646976A (en) 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
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US6014423A (en) * 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
JP3734366B2 (ja) * 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
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Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0339713A1 (de) * 1988-04-20 1989-11-02 Koninklijke Philips Electronics N.V. Röntgen-Spektralphotometer mit zweifach gebogenem Kristall
WO1999043009A1 (en) * 1998-02-19 1999-08-26 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
US6022114A (en) * 1998-05-01 2000-02-08 Nikon Corporation Anamorphic afocal beam shaping assembly
US20010028699A1 (en) * 2000-04-10 2001-10-11 Rigaku Corporation X-ray optical device and multilayer mirror for small angle scattering system
WO2002025258A1 (en) * 2000-09-22 2002-03-28 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
WO2002103710A2 (en) * 2001-06-19 2002-12-27 X-Ray Optical Systems, Inc. Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
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SUZUKI Y ET AL: "X-Ray focusing with elliptical Kirkpatrick-Baez mirror system", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO,JP, vol. 30, no. 5, 1 May 1991 (1991-05-01), pages 1127 - 1130, XP002436248, ISSN: 0021-4922 *

Also Published As

Publication number Publication date
DE10254026B4 (de) 2006-09-14
DE10254026C5 (de) 2009-01-29
US7242746B2 (en) 2007-07-10
DE10254026A1 (de) 2004-06-17
US20040096034A1 (en) 2004-05-20
EP1422725B1 (de) 2014-11-05
DE10254026B9 (de) 2007-04-19
US20060133569A1 (en) 2006-06-22
EP1422725A2 (de) 2004-05-26

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