EP1422725A3 - Reflector for X-rays - Google Patents
Reflector for X-rays Download PDFInfo
- Publication number
- EP1422725A3 EP1422725A3 EP03020837A EP03020837A EP1422725A3 EP 1422725 A3 EP1422725 A3 EP 1422725A3 EP 03020837 A EP03020837 A EP 03020837A EP 03020837 A EP03020837 A EP 03020837A EP 1422725 A3 EP1422725 A3 EP 1422725A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- reflector
- cross
- section
- along
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
Abstract
Ein Reflektor (5) für Röntgenstrahlung (2, 3, 10, 11), welcher entlang eines ersten Querschnitts (13) in einer eine x-Richtung enthaltenden Ebene (XZ) nicht-kreisbogenförmig gekrümmt ist, wobei der Reflektor (5) auch entlang eines zweiten Querschnitts (14) in einer zur x-Richtung senkrechten Ebene (YZ) gekrümmt ist, ist dadurch gekennzeichnet, dass der Reflektor (5) entlang des zweiten Querschnitts (14) ebenfalls eine von einem Kreisbogen abweichende Krümmung aufweist. Dadurch wird das Design von Röntgenspiegeln und das Strahlprofil von reflektierter Röntgenstrahlung flexibilisiert, die Fertigung von Röntgenspiegeln erleichtert und dabei gleichzeitig ein hohes Reflexionsvermögen und gute Fokussierungseigenschaften von Röntgenspiegeln verfügbar. A reflector (5) for X-radiation (2, 3, 10, 11) which is non-circularly curved along a first cross-section (13) in a plane containing an x-direction (XZ), the reflector (5) also along a second cross-section (14) is curved in a plane perpendicular to the x-direction (YZ) is characterized in that the reflector (5) along the second cross-section (14) also has a curvature deviating from a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates the fabrication of X-ray mirrors while providing high reflectivity and good focusing properties of X-ray mirrors.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10254026A DE10254026C5 (en) | 2002-11-20 | 2002-11-20 | Reflector for X-radiation |
DE10254026 | 2002-11-20 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1422725A2 EP1422725A2 (en) | 2004-05-26 |
EP1422725A3 true EP1422725A3 (en) | 2009-04-29 |
EP1422725B1 EP1422725B1 (en) | 2014-11-05 |
Family
ID=32185854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03020837.5A Expired - Fee Related EP1422725B1 (en) | 2002-11-20 | 2003-09-13 | Reflector for X-rays |
Country Status (3)
Country | Link |
---|---|
US (2) | US20040096034A1 (en) |
EP (1) | EP1422725B1 (en) |
DE (1) | DE10254026C5 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6825978B2 (en) * | 2002-04-04 | 2004-11-30 | Hypervision, Inc. | High sensitivity thermal radiation detection with an emission microscope with room temperature optics |
DE60308645T2 (en) * | 2002-06-19 | 2007-10-18 | Xenocs | OPTICAL ARRANGEMENT AND METHOD THEREFOR |
JP4994375B2 (en) * | 2005-08-01 | 2012-08-08 | ザ リサーチ ファウンデーション オブ ステート ユニバーシティ オブ ニューヨーク | X-ray imaging system using point focus curved monochromator optical body |
JP4278108B2 (en) * | 2006-07-07 | 2009-06-10 | 株式会社リガク | Ultra-small angle X-ray scattering measurement device |
US7555098B2 (en) * | 2007-05-02 | 2009-06-30 | HD Technologies Inc. | Method and apparatus for X-ray fluorescence analysis and detection |
US7920676B2 (en) * | 2007-05-04 | 2011-04-05 | Xradia, Inc. | CD-GISAXS system and method |
US7706503B2 (en) * | 2007-11-20 | 2010-04-27 | Rigaku Innovative Technologies, Inc. | X-ray optic with varying focal points |
DE102009047179B8 (en) * | 2009-11-26 | 2016-08-18 | Carl Zeiss Smt Gmbh | projection lens |
JP6322172B2 (en) * | 2015-09-11 | 2018-05-09 | 株式会社リガク | X-ray small angle optical system |
CN116914228B (en) * | 2023-09-13 | 2024-04-12 | 厦门海辰储能科技股份有限公司 | Battery cell, battery and electric equipment |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0339713A1 (en) * | 1988-04-20 | 1989-11-02 | Koninklijke Philips Electronics N.V. | X-ray spectrometer having a doubly curved crystal |
WO1999043009A1 (en) * | 1998-02-19 | 1999-08-26 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
US6022114A (en) * | 1998-05-01 | 2000-02-08 | Nikon Corporation | Anamorphic afocal beam shaping assembly |
US20010028699A1 (en) * | 2000-04-10 | 2001-10-11 | Rigaku Corporation | X-ray optical device and multilayer mirror for small angle scattering system |
WO2002025258A1 (en) * | 2000-09-22 | 2002-03-28 | X-Ray Optical Systems, Inc. | Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic |
WO2002103710A2 (en) * | 2001-06-19 | 2002-12-27 | X-Ray Optical Systems, Inc. | Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4525853A (en) * | 1983-10-17 | 1985-06-25 | Energy Conversion Devices, Inc. | Point source X-ray focusing device |
NL8501181A (en) * | 1985-04-24 | 1986-11-17 | Philips Nv | CRYSTAL FOR A ROENT GENAL ANALYSIS DEVICE. |
US4951304A (en) * | 1989-07-12 | 1990-08-21 | Adelphi Technology Inc. | Focused X-ray source |
DE4027285A1 (en) * | 1990-08-29 | 1992-03-05 | Zeiss Carl Fa | X-RAY MICROSCOPE |
DE4407278A1 (en) * | 1994-03-04 | 1995-09-07 | Siemens Ag | X-ray analyzer |
US5646976A (en) * | 1994-08-01 | 1997-07-08 | Osmic, Inc. | Optical element of multilayered thin film for X-rays and neutrons |
US5742658A (en) * | 1996-05-23 | 1998-04-21 | Advanced Micro Devices, Inc. | Apparatus and method for determining the elemental compositions and relative locations of particles on the surface of a semiconductor wafer |
US6014423A (en) * | 1998-02-19 | 2000-01-11 | Osmic, Inc. | Multiple corner Kirkpatrick-Baez beam conditioning optic assembly |
JP3734366B2 (en) * | 1998-03-20 | 2006-01-11 | 株式会社リガク | X-ray analyzer |
DE19833524B4 (en) * | 1998-07-25 | 2004-09-23 | Bruker Axs Gmbh | X-ray analyzer with gradient multilayer mirror |
US6285743B1 (en) * | 1998-09-14 | 2001-09-04 | Nikon Corporation | Method and apparatus for soft X-ray generation |
US6339634B1 (en) * | 1998-10-01 | 2002-01-15 | Nikon Corporation | Soft x-ray light source device |
US6014099A (en) * | 1998-11-09 | 2000-01-11 | The United States Of America As Represented By The Secretary Of The Army | Isar method to analyze radar cross sections |
US6389100B1 (en) * | 1999-04-09 | 2002-05-14 | Osmic, Inc. | X-ray lens system |
DE19932275B4 (en) * | 1999-07-06 | 2005-08-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for X-ray fluorescence analysis |
US6278764B1 (en) * | 1999-07-22 | 2001-08-21 | The Regents Of The Unviersity Of California | High efficiency replicated x-ray optics and fabrication method |
US6421417B1 (en) * | 1999-08-02 | 2002-07-16 | Osmic, Inc. | Multilayer optics with adjustable working wavelength |
JP3741411B2 (en) * | 1999-10-01 | 2006-02-01 | 株式会社リガク | X-ray focusing apparatus and X-ray apparatus |
US6317483B1 (en) * | 1999-11-29 | 2001-11-13 | X-Ray Optical Systems, Inc. | Doubly curved optical device with graded atomic planes |
US6606371B2 (en) * | 1999-12-20 | 2003-08-12 | Agere Systems Inc. | X-ray system |
JP2002006096A (en) * | 2000-06-23 | 2002-01-09 | Nikon Corp | Electromagnetic wave generating device, semiconductor manufacturing device using it, and manufacturing method therefor |
US6625251B2 (en) * | 2000-09-22 | 2003-09-23 | Ntt Advanced Technology Corporation | Laser plasma x-ray generation apparatus |
JP3762665B2 (en) * | 2001-07-03 | 2006-04-05 | 株式会社リガク | X-ray analyzer and X-ray supply device |
DE60308645T2 (en) * | 2002-06-19 | 2007-10-18 | Xenocs | OPTICAL ARRANGEMENT AND METHOD THEREFOR |
-
2002
- 2002-11-20 DE DE10254026A patent/DE10254026C5/en not_active Expired - Fee Related
-
2003
- 2003-09-13 EP EP03020837.5A patent/EP1422725B1/en not_active Expired - Fee Related
- 2003-10-29 US US10/695,504 patent/US20040096034A1/en not_active Abandoned
-
2005
- 2005-12-01 US US11/290,545 patent/US7242746B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0339713A1 (en) * | 1988-04-20 | 1989-11-02 | Koninklijke Philips Electronics N.V. | X-ray spectrometer having a doubly curved crystal |
WO1999043009A1 (en) * | 1998-02-19 | 1999-08-26 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
US6022114A (en) * | 1998-05-01 | 2000-02-08 | Nikon Corporation | Anamorphic afocal beam shaping assembly |
US20010028699A1 (en) * | 2000-04-10 | 2001-10-11 | Rigaku Corporation | X-ray optical device and multilayer mirror for small angle scattering system |
WO2002025258A1 (en) * | 2000-09-22 | 2002-03-28 | X-Ray Optical Systems, Inc. | Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic |
WO2002103710A2 (en) * | 2001-06-19 | 2002-12-27 | X-Ray Optical Systems, Inc. | Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection |
Non-Patent Citations (2)
Title |
---|
COHEN L M: "Optimum shape of a Kirkpatrick-Baez X-ray reflector supported at discrete points for on-axis performance", APPLIED OPTICS USA, vol. 20, no. 9, 1 May 1981 (1981-05-01), pages 1545 - 1549, XP002519451, ISSN: 0003-6935 * |
SUZUKI Y ET AL: "X-Ray focusing with elliptical Kirkpatrick-Baez mirror system", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO,JP, vol. 30, no. 5, 1 May 1991 (1991-05-01), pages 1127 - 1130, XP002436248, ISSN: 0021-4922 * |
Also Published As
Publication number | Publication date |
---|---|
EP1422725A2 (en) | 2004-05-26 |
US20060133569A1 (en) | 2006-06-22 |
EP1422725B1 (en) | 2014-11-05 |
DE10254026B4 (en) | 2006-09-14 |
US20040096034A1 (en) | 2004-05-20 |
DE10254026B9 (en) | 2007-04-19 |
DE10254026A1 (en) | 2004-06-17 |
US7242746B2 (en) | 2007-07-10 |
DE10254026C5 (en) | 2009-01-29 |
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