EP1422725A3 - Réflecteur pour rayons X - Google Patents

Réflecteur pour rayons X Download PDF

Info

Publication number
EP1422725A3
EP1422725A3 EP03020837A EP03020837A EP1422725A3 EP 1422725 A3 EP1422725 A3 EP 1422725A3 EP 03020837 A EP03020837 A EP 03020837A EP 03020837 A EP03020837 A EP 03020837A EP 1422725 A3 EP1422725 A3 EP 1422725A3
Authority
EP
European Patent Office
Prior art keywords
reflector
cross
section
along
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP03020837A
Other languages
German (de)
English (en)
Other versions
EP1422725A2 (fr
EP1422725B1 (fr
Inventor
Carsten Michaelsen
Michael Dahms
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
InCoaTec GmbH
Original Assignee
InCoaTec GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by InCoaTec GmbH filed Critical InCoaTec GmbH
Publication of EP1422725A2 publication Critical patent/EP1422725A2/fr
Publication of EP1422725A3 publication Critical patent/EP1422725A3/fr
Application granted granted Critical
Publication of EP1422725B1 publication Critical patent/EP1422725B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Optical Elements Other Than Lenses (AREA)
EP03020837.5A 2002-11-20 2003-09-13 Réflecteur pour rayons X Expired - Lifetime EP1422725B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10254026 2002-11-20
DE10254026A DE10254026C5 (de) 2002-11-20 2002-11-20 Reflektor für Röntgenstrahlung

Publications (3)

Publication Number Publication Date
EP1422725A2 EP1422725A2 (fr) 2004-05-26
EP1422725A3 true EP1422725A3 (fr) 2009-04-29
EP1422725B1 EP1422725B1 (fr) 2014-11-05

Family

ID=32185854

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03020837.5A Expired - Lifetime EP1422725B1 (fr) 2002-11-20 2003-09-13 Réflecteur pour rayons X

Country Status (3)

Country Link
US (2) US20040096034A1 (fr)
EP (1) EP1422725B1 (fr)
DE (1) DE10254026C5 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6825978B2 (en) * 2002-04-04 2004-11-30 Hypervision, Inc. High sensitivity thermal radiation detection with an emission microscope with room temperature optics
EP1732087A3 (fr) * 2002-06-19 2007-03-28 Xenocs Ensemble optique et dispositif associé
CN101356589B (zh) * 2005-08-01 2013-02-27 纽约州立大学研究基金会 采用点聚焦、弯曲单色光学器件的x射线成像系统
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US7706503B2 (en) * 2007-11-20 2010-04-27 Rigaku Innovative Technologies, Inc. X-ray optic with varying focal points
DE102009047179B8 (de) * 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
JP6322172B2 (ja) * 2015-09-11 2018-05-09 株式会社リガク Ｘ線小角光学系装置
CN116914228B (zh) * 2023-09-13 2024-04-12 厦门海辰储能科技股份有限公司 电芯、电池和用电设备

Citations (6)

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Publication number Priority date Publication date Assignee Title
EP0339713A1 (fr) * 1988-04-20 1989-11-02 Koninklijke Philips Electronics N.V. Spectromètre à rayons X muni d'un cristal courbé dans deux directions
WO1999043009A1 (fr) * 1998-02-19 1999-08-26 Osmic, Inc. Ensemble optique de conditionnement d'un faisceau kirkpatrick-baez a angle simple
US6022114A (en) * 1998-05-01 2000-02-08 Nikon Corporation Anamorphic afocal beam shaping assembly
US20010028699A1 (en) * 2000-04-10 2001-10-11 Rigaku Corporation X-ray optical device and multilayer mirror for small angle scattering system
WO2002025258A1 (fr) * 2000-09-22 2002-03-28 X-Ray Optical Systems, Inc. Appareil de fluorescence x a reflexion totale et procede utilisant une optique a courbure double
WO2002103710A2 (fr) * 2001-06-19 2002-12-27 X-Ray Optical Systems, Inc. Systeme de spectrometre x dispersif en longueur d'onde avec optique de focalisation pour l'excitation et monochromateur pour la collecte

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Publication number Priority date Publication date Assignee Title
US4525853A (en) * 1983-10-17 1985-06-25 Energy Conversion Devices, Inc. Point source X-ray focusing device
NL8501181A (nl) * 1985-04-24 1986-11-17 Philips Nv Kristal voor een roentgenanalyse apparaat.
US4951304A (en) * 1989-07-12 1990-08-21 Adelphi Technology Inc. Focused X-ray source
DE4027285A1 (de) * 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
DE4407278A1 (de) * 1994-03-04 1995-09-07 Siemens Ag Röntgen-Analysegerät
US5646976A (en) 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
US5742658A (en) * 1996-05-23 1998-04-21 Advanced Micro Devices, Inc. Apparatus and method for determining the elemental compositions and relative locations of particles on the surface of a semiconductor wafer
US6014423A (en) * 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
JP3734366B2 (ja) * 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
US6285743B1 (en) * 1998-09-14 2001-09-04 Nikon Corporation Method and apparatus for soft X-ray generation
US6339634B1 (en) * 1998-10-01 2002-01-15 Nikon Corporation Soft x-ray light source device
US6014099A (en) * 1998-11-09 2000-01-11 The United States Of America As Represented By The Secretary Of The Army Isar method to analyze radar cross sections
US6389100B1 (en) * 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
DE19932275B4 (de) * 1999-07-06 2005-08-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Röntgenfluoreszenzanalyse
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
US6421417B1 (en) * 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
JP3741411B2 (ja) * 1999-10-01 2006-02-01 株式会社リガク Ｘ線集光装置及びｘ線装置
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6606371B2 (en) * 1999-12-20 2003-08-12 Agere Systems Inc. X-ray system
JP2002006096A (ja) * 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
US6625251B2 (en) * 2000-09-22 2003-09-23 Ntt Advanced Technology Corporation Laser plasma x-ray generation apparatus
JP3762665B2 (ja) * 2001-07-03 2006-04-05 株式会社リガク Ｘ線分析装置およびｘ線供給装置
EP1732087A3 (fr) * 2002-06-19 2007-03-28 Xenocs Ensemble optique et dispositif associé

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0339713A1 (fr) * 1988-04-20 1989-11-02 Koninklijke Philips Electronics N.V. Spectromètre à rayons X muni d'un cristal courbé dans deux directions
WO1999043009A1 (fr) * 1998-02-19 1999-08-26 Osmic, Inc. Ensemble optique de conditionnement d'un faisceau kirkpatrick-baez a angle simple
US6022114A (en) * 1998-05-01 2000-02-08 Nikon Corporation Anamorphic afocal beam shaping assembly
US20010028699A1 (en) * 2000-04-10 2001-10-11 Rigaku Corporation X-ray optical device and multilayer mirror for small angle scattering system
WO2002025258A1 (fr) * 2000-09-22 2002-03-28 X-Ray Optical Systems, Inc. Appareil de fluorescence x a reflexion totale et procede utilisant une optique a courbure double
WO2002103710A2 (fr) * 2001-06-19 2002-12-27 X-Ray Optical Systems, Inc. Systeme de spectrometre x dispersif en longueur d'onde avec optique de focalisation pour l'excitation et monochromateur pour la collecte

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
COHEN L M: "Optimum shape of a Kirkpatrick-Baez X-ray reflector supported at discrete points for on-axis performance", APPLIED OPTICS USA, vol. 20, no. 9, 1 May 1981 (1981-05-01), pages 1545 - 1549, XP002519451, ISSN: 0003-6935 *
SUZUKI Y ET AL: "X-Ray focusing with elliptical Kirkpatrick-Baez mirror system", JAPANESE JOURNAL OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO,JP, vol. 30, no. 5, 1 May 1991 (1991-05-01), pages 1127 - 1130, XP002436248, ISSN: 0021-4922 *

Also Published As

Publication number Publication date
US20060133569A1 (en) 2006-06-22
DE10254026B9 (de) 2007-04-19
US20040096034A1 (en) 2004-05-20
DE10254026C5 (de) 2009-01-29
EP1422725A2 (fr) 2004-05-26
EP1422725B1 (fr) 2014-11-05
DE10254026B4 (de) 2006-09-14
DE10254026A1 (de) 2004-06-17
US7242746B2 (en) 2007-07-10

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