JP6322172B2 - X線小角光学系装置 - Google Patents
X線小角光学系装置 Download PDFInfo
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- JP6322172B2 JP6322172B2 JP2015179651A JP2015179651A JP6322172B2 JP 6322172 B2 JP6322172 B2 JP 6322172B2 JP 2015179651 A JP2015179651 A JP 2015179651A JP 2015179651 A JP2015179651 A JP 2015179651A JP 6322172 B2 JP6322172 B2 JP 6322172B2
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- optical system
- multilayer mirror
- sample
- angle optical
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- 230000003287 optical effect Effects 0.000 title claims description 49
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000005259 measurement Methods 0.000 description 13
- 239000013078 crystal Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000004907 flux Effects 0.000 description 4
- 239000010949 copper Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000235 small-angle X-ray scattering Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/054—Investigating materials by wave or particle radiation by diffraction, scatter or reflection small angle scatter
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
Claims (5)
- 微小焦点を有する、X線源と、
楕円反射面を有し、前記X線源が出射するX線を集光して試料に照射する、多層膜ミラーと、
前記試料より発生する散乱X線を検出する、X線検出器と、
を備えるX線小角光学系装置であって、
前記多層膜ミラーの前記楕円反射面は、焦点A及び焦点Bを有し、
前記微小焦点が前記焦点Aを含むよう、前記X線源は配置され、
前記X線検出器は、前記焦点Bよりも前記多層膜ミラー側に配置される、
ことを特徴とする、X線小角光学系装置。 - 前記多層膜ミラーがモザイシティを有することにより、前記多層膜ミラーと前記焦点Bとの間に、擬似平行光領域が形成される、
ことを特徴とする、請求項1に記載のX線小角光学系装置。 - 前記擬似平行光領域にて前記試料を支持するとともに、X線の光軸方向に沿って前記擬似平行光領域の中で前記試料を移動させる、試料台を、
さらに備える、請求項2に記載のX線小角光学系装置。 - 前記擬似平行光領域は、X線ビームのビームサイズが、最小となる値となる位置を含み、該最小の値の1.2倍以下となる領域である、
ことを特徴とする、請求項2又は3に記載のX線小角光学系装置。 - 前記多層膜ミラーの楕円反射面の中心位置と前記焦点Bとの距離が1000mm以上である、
ことを特徴とする、請求項1乃至4のいずれかに記載のX線小角光学系装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015179651A JP6322172B2 (ja) | 2015-09-11 | 2015-09-11 | X線小角光学系装置 |
EP16001944.4A EP3141889B1 (en) | 2015-09-11 | 2016-09-06 | X-ray small angle optical system with multilayer mirror |
US15/259,581 US10429325B2 (en) | 2015-09-11 | 2016-09-08 | X-ray small angle optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015179651A JP6322172B2 (ja) | 2015-09-11 | 2015-09-11 | X線小角光学系装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017053803A JP2017053803A (ja) | 2017-03-16 |
JP2017053803A5 JP2017053803A5 (ja) | 2018-03-08 |
JP6322172B2 true JP6322172B2 (ja) | 2018-05-09 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015179651A Active JP6322172B2 (ja) | 2015-09-11 | 2015-09-11 | X線小角光学系装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US10429325B2 (ja) |
EP (1) | EP3141889B1 (ja) |
JP (1) | JP6322172B2 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
EP2778665B1 (en) * | 2013-03-15 | 2019-05-08 | Bruker AXS GmbH | X-ray analyzing system for x-ray scattering analysis |
US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
JP6501275B2 (ja) * | 2017-03-17 | 2019-04-17 | 株式会社大一商会 | 遊技機 |
JP6478421B2 (ja) * | 2017-03-21 | 2019-03-06 | 株式会社大一商会 | 遊技機 |
DE112019002822T5 (de) | 2018-06-04 | 2021-02-18 | Sigray, Inc. | Wellenlängendispersives röntgenspektrometer |
DE102018219751A1 (de) * | 2018-07-09 | 2020-01-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Probenuntersuchungsvorrichtung mittels röntgen-ultrakleinwinkelstreuung |
GB2591630B (en) | 2018-07-26 | 2023-05-24 | Sigray Inc | High brightness x-ray reflection source |
US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
WO2020051061A1 (en) | 2018-09-04 | 2020-03-12 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
WO2020051221A2 (en) | 2018-09-07 | 2020-03-12 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
WO2021162947A1 (en) | 2020-02-10 | 2021-08-19 | Sigray, Inc. | X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6069934A (en) * | 1998-04-07 | 2000-05-30 | Osmic, Inc. | X-ray diffractometer with adjustable image distance |
US6504902B2 (en) * | 2000-04-10 | 2003-01-07 | Rigaku Corporation | X-ray optical device and multilayer mirror for small angle scattering system |
DE10254026C5 (de) * | 2002-11-20 | 2009-01-29 | Incoatec Gmbh | Reflektor für Röntgenstrahlung |
US7072442B1 (en) * | 2002-11-20 | 2006-07-04 | Kla-Tencor Technologies Corporation | X-ray metrology using a transmissive x-ray optical element |
JP3697246B2 (ja) * | 2003-03-26 | 2005-09-21 | 株式会社リガク | X線回折装置 |
US7280634B2 (en) * | 2003-06-13 | 2007-10-09 | Osmic, Inc. | Beam conditioning system with sequential optic |
US7439492B1 (en) * | 2005-02-04 | 2008-10-21 | The United States Of America As Represented By The United States Department Of Energy | Nondispersive neutron focusing method beyond the critical angle of mirrors |
JP4861284B2 (ja) * | 2007-09-28 | 2012-01-25 | 株式会社リガク | X線回折装置およびx線回折方法 |
EP2075569B1 (en) * | 2007-12-31 | 2012-02-15 | Xenocs S.A. | X-ray beam device |
EP3121592A1 (en) * | 2009-07-01 | 2017-01-25 | Rigaku Corporation | X-ray apparatus, method of using the same and x-ray irradiation method |
JP2015078835A (ja) * | 2012-01-18 | 2015-04-23 | 株式会社リガク | X線回折装置 |
US9014335B2 (en) * | 2012-06-08 | 2015-04-21 | Rigaku Innovative Technologies, Inc. | Dual mode small angle scattering camera |
-
2015
- 2015-09-11 JP JP2015179651A patent/JP6322172B2/ja active Active
-
2016
- 2016-09-06 EP EP16001944.4A patent/EP3141889B1/en active Active
- 2016-09-08 US US15/259,581 patent/US10429325B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2017053803A (ja) | 2017-03-16 |
US20170074809A1 (en) | 2017-03-16 |
US10429325B2 (en) | 2019-10-01 |
EP3141889A1 (en) | 2017-03-15 |
EP3141889B1 (en) | 2022-03-16 |
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