EP1362646A1 - Appareil et méthode pour le nettoyage de support photorécepteur électrophotographique - Google Patents

Appareil et méthode pour le nettoyage de support photorécepteur électrophotographique Download PDF

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Publication number
EP1362646A1
EP1362646A1 EP03010497A EP03010497A EP1362646A1 EP 1362646 A1 EP1362646 A1 EP 1362646A1 EP 03010497 A EP03010497 A EP 03010497A EP 03010497 A EP03010497 A EP 03010497A EP 1362646 A1 EP1362646 A1 EP 1362646A1
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EP
European Patent Office
Prior art keywords
substrate
washing
rinsing
pure water
alkaline ionized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03010497A
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German (de)
English (en)
Inventor
Sakae c/o Ricoh Company Ltd. Suzuki
Tatusi c/o Ricoh Company Ltd. Umayahara
Yoshihiro c/o Ricoh Company Ltd. Yamaguchi
Kifuku c/o Ricoh Company Ltd. Takagi
Go c/o Ricoh Company Ltd. Egawa
Kenji c/o Ricoh Company Ltd. Hosokawa
Akihiro c/o Ricoh Company Ltd. Iiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
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Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Publication of EP1362646A1 publication Critical patent/EP1362646A1/fr
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/10—Bases for charge-receiving or other layers
    • G03G5/102—Bases for charge-receiving or other layers consisting of or comprising metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/048—Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Definitions

  • the present invention relates to a method and an apparatus for washing a substrate. Particularly, the present invention relates to a method and apparatus for washing a substrate of an electrophotographic photoreceptor before forming a photosensitive layer thereon.
  • a method for manufacturing a cylindrical substrate for an electrophotographic photoreceptor a method in which a substrate is prepared by ironing, cold drawing or the like, and a method in which a substrate which is obtained by ironing, cold drawing or the like is turned, are typically used.
  • a high viscosity oil used during the plastic forming process of the substrate which is obtained by the above-mentioned ironing or cold drawing method adheres on the substrate.
  • a turning oil used during the turning process adheres on the substrate.
  • An electrophotographic photoreceptor is manufactured by coating a coating liquid including a photosensitive material on an outer circumference of an electroconductive substrate, resulting in formation of a photosensitive layer on the outer circumference of the substrate.
  • the photosensitive layer is formed by dipping a substrate, on which oils, foreign materials or the like are adhered, in a coating liquid, the coating liquid is polluted with the oils, foreign materials or the like adhered on the substrate, resulting in deterioration of the coating liquid, and thereby a photosensitive layer having a desired characteristic cannot be formed.
  • coating defects such as uneven coating are formed due to the oils and foreign materials. Therefore, the substrate is necessary to be washed before the coating liquid including a photosensitive material is coated on the outer circumference thereof.
  • halogenated hydrocarbon solvents which have been used for washing a substrate are hardly used in order to prevent occurrence of environmental problems such as ozone depletion, warming of the earth, air pollution, and problems concerning human bodies.
  • an object of the present invention is to provide a method and an apparatus for washing a substrate of an electrophotographic photoreceptor, wherein oils adhered on a surface of a substrate is removed without damaging the substrate.
  • Another object of the present invention is to provide a washing liquid without a dangerous operation such as handling a strong alkali material.
  • the present invention contemplates the provision of a method for washing a substrate of an electrophotographic photoreceptor including degreasing the substrate with a washing liquid; then rinsing the substrate with pure water; and then drying the substrate, wherein the washing liquid is alkaline ionized water having a temperature of from 20 °C to 90 °C.
  • an external force is applied to the substrate in order to improve the washing effect of the alkaline ionized water.
  • the external force is applied using supersound and/or a brush.
  • the substrate is oscillated while the substrate is dipped in the alkaline ionized water.
  • a bubble having a diameter of from 5 mm to 100 mm is insufflated onto the substrate in the rinsing process.
  • the quantity of air used for generating bubbles is from 10 L/minute to 80 L/minute.
  • the substrate is dipped into pure water heated at a temperature of from 60 °C to 95 °C to be heated and then taken out of the pure water to dry water adhered to the surface of the substrate.
  • the pure water has a resistivity not less than 1M ⁇ ⁇ cm.
  • the drawing speed of the substrate in the drying process is from 3 to 20mm/second.
  • an apparatus for washing a substrate for an electrophotographic photoreceptor including:
  • FIG. 1 is a schematic diagram illustrating an example of the washing apparatus of the present invention.
  • Various lubricants used in the manufacturing processes of a substrate for an electrophotographic photoreceptor are strongly adhered onto the substrate to an extent such that the lubricating property of the lubricants does not deteriorate even when the lubricants are brought into contact with a cutter or a die, i.e. , such that the oil slick formed on the substrate is not easily removed.
  • the method of the present invention including degreasing the substrate with a washing liquid; then rinsing the substrate with pure water; and then drying the substrate, wherein the washing liquid is alkaline ionized water having a temperature of from 20 °C to 90 °C.
  • the lubricants adhered strongly on the substrate can be removed by using this method.
  • the washing method of the present invention includes the following processes.
  • a substrate 4 is transferred from a previous process by a slider 6, and dipped into a washing container 1 containing alkaline ionized water 9 by a lifter 7 to degrease the substrate 4.
  • the substrate 4 is drawn up by the lifter 7.
  • Numeral 14 denotes a substrate holder.
  • Numeral 5 denotes ultrasonic oscillators serving as an external force applier and configured to apply an ultrasound to the washing liquid 9.
  • the oils removed from the substrate and mixed with the alkaline ionized water 9 are separated from the alkaline ionized water by a separator 8.
  • the alkaline ionized water 9 is circulated between the reservoir container R 1 and the separator 8 through passages T 1 and T 1 '.
  • a pump P 1 and a filter F 1 are provided at a position of the passages T 1 .
  • the substrate 4 is transferred from the washing process to the rinsing process by the slider 6, and dipped into a rinsing container 2 containing pure water 12 by the lifter 7.
  • Pure water 12 in a reservoir container R 2 is poured into the rinsing container 2 containing pure water 12 to remove the alkaline ionized water adhered on the substrate 4.
  • Numeral 11 denotes bubbles which are generated for effectively rinsing the substrate 4 .
  • Numeral 10 denotes nozzles configured to blow airs to form the bubbles 11.
  • Numeral 15 denotes an air blower configured to blow air to generate the bubbles 11.
  • the pure water 12 is circulated between the rinsing container 2 and the reservoir container R 2 through passages T 2 and C 2 .
  • a pump P 2 and a filter F 2 are provided at a position of the passages T 2 .
  • the substrate 4 is transferred from the rinsing process to the drying process by the slider 6, and dipped into the warming container 3 containing warm pure water 13 by the lifter 7 to heat the substrate 4.
  • the heated substrate is drawn up from the warm pure water 13 and water adhered thereon is naturally dried because the substrate 4 is heated.
  • the warm pure water 13 is circulated between the warming container 3 and the reservoir container R 3 through passages T 3 and C 3 .
  • a pump P 3 and a filter F 3 are provided at a position of the passages T 3 .
  • Character H 3 denotes a heater configured to heat the pure water 13.
  • the temperature of the alkaline ionized water for use in the present invention is preferably from 20 °C to 90 °C, more preferably from 30 °C to 80 °C, and even more preferably from 40 °C to 60 °C.
  • Alkaline ionized water having too low temperature produces a low effect, to the contrary, alkaline ionized water having too high temperature does not function as the alkaline ionized water. It is possible to cleanly remove the oils adhered on a substrate for an electrophotographic photoreceptor when the temperature of the alkaline ionized water is properly controlled.
  • Alkaline ionized water is known as reduced water or super alkaline ionized water.
  • alkaline ionized water is prepared as follows. An electrolyte is dissolved at a low concentration in water contained in a container in which an anode chamber and a cathode chamber are formed by a diaphragm. When the water is electrolyzed, the water showing alkalinity contained in the cathode chamber is the alkaline ionized water.
  • electrolyte examples include salts of alkali metals such as sodium chloride, calcium chloride and salt of organic acid such as sodium lactate, calcium lactate, etc.
  • the alkaline ionized water has a pH greater than 7.
  • the pH thereof depends on the quantity of the electrolyte added and the quantity of electricity applied during the electrolysis.
  • Alkaline ionized water having a pH of from 8 to 11 is preferably used in the present invention.
  • water in the cathode chamber maybe used when the pH thereof falls in a range of from 8 to 11 during the electrolysis.
  • Alkaline ionized water can effectively remove organic foreign materials such as oils adhered on the surface of a substrate.
  • organic foreign materials such as oils adhered on the surface of a substrate.
  • inorganic foreign materials such as aluminum powders, sand powders, etc. adhered on the surface of the substrate can also be removed.
  • Alkaline ionized water having a pH less than 8 has poor washing ability.
  • a large sized facility is necessary when alkaline ionized water having a pH greater than 13 is used.
  • alkaline ionized water has an effect of removing oils, foreign materials and the like adhered on a surface of a cylindrical substrate.
  • the organic material can be removed by dipping a cylindrical substrate into alkaline ionized water.
  • good washing effect can be obtained by applying a physical force to the substrate, for example, by performing contact washing.
  • the method utilizing a physical force are a method in which a temperature of alkaline ionized water is increased, a method in which ultrasound is used when the substrate is dipped in alkaline ionized water, a method in which a gas is injected in alkaline ionized water for bubbling and a method in which a brush, a sponge and the like material are used for wiping the substrate.
  • the washing ability can be improved by oscillating the substrate in the vertical direction while an external force is applied thereto utilizing ultrasonic oscillators, bubbling, brushes, sponges or the like.
  • the substrate is preferably washed with a high frequency ultrasound oscillator having a frequency of from 100 kHz to 150 kHz, so that the surface of the substrate is not damaged.
  • the material of the substrate is aluminum
  • various aluminum compositions can be used.
  • aluminum alloys of A1000 group, aluminum alloys of A3000 group and aluminum alloys of A6000 group can apply thereto, and other aluminum alloys can apply without problems.
  • the strength of the applied ultrasound is preferably 20 percent lower than in the case when other alloys are ultrasonically washed.
  • the washing method of the present invention can also be applied to washing of a nickel seamless belt prepared by electroforming.
  • the strength of the ultrasound is preferably decreased.
  • the seamless belt materials are preferably washed using a high frequency ultrasonic oscillator oscillating an ultrasound having a frequency of from 100 kHz to 150 kHz.
  • Oscillation of the substrate is performed in order to avoid uneven washing of the ultrasonic irradiation, and length of the oscillation in the vertical direction is preferably not less than 50 mm.
  • At least two ultrasonic oscillators 5, which are illustrated in Figure, are arranged so as to be located in or in the vicinity of the washing container 1 containing alkaline ionized water while horizontally opposed to each other.
  • two ultrasonic oscillators are arranged such that one of the at least two ultrasonic oscillators is dislocated in the vertical direction.
  • the one of the two ultrasonic oscillators is dislocated at an angle of from 3° to 15°.
  • the density of the pile is preferably not less than 10 pieces/cm 2 .
  • the materials for use as the pile include nylon, polypropylene, rayon, polyester, polytetraphloroethylene type fluorocarbon resin, mixture thereof, animal hairs and the like.
  • the number of rotations of the brush is determined depending on the diameter and the rotating speed of the brush. When the rotating speed is too low, the ability of the brush to remove foreign materials is low.
  • the brush and the substrate should rotate in the same direction.
  • the brush and the substrate By rotating the brush and the substrate in the same direction, the brush and the substrate have different running directions at the contact region thereof, so that a good washing effect can be obtained.
  • the rotating speed of the brush and the substrate at the contact region is preferably not less than 5 m/minute.
  • the substrate or the brush is preferably oscillated in the axis direction of the substrate to avoid uneven washing.
  • the washing effect can be improved by using a combination of ultrasound with a brush.
  • the quantity of the surfactant can be decreased by combining the washing method using a known surfactant and the washing method using alkaline ionized water compared to a case in which a known surfactant or the like is used alone.
  • An object of the rinsing process is to remove the alkaline ionized water adhered on the substrate in the washing process performed in the washing container.
  • Water or pure water is suitably used as the rinsing liquid in the rinsing process.
  • ultrasonic rinsing with an ultrasonic oscillator and bubbling rinsing using bubbles are suitable.
  • the bubbling rinsing is advantageous, when the amount of capital investment is taken into consideration.
  • bubbles 11 When forming bubbles 11, having a diameter of from 5 mm to 100 mm are preferably used. Bubbles having a size of less than 5 mm and greater than 100 mm are inferior in rinsing ability.
  • the size of the bubbles 11 can be adjusted by changing the quantity of blown air (i.e., the air pressure). When the air pressure is greater than 0.1 Mpa, bubbles are united, resulting in formation of large bubbles having a size not less than 10 mm.
  • the air pressure is preferably not greater than 0.1 Mpa, and more preferably from 0.03 Mpa to 0.07 Mpa, in order to form bubbles having a size of from 3 mm to 5 mm.
  • the quantity of blown air used for generating the bubbles is from 10 L/minute to 80 L/minute, preferably from 20 L/minute to 60 L/minute, and more preferably from 40 L/minute to 50 L/minute.
  • the blown air When the blown air is less than 10 L/minute, the number of the generated bubbles is small. In contrast, when the blown air is greater than 80 L/minute, the volume of the blown air is so large that the rinsing ability deteriorates.
  • nozzles 10 It is preferable to use a circular or plate-form sintered ceramic or sintered plastic porous material as the nozzles 10.
  • Bubbles of uniform size are obtained when a sintered ceramic porous material or a sintered plastic porous material are used.
  • the average pore diameter of the porous material is preferably not greater than 100 ⁇ m, and more preferably from 30 ⁇ m to 60 ⁇ m.
  • the bubbles generated by the nozzles 10 rise along the surface and the inside of the substrate while removing the remaining washing liquid and foreign materials.
  • the rinsing effect is high when the diameter of the bubbles 11 is not greater than 10 mm.
  • the bubbles 11 preferably have a uniform size of not less than 3 mm and not greater than 5 mm.
  • the air for use in generating bubbles preferably has a clean level not lower than class 100, and more preferably not lower than class 10, in order not to mix foreign materials such as dust, oils and the like with pure water 12.
  • a circular sintered ceramic porous material or a circular sintered plastic porous material having a diameter greater than 50 mm is used as the nozzles 10
  • a large number of bubbles are formed in the center portion of the porous material but a small number of the bubbles are formed in the edge portions of the porous material, and thereby uniform size bubbles cannot be generated from the nozzles 10.
  • the diameter of the circular porous material is preferably not greater than 50 mm, and more preferably from 25 mm to 35 mm.
  • the size is preferably 50 mm square, and more preferably from 25 mm square to 35 mm square.
  • the bubbles 11 can be contacted with the surface and inside of all kinds of substrates to be washed without changing the nozzles when the kind of the substrates to be washed is changed.
  • the lifter 7 and the substrate holder 14 provided on the lifter 7 have an opening in order not to disturb the bubbles 11 coming from the lower portion of the rinsing container 2 to be contacted with a surface and inside of the substrate 4.
  • the substrate 4 is oscillated in the vertical direction by the lifter 7 to agitate pure water around the substrate 4, resulting in improvement of the rinsing effect.
  • the substrate 4 is dipped into warm pure water 13 in the warming container 3 to be heated up to the temperature of the pure water. Then the substrate is drawn up at a certain speed. Since the substrate 4 is heated, the pure water adhered on the circumferential surface of the substrate 4 can be easily evaporated and dried.
  • the temperature of the pure water 13 is preferably from 60 °C to 95 °C, more preferably from 70 °C to 80 °C, and even more preferably 75 °C ⁇ 3 °C, considering a drying speed and a change of a state of a surface of the substrate.
  • a hydroxide layer tends to be formed on the surface of the substrate 4. It is not preferable for the substrate 4 to have such a hydroxide layer because the layer affects the electric property of a photosensitive layer which is to be formed thereon.
  • the drawing speed of the substrate 4 from the warm pure water 13 is preferably from 3 to 20 mm/second.
  • the washing method of the present invention can also be applied for washing the substrates other than the above-mentioned aluminum-alloy-based substrate.
  • the washing method can also be applied to a washing a nickel seamless belt prepared by electroforming, and nickel sulfamate and the like compounds remaining thereon can be removed.
  • the washing method can be effectively used for washing a synthetic polymer substrate, and releasing agents remaining thereon can be effectively removed.
  • an object (substrate) to be washed is not limited as long as the object can fit into the washing, rinsing and warming containers.
  • An A3100 aluminum-alloy-based tube having an outer diameter of 100.7 mm, an inner diameter of 97.5 mm and a length of 360 mm was prepared by drawing processing.
  • the tube was turned with a turning machine using a polycrystalline diamond as a turning tool, so that the outer diameter becomes 100 mm. (Hereinafter, this tube is referred to as a substrate)
  • kerosene was used as a turning oil, and the substrate was turned with spraying kerosene to the turning portion. Therefore, a small quantity of kerosene was adhered on the surface of the substrate.
  • a contact washing was performed five times with a washing apparatus as illustrated in Figure using alkaline ionized water having a pH of 10.8 as a washing liquid.
  • the substrate was washed twice with tap water, rinsed with pure water three times, and then dried after dipped into the warm pure water.
  • the undercoat layer coating liquid was coated on the washed substrate by a dip coating method, and then dried at 140 ° C for 20 minutes. Thus, an undercoat layer having a thickness of 4.5 ⁇ m was formed.
  • the mixture was transferred to a container.
  • the mixture was diluted with methyl ethyl ketone, so as to have a solid content of 1.5 %.
  • a polyether-modified silicone oil having a viscosity of 120 cs hydrophilic silicone oil SH-3746 manufactured by Dow Corning Toray Silicone Co., Ltd. was added in an amount of 0.02 % based on the total weight of the liquid to prepare a charge generation layer coating liquid.
  • the charge generation layer coating liquid was coated on the substrate including the undercoat layer by a dip coating method, and then dried at 130 °C for 20 minutes. Thus, a generation layer having a thickness of 0.2 ⁇ m was formed.
  • the charge transport layer coating liquid was coated on the charge generation layer formed overlying the substrate by a dip coating method, and then dried at 130 °C for 20 minutes. Thus, a charge transport layer having a thickness of 20 ⁇ m was formed.
  • Example 1 The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that a brush on which a pile having a diameter of 0.1 mm, and a length of 20 mm is provided at a density of 30 pieces/cm 2 was used for rubbing the substrate in the washing process.
  • the resultant print images have good image qualities.
  • the washing time was the same as that in Example 1. As a result of the observation of the washing process, this method could remove stains faster than the method in Example 1.
  • Example 1 The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that an ultrasound of 100 kHz irradiated the substrate in the washing process.
  • the resultant print images have good image qualities.
  • the washing time was the same as that in Example 1. As a result of the observation of the washing process, this method could remove stains faster than the method in Example 1.
  • Example 1 The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that bubbles having a diameter of 120 mm were applied to the substrate by blowing air at a flow rate of 50 L/minute.
  • the resultant print images have good image qualities.
  • the washing time was the same as that in Example 1. As a result of the observation of the washing process, this method could remove stains faster than the method in Example 1.
  • Example 1 The procedure for preparation and evaluation of the photoreceptor in Example 1 was repeated except that bubbles having a diameter of 50 mm were applied to the substrate by blowing air at a flow rate of 50 L/minute.
  • the resultant print images have good image qualities.
  • Example 1 Next, the procedure for washing the substrate in Example 1 was repeated except that a washing liquid in which a surfactant "SUNWASH FM-950" manufactured by Lion Corp. was diluted with water so that the mixture has a pH of 10.8 was used in the washing process.
  • a washing liquid in which a surfactant "SUNWASH FM-950" manufactured by Lion Corp. was diluted with water so that the mixture has a pH of 10.8 was used in the washing process.
  • Example 2 Next, the procedure for preparation of the undercoat layer in Example 1 was repeated. Thus, an undercoat layer having a thickness of 4.5 ⁇ m was formed on the above-prepared substrate.
  • the undercoat layer formed on the substrate was observed with naked eyes, several circular coating defects in which the coating liquid were repelled were found.
  • Example 2 Next, the procedure for preparation of the charge generation layer in Example 1 was repeated. Thus, a charge generation layer having a thickness of 0.2 ⁇ m was formed.
  • the thus prepared charge generation layer was observed with naked eyes, several coating defects in which the amount of the charge generation layer coating liquid adhered on the circular coating defects on the undercoat layer was small (i.e., the coating defects of the undercoat layer repelled the charge generation layer coating liquid).
  • Example 2 Next, the procedure for preparation of the charge transport layer in Example 1 was repeated. Thus, a charge transport layer having a thickness of 20 ⁇ m was formed.
  • the thus prepared charge transport layer was observed with naked eyes, coating defects in which the coating liquid was repelled were found.
  • alkaline ionized water itself can remove oils adhered on a substrate, and, oils and the like materials can be effectively removed by using additionally an ultrasound and a brush to apply an external force to the substrate.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Photoreceptors In Electrophotography (AREA)
EP03010497A 2002-05-10 2003-05-09 Appareil et méthode pour le nettoyage de support photorécepteur électrophotographique Withdrawn EP1362646A1 (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2002136130 2002-05-10
JP2002136130 2002-05-10
JP2002262378 2002-09-09
JP2002262378 2002-09-09
JP2003031951 2003-02-10
JP2003031951 2003-02-10

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008108643A2 (fr) * 2007-03-07 2008-09-12 Asml Netherlands B.V. Élimination du dépôt sur un élément d'un appareil lithographique

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006030580A (ja) * 2004-07-15 2006-02-02 Fuji Denki Gazo Device Kk 電子写真感光体用アルミニウム円筒状基体の洗浄方法
JP2007058110A (ja) * 2005-08-26 2007-03-08 Fuji Electric Device Technology Co Ltd 電子写真感光体の製造方法および電子写真感光体
CN101531108B (zh) * 2009-04-20 2011-07-27 湖州市善琏含山湖笔厂 一种毛笔锋毫的脱脂处理方法

Citations (4)

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Publication number Priority date Publication date Assignee Title
US5520744A (en) * 1993-05-17 1996-05-28 Dainippon Screen Manufacturing Co., Ltd. Device for rinsing and drying substrate
US5817185A (en) * 1995-01-12 1998-10-06 Tokyo Electron Limited Method for washing substrates
JP2000225381A (ja) * 1999-02-05 2000-08-15 Ricoh Co Ltd 電子写真感光体用基体の洗浄方法及びその洗浄装置
DE10020103A1 (de) * 2000-04-22 2001-10-31 Contrade Mikrostruktur Technol Verfahren und Vorrichtung zum nasschemischen Entfernen von Schichten und zur Reinigung von scheibenförmigen Einzelsubstraten

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5520744A (en) * 1993-05-17 1996-05-28 Dainippon Screen Manufacturing Co., Ltd. Device for rinsing and drying substrate
US5817185A (en) * 1995-01-12 1998-10-06 Tokyo Electron Limited Method for washing substrates
JP2000225381A (ja) * 1999-02-05 2000-08-15 Ricoh Co Ltd 電子写真感光体用基体の洗浄方法及びその洗浄装置
DE10020103A1 (de) * 2000-04-22 2001-10-31 Contrade Mikrostruktur Technol Verfahren und Vorrichtung zum nasschemischen Entfernen von Schichten und zur Reinigung von scheibenförmigen Einzelsubstraten

Non-Patent Citations (1)

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Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 11 3 January 2001 (2001-01-03) *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008108643A2 (fr) * 2007-03-07 2008-09-12 Asml Netherlands B.V. Élimination du dépôt sur un élément d'un appareil lithographique
WO2008108643A3 (fr) * 2007-03-07 2008-11-27 Asml Netherlands Bv Élimination du dépôt sur un élément d'un appareil lithographique

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CN1456396A (zh) 2003-11-19
CN100441323C (zh) 2008-12-10

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